Method and system for context-aware overlay adjustment
By utilizing the image context region characteristics of the pattern during overlay measurement, the initial overlay is adjusted, thus solving the problem of inaccurate overlay measurement in the prior art and improving the accuracy and reliability of semiconductor manufacturing.
CN120898174APending Publication Date: 2025-11-04ASML NETHERLANDS BV
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Patent Information
- Application Number
- CN202480023763.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Priority Date
- 2023-04-06
- Filing Date
- 2024-03-07
- Publication Date
- 2025-11-04
AI Technical Summary
Technical Problem
In determining overlay in semiconductor manufacturing, conventional methods rely on explicit image information while neglecting the contextual region of the image, leading to inaccurate overlay measurements.
Method used
By extracting the image context region of the pattern, utilizing the characteristics of the context region to determine the overlay, and adjusting the initial overlay based on correlation, the inaccuracy of feature position is eliminated or minimized.
Benefits of technology
This improves the accuracy of overlay measurements, reduces errors in feature positions, and enhances the precision and reliability of the semiconductor manufacturing process.
✦ Generated by Eureka AI based on patent content.
Abstract
Systems and methods for determining overlay between features of a pattern are described herein. The method includes obtaining a representation of an image having a plurality of features. Contextual regions of the image that do not contain any target features defined in the corresponding design layout are determined, and overlay of the features is determined based on characteristics of the contextual regions. The overlay is compared to an initial overlay determined using another process based on a non-contextual region of the image. The initial overlay is then adjusted or "fine tuned" by adjusting parameters of other processes based on the comparison result.
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