Free electron laser device, microwave electron gun, and method for manufacturing microwave electron gun

By designing an over-insertion structure for the cathode plug and controlling surface roughness in the microwave electron gun, the problem of increased dark current in the microwave electron gun was solved, achieving a reduction in dark current and an improvement in beam current and light output quality without reducing the acceleration cavity pressure.

CN122456280APending Publication Date: 2026-07-24张江国家实验室 +1
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Patent Information

Application Number
CN202510121220.8
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-01-24
Publication Date
2026-07-24

AI Technical Summary

Technical Problem

Existing technologies have limitations in suppressing dark current in microwave electron guns, which causes dark current to gradually increase during high-power operation, affecting beam quality and FEL output quality.

Method used

By designing an over-insertion structure for the cathode plug in the microwave electron gun, the top surface of the cathode plug protrudes 0.2mm to 1mm relative to the top surface of the cathode hole, thus optimizing the electric field strength and dark current trajectory in the cathode hole region. Combined with surface roughness control, this reduces the efficiency of dark current generation and transmission.

Benefits of technology

It effectively reduces dark current, improves beam quality and FEL output quality, and avoids the impact of increased dark current on downstream equipment.

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Abstract

The microwave electron gun of the present invention has a cavity and a cathode plug, the cavity comprising: a cylindrical cavity wall extending in the direction of the central axis of the cavity; the cathode cavity is arranged at one end of the cylindrical cavity wall, and a cathode hole is formed in the cathode cavity; after the cathode plug is inserted into the cathode hole, the top surface of the cathode plug protrudes a predetermined distance relative to the top surface of the cathode hole.
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