Gas inlet blockage water-gas isolation protection assembly for semiconductor tail gas treatment

Abstract

The invention discloses a gas inlet blockage water-gas isolation protection assembly for semiconductor tail gas treatment. The top cover and the bottom cover are welded to the upper end and the lower end of the main cylinder respectively, the center cylinder is fixed to the top of the top cover, the bottom end of the center cylinder penetrates into the inner side of the main cylinder, and the flange connecting top base is fixed to the top end of the center cylinder and used for being fixedly connected with an air inlet pipe. The flange seat nitrogen purging structure is arranged on the flange connecting top seat; the side nitrogen purging structure and the bottom water spraying structure are arranged on the main barrel; double air curtains are formed through the flange base nitrogen purging structure and the side nitrogen purging structure, comprehensive water vapor isolation is achieved, dust generation and accumulation are fundamentally avoided, and compared with an existing scraper cleaning mode, the protection effect is more thorough; a bottom water spraying structure can be used for quickly cleaning possible dust at the joint of the air inlet pipe; moving parts such as a scraper do not need to be arranged, and the problems of part jamming, abrasion, untimely dust cleaning and the like do not exist.

Description

A semiconductor exhaust gas treatment inlet blockage water vapor isolation and protection component Technical Field

[0001] This invention belongs to the field of semiconductor exhaust gas treatment technology, specifically relating to an air inlet blockage water vapor isolation and protection component for semiconductor exhaust gas treatment. Background Technology

[0002] During semiconductor manufacturing, exhaust gases containing elements such as silicon, phosphorus, and boron are generated, including SiH4 (silane), DCS (dichlorosilane), TCS (trichlorosilane), and BCl3 (boron trichloride). These gases are highly reactive. When the air inlet of the exhaust gas treatment system comes into contact with the external environment, moisture from the environment enters the air inlet channel and reacts chemically with the aforementioned gases to generate solid dust particles. These dust particles gradually accumulate on the inner wall of the air inlet, pipe interfaces, and other locations. Over time, this accumulation can lead to narrowing or even blockage of the air inlet channel, affecting the normal operation of the exhaust gas treatment system, reducing treatment efficiency, and potentially causing equipment failure and increasing maintenance costs.

[0003] In existing technologies, the main solution to this problem is to install cleaning components such as scrapers at the air inlet, and to remove dust by manually or automatically driving the scrapers periodically. However, the scrapers are prone to jamming and wear during long-term use, resulting in untimely dust removal. On the other hand, the contact between the scraper and the inner wall of the pipe will cause wear, which may affect the pipe's sealing performance. Moreover, the additional moving parts increase the complexity of the equipment and the risk of failure, and cannot fundamentally solve the problem of dust generation. Therefore, this invention proposes an air inlet blockage water vapor isolation and protection component for semiconductor exhaust gas treatment. Summary of the Invention

[0004] The purpose of this invention is to provide a water vapor isolation and protection component for the air inlet of a semiconductor exhaust gas treatment device, so as to solve the problems mentioned in the background art.

[0005] To achieve the above objectives, the present invention provides the following technical solution: a water vapor isolation and protection assembly for inlet blockage in semiconductor exhaust gas treatment, comprising a main cylinder, a top cover and a bottom cover respectively welded to the upper and lower ends of the main cylinder, a central cylinder fixed to the top of the top cover and extending through to the inner side of the main cylinder, a flange connecting top seat fixed to the top of the central cylinder for connection and fixation with the inlet pipe, a central partition plate fixed between the central cylinder and the main cylinder, and a bottom partition cylinder fixed to the bottom surface of the central partition plate, wherein there is a gap between the bottom partition cylinder and the bottom cover for spraying water to pass through. The central cylinder is coaxially sleeved on the outer side of the bottom end of the air inlet pipe, and an annular isolation cavity is formed between the central cylinder and the air inlet pipe; a flange seat nitrogen purging structure is provided on the flange connection top seat; a side nitrogen purging structure and a bottom water spray structure are provided on the main cylinder body, the bottom water spray structure is located at the bottom of the side nitrogen purging structure, and the air outlet direction of the flange seat nitrogen purging structure and the side nitrogen purging structure are both towards the annular isolation cavity, and the spray direction of the bottom water spray structure is towards the interface between the bottom end of the air inlet pipe and the external pipeline.

[0006] Preferably, the flange seat nitrogen purging structure includes two flange air inlets opened on the surface of the flange connection top seat and communicating with the annular isolation cavity, and also includes a flange seat nitrogen purging pipe fixed to the outer wall of the flange connection top seat and communicating with the flange air inlets.

[0007] Preferably, the diameter of the flange air inlet is 2-5mm, and a flow regulating valve and a pressure sensor are connected in series on the nitrogen purge pipe of the flange seat.

[0008] Preferably, the side nitrogen purging structure includes a side nitrogen purging seat fixed to the outer surface of the main cylinder and extending into the inner side of the main cylinder, a nitrogen delivery pipe connected to the outer end of the side nitrogen purging seat, and a plurality of purging holes extending through the surface of the central partition.

[0009] Preferably, the nitrogen delivery pipe and the flange seat nitrogen purging pipe are connected in parallel to the same nitrogen source, and the nitrogen delivery pipe is equipped with an independent flow control valve.

[0010] Preferably, the bottom water spray structure includes a bottom water spray seat fixed to the outer wall of the main cylinder and extending to the inner side of the main cylinder, and a water delivery pipe connected to the outer end of the bottom water spray seat. The inner wall of the bottom cover is provided with a conical guide surface.

[0011] Preferably, the bottom height of the air inlet pipe is lower than the bottom height of the central cylinder, the bottom height of the bottom partition cylinder is lower than the bottom height of the air inlet pipe, and the main cylinder, top cover, bottom cover, central cylinder, central partition, bottom partition cylinder and flange connection top seat are made of PVC or stainless steel.

[0012] Preferably, it also includes a filter structure disposed between the side nitrogen purging seat and the nitrogen delivery pipe. The filter structure includes an annular mounting groove formed on the end face of the nitrogen delivery pipe, an annular filter seat installed in the annular mounting groove, and a metal filter fixed to the inner wall of the annular filter seat.

[0013] Preferably, the filter structure further includes an annular inner wall groove formed on the inner wall of the annular mounting groove, an annular rubber seat embedded in the annular inner wall groove, a plurality of integrated T-shaped clips provided on the side of the annular rubber seat, and a plurality of T-shaped clip holes formed on the surface of the annular filter seat corresponding to the T-shaped clips, wherein the ends of the T-shaped clips are clipped into the T-shaped clip holes.

[0014] Compared with the prior art, the beneficial effects of the present invention are as follows: The present invention forms a double air curtain through the flange seat nitrogen purging structure and the side nitrogen purging structure, achieving comprehensive water vapor isolation, blocking the contact conditions between easily reactive gases and water vapor, fundamentally avoiding the generation and accumulation of dust, and providing a more thorough protective effect compared with the existing scraper cleaning method; the bottom water spray structure can quickly clean any dust that may be present at the air inlet pipe interface; there is no need to set up moving parts such as scrapers, eliminating problems such as component jamming, wear and tear, and untimely dust cleaning, thus reducing the risk of equipment failure. Attached Figure Description

[0015] Figure 1 is a structural schematic diagram of the present invention; Figure 2 is a perspective sectional view of the present invention; Figure 3 is a cross-sectional view of the present invention; Figure 4 is a sectional view of the connection between the flange connection top seat and the flange seat nitrogen purging pipe of the present invention; Figure 5 is a sectional view of the connection between the side nitrogen purging seat and the nitrogen delivery pipe of the present invention; Figure 6 is a partial enlarged view of area A in Figure 5 of the present invention; In the figures: 1, main cylinder; 2, top cover; 3, bottom cover; 31, conical guide surface; 4, central cylinder; 5, central partition plate; 51, blowing... 6. Sweeping hole; 7. Bottom partition cylinder; 8. Side nitrogen purging seat; 9. Bottom water spray seat; 10. Flange connection top seat; 11. Flange air inlet; 12. Flange seat nitrogen purging pipe; 13. Nitrogen delivery pipe; 14. Water delivery pipe; 15. Air inlet pipe; 16. Filter screen structure; 17. Annular mounting groove; 18. Annular filter screen seat; 19. Metal filter screen; 10. Annular inner wall groove; 11. Annular rubber seat; 12. T-shaped clamp; 13. T-shaped clamp hole. Detailed Implementation

[0016] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0017] Example 1 (Refer to Figures 1 to 4) is the first embodiment of the present invention, which provides the following technical solution: A water vapor isolation and protection component for inlet blockage in semiconductor exhaust gas treatment, comprising a main cylinder 1, a top cover 2 and a bottom cover 3 respectively welded to the upper and lower ends of the main cylinder 1, a central cylinder 4 fixed to the top of the top cover 2 and extending to the inner side of the main cylinder 1 at its bottom end, a flange connecting top seat 9 fixed to the top of the central cylinder 4 for connection and fixation with the inlet pipe 13, a central partition 5 fixed between the central cylinder 4 and the main cylinder 1, and a bottom partition 6 fixed to the bottom surface of the central partition 5, wherein there is a gap between the bottom partition 6 and the bottom cover 3 for spraying water to pass through, the central cylinder 4 is coaxially sleeved on the outer side of the bottom end of the inlet pipe 13, and an annular isolation cavity is formed between the central cylinder 4 and the inlet pipe 13, wherein the air inlet... The inlet pipe 13 is used to transport semiconductor exhaust gas. This protective component is equivalent to being fitted onto the outside of the inlet pipe 13. The annular isolation cavity is used to isolate water vapor from the external environment from entering the area surrounding the inlet pipe 13. The inner wall of the annular isolation cavity is coated with a fluorocarbon coating, which has excellent anti-corrosion and anti-adhesion properties, improving service life. The flange seat nitrogen purging structure set on the flange connection top seat 9 is the first line of defense for water vapor isolation. The side nitrogen purging structure and the bottom water spray structure set on the main cylinder 1 are located at the bottom of the side nitrogen purging structure. The outlet direction of the flange seat nitrogen purging structure and the side nitrogen purging structure is towards the annular isolation cavity. The spray direction of the bottom water spray structure is towards the interface between the bottom end of the inlet pipe 13 and the external pipeline.

[0018] In this embodiment, preferably, the flange seat nitrogen purging structure includes two flange air inlets 91 opened on the surface of the flange connecting top seat 9 and communicating with the annular isolation cavity, and also includes a flange seat nitrogen purging pipe 10 fixed to the outer wall of the flange connecting top seat 9 and communicating with the flange air inlets 91. Subsequently, the flange seat nitrogen purging pipe 10 can deliver nitrogen to the annular isolation cavity through the flange air inlets 91 to purge, forming a downward air curtain, which can both prevent water vapor in the upper environment from penetrating downward and blow down any dust that may float on the upper part of the annular isolation cavity, facilitating subsequent cleaning.

[0019] In this embodiment, preferably, the diameter of the flange air inlet 91 is 2mm, and a flow regulating valve and a pressure sensor are connected in series on the flange seat nitrogen purge pipe 10, which can accurately control the nitrogen delivery flow rate and pressure.

[0020] In this embodiment, preferably, the side nitrogen purging structure includes a side nitrogen purging seat 7 fixed to the outer surface of the main cylinder 1 and extending to the inner side of the main cylinder 1, a nitrogen delivery pipe 11 connected to the outer end of the side nitrogen purging seat 7, and multiple purging holes 51 penetrating the surface of the central partition 5, serving as a second water vapor isolation barrier. Subsequently, the nitrogen delivery pipe 11 can deliver nitrogen to the area above the central partition 5 on the inner side of the main cylinder 1 through the side nitrogen purging seat 7, and the nitrogen can be purged through the multiple purging holes 51 to the inner side of the bottom partition 6 below the central partition 5, forming a surrounding air curtain around the bottom end of the air inlet pipe 13, further blocking water vapor from entering from the side.

[0021] In this embodiment, preferably, the nitrogen delivery pipe 11 and the flange seat nitrogen purging pipe 10 are connected in parallel to the same nitrogen source to achieve synchronous gas supply. The nitrogen delivery pipe 11 is equipped with an independent flow control valve, which can adjust the side nitrogen purging flow rate according to actual usage requirements, and form a coordinated cooperation with the flange seat nitrogen purging structure.

[0022] In this embodiment, preferably, the bottom water spray structure includes a bottom water spray seat 8 fixed to the outer wall of the main cylinder 1 and extending to the inner side of the main cylinder 1, and a water delivery pipe 12 connected to the outer end of the bottom water spray seat 8. The inner wall of the bottom cover 3 is provided with a conical guide surface 31 for rinsing and cleaning the dust that may remain at the bottom end interface of the air inlet pipe 13 and the bottom of the annular isolation cavity. Subsequently, the water delivery pipe 12 can deliver spray water to the area below the central partition 5 inside the main cylinder 1 through the bottom water spray seat 8, and spray it into the inner area of ​​the bottom partition 6 through the gap between the bottom partition 6 and the bottom cover 3. The spray range covers the bottom end interface face of the air inlet pipe 13 and the bottom area of ​​the annular isolation cavity, ensuring that there are no dead corners in the rinsing.

[0023] In this embodiment, preferably, the bottom height of the air inlet pipe 13 is lower than the bottom height of the central cylinder 4, and the bottom height of the bottom partition cylinder 6 is lower than the bottom height of the air inlet pipe 13. The main cylinder 1, top cover 2, bottom cover 3, central cylinder 4, central partition 5, bottom partition cylinder 6, and flange connection top seat 9 are made of PVC or stainless steel to adapt to different usage scenarios and cost requirements. When PVC is used, the nitrogen delivery pipe 11 and the flange seat nitrogen purging pipe 10 deliver room temperature nitrogen. When stainless steel is used, the nitrogen delivery pipe 11 and the flange seat nitrogen purging pipe 10 deliver hot nitrogen at a temperature of 40-60℃.

[0024] Example 2, as shown in Figures 1 to 6, is the second embodiment of the present invention. This embodiment is based on the previous embodiment, but with the difference that it also includes a filter structure 14 disposed between the side nitrogen purging seat 7 and the nitrogen delivery pipe 11. The filter structure 14 includes an annular mounting groove 141 formed on the end face of the nitrogen delivery pipe 11, an annular filter seat 142 installed in the annular mounting groove 141, and a metal filter 143 fixed to the inner wall of the annular filter seat 142, which can filter the nitrogen delivered from the nitrogen delivery pipe 11.

[0025] In this embodiment, preferably, the filter structure 14 further includes an annular inner wall groove 144 formed on the inner wall of the annular mounting groove 141, an annular rubber seat 145 embedded in the annular inner wall groove 144, a plurality of integral T-shaped clips 146 provided on the side of the annular rubber seat 145, and a plurality of T-shaped holes 147 formed on the surface of the annular filter seat 142 corresponding to the T-shaped clips 146, wherein the ends of the T-shaped clips 146 are engaged in the T-shaped holes 147, wherein both the T-shaped clips 146 and the annular rubber seat 145 are made of fluororubber. Made of a material that undergoes elastic deformation when compressed, the annular filter holder 142 is stably installed in the annular mounting groove 141. If the annular filter holder 142 and the metal filter 143 need to be removed for cleaning or replacement, simply separate the nitrogen delivery pipe 11 and the side nitrogen purging seat 7, then forcefully pry the annular filter holder 142 out of the annular mounting groove 141, causing the T-shaped clip 146 to undergo elastic deformation under compression, thus easily removing the annular filter holder 142 and the metal filter 143 for cleaning or replacement.

[0026] Although embodiments of the invention have been shown and described (see the detailed description above), it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A water vapor isolation and protection component for inlet blockage in semiconductor exhaust gas treatment, characterized in that: The system includes a main cylinder (1), a top cover (2) and a bottom cover (3) welded to the upper and lower ends of the main cylinder (1) respectively, a central cylinder (4) fixed to the top of the top cover (2) and extending to the inside of the main cylinder (1) at its bottom end, a flange connecting top seat (9) fixed to the top of the central cylinder (4) for connection and fixation with the air inlet pipe (13), a central partition plate (5) fixed between the central cylinder (4) and the main cylinder (1), and a bottom partition cylinder (6) fixed to the bottom surface of the central partition plate (5), with a gap between the bottom partition cylinder (6) and the bottom cover (3) for spray water to pass through. The central cylinder (4) A coaxial sleeve is installed on the outer side of the bottom end of the air inlet pipe (13), and an annular isolation cavity is formed between the central cylinder (4) and the air inlet pipe (13); a flange seat nitrogen purging structure is installed on the flange connection top seat (9); a side nitrogen purging structure and a bottom water spraying structure are installed on the main cylinder (1), the bottom water spraying structure is located at the bottom of the side nitrogen purging structure, and the air outlet direction of the flange seat nitrogen purging structure and the side nitrogen purging structure are both towards the annular isolation cavity, and the spraying direction of the bottom water spraying structure is towards the interface between the bottom end of the air inlet pipe (13) and the external pipeline.

2. The inlet blockage water vapor isolation and protection component for semiconductor exhaust gas treatment according to claim 1, characterized in that: The flange seat nitrogen purging structure includes two flange inlet holes (91) opened on the surface of the flange connection top seat (9) and communicating with the annular isolation cavity, and also includes a flange seat nitrogen purging pipe (10) fixed on the outer wall of the flange connection top seat (9) and communicating with the flange inlet holes (91).

3. The inlet blockage water vapor isolation and protection component for semiconductor exhaust gas treatment according to claim 2, characterized in that: The flange air inlet (91) has a diameter of 2-5 mm, and a flow regulating valve and a pressure sensor are connected in series on the flange seat nitrogen purge pipe (10).

4. A semiconductor exhaust gas treatment inlet blockage water vapor isolation and protection component according to claim 3, characterized in that: The side nitrogen purging structure includes a side nitrogen purging seat (7) fixed on the outer surface of the main cylinder (1) and with its inner end extending to the inner side of the main cylinder (1), a nitrogen delivery pipe (11) connected to the outer end of the side nitrogen purging seat (7), and multiple purging holes (51) that are opened through the surface of the central partition (5).

5. A semiconductor exhaust gas treatment inlet blockage water vapor isolation and protection component according to claim 4, characterized in that: The nitrogen delivery pipe (11) and the flange seat nitrogen purging pipe (10) are connected in parallel to the same nitrogen source, and the nitrogen delivery pipe (11) is equipped with an independent flow control valve.

6. The inlet blockage water vapor isolation and protection component for semiconductor exhaust gas treatment according to claim 1, characterized in that: The bottom water spray structure includes a bottom water spray seat (8) fixed to the outer wall of the main cylinder (1) and the inner end of which extends to the inner side of the main cylinder (1), and a water delivery pipe (12) connected to the outer end of the bottom water spray seat (8). The inner wall of the bottom cover (3) is provided with a conical guide surface (31).

7. A water vapor isolation and protection assembly for inlet blockage in semiconductor exhaust gas treatment according to claim 1, characterized in that: The bottom height of the air inlet pipe (13) is lower than the bottom height of the center cylinder (4), and the bottom height of the bottom partition cylinder (6) is lower than the bottom height of the air inlet pipe (13). The main cylinder (1), top cover (2), bottom cover (3), center cylinder (4), center partition (5), bottom partition cylinder (6) and flange connection top seat (9) are made of PVC or stainless steel.

8. A water vapor isolation and protection component for inlet blockage in semiconductor exhaust gas treatment according to claim 1, characterized in that: It also includes a filter structure (14) disposed between the side nitrogen purging seat (7) and the nitrogen delivery pipe (11). The filter structure (14) includes an annular mounting groove (141) opened on the end face of the nitrogen delivery pipe (11), an annular filter seat (142) installed in the annular mounting groove (141), and a metal filter (143) fixed on the inner wall of the annular filter seat (142).

9. A water vapor isolation and protection assembly for inlet blockage in semiconductor exhaust gas treatment according to claim 8, characterized in that: The filter structure (14) further includes an annular inner wall groove (144) opened on the inner wall of the annular mounting groove (141), an annular rubber seat (145) embedded in the annular inner wall groove (144), a plurality of integrated T-shaped clips (146) provided on the side of the annular rubber seat (145), and a plurality of T-shaped holes (147) corresponding to the T-shaped clips (146) opened on the surface of the annular filter seat (142), wherein the end of the T-shaped clip (146) is locked in the T-shaped hole (147).

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