Differential regulated dual chamber feed device for platinum channel and control method

Abstract

The application belongs to the technical field of liquid crystal display substrate glass and special glass manufacturing, and relates to a differential voltage-stabilized double-chamber feeding device for a platinum channel and a control method. The device comprises a buffer chamber and a current stabilizing chamber which are coaxially and serially arranged, and a flow-limiting channel is arranged between the buffer chamber and the current stabilizing chamber. The flow-limiting channel is a damping flow channel. An air vent pipeline is arranged on the top of the buffer chamber and is connected with the atmosphere. The current stabilizing chamber is a closed cavity, and a pressure fine adjustment interface is arranged on the top of the current stabilizing chamber. An inflow pipe is connected to the feeding end of the buffer chamber, and a feeding pipe is connected to the discharging end of the current stabilizing chamber. The current stabilizing chamber is provided with a pressure monitoring device, the feeding pipe is provided with a flow detection device, and the pressure monitoring device, the flow detection device and the pressure fine adjustment interface are all connected with a control unit. The application realizes ultra-high stability of flow, maintains the calmness of the liquid level of the buffer chamber, protects the balance state of the surface hetero-layer and prevents the generation of bright line defects.

Description

Technical Field

[0001] This invention belongs to the field of liquid crystal display substrate glass and special glass manufacturing technology, and relates to a differential voltage-regulated dual-chamber feeding device and control method for platinum channels. Background Technology

[0002] The platinum channel is an indispensable core thermal equipment in modern high-end substrate glass production lines, hailed as the "heart" and "throat" of the entire manufacturing process. After receiving the high-temperature molten glass from the furnace, it undergoes a series of precise heat treatment processes, including clarification, homogenization, and cooling, ultimately delivering a high-quality molten glass with uniform composition, no bubbles, no streaks, and extremely uniform temperature to the forming equipment. The feeding section, as the final exit point of the platinum channel, directly determines the starting quality of the forming process and is a key node in controlling the final thickness difference, stress distribution, and macroscopic defect level of the product. With the rapid development of the display industry towards higher generation lines, ultra-high-definition resolution, and flexible displays, the market has placed higher demands on the size, optical performance, and mass production economics of substrate glass, resulting in a continuous increase in the throughput of platinum channels. However, this dramatic increase in flow rate has brought unprecedented challenges to the stability of the final feeding process. According to the basic principles of fluid mechanics, the kinetic energy of a fluid is proportional to the square of its flow rate. This means that under high-throughput conditions, any tiny temperature unevenness or pressure pulsation from upstream will be amplified dramatically, transformed into strong fluid momentum fluctuations, and eventually erupt at the "outlet" of the feeding section.

[0003] like Figure 2As shown, the traditional single-chamber feeding tank structure maintains a constant liquid level through an opening connected to the atmosphere, achieving basic flow stability through the principle of static pressure difference. However, under ultra-high flow rate impact, the inherent drawbacks of this structure are exposed. Firstly, the large flow rate of fluid rushing into the limited volume chamber at high speed creates complex eddies and backflows inside, causing continuous and violent sloshing of the free liquid surface (i.e., the liquid surface in contact with the atmosphere) (i.e., the Seiche effect). This instability of the liquid level directly leads to periodic fluctuations in the static pressure driving the fluid outflow, making it difficult to control the outlet flow rate, ultimately resulting in unacceptable thickness deviations (thickness differences) on the formed glass plate. Secondly, because the surface of the molten glass at the top of the feeding tank is exposed to the air atmosphere for a long time, certain components undergo selective volatilization and re-reaction with the atmosphere, resulting in the formation of a heterogeneous surface layer that differs significantly from the main molten glass in viscosity, surface tension, and chemical composition. On a calm liquid surface, this heterogeneous glass layer can accumulate relatively stably. However, the violent surface sloshing caused by high flow rates can tear, entrain, and carry this heterogeneous glass layer into the main liquid flow heading towards the outlet. During subsequent forming, these entrained heterogeneous glass molecules, due to their different physical properties, will form permanent streaks with a different refractive index than the main glass. These are visible defects, such as bright lines or wavy lines, on the finished glass sheet. Such defects are fatal to optical-grade glass, directly rendering the entire sheet unusable. While existing technologies have made numerous improvements to the single-chamber structure, such as optimizing its shape curves or adding internal baffles, these are all repairs within the framework of "solving all problems within one container," failing to fundamentally reconcile the inherently contradictory goals of "maintaining a stable atmospheric pressure baseline" and "suppressing liquid surface fluctuations," and "removing surface heterogeneity" and "providing a stable outlet flow rate." Summary of the Invention

[0004] The purpose of this invention is to solve the technical problem that the existing feeding trough structure cannot meet the glass quality requirements under ultra-high flow conditions, and to provide a differential voltage-stabilized dual-chamber feeding device and control method for platinum channels.

[0005] To achieve the above objectives, the present invention employs the following technical solution: In a first aspect, the present invention discloses a differential voltage-stabilized dual-chamber feeding device for platinum channels, comprising a buffer chamber and a flow-stabilizing chamber arranged coaxially in series, wherein the buffer chamber and the flow-stabilizing chamber are connected by a flow-limiting channel; the flow-limiting channel is a damped flow channel; the top of the buffer chamber is provided with a vent pipe communicating with the atmosphere; the flow-stabilizing chamber is a sealed cavity with a pressure fine-tuning interface at its top; the inlet end of the buffer chamber is connected to an inflow pipe, and the outlet end of the flow-stabilizing chamber is connected to a feeding pipe; the flow-stabilizing chamber is provided with a pressure monitoring device, and the feeding pipe is provided with a flow detection device; the pressure monitoring device, the flow detection device, and the pressure fine-tuning interface are all connected to a control unit.

[0006] Further improvements are made in the following aspects: The cross-sectional area of ​​the buffer chamber is larger than that of the inflow pipe, and the cross-sectional area of ​​the buffer chamber is more than 10 times that of the inflow pipe; the venting pipe is a top thin pipe, which is connected to the top of the buffer chamber, so that the liquid pressure inside the buffer chamber is always equal to the atmospheric pressure.

[0007] The flow resistance R of the flow-limiting channel is based on the glass melt viscosity μ, the channel length L, and the channel radius r, and is expressed by the Hagen-Poiseuille equation R = (8μL) / (πr). 4 ) Calculated; Alternatively, the flow resistance R of the flow-limiting channel can be based on the glass melt viscosity μ, the channel length L, and the channel diameter d, and can be determined by the Hagen-Poiseuille law: R = (128 μL) / (πd). 4 ) was calculated.

[0008] The pressure fine-tuning interface includes a precision pressure control device, which is a pressure fine-tuning device and a precision inert gas pressure control system.

[0009] The precision inert gas pressure control system includes a gas source and a flow regulation component. The gas source is a high-purity nitrogen or argon gas source, and the flow regulation component is a proportional valve or a servo valve.

[0010] The pressure monitoring device is a pressure sensor, and the detection end of the pressure sensor extends into the flow stabilization chamber to monitor the pressure inside the flow stabilization chamber in real time.

[0011] The pressure sensor is a high-resolution, temperature-resistant pressure sensor with a resolution greater than 10 Pa.

[0012] The flow stabilizing cavity is provided with a heating component and a heat insulation component on its exterior. The heating component is a heater, and the heat insulation component is a heat insulation layer. The heating component and the heat insulation component are wrapped around the outside of the flow stabilizing cavity.

[0013] The buffer chamber, flow stabilizing chamber, flow limiting channel, inflow pipe and feed pipe are all made of platinum and are welded together to ensure airtightness and structural strength at high temperatures.

[0014] Secondly, this invention discloses a differential voltage-regulated dual-chamber feeding control method for a platinum channel based on the above-mentioned device, comprising: The high-temperature molten glass flows into the buffer chamber through the inlet pipe, and the buffer chamber maintains pressure balance with atmospheric pressure through the top vent pipe; The buffer chamber relies on the atmospheric pressure environment and large volume characteristics to initially absorb and filter the flow and pressure fluctuations of the molten glass from upstream. The initially stabilized molten glass flows into the sealed flow stabilizing chamber through the flow-limiting channel of the damping flow channel structure; The pressure in the flow stabilizing chamber is monitored in real time by a pressure monitoring device, and the glass melt outlet flow rate of the feed pipe is monitored in real time by the weight of the plate per hour. The monitored values ​​of pressure and outlet flow rate are transmitted to the control unit. The control unit compares the monitored value of the outlet flow with the target set value of the flow, and outputs a control command to the pressure fine-tuning interface through the PID control algorithm to drive the pressure fine-tuning interface to dynamically adjust the pressure in the flow stabilizing chamber: if the outlet flow is too low, the pressure is reduced to increase the driving pressure difference between the buffer chamber and the flow stabilizing chamber; if the outlet flow is too high, the pressure is increased to reduce the driving pressure difference. By continuously executing the above closed-loop control process, external disturbances during the glass melt transportation process are compensated in real time, so that the glass melt outlet flow rate of the supply pipe is stabilized within the fluctuation range of the target flow rate setting value.

[0015] Compared with the prior art, the present invention has the following beneficial effects: This invention discloses a differential pressure-stabilized dual-chamber feeding device for platinum channels. By forming a functionally differentiated dual-chamber structure through a buffer chamber and a flow-stabilizing chamber connected in series on the upper and lower coaxial lines, and in conjunction with a flow-limiting channel of a damping flow channel structure, the synergistic effect of buffering and stabilizing flow and precise flow control is achieved. This effectively solves the industry pain points of liquid level fluctuation, unstable flow and heterogeneous layer entrainment during the feeding process of high-flow platinum channels, and significantly improves the overall feeding performance. The buffer chamber, connected to the atmosphere via a top vent pipe, maintains its internal pressure consistent with atmospheric pressure, providing a stable static pressure reference for the system. Its large volume effectively absorbs flow and pressure fluctuations in the upstream molten glass, significantly reducing its flow velocity and preventing violent surface sloshing. This ensures the heterogeneous layer on the molten glass surface remains in a stable equilibrium, preventing it from being drawn into the main flow and eliminating fatal defects such as visible lines and ripples in the finished glass. The flow-limiting channel of the damping flow channel structure decouples the pressure between the buffer chamber and the flow stabilizing chamber, effectively attenuating the direct transmission of minor fluctuations in the buffer chamber's liquid level to the flow stabilizing chamber's pressure. This significantly reduces the impact of upstream disturbances on the flow control loop, making the pressure control of the flow stabilizing chamber more independent and stable. The closed-loop flow control system, consisting of a sealed flow stabilizing chamber, a pressure monitoring device, a flow detection device, a control unit, and a pressure fine-tuning interface, can collect real-time data on the internal pressure of the flow stabilizing chamber and the outlet flow of the feed pipe through the pressure monitoring device and the flow detection device. The control unit enables real-time comparison of the data and precise output of control commands. Then, the pressure inside the flow stabilizing chamber is dynamically adjusted through the pressure fine-tuning interface, achieving linear and direct control of the driving pressure difference between the buffer chamber and the flow stabilizing chamber, and ultimately achieving high-frequency and precise control of the outlet flow of the feed pipe. The overall device, through the combination of structure and control, achieves ultra-stable output of glass melt supply flow under high flow conditions, keeping the flow fluctuation rate within an extremely low range, effectively ensuring the uniformity of the thickness of the formed glass plate, optimizing the glass stress distribution, and avoiding glass defects caused by heterogeneous layers from the source, thereby improving the yield of high-end substrate glass. At the same time, the structural design of each component is simple and the function is clear. The platinum components combined with the welding forming process ensure the airtightness and structural strength of the device under high-temperature conditions, and are suitable for long-term stable operation of high-flow platinum channels. It provides reliable equipment support for the mass production of high-generation lines, ultra-high-definition resolution, and flexible displays of liquid crystal display substrate glass and special glass.

[0016] Furthermore, the cross-sectional area of ​​the flushing chamber is more than 10 times that of the inflow pipe, which allows the high-speed glass melt flowing in from upstream to drop sharply after entering the buffer chamber. This maximizes the conversion of the kinetic energy of the glass melt into potential energy, effectively weakens the pressure and flow pulsations of the incoming flow, and significantly reduces the possibility of sloshing of the glass melt surface in the buffer chamber. This further enhances the absorption and filtering effect of the buffer chamber on upstream disturbances, ensuring that the heterogeneous layer on the surface of the glass melt is always in a stable equilibrium state. At the same time, the venting pipe is limited to a thin tube at the top and connected to the top of the buffer chamber. This ensures that the liquid surface pressure inside the buffer chamber is always equal to atmospheric pressure, providing a stable and undisturbed static pressure reference for the entire feeding system. It also avoids additional interference from external airflow to the liquid surface in the buffer chamber due to an excessively large diameter venting pipe, further ensuring the stability of the liquid surface in the buffer chamber. From a structural design perspective, this further avoids the risk of heterogeneous layer entrapment and improves the stability of the static pressure reference.

[0017] Furthermore, by accurately calculating the flow resistance value of the flow-limiting channel using the Hagen-Poiseuille equation or law, suitable structural parameters for the flow-limiting channel can be designed based on the actual viscosity characteristics of the molten glass at the operating temperature, enabling the flow-limiting channel to possess precise and suitable flow resistance performance. This design ensures, on the one hand, that the molten glass flows continuously and smoothly between the buffer chamber and the stabilizing chamber, preventing stagnation due to excessive flow resistance and avoiding loss of damping effect due to insufficient flow resistance; on the other hand, it allows the flow-limiting channel to achieve optimal pressure decoupling, maximizing the attenuation of the direct transmission of small fluctuations in the buffer chamber level to the stabilizing chamber pressure, significantly reducing the interference of upstream disturbances on the stabilizing chamber pressure control loop, making the pressure regulation of the stabilizing chamber more independent, precise, and efficient. This lays the structural foundation for subsequent high-precision control of the outlet flow rate by adjusting the stabilizing chamber pressure, ensuring that the damping function of the flow-limiting channel is highly matched to the actual operating conditions, and improving the adaptability and flow control stability of the entire dual-chamber feeding device under different molten glass operating conditions.

[0018] This invention discloses a differential voltage-stabilized dual-chamber feeding control method for platinum channels. Utilizing the structural characteristics of the device, it forms an adaptable closed-loop control process, achieving precise and stable control of the high-flow-rate platinum channel feeding process. This effectively solves the technical problems of large flow fluctuations, easy heterogeneous layer entrainment, and untimely disturbance compensation in traditional feeding control, significantly improving the process stability and controllability of the high-end substrate glass feeding stage. The method first utilizes the pressure balance characteristics of the buffer chamber connected to the atmosphere and the advantages of its large-volume structure to pre-absorb and filter the flow and pressure fluctuations of the upstream molten glass. This weakens the impact of disturbances at the front end of the process, ensuring the stability of the molten glass surface and maintaining the balance of the surface heterogeneous layer. This fundamentally avoids glass defects caused by heterogeneous layer entrainment and lays a stable material foundation for subsequent flow stabilization and control stages. Then, the flow-limiting channel of the damping flow channel structure achieves pressure decoupling between the buffer chamber and the flow stabilization chamber, reducing the pressure interference of upstream liquid level fluctuations on the flow stabilization chamber and making the pressure control of the flow stabilization chamber more independent. Meanwhile, this method uses a pressure monitoring device to collect the pressure of the flow stabilizing chamber in real time and accurately monitors the outlet flow rate by plate weight per unit hour, ensuring the real-time nature and accuracy of the monitoring data and providing reliable data support for regulation. Furthermore, by combining the control unit with the PID control algorithm, it realizes the rapid comparison between the flow monitoring value and the target value and the precise output of the regulation command. The pressure of the flow stabilizing chamber is dynamically adjusted according to the flow deviation, and the linear regulation of the outlet flow rate is achieved by changing the driving pressure difference between the two chambers. Moreover, the regulation logic of reducing pressure when the flow rate is too low and increasing pressure when the flow rate is too high is direct, efficient, and has a fast response speed. Furthermore, by continuously executing the aforementioned closed-loop control process, various external disturbances such as upstream temperature fluctuations and flow pulsations during the glass melt transportation process can be compensated in real time and dynamically. This ensures that the glass melt outlet flow rate of the supply pipe remains stable within an extremely narrow fluctuation range of the target flow rate, effectively guaranteeing the uniformity of glass thickness in the forming process, optimizing glass stress distribution, reducing the macroscopic defect rate of finished glass, and improving the production yield of high-end substrate glass. At the same time, the entire control process is highly compatible with the device structure, with coherent steps and precise control methods. It does not require complex mechanical operations and is suitable for continuous production conditions of high-flow platinum channels, providing stable process control guarantees for the mass production of high-generation lines of liquid crystal display substrate glass and special glass. Attached Figure Description

[0019] To more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of the present invention and should not be regarded as a limitation on the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0020] Figure 1 This is a schematic diagram of the hot-end equipment structure of the substrate glass in an embodiment of the present invention; Figure 2 This is a schematic diagram of a single-chamber feeding structure in the prior art; Figure 3 This is a schematic diagram of a differential voltage-stabilized dual-chamber feeding device for a platinum channel according to an embodiment of the present invention; Figure 4 This is a schematic diagram of the main parameters of a differential voltage-stabilized dual-chamber feeding device for a platinum channel according to an embodiment of the present invention.

[0021] Wherein: 1-Kiln; 2-Heating section; 3-Clarification section; 4-Cooling section; 5-Stirring section; 6-Cooling section; 7-Feeding section; 8-Forming system; 9-Inflow pipe; 10-Top thin pipe; 11-Buffer chamber; 12-Flow limiting channel; 13-Flow stabilizing chamber; 14-Feeding pipe; 15-Heterogeneous glass layer; 16-Pressure fine adjustment device. Detailed Implementation

[0022] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. The components of the embodiments of the present invention described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.

[0023] Therefore, the following detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely to illustrate selected embodiments of the invention. All other embodiments obtained by those skilled in the art based on the embodiments of the invention without inventive effort are within the scope of protection of the invention.

[0024] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.

[0025] In the description of the embodiments of the present invention, it should be noted that if terms such as "upper," "lower," "horizontal," or "inner" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship commonly used when the product of the invention is in use, they are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the present invention. Furthermore, terms such as "first" and "second" are only used to distinguish descriptions and should not be construed as indicating or implying relative importance.

[0026] Furthermore, the use of the term "horizontal" does not imply that the component must be absolutely horizontal, but rather that it can be slightly tilted. For example, "horizontal" simply means that its direction is more horizontal than "vertical," and does not mean that the structure must be completely horizontal, but can be slightly tilted.

[0027] In the description of the embodiments of the present invention, it should also be noted that, unless otherwise explicitly specified and limited, the terms "set," "install," "connect," and "link" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in the present invention according to the specific circumstances.

[0028] The present invention will now be described in further detail with reference to the accompanying drawings: See Figure 1 and Figure 3 This invention discloses a differential pressure-stabilized dual-chamber feeding device for platinum channels. It is characterized by comprising a buffer chamber 11 and a flow-stabilizing chamber 13 coaxially connected in series, with the buffer chamber 11 and flow-stabilizing chamber 13 connected via a flow-limiting channel 12. The flow-limiting channel 12 is a damped flow channel. The top of the buffer chamber 11 has a vent pipe communicating with the atmosphere. The flow-stabilizing chamber 13 is a sealed cavity with a pressure fine-tuning interface at its top. The inlet end of the buffer chamber 11 is connected to an inflow pipe 9, and the outlet end of the flow-stabilizing chamber 13 is connected to a feeding pipe 14. The flow-stabilizing chamber 13 is equipped with a pressure monitoring device, and the feeding pipe 14 is equipped with a flow detection device. The pressure monitoring device, flow detection device, and pressure fine-tuning interface are all connected to a control unit. The precision inert gas pressure control system includes a gas source and a flow regulation component. The gas source is a high-purity nitrogen or argon gas source, and the flow regulation component is a proportional valve or a servo valve. The pressure monitoring device is a pressure sensor, the detection end of which extends into the flow stabilizing cavity 13 to monitor the pressure inside the flow stabilizing cavity 13 in real time. The pressure sensor is a high-resolution, high-temperature resistant pressure sensor with a resolution greater than 10 Pa. A heating element and an insulation element are provided on the outside of the flow stabilizing cavity 13. The heating element is a heater, and the insulation element is an insulation layer, which wrap around the outside of the flow stabilizing cavity 13. The buffer cavity 11, the flow stabilizing cavity 13, the flow limiting channel 12, the inflow pipe 9, and the feed pipe 14 are all made of platinum and are welded together to ensure airtightness and structural strength at high temperatures.

[0029] This invention discloses a differential pressure-stabilized dual-chamber feeding device for platinum channels. By forming a functionally differentiated dual-chamber structure through a buffer chamber and a flow-stabilizing chamber connected in series on the upper and lower coaxial lines, and in conjunction with a flow-limiting channel of a damping flow channel structure, the synergistic effect of buffering and stabilizing flow and precise flow control is achieved. This effectively solves the industry pain points of liquid level fluctuation, unstable flow and heterogeneous layer entrainment during the feeding process of high-flow platinum channels, and significantly improves the overall feeding performance. The buffer chamber, connected to the atmosphere via a top vent pipe, maintains its internal pressure consistent with atmospheric pressure, providing a stable static pressure reference for the system. Its large volume effectively absorbs flow and pressure fluctuations in the upstream molten glass, significantly reducing its flow velocity and preventing violent surface sloshing. This ensures the heterogeneous layer on the molten glass surface remains in a stable equilibrium, preventing it from being drawn into the main flow and eliminating fatal defects such as visible lines and ripples in the finished glass. The flow-limiting channel of the damping flow channel structure decouples the pressure between the buffer chamber and the flow stabilizing chamber, effectively attenuating the direct transmission of minor fluctuations in the buffer chamber's liquid level to the flow stabilizing chamber's pressure. This significantly reduces the impact of upstream disturbances on the flow control loop, making the pressure control of the flow stabilizing chamber more independent and stable. The closed-loop flow control system, consisting of a sealed flow stabilizing chamber, a pressure monitoring device, a flow detection device, a control unit, and a pressure fine-tuning interface, can collect real-time data on the internal pressure of the flow stabilizing chamber and the outlet flow of the feed pipe through the pressure monitoring device and the flow detection device. The control unit enables real-time comparison of the data and precise output of control commands. Then, the pressure inside the flow stabilizing chamber is dynamically adjusted through the pressure fine-tuning interface, achieving linear and direct control of the driving pressure difference between the buffer chamber and the flow stabilizing chamber, and ultimately achieving high-frequency and precise control of the outlet flow of the feed pipe. The overall device, through the combination of structure and control, achieves ultra-stable output of glass melt supply flow under high flow conditions, keeping the flow fluctuation rate within an extremely low range, effectively ensuring the uniformity of the thickness of the formed glass plate, optimizing the glass stress distribution, and avoiding glass defects caused by heterogeneous layers from the source, thereby improving the yield of high-end substrate glass. At the same time, the structural design of each component is simple and the function is clear. The platinum components combined with the welding forming process ensure the airtightness and structural strength of the device under high-temperature conditions, and are suitable for long-term stable operation of high-flow platinum channels. It provides reliable equipment support for the mass production of high-generation lines, ultra-high-definition resolution, and flexible displays of liquid crystal display substrate glass and special glass.

[0030] The cross-sectional area of ​​the buffer chamber 11 is larger than that of the inflow pipe 9, and the cross-sectional area of ​​the buffer chamber 11 is more than 10 times that of the inflow pipe 9; the venting pipe is a top thin pipe 10, which is connected to the top of the buffer chamber 11, so that the liquid pressure inside the buffer chamber 11 is always equal to the atmospheric pressure. This design allows the high-speed inflow of molten glass from upstream to rapidly decrease in velocity upon entering the buffer chamber, maximizing the conversion of kinetic energy into potential energy. This effectively weakens pressure and flow pulsations in the incoming flow, significantly reducing the likelihood of surface sloshing within the buffer chamber. It further enhances the buffer chamber's absorption and filtering effect on upstream disturbances, ensuring the heterogeneous layer on the molten glass surface remains in a stable equilibrium. Simultaneously, the venting pipe is limited to a thin top tube connected to the top of the buffer chamber. This ensures the internal liquid pressure remains constant at atmospheric pressure, providing a stable and undisturbed static pressure reference for the entire feeding system. It also prevents external airflow from causing additional interference to the buffer chamber's liquid surface due to an excessively large venting pipe diameter, further guaranteeing the stability of the buffer chamber's liquid surface. From a structural design perspective, this further mitigates the risk of heterogeneous layer entrapment and improves the stability of the static pressure reference.

[0031] See Figure 4 The flow resistance R of the flow-limiting channel 12 is based on the glass melt viscosity μ, the channel length L, and the channel radius r, and is expressed by the Hagen-Poiseuille equation R = (8μL) / (πr). 4 The flow resistance R of the flow-limiting channel 12 is calculated based on the glass melt viscosity μ, the channel length L, and the channel diameter d, and is obtained by the Hagen-Poiseuille law R=(128μL) / (πd). 4 The flow resistance value of the flow-limiting channel is accurately calculated using the Hagen-Poiseuille equation or law. Based on the actual viscosity characteristics of the molten glass at the operating temperature, suitable structural parameters for the flow-limiting channel can be designed, ensuring precise and appropriate flow resistance performance. This design guarantees continuous and stable flow of the molten glass between the buffer chamber and the stabilizing chamber, preventing stagnation due to excessive flow resistance and avoiding loss of damping effect due to insufficient flow resistance. Furthermore, it allows the flow-limiting channel to achieve optimal pressure decoupling, maximizing the attenuation of the direct transmission of small fluctuations in the buffer chamber level to the stabilizing chamber pressure. This significantly reduces the interference of upstream disturbances on the stabilizing chamber pressure control loop, making the pressure regulation of the stabilizing chamber more independent, precise, and efficient. This lays the structural foundation for subsequent high-precision control of the outlet flow rate through adjusting the stabilizing chamber pressure, ensuring that the damping function of the flow-limiting channel is highly matched to actual operating conditions, and improving the adaptability and flow control stability of the entire dual-chamber feeding device under different molten glass operating conditions.

[0032] This invention also discloses a differential voltage-regulated dual-chamber feeding control method for platinum channels, comprising: Step 1: The high-temperature molten glass flows into the buffer chamber 11 through the inflow pipe 9. The buffer chamber 11 maintains pressure balance with atmospheric pressure through the top vent pipe. Step 2: Buffer chamber 11, relying on atmospheric pressure environment and large volume characteristics, performs preliminary absorption and filtering of glass melt flow and pressure fluctuations from upstream. Step 3: The initially stabilized molten glass flows into the sealed flow stabilizing chamber 13 through the flow-limiting channel 12 of the damping flow channel structure. Step 4: The pressure in the flow stabilizing chamber 13 is monitored in real time by the pressure monitoring device, and the glass melt outlet flow rate of the feed pipe 14 is monitored in real time by the plate weight per unit hour, and the monitored values ​​of pressure and outlet flow rate are transmitted to the control unit. Step 5: The control unit compares the monitored value of the outlet flow rate with the target flow rate setting value, and outputs a control command to the pressure fine-tuning interface through the PID control algorithm to drive the pressure fine-tuning interface to dynamically adjust the pressure in the flow stabilizing chamber 13: if the outlet flow rate is too low, the pressure is reduced to increase the driving pressure difference between the buffer chamber 11 and the flow stabilizing chamber 13; if the outlet flow rate is too high, the pressure is increased to reduce the driving pressure difference. Step six: Continue to execute the above closed-loop control process to compensate for external disturbances during the glass melt transportation process in real time, so that the glass melt outlet flow rate of the supply pipe 14 is stabilized within the fluctuation range of the target flow rate setting value.

[0033] The working process of this invention is as follows: This invention specifically relates to a simple cavity structure with interconnected upper and lower sections and differentiated functions, supplemented by external pressure precision control, which fundamentally solves the systemic problems of liquid surface fluctuation, heterogeneous layer equilibrium disruption and unstable outlet flow under high flow rates.

[0034] Preferably, the device consists of a buffer chamber 11 and a flow stabilizing chamber 13 connected coaxially in series. The buffer chamber 11, as the upper chamber, is connected to the atmosphere via a thin tube at its top, ensuring that the internal liquid surface pressure P1 is always equal to atmospheric pressure, providing an absolutely stable static pressure reference point for the entire system. Its large diameter (D1) design causes a sharp drop in flow velocity when high-speed liquid from upstream enters the chamber, effectively absorbing and reducing pressure and flow pulsations, acting as a primary "pressure stabilizer." This allows the heterogeneous layer on the surface of the top molten glass to exist stably and maintain its equilibrium state, preventing disruption of this balance due to violent liquid surface sloshing. Preferably, the flow stabilizing chamber 13, as the lower chamber, has a design concept completely opposite to that of the buffer chamber 11; it is a completely sealed pressure vessel. Its top is completely sealed and equipped with a pressure fine-tuning interface 16 for connecting to an external precision pressure control device. This makes its internal pressure P2 a control variable that can be independently, quickly, and precisely adjusted. The stability of the outlet flow rate Q is primarily driven by the pressure difference ΔP between the two chambers (ΔP = P1 + ρgh1 - P2). Since P1 (atmospheric pressure) and the liquid level h1 in the buffer chamber 11 are designed to remain highly stable, the driving pressure difference ΔP can be linearly and directly adjusted by precisely controlling P2, thereby achieving high-frequency closed-loop control of the outlet flow rate Q. Preferably, the buffer chamber 11 and the flow stabilizing chamber 13 are connected by a flow-limiting channel 12. This flow-limiting channel 12 is precisely designed, and its flow resistance R can be calculated based on the fluid viscosity μ, channel length L, and radius r using the Hagen-Poiseuille equation R = (8μL) / (πr). 4 Theoretical calculations and optimizations were performed. An appropriate flow resistance value can ensure continuous flow of molten glass and effectively attenuate the direct transmission of liquid level fluctuations (Δh1) in the buffer chamber to the pressure in the flow stabilizing chamber 13, thus playing a "decoupling" role and making the pressure control of the flow stabilizing chamber more independent, efficient and stable.

[0035] The control method for matching the above-mentioned dual-chamber device includes the following specific steps: (1) When the system is heated, the glass melt fills the buffer chamber through the inflow pipe and maintains equilibrium with atmospheric pressure through the top thin tube; (2) The buffer chamber, with its atmospheric pressure environment and large volume characteristics, performs preliminary absorption and filtering of flow and pressure fluctuations from upstream; (3) The initially stabilized molten glass flows into the flow stabilizing chamber through the flow-limiting channel; (4) A high-precision pressure sensor monitors the pressure P2 in the flow stabilization chamber in real time, and monitors the flow rate Q at the feed outlet in real time by the plate weight per unit hour; (5) The controller compares the monitored value with the target set value and drives the pressure fine-tuning device to dynamically adjust the pressure P2 in the flow stabilizing chamber through the PID control algorithm: if the flow rate is too low, the controller commands to reduce P2 to increase the driving pressure difference ΔP; if the flow rate is too high, the controller commands to increase P2 to decrease ΔP. (6) This closed-loop control process has a fast response speed and can continuously compensate for external disturbances, ensuring that the outlet flow rate is stable within the extremely narrow fluctuation range of the set value.

[0036] Preferably, the pressure fine-tuning device employs a precision inert gas pressure control system, which adjusts the pressure of the inert gas injected into the top of the flow stabilizing chamber to change P2, achieving precise control without mechanical contact or moving parts. Preferably, the final pressure control accuracy can reach within ±50 Pa, corresponding to a flow fluctuation rate controllable below ±0.5%, far exceeding the control level of traditional feeding troughs.

[0037] This invention, through the principles of functional decomposition and differential voltage regulation, not only achieves ultra-high flow stability but also protects the equilibrium state of the surface heterogeneous layer by maintaining the calmness of the liquid surface in the buffer chamber, fundamentally preventing the generation of defects such as visible lines. Simulation calculations and experimental verification show that the feeding system using this scheme reduces the outlet flow fluctuation amplitude by more than 80% compared to traditional structures and effectively avoids defects caused by the disruption of the heterogeneous layer's equilibrium state, providing a reliable equipment foundation for the production of high-end substrate glass with ultra-high uniformity.

[0038] The working principle of this invention is as follows: The hot-end manufacturing of substrate glass comprises three main systems: furnace, channel, and forming. Its main functional sections are as follows: Figure 1 As shown, it includes a kiln 1, a heating section 2, a clarification section 3, a cooling section 4, a stirring section 5, a cooling section 6, a feeding section 7, and a molding system 8. The stability of the feeding section is the final factor determining success or failure. Figure 2 As shown, the existing single-chamber feeding tank and the internal molten glass have the following main characteristics, specifically including the inflow pipe 9, the top thin pipe 10, the buffer chamber 11, the feeding pipe 14, and the heterogeneous glass layer 15 present on the top liquid surface. With the continuous increase in flow rate, the existing feeding structure's ability to control the flow rate is limited, easily causing flow rate fluctuations and disturbances to the top heterogeneous glass. Specifically, according to Bernoulli's equation, the total pressure head of a fluid consists of the velocity head, pressure head, and position head. When a high-flux liquid flows at a relatively high velocity V1 from the inflow pipe 9 (which has a smaller cross-sectional area) into a chamber with a suddenly increased cross-sectional area, its velocity head (ρV1) increases significantly. 2 / 2) The flow rate decreases sharply, and according to the law of conservation of energy, this mainly translates into pressure head (manifested as static pressure P) and position head (manifested as liquid level rise h). However, in an open container with a free surface, this energy conversion is not smooth and easily generates violent surface waves and complex eddy structures. Any small fluctuations upstream will be amplified here, leading to instability of the free surface. According to the principles of hydrostatics, the outlet flow rate Q is directly related to the driving pressure head (ρgh, where h is the liquid level height above the outlet). Therefore, fluctuations in the liquid surface (Δh) directly lead to fluctuations in flow rate (ΔQ). At the same time, the existence of the free surface inevitably leads to the formation of a surface heterogeneous layer, which is the result of a long-term physicochemical process. Under ideal equilibrium conditions, this heterogeneous layer does not interfere with the main molten glass, but once the liquid surface becomes unstable, according to the principle of fluid shear force, the interlayer equilibrium is broken, and the heterogeneous layer is inevitably drawn into the main flow.

[0039] The solution proposed in this invention stems from a fundamental analysis and functional decomposition of the aforementioned problems. The overall solution is as follows: Figure 3 As shown, a dual-chamber structure is employed. The upper chamber, referred to as buffer chamber 11, is designed as a classic "open container." Its large diameter (e.g., its cross-sectional area can be more than 10 times that of the inflow pipe) is crucial to its function. When a potentially volatile fluid flow from upstream flows in at a velocity V1, according to the continuity equation Q = A1×V1 = A2×V2, with the buffer chamber's cross-sectional area A2 much larger than A1, the flow velocity V2 within the chamber will drastically decrease to less than one-tenth of V1. The fluid's kinetic energy (ρV1) 2 / 2) The vast majority of the energy is converted into potential energy (ρgh), manifested as a steady, slow rise in the liquid level. Any fluctuation in flow rate is primarily converted into a small change in the liquid level height h1, rather than a violent pressure fluctuation or surface undulation. This is the fluid dynamics essence of its "buffering" or "filtering" effect. Simultaneously, its structure, connected to the atmosphere through a thin tube, ensures that the static pressure P1 at any point within the cavity is strictly equal to atmospheric pressure. This is an absolutely stable pressure benchmark, unaffected by any upstream processes. Its key function is to provide a broad and calm liquid surface, allowing the surface heterogeneous layer to exist stably on the outermost layer, maintaining its equilibrium state and avoiding the risk of entrainment.

[0040] The lower chamber, 13, is a flow-stabilizing chamber designed as a pure "pressure control unit." Its airtightness is fundamental to all its functions. Its connection to the upstream is solely through a narrow flow-limiting channel 12. The design of this channel is crucial; its diameter d and length L must be calculated based on the viscosity μ of the molten glass at the operating temperature to determine a suitable flow resistance value R. According to the Hagen-Poiseuille law, for laminar flow, R = (128 μL) / (πd) 4The main function of this flow resistance is "decoupling," isolating the buffer chamber 11 (pressure reference chamber) from the stabilizing chamber 13 (pressure control chamber) to a certain extent. This means that the pressure disturbance (ρgΔh1) caused by the small fluctuation (Δh1) of the liquid level h1 in the buffer chamber will be significantly attenuated by the flow resistance of the flow limiting channel 12 when it is transmitted to the stabilizing chamber 13, thereby greatly reducing the interference of upstream fluctuations on the control loop and making the system easier to stabilize. The core control principle of the entire device is based on static pressure difference drive, which drives the glass liquid to flow out of the outlet of the feed pipe 14. The effective pressure difference ΔP_eff = (P1 + ρgh1) - P2. Since P1 is a constant atmospheric pressure, and ρgh1 remains highly stable under the good buffering effect of the buffer chamber 11, the change of ΔP_eff mainly depends on the change of P2. Therefore, the control of the outlet flow rate Q is transformed into the precise control of the pressure P2 in the stabilizing chamber 13. Relevant parameters and variables are as follows. Figure 4 As indicated by the label.

[0041] In actual installation and operation, a problem-prevention approach is consistently implemented. Firstly, in manufacturing, all platinum components must be formed using high-quality welding to ensure airtightness and structural strength at high temperatures. The pressure fine-tuning device primarily uses an external precision inert gas pressure control system, with high-purity nitrogen or argon as the gas source. The injection pressure is precisely adjusted via proportional or servo valves. This solution eliminates moving parts entering the high-temperature molten glass, ensuring the highest reliability. When the system starts running, the molten glass slowly fills both chambers. Once the operating conditions stabilize, the control loop is activated. The controller (such as a PLC) reads signals from the flow meter and pressure sensor in real time. Its control algorithm employs classic PID control. For example, if the flow rate Q is detected to be lower than the set value Q_set, the controller immediately increases the output value. This signal instructs the pressure control system to slightly reduce the injection pressure, resulting in a decrease in P2. According to ΔP_eff = (P1 + ρgh1) - P2, ΔP_eff increases accordingly, driving more molten glass to flow out, causing the flow rate Q to rise back to Q_set. The entire process operates on a millisecond-level response time, effectively offsetting any disturbances caused by temperature fluctuations, upstream liquid level changes, etc. To ensure control accuracy, the pressure sensor must be selected with high resolution (better than 10 Pa) and high temperature resistance. A high-efficiency heater and insulation layer should be arranged outside the entire flow stabilization chamber to ensure an extremely uniform internal temperature field, avoiding new fluctuations introduced by changes in the viscosity of the molten glass due to temperature unevenness. Through this differential voltage stabilization design—clear in principle, simple in structure, yet extremely effective—this invention successfully transforms high-flow-rate feeding from a challenging problem into a precisely controllable process, providing a solid technical guarantee for the production of next-generation top-quality substrate glass.

[0042] The above are merely preferred embodiments of the present invention and are not intended to limit the present invention. Various modifications and variations can be made to the present invention by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the scope of protection of the present invention.

Claims

1. A differential voltage-stabilized dual-chamber feeding device for platinum channels, characterized in that, The device includes a buffer chamber (11) and a flow stabilizing chamber (13) connected in series on the upper and lower sides, and the buffer chamber (11) and the flow stabilizing chamber (13) are connected by a flow limiting channel (12); the flow limiting channel (12) is a damped flow channel; the top of the buffer chamber (11) is provided with a vent pipe connected to the atmosphere; the flow stabilizing chamber (13) is a closed cavity and is provided with a pressure fine-tuning interface at the top; the feed end of the buffer chamber (11) is connected to an inflow pipe (9), and the discharge end of the flow stabilizing chamber (13) is connected to a feed pipe (14); the flow stabilizing chamber (13) is provided with a pressure monitoring device, and the feed pipe (14) is provided with a flow detection device; the pressure monitoring device, the flow detection device and the pressure fine-tuning interface are all connected to a control unit.

2. The differential voltage-stabilized dual-chamber feeding device for platinum channels according to claim 1, characterized in that, The cross-sectional area of ​​the buffer chamber (11) is larger than that of the inflow pipe (9), and the cross-sectional area of ​​the buffer chamber (11) is more than 10 times that of the inflow pipe (9); the ventilation pipe is a top thin pipe (10), which is connected to the top of the buffer chamber (11) so that the liquid pressure inside the buffer chamber (11) is always equal to the atmospheric pressure.

3. The differential voltage-stabilized dual-chamber feeding device for platinum channels according to claim 1, characterized in that, The flow resistance R of the flow-limiting channel (12) is based on the glass melt viscosity μ, the channel length L, and the channel radius r, and is given by the Hagen-Poiseuille equation R=(8μL) / (πr). 4 ) Calculated; Alternatively, the flow resistance R of the flow-limiting channel (12) is based on the glass melt viscosity μ, the channel length L, and the channel diameter d, and is determined by the Hagen-Poiseuille law: R = (128μL) / (πd). 4 ) was calculated.

4. The differential voltage-stabilized dual-chamber feeding device for platinum channels according to claim 1, characterized in that, The pressure fine-tuning interface includes a precision pressure control device, which is a pressure fine-tuning device (16), and the pressure fine-tuning device (16) is a precision inert gas pressure control system.

5. The differential voltage-stabilized dual-chamber feeding device for platinum channels according to claim 4, characterized in that, The precision inert gas pressure control system includes a gas source and a flow regulation component. The gas source is a high-purity nitrogen or argon gas source, and the flow regulation component is a proportional valve or a servo valve.

6. The differential voltage-stabilized dual-chamber feeding device for platinum channels according to claim 1, characterized in that, The pressure monitoring device is a pressure sensor. The detection end of the pressure sensor extends into the flow stabilizing cavity (13) to monitor the pressure inside the flow stabilizing cavity (13) in real time.

7. The differential voltage-stabilized dual-chamber feeding device for platinum channels according to claim 6, characterized in that, The pressure sensor is a high-resolution, temperature-resistant pressure sensor with a resolution greater than 10 Pa.

8. The differential voltage-stabilized dual-chamber feeding device for platinum channels according to claim 1, characterized in that, The outside of the flow stabilizing cavity (13) is provided with a heating component and a heat insulation component. The heating component is a heater, and the heat insulation component is a heat insulation layer. The heating component and the heat insulation component are wrapped around the outside of the flow stabilizing cavity (13).

9. The differential voltage-stabilized dual-chamber feeding device for platinum channels according to claim 1, characterized in that, The buffer chamber (11), flow stabilizing chamber (13), flow limiting channel (12), inflow pipe (9) and supply pipe (14) are all made of platinum and are welded together to ensure airtightness and structural strength at high temperatures.

10. A differential voltage-regulated dual-chamber feeding control method for a platinum channel based on the apparatus of any one of claims 1-9, characterized in that, include: The high-temperature molten glass flows into the inlet pipe (9) and fills the buffer chamber (11). The buffer chamber (11) maintains pressure balance with atmospheric pressure through the top vent pipe. The buffer chamber (11) relies on the atmospheric pressure environment and large volume characteristics to initially absorb and filter the flow rate and pressure fluctuations of the glass melt from upstream; The initially stabilized molten glass flows into the closed flow stabilizing chamber (13) through the flow-limiting channel (12) of the damping flow channel structure. The pressure in the flow stabilizing chamber (13) is monitored in real time by a pressure monitoring device, and the glass melt outlet flow rate of the feed pipe (14) is monitored in real time by the plate weight per unit hour. The monitored values ​​of pressure and outlet flow rate are transmitted to the control unit. The control unit compares the monitored value of the outlet flow with the target set value of the flow, and outputs the control command to the pressure fine-tuning interface through the PID control algorithm to drive the pressure fine-tuning interface to dynamically adjust the pressure in the flow stabilizing chamber (13): if the outlet flow is too low, the pressure is reduced to increase the driving pressure difference between the buffer chamber (11) and the flow stabilizing chamber (13); If the outlet flow rate is too high, the pressure is increased to reduce the driving pressure differential; The above closed-loop control process is continuously executed to compensate for external disturbances during the glass melt transportation process in real time, so that the glass melt outlet flow rate of the supply pipe (14) is stabilized within the fluctuation range of the flow target set value.

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