Display substrate and display device

Abstract

The utility model discloses a display substrate and a display device. The display substrate comprises a substrate body and an isolation layer located on the substrate body. The substrate comprises a display area, the part, located in the display area, of the isolation layer comprises a plurality of isolation patterns arranged in an array mode in the first direction and the second direction, and each isolation pattern comprises a plurality of isolation sub-patterns; at least a first interval and a second interval which are arranged in the second direction are arranged between the adjacent isolation patterns arranged in the first direction, and the ratio of the width of at least part of the first interval to the width of at least part of the second interval is 0.9-1.1. And by setting the width sizes of different intervals, anode residues can be avoided.

Description

Technical Field

[0001] This utility model relates to a display substrate and a display device. Background Technology

[0002] Organic light-emitting diode (OLED) display devices can employ organic light-emitting display devices with a tandem structure. By adding at least one light-emitting layer and a charge-generating layer to the device, the lifespan and brightness of the light-emitting device are improved. This is beneficial for achieving advantages such as long lifespan, high efficiency, low power consumption, active light emission, high brightness, high resolution, wide viewing angle, and fast response speed in organic light-emitting diode display devices. Utility Model Content

[0003] This utility model provides a display substrate and a display device.

[0004] This invention provides a display substrate, comprising: a substrate including a display area; and an isolation layer located on the substrate. The portion of the isolation layer located in the display area includes a plurality of isolation patterns arranged in an array along a first direction and a second direction. Each isolation pattern includes a plurality of isolation sub-patterns. The first direction intersects the second direction. Adjacent isolation patterns arranged along the first direction have at least a first interval and a second interval arranged along the second direction. One of the adjacent isolation patterns includes at least a first isolation sub-pattern and a second isolation sub-pattern arranged along the second direction. The interval between the first isolation sub-pattern and another adjacent isolation pattern is the first interval, and the interval between the second isolation sub-pattern and another adjacent isolation pattern is the second interval. The ratio between the width of at least a portion of the first interval and the width of at least a portion of the second interval is 0.9 to 1.1.

[0005] For example, according to an embodiment of the present invention, adjacent isolation patterns arranged along the second direction have at least a third interval and a fourth interval arranged along the first direction. One of the adjacent isolation patterns includes at least a third isolation sub-pattern and a fourth isolation sub-pattern arranged along the first direction. The interval between the third isolation sub-pattern and another isolation pattern in the adjacent isolation patterns is the third interval, and the interval between the fourth isolation sub-pattern and another isolation pattern in the adjacent isolation patterns is the fourth interval. The ratio between the width of at least a portion of the third interval and the width of at least a portion of the fourth interval is 0.9 to 1.1.

[0006] For example, according to an embodiment of the present invention, at least a portion of the edge of the first isolation sub-pattern is flush with at least a portion of the edge of the second isolation sub-pattern, and at least a portion of the edge of the third isolation sub-pattern is flush with at least a portion of the edge of the fourth isolation sub-pattern.

[0007] For example, according to an embodiment of the present invention, the width of the first interval, the width of the second interval, the width of the third interval, and the width of the fourth interval are all not less than 1.8 micrometers and not greater than 12 micrometers.

[0008] For example, according to an embodiment of the present invention, at least two adjacent isolation patterns are independent structures.

[0009] For example, according to an embodiment of the present invention, the substrate further includes a peripheral region surrounding the display area, the isolation layer includes a first isolation layer located in the display area and a second isolation layer located in the peripheral region, the first isolation layer includes the plurality of isolation patterns, and the second isolation layer surrounds at least a portion of the first isolation layer.

[0010] For example, according to an embodiment of the present invention, in the first direction, the size of the second isolation layer is not less than the sum of the sizes of two adjacent isolation sub-patterns arranged along the first direction; in the second direction, the size of the second isolation layer is not less than the sum of the sizes of two adjacent isolation sub-patterns arranged along the second direction.

[0011] For example, according to an embodiment of the present invention, the second isolation layer includes a plurality of sub-patterns, the plurality of sub-patterns including at least a first sub-pattern, a second sub-pattern, and a third sub-pattern. The shape of the first sub-pattern is substantially the same as the shape of the first isolation sub-pattern, the shape of the second sub-pattern is substantially the same as the shape of the second isolation sub-pattern, and the shape of the third sub-pattern is substantially the same as the shape of the isolation sub-pattern that is different from the first isolation sub-pattern and the second isolation sub-pattern among the third isolation sub-pattern and the fourth isolation sub-pattern.

[0012] For example, according to an embodiment of the present invention, the display substrate further includes: a plurality of pixel units located on the substrate, each pixel unit including a different color sub-pixel, and at least some of the sub-pixels including a first electrode, a light-emitting functional layer, and a second electrode stacked sequentially, the first electrode being located between the light-emitting functional layer and the substrate; a pixel defining pattern located at least on the side of the first electrode away from the substrate, the pixel defining pattern including a plurality of first openings and a plurality of second openings, the plurality of first openings being configured to define the light-emitting areas of the plurality of sub-pixels in the plurality of pixel units. An isolation layer is located between the first electrode and the substrate, and the edges of the isolation layer exposed by the plurality of second openings are configured to block at least a portion of the light-emitting functional layer.

[0013] For example, according to an embodiment of the present invention, the plurality of pixel units are configured one-to-one with the plurality of isolation patterns, and the plurality of isolation sub-patterns in each isolation pattern are configured one-to-one with the sub-pixels in each pixel unit; each pixel unit includes a first color sub-pixel, a second color sub-pixel, and a third color sub-pixel, the first color sub-pixel and the second color sub-pixel are arranged along the second direction, the first color sub-pixel and the third color sub-pixel are arranged along the first direction, and in the second direction, the distance between the edge of the light-emitting area of ​​at least one of the first color sub-pixel and the second color sub-pixel and the edge of the corresponding isolation sub-pattern is less than the distance between the edge of the light-emitting area of ​​the third color sub-pixel and the edge of its corresponding isolation sub-pattern.

[0014] For example, according to an embodiment of the present invention, the plurality of pixel units are configured one-to-one with the plurality of isolation patterns, and the plurality of isolation sub-patterns in each isolation pattern are configured one-to-one with the sub-pixels in each pixel unit; each pixel unit includes a first color sub-pixel, two second color sub-pixels, and a third color sub-pixel, the two second color sub-pixels including a first pixel block and a second pixel block, the area of ​​the light-emitting area of ​​each first color sub-pixel and each second color sub-pixel is smaller than the area of ​​the light-emitting area of ​​each third color sub-pixel; the first color sub-pixel and the first pixel block are arranged along the first direction, the third color sub-pixel and the second pixel block are arranged along the first direction, the first color sub-pixel and the second pixel block are arranged along the second direction, and the third color sub-pixel and the first pixel block are arranged along the second direction. In the same direction of the first direction and the second direction, the distance between the edge of the light-emitting area of ​​the third color sub-pixel and the edge of its corresponding isolation sub-pattern is not greater than the distance between the edge of the light-emitting area of ​​at least one of the other color sub-pixels and the edge of its corresponding isolation sub-pattern.

[0015] For example, according to an embodiment of the present invention, in the same pixel unit, at least a portion of the edge of the isolation sub-pattern corresponding to the third color sub-pixel extending along the first direction is flush with at least a portion of the edge of the isolation sub-pattern corresponding to the other color sub-pixel extending along the first direction.

[0016] For example, according to an embodiment of the present invention, the plurality of isolation patterns are an integrated structure.

[0017] For example, according to an embodiment of the present invention, in the same isolation pattern, there is a gap between adjacent isolation sub-patterns, and the extending direction of the gap intersects with the arrangement direction of the adjacent isolation sub-patterns.

[0018] For example, according to an embodiment of the present invention, the first electrode includes a main electrode and a connecting electrode. Along a direction perpendicular to the substrate, the connecting electrode does not overlap with the first opening. The connecting electrode is configured to be electrically connected to the pixel circuit included in the sub-pixel. The isolation pattern includes a protrusion located between at least two adjacent isolation sub-patterns. The protrusion and at least one of the adjacent two isolation sub-patterns are integrally formed. The protrusion includes a via so that the connecting electrode is electrically connected to the pixel circuit through the via.

[0019] For example, according to an embodiment of the present invention, there is a gap extending along the second direction between the isolation sub-pattern corresponding to the third color sub-pixel and the isolation sub-pattern corresponding to other color sub-pixels adjacent to the third color sub-pixel in the first direction, wherein the width ratio of the gap at different positions other than the protrusion is 0.9 to 1.1.

[0020] For example, according to an embodiment of the present invention, at least one protrusion and an adjacent isolation sub-pattern are provided with a gap.

[0021] For example, according to an embodiment of the present invention, each protrusion is connected to one of the isolation sub-patterns located on both sides thereon, and is spaced apart from the other.

[0022] For example, according to an embodiment of the present invention, any two adjacent isolation sub-patterns arranged along the second direction are independent structures, and the isolation sub-pattern corresponding to the third color sub-pixel and the isolation sub-pattern corresponding to one of the first color sub-pixels and the second color sub-pixel adjacent to the third color sub-pixel are connected to each other; or any two adjacent isolation sub-patterns arranged along the first direction are independent structures, and the isolation sub-pattern corresponding to the first color sub-pixel and the isolation sub-pattern corresponding to the second color sub-pixel in the same pixel unit are connected to each other, or the isolation sub-pattern corresponding to the first color sub-pixel and the isolation sub-pattern corresponding to the second color sub-pixel located in adjacent pixel units are connected to each other.

[0023] For example, according to an embodiment of the present invention, in one of the adjacent pixel units arranged along the second direction, the isolation sub-pattern corresponding to the third color sub-pixel and the isolation sub-pattern corresponding to other color sub-pixels are integrated into a structure; in the other adjacent pixel unit, the isolation sub-pattern corresponding to the third color sub-pixel and the isolation sub-pattern corresponding to other color sub-pixels are independent of each other; in the first direction, the isolation sub-pattern corresponding to the third color sub-pixel and the isolation sub-pattern corresponding to other color sub-pixels located on one side of it are integrated into a structure, and the isolation sub-pattern corresponding to other color sub-pixels located on the other side of it are independent of each other.

[0024] For example, according to an embodiment of the present invention, different isolation sub-patterns are independent of each other.

[0025] For example, according to an embodiment of the present invention, in the same pixel unit, the isolation sub-pattern corresponding to the third color sub-pixel and the isolation sub-pattern corresponding to the first pixel block have a first sub-space extending along the first direction, and the isolation sub-pattern corresponding to the first color sub-pixel and the isolation sub-pattern corresponding to the second pixel block have a second sub-space extending along the first direction, and the ratio of the width of at least a portion of the first sub-space to the width of at least a portion of the second sub-space is 0.9 to 1.1; in the same pixel unit, the isolation sub-pattern corresponding to the third color sub-pixel and the isolation sub-pattern corresponding to the second pixel block have a third sub-space extending along the second direction, and the isolation sub-pattern corresponding to the first color sub-pixel and the isolation sub-pattern corresponding to the first pixel block have a fourth sub-space extending along the second direction, and the ratio of the width of at least a portion of the third sub-space to the width of at least a portion of the fourth sub-space is 0.9 to 1.1.

[0026] For example, according to an embodiment of the present invention, there is no gap between different isolation sub-patterns in the same isolation pattern.

[0027] For example, according to an embodiment of the present invention, the different isolation patterns are independent structures.

[0028] For example, according to an embodiment of the present invention, the ratio between the width at each position in the first interval and the width at each position in the second interval is 0.9 to 1.1; or the first electrode includes a main electrode and a connecting electrode, and along a direction perpendicular to the substrate, the connecting electrode does not overlap with the first opening, and the connecting electrode is configured to be electrically connected to the pixel circuit included in the sub-pixel; the isolation pattern includes a protrusion located between at least two adjacent isolation sub-patterns, the protrusion including a via to allow the connecting electrode to be electrically connected to the pixel circuit through the via, and the ratio between the width at each position in one of the first interval and the second interval other than the protrusion and the width at each position in the other interval is 0.9 to 1.1.

[0029] Another embodiment of the present invention provides a display device, including any of the above-described display substrates.

[0030] Setting different interval widths helps to avoid anode residue. Attached Figure Description

[0031] To more clearly illustrate the technical solutions of the embodiments of this utility model, the accompanying drawings of the embodiments will be briefly introduced below. Obviously, the drawings described below only relate to some embodiments of this utility model, and are not intended to limit this utility model.

[0032] Figure 1 This is a schematic diagram of a partial planar structure in a display substrate.

[0033] Figure 2 For along Figure 1 A schematic diagram of the local structure intercepted by line AA'.

[0034] Figures 3A to 3C For along Figure 1 The process flow diagram shows the portion of the BB' line that forms the anode.

[0035] Figure 4 for Figure 1 The image shows a schematic diagram of a portion of the display substrate under an optical microscope.

[0036] Figure 5 for Figure 1 The image shown is a focused ion beam (FIB) diagram of a portion of the display substrate.

[0037] Figure 6 for Figure 1 The image shows a bright spot pattern on the substrate.

[0038] Figure 7 This is a partial planar structure schematic diagram of a display substrate provided according to an example of an embodiment of the present utility model.

[0039] Figure 8 For including Figure 7 A schematic diagram of the display substrate with the isolation layer shown.

[0040] Figures 9 to 11 For along Figure 8 The process flow diagram shown is for forming the first electrode from the portion intercepted by the CC' line.

[0041] Figure 12 For along Figure 8 The diagram shows a partial cross-sectional view of the substrate cut by the DD' line.

[0042] Figures 13 to 15 For along Figure 8 The process flow diagram shows the portion of the anode formed by the section cut off by the EE' line.

[0043] Figure 16 This is a partial planar structure schematic diagram of a display substrate provided according to another example of an embodiment of the present utility model.

[0044] Figures 17 to 19 For along Figure 16 The process flow diagram shows the portion intercepted by the FF' line that forms the anode.

[0045] Figure 20 This is a schematic diagram showing the structure where the edge of the first electrode extends beyond the edge of the insulator pattern.

[0046] Figures 21 to 24 This is a partial planar structure schematic diagram of a display substrate provided according to other examples of embodiments of the present utility model.

[0047] Figure 25 for Figure 24 The image shows a bright spot pattern on the substrate.

[0048] Figure 26A for Figure 24 The image shown is a partial view of the display substrate under an optical microscope.

[0049] Figure 26B for Figure 24 The image shown is a focused ion beam (FIB) diagram of a portion of the display substrate.

[0050] Figure 27 and Figure 28 This is a schematic diagram of the portion of the membrane layer containing the isolation layer located in the peripheral region in different examples of embodiments of the present utility model.

[0051] Figure 29 for Figure 28A magnified view of a portion of region G shown.

[0052] Figure 30 This is a partial planar structure schematic diagram of a display substrate provided according to another example of an embodiment of the present utility model.

[0053] Figure 31 This is a schematic diagram of a partial planar structure in a display substrate.

[0054] Figure 32 This is a partial planar structure schematic diagram of a display substrate provided according to an example of an embodiment of the present utility model.

[0055] Figure 33 For including Figure 32 A schematic diagram of the display substrate with the isolation layer shown.

[0056] Figure 34 and Figure 35 This is a partial planar structural schematic diagram of a display substrate provided according to different examples of embodiments of the present utility model.

[0057] Figure 36 This is a schematic block diagram of a display device according to another embodiment of the present invention. Detailed Implementation

[0058] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this utility model. Based on the described embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this utility model.

[0059] Unless otherwise defined, the technical or scientific terms used in this invention shall have the ordinary meaning understood by one of ordinary skill in the art to which this invention pertains. The terms "first," "second," and similar terms used in this invention do not indicate any order, quantity, or importance, but are merely used to distinguish different components. Terms such as "comprising" or "including" mean that the element or object preceding the word encompasses the elements or objects listed following the word and their equivalents, without excluding other elements or objects.

[0060] The features "parallel," "perpendicular," and "identical" used in this embodiment of the invention include the strictly defined meanings of "parallel," "perpendicular," and "identical," as well as cases where "approximately parallel," "approximately perpendicular," and "approximately identical" contain a certain degree of error. Taking into account measurement and errors associated with the measurement of a specific quantity (e.g., limitations of the measurement system), they represent the acceptable deviation range for a specific value as determined by a person skilled in the art. For example, "approximately" can mean within one or more standard deviations, or within 10% or 5% of the value. Unless otherwise specified in the following embodiments of the invention, the quantity of a component is implied to mean that the component can be one or more, or can be understood as at least one. "At least one" refers to one or more, and "more" refers to at least two.

[0061] Tandem technology involves stacking and connecting two light-emitting layers in series within a sub-pixel, with a charge-generating layer (such as a P-type doped charge-generating layer P-CGL and an N-type doped charge-generating layer N-CGL) between the stacked light-emitting layers. Compared to display substrates without tandem devices, tandem devices use N / P-CGL as a heterojunction to connect the two light-emitting layers in series. This technology achieves dual-emitting device cascading, significantly reducing the emission current of the light-emitting devices at the same luminous intensity, thus improving the lifetime of organic light-emitting elements and reducing power consumption. Consequently, the application of tandem devices in the automotive field is gradually increasing.

[0062] Figure 1 This is a schematic diagram of a partial planar structure in a display substrate. Figure 2 For along Figure 1 A schematic diagram of the local structure intercepted by line AA'.

[0063] like Figure 1 and Figure 2 As shown, when the display substrate includes an organic light-emitting display device with a tandem structure, an inorganic layer 004 is provided between the anode 006 of the sub-pixels, such as red sub-pixel 001, green sub-pixel 002 and blue sub-pixel 003, and the substrate, and the edges of the inorganic patterns 004 corresponding to at least some sub-pixels are exposed by the openings 005 in the pixel defining pattern 008 to block the charge generation layer in the light-emitting functional layer, thereby reducing crosstalk between adjacent sub-pixels.

[0064] like Figure 1 and Figure 2As shown, an organic layer 007 is disposed on the side of the inorganic pattern 004 away from the pixel-defined pattern 008. During the etching process of forming the inorganic pattern 004 on the organic layer 007, the etching gas etches the portion of the organic layer 007 not covered by the inorganic pattern 004 to form a groove 071. The edge of the inorganic pattern 004 covering the groove 071 protrudes relative to the edge of the groove 071, forming an undercut structure. The depth of the groove 071 is 0~1 micrometer, such as 0.18 micrometers.

[0065] Figures 3A to 3C For along Figure 1 The process flow diagram shows the portion of the BB' line that forms the anode. Figure 4 for Figure 1 The image shows a schematic diagram of a portion of the display substrate under an optical microscope. Figure 5 for Figure 1 The image shown is a focused ion beam (FIB) diagram of a portion of the display substrate. Figure 6 for Figure 1 The image shows a bright spot pattern on the substrate.

[0066] The process of forming the anode mainly includes coating the anode film layer with photoresist, exposure, development of the photoresist, etching of the anode film layer to form the anode pattern, and removal of the photoresist.

[0067] During the research, the inventors of this application discovered that: Figure 1 As shown, the distance D1 between the inorganic patterns 004 corresponding to adjacent blue sub-pixels 003 arranged along the Y direction is approximately 28-31 micrometers, and the distance D2 between the inorganic patterns 004 corresponding to adjacent red sub-pixels 001 and green sub-pixels 002 arranged along the Y direction is approximately 4-6 micrometers. Clearly, the distance between the inorganic patterns corresponding to adjacent blue sub-pixels is relatively large.

[0068] like Figure 3A As shown, after the inorganic pattern 004 is patterned, a conductive layer 061 is formed on the inorganic pattern 004 and the organic layer 007, and then a photoresist layer 081 is formed on the conductive layer 061.

[0069] like Figure 1 , Figure 3A and Figure 3BAs shown, a photoresist pattern 082 is formed by patterning the photoresist layer 081 using a photomask. The organic layer 007 contains grooves. On one hand, the size of the grooves in the Y direction is larger than D1. On the other hand, the height difference between the portion of the conductive layer 061 used to pattern the anode on the inorganic pattern 004 and the portion located in the grooves is significant. This results in a faster flow rate of the developer 083 towards the grooves during the development process compared to other locations. The developer at the edge of the light-emitting area, i.e., the edge of the inorganic pattern 004, is diluted, leading to insufficient reaction of the photoresist layer at the edge of the inorganic pattern 004, resulting in residual photoresist pattern 084.

[0070] like Figure 3B and Figure 3C As shown, after patterning the conductive layer 061 using photoresist pattern 082 and photoresist pattern residue 084 as masks to form the anode 006, anode residue 062 will also exist. This anode residue 062 may cause electrical connection problems between the anodes of adjacent sub-pixels, resulting in display defects, such as those observed during product highlight analysis. Figure 6 The full-screen highlight 009 shown Figure 6 The black dots 009 shown are all bright spots) clustering problem, which means that bright spot defects have been generated.

[0071] like Figure 4 As shown, there is residual anode 062 at the edge of anode 006. Figure 5 As shown, there is an anode residue 062 between the anodes 006 of adjacent sub-pixels, which can easily lead to electrical connection problems between the anodes 006 of adjacent sub-pixels.

[0072] This invention provides a display substrate and a display device. The display substrate includes a substrate and an isolation layer located on the substrate. The substrate includes a display area, and the portion of the isolation layer located in the display area includes a plurality of isolation patterns arranged in an array along a first direction and a second direction. Each isolation pattern includes a plurality of isolation sub-patterns, and the first direction intersects the second direction. Adjacent isolation patterns arranged along the first direction have at least a first interval and a second interval arranged along the second direction. One of the adjacent isolation patterns includes at least a first isolation sub-pattern and a second isolation sub-pattern arranged along the second direction. The interval between the first isolation sub-pattern and another adjacent isolation pattern is the first interval, and the interval between the second isolation sub-pattern and another adjacent isolation pattern is the second interval. The ratio between the width of at least a portion of the first interval and the width of at least a portion of the second interval is 0.9 to 1.1.

[0073] By setting the ratio between the width of the first interval and the width of the second interval between different isolation patterns, it is beneficial to reduce the difference in the interval width between different isolation patterns, thereby significantly alleviating the display bright spot phenomenon caused by anode residue on the display substrate.

[0074] The display substrate and display device provided in the embodiments of this utility model are described below with reference to the accompanying drawings.

[0075] Figure 7 This is a partial planar structure schematic diagram of a display substrate provided according to an example of an embodiment of the present utility model.

[0076] like Figure 7 As shown, the display substrate includes a substrate 01 and an isolation layer 10 located on the substrate 01. The substrate 01 includes a display area 010. The portion of the isolation layer 10 located in the display area 010 includes a plurality of isolation patterns 100 arranged in an array along a first direction and a second direction. Each isolation pattern 100 includes a plurality of isolation sub-patterns 101, and the first direction intersects the second direction. For example, the isolation layer 10 can be made of an inorganic non-metallic material, such as silicon nitride (SiNx) or silicon oxide (SiOx).

[0077] For example, such as Figure 7 As shown, different isolation patterns 100 may have the same shape, but are not limited to this; for example, at least two isolation patterns 100 may have different shapes. For example, at least two of the multiple isolation sub-patterns 101 included in the same isolation pattern 100 may have different shapes.

[0078] For example, such as Figure 7 As shown, the first direction can be parallel to the X-direction, and the second direction can be parallel to the Y-direction. For example, the angle between the first and second directions can be 80 to 100 degrees, or the first and second directions can be perpendicular. For example, one of the first and second directions can be a row direction, and the other can be a column direction. However, this is not a limitation, and the first and second directions can be interchanged.

[0079] like Figure 7As shown, adjacent isolation patterns 100 arranged along a first direction have at least a first interval 201 and a second interval 202 arranged along a second direction. One of the adjacent isolation patterns 100 includes at least a first isolation sub-pattern 110 and a second isolation sub-pattern 120 arranged along the second direction. The interval between the first isolation sub-pattern 110 and another isolation pattern 100 in the adjacent isolation patterns 100 is the first interval 201, and the interval between the second isolation sub-pattern 120 and another isolation pattern 100 in the adjacent isolation patterns 100 is the second interval 202. The ratio between the width of at least a portion of the first interval 201 and the width of at least a portion of the second interval 202 is 0.9 to 1.1. For example, the width of the first interval 201 can refer to the dimension of the first interval 201 in the first direction; the width of the second interval 202 can refer to the dimension of the second interval 202 in the first direction.

[0080] By setting the ratio between the width of the first interval and the width of the second interval between different isolation patterns, it is beneficial to reduce the difference in the interval width between different isolation patterns, thereby significantly alleviating the display bright spot phenomenon caused by anode residue on the display substrate.

[0081] For example, Figure 7 The schematic diagram shows that one of the adjacent isolation patterns 100 arranged along the first direction includes two isolation sub-patterns 101, but is not limited thereto, and may also include three or more isolation sub-patterns 101. Figure 7 The diagram schematically shows that another isolation pattern 100 in an adjacent isolation pattern 100 includes an isolation sub-pattern 101, but is not limited thereto, and may also include two or more isolation sub-patterns 101.

[0082] For example, such as Figure 7 As shown, the distance between the edge of the first isolation sub-pattern 110 away from the center of the isolation pattern 100 and the edge of the adjacent isolation pattern 100 near the first isolation sub-pattern 110 is the first distance 201. The distance between the edge of the second isolation sub-pattern 120 away from the center of the isolation pattern 100 and the edge of the adjacent isolation pattern 100 near the second isolation sub-pattern 120 is the second distance 202. For example, the width of each position in the first distance 201 is equal. The second distance 202 includes the protrusion 1011 in the isolation layer 10 (described later), so the width of some positions in the second distance 202 is equal. For example, the width of the first distance 201 is equal to the width of the second distance 202 except for the protrusion 1011.

[0083] In some examples, such as Figure 7As shown, adjacent isolation patterns 100 arranged along the second direction have at least a third interval 203 and a fourth interval 204 arranged along the first direction. One of the adjacent isolation patterns 100 includes at least a third isolation sub-pattern 130 and a fourth isolation sub-pattern 140 arranged along the first direction. The interval between the third isolation sub-pattern 130 and another isolation pattern 100 in the adjacent isolation patterns 100 is the third interval 203, and the interval between the fourth isolation sub-pattern 140 and another isolation pattern 100 in the adjacent isolation patterns 100 is the fourth interval 204. The ratio between at least a portion of the width of the third interval 203 and at least a portion of the width of the fourth interval 204 is 0.9 to 1.1. For example, the width of the third interval 203 can refer to the dimension of the third interval 203 in the second direction; the width of the fourth interval 204 can refer to the dimension of the fourth interval 204 in the second direction.

[0084] By setting the ratio between the width of the first interval 201 and the width of the second interval 202 between different isolation patterns 100, and simultaneously setting the ratio between the width of the fourth interval 204 and the width of the third interval 203, it is beneficial to reduce the difference in the interval width between different isolation patterns 100 in each direction, which can further alleviate the problem of display bright spots caused by anode residue on the display substrate.

[0085] For example, Figure 7 The schematic diagram shows that one of the adjacent isolation patterns 100 arranged along the second direction includes two isolation sub-patterns 101, but is not limited thereto, and may also include three or more isolation sub-patterns 101. Figure 7 The diagram schematically shows that another isolation pattern 100 in an adjacent isolation pattern 100 includes two isolation sub-patterns 101 arranged along a second direction, but is not limited thereto, and may also include one or more isolation sub-patterns 101.

[0086] For example, such as Figure 7 As shown, the interval between the edge of the third isolation sub-pattern 130 away from the center of its containing isolation pattern 100 and the edge of the adjacent isolation pattern 100 near the third isolation sub-pattern 130 is the third interval 203. The interval between the edge of the fourth isolation sub-pattern 140 away from the center of its containing isolation pattern 100 and the edge of the adjacent isolation pattern 100 near the fourth isolation sub-pattern 140 is the second interval 202. For example, the width of each position in the third interval 203 is equal, and the width of each position in the fourth interval 204 is equal. For example, the width of the third interval 203 is equal to the width of the fourth interval 204.

[0087] For example, such as Figure 7 As shown, one of the third isolation sub-pattern 130 and the fourth isolation sub-pattern 140 can be one of the first isolation sub-pattern 110 and the second isolation sub-pattern 120. Figure 7 The fourth isolation sub-pattern 140 is schematically shown as the second isolation sub-pattern 120, but it is not limited thereto. The third isolation sub-pattern 130 can also be the second isolation sub-pattern 120, or the fourth isolation sub-pattern 140 can be the first isolation sub-pattern 110, or the third isolation sub-pattern 130 can be the first isolation sub-pattern 110.

[0088] For example, such as Figure 7 As shown, the third interval 203 can be the interval between two third isolation sub-patterns 130 in two adjacent isolation patterns, the fourth interval 204 can be the interval between the fourth isolation sub-pattern 140 (or the second isolation sub-pattern 120) in one isolation pattern and the first isolation sub-pattern 110 in another isolation pattern, the first interval 201 can be the interval between the first isolation sub-pattern 110 in one isolation pattern and the third isolation sub-pattern 130 in another isolation pattern, and the second isolation sub-pattern 120 can be the interval between the second isolation sub-pattern 120 (or the fourth isolation sub-pattern 140) in one isolation pattern and the third isolation sub-pattern 130 in another isolation pattern.

[0089] For example, such as Figure 7 As shown, the same isolation pattern 100 includes three isolation sub-patterns 101, which include the first isolation sub-pattern 110, the second isolation sub-pattern 120 (or the fourth isolation sub-pattern 140) and the third isolation sub-pattern 130.

[0090] In some examples, such as Figure 7 As shown, in the same isolation pattern 100, there is a gap between adjacent isolation sub-patterns 101, and the extension direction of the gap intersects with the arrangement direction of the adjacent isolation sub-patterns 101.

[0091] For example, such as Figure 7 As shown, in the same isolation pattern 100, the third isolation sub-pattern 130 is provided with a gap extending along the Y direction between the first isolation sub-pattern 110 and the second isolation sub-pattern 120, and the first isolation sub-pattern 110 is provided with a gap extending along the X direction between the second isolation sub-pattern 120.

[0092] For example, such as Figure 7 As shown, in the same isolation pattern 100, the portion of the interval extending along the second direction between the third isolation sub-pattern 130 and the second isolation sub-pattern 120 can be equal to the interval extending along the second direction between the third isolation sub-pattern 130 and the first isolation sub-pattern 110.

[0093] For example, such as Figure 7 As shown, in the same isolation pattern 100, multiple isolation sub-patterns 101 are integrated into a single structure.

[0094] In some examples, such as Figure 7 As shown, the multiple isolation patterns 100 are an integrated structure.

[0095] Figure 8 For including Figure 7 A schematic diagram of the display substrate with the isolation layer shown. Figures 9 to 11 For along Figure 8 The process flow diagram shown is for forming the first electrode from the portion intercepted by the CC' line. Figure 12 For along Figure 8 The diagram shows a partial cross-sectional view of the substrate cut by the DD' line.

[0096] In some examples, such as Figure 8 and Figure 12 As shown, the display substrate also includes a plurality of pixel units 300 and a pixel defining pattern 400. The pixel units 300 are located on the substrate 01. Each pixel unit 300 includes sub-pixels 310 of different colors. At least some of the sub-pixels 310 include a first electrode 311, a light-emitting functional layer 313 and a second electrode 312 stacked sequentially. The first electrode 311 is located between the light-emitting functional layer 313 and the substrate 01. The pixel defining pattern 400 is located at least on the side of the first electrode 311 away from the substrate 01. The pixel defining pattern 400 includes a plurality of first openings 410 and a plurality of second openings 420. The plurality of first openings 410 are configured to define the light-emitting area of ​​the sub-pixels 310 in the plurality of pixel units 300.

[0097] For example, such as Figure 12 As shown, the light-emitting functional layer 313 may include a light-emitting layer for emitting light and a charge-generating layer (CGL). For example, the light-emitting functional layer 313 may be a film layer in an organic light-emitting element. For example, the light-emitting functional layer 313 may include a first light-emitting layer and a second light-emitting layer stacked together, with the charge-generating layer located between the first light-emitting layer and the second light-emitting layer. Figure 12 The thicknesses of the multiple film layers included in the illustrated light-emitting functional layer 313 are only for clear illustration and do not represent actual dimensions. For example, in the same sub-pixel 310, the first light-emitting layer and the second light-emitting layer can be light-emitting layers that emit the same color of light. For example, the first light-emitting layer in a sub-pixel 310 that emits different colors of light emits different colors of light. For example, the second light-emitting layer in a sub-pixel 310 that emits different colors of light emits different colors of light. Of course, the embodiments of this utility model are not limited to this. For example, in the same sub-pixel 310, the first light-emitting layer and the second light-emitting layer can be light-emitting layers that emit different colors of light. By setting light-emitting layers that emit different colors of light in the same sub-pixel 310, the light emitted by the multiple light-emitting layers included in the sub-pixel 310 can be mixed into white light. The color of the light emitted by each sub-pixel 310 can be adjusted by setting a color filter layer.

[0098] For example, such as Figure 12 As shown, the film layer between the charge generation layer and the substrate 01 may include a first light-emitting layer and other functional layers. For example, a hole injection layer may be disposed between the first electrode 311 and the first light-emitting layer; an electron transport layer may be disposed between the charge generation layer and the first light-emitting layer. For example, the film layer between the charge generation layer and the second electrode 312 may include a second light-emitting layer and other functional layers. For example, a hole transport layer may be disposed between the second light-emitting layer and the charge generation layer; an electron transport layer and an electron injection layer may be disposed between the second light-emitting layer and the second electrode 312.

[0099] For example, the hole injection layer, hole transport layer, electron transport layer, electron injection layer, charge generation layer, and second electrode 312 are all common film layers of multiple sub-pixels 310, and can be called common layers. For example, the aforementioned common layer and second electrode 312 can be full-surface film layers formed using an open mask. For example, the first light-emitting layer and the second light-emitting layer can be film layers formed using a fine metal mask (FMM), and a gap can be set between the light-emitting layers of different sub-pixels 310.

[0100] For example, such as Figure 12 As shown, the charge generation layer has strong conductivity, which enables the light-emitting functional layer 313 to have advantages such as long lifetime, low power consumption, and high brightness. For example, the charge generation layer may include an N-type charge generation layer and a P-type charge generation layer. For example, the material of the charge generation layer may be a material containing phosphorothoxy groups or a material containing triazine. For example, the ratio of the electron mobility of the charge generation layer material to the electron mobility of the electron transport layer material is 10. -2 ~10 2 .

[0101] For example, such as Figure 12 As shown, the first electrode 311 can be the anode, and the second electrode 312 can be the cathode.

[0102] For example, such as Figure 12As shown, the first opening 410 can be a pixel opening used to define the light-emitting area of ​​the sub-pixel 310. When the light-emitting functional layer 313 is formed in the first opening 410 of the pixel defining pattern 400, the first electrode 311 and the second electrode 312 located on both sides of the light-emitting functional layer 313 can drive the light-emitting functional layer 313 in the first opening 410 to emit light. The aforementioned light-emitting area can refer to the area where the sub-pixel 310 effectively emits light, and the shape of the light-emitting area refers to a two-dimensional shape. For example, the shape of the light-emitting area can be the same as the shape of the first opening 410 of the pixel defining pattern 400. The aforementioned light-emitting area can refer to the area defined by a ring of edges surrounding the pixel defining portion of the first opening 410 and the second opening 420 that contacts the first electrode 311 in the pixel defining pattern 400. This area can be called a PDL opening. For example, the material of the pixel defining portion can include polyimide, acrylic, or polyethylene terephthalate, etc.

[0103] In some examples, such as Figure 8 and Figure 12 As shown, the isolation layer 10 is located between the first electrode 311 and the substrate 01, and the edges of the isolation layer 10 exposed by a plurality of second openings 420 are configured to block at least a portion of the light-emitting functional layer 313. Figure 12 The diagram schematically shows that the edge of the isolation layer 10 exposed by the second opening 420 blocks all the film layers of the light-emitting functional layer 313 and the second electrode 312, but it is not limited thereto. The edge of the isolation layer 10 exposed by the second opening 420 can block part of the film layers of the light-emitting functional layer 313 without blocking the second electrode 312.

[0104] For example, such as Figure 12 As shown, the organic layer 007 can be a planarization layer or an isolation layer. For example, the edge of the isolation sub-pattern 101 protrudes relative to the edge of the groove in the planarization layer. The portion of the protruding edge exposed by the second opening 420 can be used to block at least one layer of the light-emitting functional layer 313. The portion of the protruding edge covered by the pixel-defining portion of the pixel-defining pattern 400 is not used to block the light-emitting functional layer 313.

[0105] For example, such as Figure 12 As shown, the orthographic projection of the first electrode 311 on the substrate 01 is completely within the orthographic projection of the isolation layer 10 on the substrate 01, so as to avoid the first electrode 311 covering the uneven surface of the planarization layer that is not covered by the isolation layer 10, which would affect the performance of the first electrode 311.

[0106] For example, such as Figure 12 As shown, a film layer 02 is disposed between the substrate 01 and the organic layer 007. The film layer 02 may include the pixel circuit of the sub-pixel 310, multiple signal lines, insulating layers between different conductive layers, and other film layers.

[0107] In some examples, such as Figure 7 and Figure 8 As shown, multiple pixel units 300 are configured one-to-one with multiple isolation patterns 100, and multiple isolation sub-patterns 101 in each isolation pattern 100 are configured one-to-one with sub-pixels 310 in each pixel unit 300. The above-mentioned "multiple pixel units 300 are configured one-to-one with multiple isolation patterns 100" means that an isolation pattern 100 is provided between the first electrode 311 of each pixel unit 300 and the substrate 01; the above-mentioned "multiple isolation sub-patterns 101 in each isolation pattern 101 are configured one-to-one with sub-pixels 310 in each pixel unit 300" means that an isolation sub-pattern 101 is provided between the first electrode 311 of each sub-pixel 310 and the substrate 01.

[0108] In some examples, such as Figure 7 and Figure 8 As shown, at least a portion of the edge of the first isolation sub-pattern 110 is flush with at least a portion of the edge of the second isolation sub-pattern 120, and at least a portion of the edge of the third isolation sub-pattern 130 is flush with at least a portion of the edge of the fourth isolation sub-pattern 140.

[0109] By setting the edges of the first isolation sub-pattern 110 and the second isolation sub-pattern 120 to be flush, and setting the edges of the third isolation sub-pattern 130 and the fourth isolation sub-pattern 140 to be flush, the widths of the first interval 201 and the second interval 202 are equal, and the widths of the third interval 203 and the fourth interval 204 are equal. This ensures that the developing environment of the developer is the same at different intervals. For example, the speed change of the developer is small when it flows from the first interval 201 to the second interval 202, and the speed change is small when it flows from the third interval 203 to the fourth interval 204. This avoids the different flow speeds of the developer at different intervals, which would affect the full reaction of the photoresist. In turn, it avoids the presence of residues at locations where the first electrode 311 should not be retained during the patterning process of forming the first electrode 311.

[0110] In some examples, such as Figure 7 and Figure 8 As shown, the widths of the first interval 201, the second interval 202, the third interval 203, and the fourth interval 204 are all not less than 1.8 micrometers and not greater than 12 micrometers.

[0111] By setting the widths of the first interval 201, the second interval 202, the third interval 203, and the fourth interval 204 within a size range of not less than 1.8 micrometers and not more than 12 micrometers, the flow rate of the developer at each interval can be effectively slowed down, achieving a full reaction between the photoresist and the developer. This solves the problem of residual first electrode 311 in display substrates including Tandem devices and effectively avoids the problem of high bright spot occurrence.

[0112] For example, such as Figure 7 and Figure 8 As shown, the width of the first interval 201 and the width of the second interval 202 are 8-9 micrometers, and the width of the third interval 203 and the width of the fourth interval 204 are 4-6 micrometers. Since the protrusion 1011 is not required in the third interval 203 and the fourth interval 204, the width of the third interval 203 and the fourth interval 204 can be smaller than the width of the first interval 201 and the second interval 202.

[0113] For example, such as Figure 9 As shown, after the isolation pattern 100 is patterned, a conductive layer 061 is formed on the isolation pattern 100, and then a photoresist layer 081 is formed on the conductive layer 061.

[0114] For example, such as Figure 10 and Figure 11 As shown, during the development of the photoresist layer, the smaller width of the third gap 203 significantly reduces the flow rate of the developer at the third gap 203, thereby achieving a full reaction between the photoresist layer and the developer and preventing issues such as those encountered during the formation of the photoresist pattern 082. Figure 3B The photoresist pattern shown is residual, which can be avoided in the process of patterning the conductive layer 061 with the photoresist pattern 082 as a mask to form the first electrode 311.

[0115] In some examples, such as Figure 7 and Figure 8 As shown, each pixel unit 300 includes a first color sub-pixel 301, a second color sub-pixel 302, and a third color sub-pixel 303. The first color sub-pixel 301 and the second color sub-pixel 302 are arranged along a second direction, and the first color sub-pixel 301 and the third color sub-pixel 303 are arranged along a first direction. For example, the first color sub-pixel 301 corresponds to the first isolation sub-pattern 110, the second color sub-pixel 302 corresponds to the second isolation sub-pattern 120, and the third color sub-pixel 303 corresponds to the third isolation sub-pattern 130. The first isolation sub-pattern 110 and the second isolation sub-pattern 120 can be interchanged, and the third isolation sub-pattern 130 and the fourth isolation sub-pattern 140 can be interchanged.

[0116] For example, Figure 8 The pixel arrangement shown is a real pixel arrangement. For example, the third color sub-pixel 303 is the blue sub-pixel 310, and one of the first color sub-pixel 301 and the second color sub-pixel 302 is a red sub-pixel, and the other is a green sub-pixel. For example, the first color sub-pixel 301 is a red sub-pixel, and the second color sub-pixel 302 is a green sub-pixel.

[0117] Figure 8 In the subsequent real pixel arrangement, the red and green sub-pixels can be arranged alternately in the Y direction as shown in the figure, but it is not limited to this. It can also be that in two adjacent pixel units 300 in the Y direction, two red sub-pixels are set adjacent to each other, or two green sub-pixels are set adjacent to each other; or, in two adjacent pixel units 300 in the X direction, two blue sub-pixels, two green sub-pixels, and two blue sub-pixels are set adjacent to each other, etc., so that multiple sub-pixels 310 of the same color are formed in the same mask opening.

[0118] For example, such as Figure 8 As shown, the distance between the edges of the light-emitting areas of the first color sub-pixel 301 and the second color sub-pixel 302 that are far apart from each other is greater than the size of the light-emitting area of ​​the third color sub-pixel 303 in the Y direction. In a typical display substrate, the distance between the edge of the isolation sub-pattern 101 corresponding to different color sub-pixels 310 and the edge of the corresponding light-emitting area is set as follows: Figure 1 The approximately equal distances shown result in the distance D1 between the isolation sub-patterns 101 corresponding to the adjacent third color sub-pixels 303 arranged along the Y direction being greater than the distance D2 between the isolation sub-patterns 101 corresponding to the adjacent first color sub-pixels 301 and second color sub-pixels 302 arranged along the Y direction. This leads to a faster flow of the developer towards the gap between the isolation sub-patterns 101 corresponding to the adjacent third color sub-pixels 303, affecting the development effect of the photoresist.

[0119] In some examples, such as Figure 8 As shown, in the second direction, the distance D01 between the edge of the light-emitting area of ​​at least one of the first color sub-pixel 301 and the second color sub-pixel 302 and the edge of the corresponding isolation sub-pattern 101 is less than the distance D02 between the edge of the light-emitting area of ​​the third color sub-pixel 303 and the edge of its corresponding isolation sub-pattern 101.

[0120] Without changing the position of the light-emitting area of ​​each color sub-pixel 310, by lengthening the size of the isolation sub-pattern 101 corresponding to the third color sub-pixel 303 in the Y direction, such as increasing the distance between the light-emitting area of ​​the third color sub-pixel 303 and the edge of the corresponding isolation sub-pixel 310 in the second direction, it is beneficial to reduce the difference in width between the third and fourth intervals, so that the developing environment of the developing solution is the same at different intervals, avoiding the difference in the flow speed of the developing solution at different intervals, which would affect the full reaction of the photoresist, and thus avoiding the presence of residues at the position where the first electrode 311 should not be retained during the patterning process of forming the first electrode 311.

[0121] For example, such as Figure 8As shown, in the second direction, the distance between the edge of the light-emitting area of ​​the first color sub-pixel 301 and the edge of the corresponding isolation sub-pattern 101 is less than the distance D02 between the edge of the light-emitting area of ​​the third color sub-pixel 303 and the edge of its corresponding isolation sub-pattern 101. For example, in the second direction, the distance between the edge of the light-emitting area of ​​the second color sub-pixel 302 and the edge of the corresponding isolation sub-pattern 101 is less than the distance D02 between the edge of the light-emitting area of ​​the third color sub-pixel 303 and the edge of its corresponding isolation sub-pattern 101. For example, in the second direction, the distances between the edges of the light-emitting areas of the first color sub-pixel 301 and the second color sub-pixel 302 and the edges of their respective isolation sub-patterns 101 are both less than the distance D02 between the edge of the light-emitting area of ​​the third color sub-pixel 303 and the edge of its corresponding isolation sub-pattern 101.

[0122] In some examples, such as Figure 8 As shown, in the same pixel unit 300, at least a portion of the edge extending along the first direction of the isolation sub-pattern 101 corresponding to the third color sub-pixel 303 is flush with at least a portion of the edge extending along the first direction of the isolation sub-pattern 101 corresponding to the other color sub-pixel 310. For example, the edge extending along the first direction of the isolation sub-pattern 101 corresponding to the third color sub-pixel 303 is completely flush with the edge extending along the first direction of the isolation sub-pattern 101 corresponding to the second color sub-pixel 302. For example, the edge extending along the first direction of the isolation sub-pattern 101 corresponding to the third color sub-pixel 303 is completely flush with the edge extending along the first direction of the isolation sub-pattern 101 corresponding to the first color sub-pixel 301.

[0123] Without changing the position of the light-emitting area of ​​each color sub-pixel 310, the size of the isolation sub-pattern 101 corresponding to the third color sub-pixel 303 in the Y direction is increased, such as increasing the distance between the light-emitting area of ​​the third color sub-pixel 303 and the edge of the corresponding isolation sub-pixel 310 in the second direction, so that the edge of the isolation sub-pattern 101 corresponding to the third color sub-pixel 303 is flush with the edge of the isolation sub-pattern 101 corresponding to the second color sub-pixel 302, and the edge of the isolation sub-pattern 101 corresponding to the third color sub-pixel 303 is flush with the edge of the isolation sub-pattern 101 corresponding to the first color sub-pixel 301.

[0124] In the verification of anode residue on the same batch of display substrates, if the number of display substrates in the batch is M, and N locations of anode residue are found during the verification of these M display substrates, then the verification value is N / M. Figure 1 The verification value of the display substrate shown is approximately 12%. Figure 7 and Figure 8The verification value of the display substrate shown is about 4.6%. Therefore, by adjusting the shape of the isolation sub-pattern 101, the probability of anode residue can be significantly reduced.

[0125] Figures 13 to 15 For along Figure 8 The process flow diagram shows the portion of the anode formed by the section cut off by the EE' line.

[0126] In some examples, such as Figure 8 and Figure 15 As shown, the first electrode 311 includes a main electrode 3111 and a connecting electrode 3112. Along a direction perpendicular to the substrate 01, the connecting electrode 3112 does not overlap with the first opening 410. The connecting electrode 3112 is configured to be electrically connected to the pixel circuit 3100 included in the sub-pixel 310. For example, the shape of the main electrode 3111 is the same as the shape of the first opening 410, and the orthographic projection of the first opening 410 on the substrate 01 is completely within the orthographic projection of the main electrode 3111 on the substrate 01. For example, the main electrode 3111 and the connecting electrode 3112 are integrally formed.

[0127] Figure 15 The specific structure of the pixel circuit 3100 and other film layers between the organic layer and the substrate 01 are omitted.

[0128] In some examples, such as Figure 15 As shown, at least two adjacent isolation sub-patterns 101 include a protrusion 1011, and the protrusion 1011 includes a via 1010 so that the connection electrode 3112 is electrically connected to the pixel circuit 3100 through the via 1010.

[0129] For example, such as Figure 8 and Figure 15 As shown, the protrusion 1011 is part of the isolation pattern 100, such as being located between two adjacent isolation sub-patterns 101. The connecting electrode 3112 overlaps with the protrusion 1011. The protrusion 1011 is provided with a via 1010 so that the connecting electrode 3112 is electrically connected to the thin film transistor in the pixel circuit 3100 through the via 1010 and the via 072 in the organic layer 007.

[0130] For example, such as Figure 8As shown, each isolation sub-pattern 101, such as isolation sub-patterns 110, 120, and 130, is integrally formed with at least one protrusion 1011. For example, each isolation sub-pattern 101 is integrally formed with a corresponding protrusion 1011, and the protrusion 1011 corresponds to a portion of the pattern protruding from the edge of the isolation sub-pattern 101. For example, with the arrow pointing to the right in the X direction and the arrow pointing to the up in the Y direction, the first isolation sub-pattern 110 is integrally formed with the protrusion 1011 located below it, the second isolation sub-pattern 120 is integrally formed with the protrusion 1011 located to its right, and the third isolation sub-pattern 130 is integrally formed with the protrusion 1011 located to its right.

[0131] In some examples, such as Figure 8 As shown, there is a gap extending along the second direction between the isolation sub-pattern 101 corresponding to the third color sub-pixel 303 and the isolation sub-pattern 101 corresponding to other color sub-pixels 310 adjacent to the third color sub-pixel 303 in the first direction, and the ratio of the widths at different positions in the gap, excluding the protrusion 1011, is 0.9 to 1.1.

[0132] For example, such as Figure 7 and Figure 8 As shown, there is a second interval 202 between the isolation sub-pattern 101 corresponding to the third color sub-pixel 303 and the isolation sub-pattern 101 corresponding to the second color sub-pixel 302, and a protrusion 1011 is provided in the second interval 202.

[0133] For example, such as Figure 13 As shown, after the sub-isolation pattern 100 is patterned, a conductive layer 061 is formed on the sub-isolation pattern 100, and then a photoresist layer 081 is formed on the conductive layer 061. For example, the conductive layer 061 is electrically connected to the pixel circuit 3100 through vias 1010 in the isolation pattern 100 and vias 072 in the organic layer 007.

[0134] For example, such as Figures 13 to 15As shown, a photoresist pattern 082 is formed by patterning the photoresist layer 081 using a mask. When the protrusion 1011 between adjacent isolation sub-patterns 101 is connected to both adjacent isolation sub-patterns 101, during the photoresist development stage of the first electrode 311 fabrication process, the connection between the protrusion 1011 and both sides of the isolation sub-patterns 101 may obstruct the flow of the photoresist developer 083. For example, the developer may be obstructed during its horizontal and vertical flow, resulting in a large difference in the developer concentration at different positions of at least one isolation sub-pattern 101. This leads to the presence of photoresist residue 084 during the development process. This residue 084 can cause residue 085 during the process of patterning the conductive layer 061 using the photoresist pattern 082 as a mask to form the first electrode 311, resulting in bright spot problems.

[0135] Figure 15 To illustrate, in some examples, Figure 8 When the isolation sub-pattern 101 shown is an integrated structure, residual material on the first electrode 311 can cause bright spot problems. However, this is not the only case; in other examples, Figure 8 When the isolation sub-pattern 101 shown is an integrated structure, the first electrode 311 has less residue, resulting in a less severe bright spot problem or no bright spot problem, or the first electrode 311 has no residue.

[0136] Figure 16 This is a partial planar structure schematic diagram of a display substrate provided according to another example of an embodiment of the present utility model.

[0137] Figure 16 The positional relationship between the isolation layer 10 and the first opening 410 and the second opening 420 in the pixel-defined pattern 400 is only shown. Figure 16 The display substrate shown is Figure 7 and Figure 8 The difference in the display substrate shown is that at least two adjacent isolation patterns 100 are independent structures. Figures 17 to 19 For along Figure 16 The process flow diagram shows the portion intercepted by the FF' line that forms the anode.

[0138] In some examples, such as Figure 16 As shown, at least two adjacent isolation patterns 100 are independent structures.

[0139] In some examples, such as Figure 16 As shown, a gap 1012 is provided between at least one protrusion 1011 and the adjacent isolation sub-pattern 101 therewith.

[0140] For example, such as Figure 17As shown, after the sub-isolation pattern 100 is patterned, a conductive layer 061 is formed on the sub-isolation pattern 100, and then a photoresist layer 081 is formed on the conductive layer 061. For example, the conductive layer 061 is electrically connected to the pixel circuit 3100 through vias 1010 in the isolation pattern 100 and vias 072 in the organic layer 007. Since a gap 1012 is provided between the protrusion 1011 in the isolation pattern 100 and the adjacent isolation sub-pattern 101, the conductive layer 061 fills the gap 1012 to form a recess.

[0141] For example, such as Figures 17 to 19 As shown, a photoresist pattern 082 is formed by patterning the photoresist layer 081 using a photomask. In the photoresist development stage of the first electrode 311 fabrication process, by setting a gap between the protrusion 1011 and the adjacent isolation sub-patterns 101, the difference in the developer at different locations can be reduced, ensuring that the developer flows sufficiently between the isolation sub-patterns 101. In particular, when the isolation sub-patterns 101 overlapping with the third color sub-pixel 303 are extended to be basically flush with the edges of the isolation sub-patterns 101 overlapping with other color sub-pixels 310, the difference in the development reaction environment of the developer between different isolation sub-patterns 101 can be significantly reduced, providing a suitable path for the flow of the developer, thereby avoiding the bright spot phenomenon caused by residue problems in the first electrode 311.

[0142] For example, such as Figure 16 As shown, the width of the gap 1012 between the protrusion 1011 and its adjacent isolation sub-pattern 101 is 2 to 5 micrometers. For example, the width of the gap 1012 between the protrusion 1011 and its adjacent isolation sub-pattern 101 is 2.3 to 4.8 micrometers. For example, the width of the gap 1012 between the protrusion 1011 and its adjacent isolation sub-pattern 101 is 3 to 4 micrometers. This embodiment of the invention will not list specific values ​​for the width of the gap between the protrusion 1011 and its adjacent isolation sub-pattern 101; it can be any value between 2 and 5. Figure 16 In the display substrate shown, the width of the gap between the protrusion 1011 and the adjacent isolating sub-pattern 101 is 2.3 micrometers.

[0143] Figure 20 This is a schematic diagram showing the structure where the edge of the first electrode 311 extends beyond the edge of the isolator pattern 101.

[0144] Theoretically, the wider the gap between the protrusion 1011 and its adjacent isolation sub-pattern 101, the better. However, this value needs to take into account the relative positional relationship between the first electrode 311 and the isolation sub-pattern 101. If the gap between the protrusion 1011 and its adjacent isolation sub-pattern 101 is too large, problems may occur. Figure 20 The fact that the edge of the first electrode 311 extends beyond the edge of the isolation sub-pattern 101 causes the first electrode 311 to have problems such as breakage and uneven surface.

[0145] In some examples, such as Figure 16 As shown, each protrusion 1011 is connected to one of the isolation sub-patterns 101 located on both sides thereon, and is spaced apart from the other. For example, different isolation sub-patterns 101 are independent structures. For example, an isolation sub-pattern 101 and a protrusion 1011 are integrated into a structure, overlapping with the protrusion 1011 integrated into each isolation sub-pattern 101 and the connection electrode 3112 of the first electrode 311 of the sub-pixel 310 corresponding to that isolation sub-pattern 101.

[0146] Figures 21 to 24 This is a partial planar structure schematic diagram of a display substrate provided according to other examples of embodiments of the present utility model. Figures 21 to 24 The positional relationship between the isolation layer 10 and the first opening 410 and the second opening 420 in the pixel-defined pattern 400 is only shown. Figures 21 to 23 The display substrate shown is Figure 16 The difference in the display substrate shown is that the connection relationship between the protrusion 1011 and the adjacent isolation sub-pattern 101 is different.

[0147] Figures 21 to 23 When a gap is provided between the protrusion 1011 and the adjacent isolation sub-pattern 101 in the display substrate shown, the width of the gap is... Figure 16 The shown intervals have the same width, such as 2.3 micrometers.

[0148] Figure 24 The display substrate shown is Figure 16 The difference in the display substrate shown is that the width of the gap between the protrusion 1011 and the adjacent isolation sub-pattern 101 is different.

[0149] In some examples, such as Figure 21 As shown, in one of the adjacent pixel units 300 arranged along the second direction, the isolation sub-pattern 101 corresponding to the third color sub-pixel 303 and the isolation sub-pattern 101 corresponding to other color sub-pixels 310 are integrated into each other. In the other adjacent pixel unit 300, the isolation sub-pattern 101 corresponding to the third color sub-pixel 303 and the isolation sub-pattern 101 corresponding to other color sub-pixels 310 are independent of each other. In the first direction, the isolation sub-pattern 101 corresponding to the third color sub-pixel 303 and the isolation sub-pattern 101 corresponding to other color sub-pixels 310 located on one side of it are integrated into each other, and the isolation sub-pattern 101 corresponding to other color sub-pixels 310 located on the other side of it are independent of each other.

[0150] In each example, an isolation sub-pattern 101 and its corresponding protrusion 1011 can be described as a whole isolation sub-pattern.

[0151] For example, such as Figure 21 As shown, in the first direction, the spacing between each overall isolation sub-pattern and its adjacent overall isolation sub-pattern is arranged in an alternating pattern. For example, the overall isolation sub-pattern corresponding to one of the adjacent third color sub-pixels 303 arranged in the second direction is connected to the overall isolation sub-pattern located to its left, and is spaced apart from the overall isolation sub-pattern located to its right; the other corresponding overall isolation sub-pattern of the adjacent third color sub-pixel 303 arranged in the second direction is connected to the overall isolation sub-pattern located to its right, and is spaced apart from the overall isolation sub-pattern located to its left. Here, we take the direction indicated by the arrow in the X direction in the figure as the rightward direction as an example for description.

[0152] For example, Figure 21 It is schematically shown that in the same pixel unit 300, the overall isolation sub-pattern corresponding to the first color sub-pixel 301 and the overall isolation sub-pattern corresponding to the second color sub-pixel 302 are connected; but not limited to this, in the same pixel unit 300, the overall isolation sub-pattern corresponding to the first color sub-pixel 301 and the overall isolation sub-pattern corresponding to the second color sub-pixel 302 can also be set at intervals.

[0153] In some examples, such as Figure 22 As shown, any two adjacent isolation sub-patterns 101 arranged along the second direction are independent structures. The isolation sub-pattern 101 corresponding to the third color sub-pixel 303 and the isolation sub-pattern 101 corresponding to one of the first color sub-pixel 301 and the second color sub-pixel 302 adjacent to the third color sub-pixel 303 are connected to each other.

[0154] For example, such as Figure 22 As shown, the isolation sub-pattern 101 corresponding to the third color sub-pixel 303 and the isolation sub-pattern 101 corresponding to the second color sub-pixel 302 located on either side of it in the first direction are integrated into a single structure. However, it is not limited to this; the isolation sub-pattern 101 corresponding to the third color sub-pixel 303 can also be integrated into a single structure with the sub-isolation pattern 100 corresponding to the first color sub-pixel 301 located on either side of it in the first direction.

[0155] For example, such as Figure 22 As shown, in the same pixel unit 300, the overall sub-isolation pattern corresponding to the first color sub-pixel 301 and the overall isolation sub-pattern corresponding to the second color sub-pixel 302 are independent structures, such as having a gap between them.

[0156] Figure 22In the display substrate shown, the developer can flow through the gap between the isolation sub-patterns 101 corresponding to the first color sub-pixel 301 and the second color sub-pixel 302, which can be referred to as a lateral full-length gap.

[0157] In some examples, such as Figure 23 As shown, any adjacent isolation sub-patterns 101 arranged along the first direction are independent structures. In the same pixel unit 300, the isolation sub-pattern 101 corresponding to the first color sub-pixel 301 and the isolation sub-pattern 101 corresponding to the second color sub-pixel 302 are connected to each other. For example, the isolation sub-pattern 101 corresponding to the first color sub-pixel 301 and the isolation sub-pattern 101 corresponding to the second color sub-pixel 302 in adjacent pixel units 300 are independent of each other.

[0158] However, this is not the only example. In other examples, any adjacent isolation sub-patterns 101 arranged along the first direction are independent structures, and the isolation sub-patterns 101 corresponding to the first color sub-pixel 301 and the second color sub-pixel 302 located in adjacent pixel units 300 are connected to each other. For example, the isolation sub-patterns 101 corresponding to the first color sub-pixel 301 and the second color sub-pixel 302 located in the same pixel unit 300 are independent of each other.

[0159] Figure 23 In the display substrate shown, the flow channels extending along the Y direction for the flow of developer are connected, which can be referred to as longitudinal full-length channels.

[0160] For example, Figure 24 The width of the gap 1012 between the protrusion 1011 and the adjacent isolation sub-pattern 101 is greater than Figure 16 The width of the spacing 1012 between the protrusion 1011 and the adjacent isolation sub-pattern 101. For example, as shown... Figure 24 As shown, the width of the gap 1012 between the protrusion 1011 and the adjacent isolation sub-pattern 101 is 5 micrometers.

[0161] In the verification of anode residue on the same batch of display substrates, if the number of display substrates in the batch is M, and N locations of anode residue are found during the verification of these M display substrates, then the verification value is N / M. Figure 16 and Figure 21 The verification value of the display substrate shown is approximately 3.8%. Figure 22 and Figure 23 The verification value of the display substrate shown is approximately 3.2%. Figure 24 The verification value of the display substrate shown is approximately 0.5%. Therefore, by adjusting the shape of the isolation sub-pattern 101, especially by increasing the distance between the protrusion 1011 and the adjacent isolation sub-pattern 101, the probability of anode residue can be further reduced.

[0162] Figure 25 for Figure 24 The image shows a bright spot pattern on the substrate. Figure 26A for Figure 24 The image shown is a partial view of the display substrate under an optical microscope. Figure 26B for Figure 24 The image shown is a focused ion beam (FIB) diagram of a portion of the display substrate.

[0163] For example, such as Figure 25 As shown, relative to Figure 6 In the case of a screen full of bright spots 009, the display substrate provided in this embodiment of the present invention sets the proportional relationship between the widths of the first interval 201 and the second interval 202, as well as the proportional relationship between the widths of the third interval 203 and the fourth interval 204, while setting the width of the gap between the protrusion 1011 and the adjacent isolation sub-pattern 101 to be large. For example, while ensuring that the position of the first electrode 311 is not affected, setting the width of the gap between the protrusion 1011 and the adjacent isolation sub-pattern 101 to the maximum is beneficial to significantly reduce the number of bright spots appearing in the display area 010 of the display substrate, such as the accumulation of bright spots 009 only at the edge of the display substrate.

[0164] For example, such as Figure 26A and Figure 26B As shown, relative to Figure 4 and Figure 5 The anode shown in the embodiment of the present invention has anode residue at the edge. By setting the proportional relationship between the width of the first interval 201 and the second interval 202 and the proportional relationship between the width of the third interval 203 and the fourth interval 204, and setting the width of the interval between the protrusion 1011 and the adjacent isolation sub-pattern 101 to be large, the probability of residue at the edge of the first electrode 311 (such as the anode) can be greatly reduced, such as to achieve basically no residue.

[0165] The positions of the second opening 420 in the above examples are for illustrative purposes only. For example, in addition to setting the second opening 420 at the edge of the isolation sub-pattern 101 corresponding to the first color sub-pixel 301 and the second color sub-pixel 302, the second opening 420 can also be set at the edge of the isolation sub-pattern 101 corresponding to the third color sub-pixel 303. For example, the second opening 420 between the first color sub-pixel 301 and the second color sub-pixel 302 can expose the isolation sub-pattern 101 corresponding to the first color sub-pixel 301, and can also expose the isolation sub-pattern 101 corresponding to the second color sub-pixel 302. For example, the second opening 420 between the third color sub-pixel 303 and the second color sub-pixel 302 can expose the isolation sub-pattern 101 corresponding to the third color sub-pixel 303, and can also expose the isolation sub-pattern 101 corresponding to the second color sub-pixel 302. For example, the second opening 420 between the first color sub-pixel 301 and the third color sub-pixel 303 can expose the isolation sub-pattern 101 corresponding to the first color sub-pixel 301, and can also expose the isolation sub-pattern 101 corresponding to the third color sub-pixel 303. In each example, the second opening 420 only exposes the straight edges of the isolation sub-pattern 101, but it is not limited to this; the second opening 420 can also expose the corners of the isolation sub-pattern 101. The patterns and distribution of the second opening 420 will not be listed here, and can be set according to requirements.

[0166] Figure 27 and Figure 28 This is a schematic diagram of the portion of the membrane layer containing the isolation layer located in the peripheral region in different examples of embodiments of the present utility model. Figure 29 for Figure 28 A magnified view of a portion of region G shown. Figure 27 and Figure 28 The display area 010 shown is an area similar to an ellipse or a racetrack. The rectangles in the display area 010 only represent different areas within the display area 010.

[0167] For example, such as Figure 27 As shown, the portion of the membrane layer containing the isolation layer 10 located in the peripheral region 011 includes identification patterns 0111 for process control testing, such as those used to test membrane layer offset. For example, the portion of the membrane layer containing the isolation layer 10 located in the peripheral region 011 also includes other patterns 0112. Figure 27 The display substrate shown is a plan view of a display substrate that has not yet undergone the cutting process during mass production. The feature is that some areas, such as the areas where the identification graphic 0111 and other patterns 0112 are located, will be cut off during the cutting process to form each display substrate.

[0168] Figure 7 and Figure 8 , Figure 16 as well as Figures 21 to 24The portion of the insulating layer 10 in the display substrate located in the peripheral region 011 can be as follows: Figure 27 As shown, it can also be as follows: Figure 28 As shown. Figure 24 The portion of the insulating layer 10 in the display substrate located in the peripheral region 011 is shown as follows. Figure 27 As shown in the example, due to the presence of fewer patterns or grooves in the peripheral area 011, such as the area where the identification pattern 0111 is located, the developer in the display area 010 near the peripheral area 011 flows into the peripheral area 011 in large quantities. This results in insufficient development of the photoresist in the edge area of ​​the display area 010, leading to residue of the first electrode 311 in the edge area of ​​the display area 010, and thus, problems such as... Figure 25 The pattern shown is a distribution of bright spots.

[0169] In some examples, such as Figure 28 and Figure 29 As shown, the substrate also includes a peripheral region 011 surrounding the display area 010. The isolation layer 10 includes a first isolation layer 11 located in the display area 010 and a second isolation layer 12 located in the peripheral region 011. The first isolation layer 11 includes the aforementioned plurality of isolation patterns 100, and the second isolation layer 12 surrounds at least a portion of the first isolation layer 11.

[0170] Figure 29 The display substrate shown is relative to Figure 28 The additional pattern in the display substrate shown is the second isolation layer 12 in this example. Figure 28 and Figure 29 As shown, setting a second isolation layer 12 in the area outside the recognition pattern 0111 can prevent the setting of the second isolation layer 12 from affecting the recognition pattern being recognized by the lens.

[0171] By adding a second isolation layer 12 to the peripheral area 011 of the display substrate, a portion of the peripheral area of ​​the display area 010 is filled with a pattern that is in the same layer as the first isolation layer 11. This reduces the height difference between the portion of the isolation layer located in the display area 010 and the portion located in the peripheral area 011, preventing the developer from flowing in large quantities from the display area 010 to the peripheral area 011 and affecting the fabrication of the first electrode 311 at the edge of the display area 010. This helps to reduce the probability of bright spots appearing, such as the edge of the display area 010 no longer having bright spots.

[0172] For example, such as Figure 28 and Figure 29As shown, the first isolation layer 11 and the second isolation layer 12 are film layers disposed in the same layer. For example, the first isolation layer 11 and the second isolation layer 12 can be connected or independent of each other. For example, along the direction perpendicular to the substrate 01, the first electrode 311 and the second isolation layer 12 do not overlap. For example, the second isolation layer 12 completely surrounds the first isolation layer 11.

[0173] In some examples, such as Figure 28 and Figure 29 As shown, in the first direction, the size of the second isolation layer 12 is not less than the sum of the sizes of two adjacent isolation sub-patterns 101 arranged along the first direction; in the second direction, the size of the second isolation layer 12 is not less than the sum of the sizes of two adjacent isolation sub-patterns 101 arranged along the second direction.

[0174] By setting the dimensional relationship between the second isolation layer 12 and the isolation sub-pattern 101 in the first isolation layer 11, excessive developer can be prevented from flowing into the second isolation layer 12, thus avoiding residue on the first electrode 311.

[0175] Figure 29 An enlarged view schematically showing a portion of the second isolation layer 12 located on the left side of the display area 010 is shown. The second isolation layer 12 located on the right, upper, and lower sides of the display area 010 can be connected with... Figure 29 The portions shown have the same pattern; that is, the second isolation layer 12 can be a pattern surrounding the display area 010, and the patterns at different locations can be as follows: Figure 29 As shown.

[0176] The aforementioned “the sum of the dimensions of two adjacent isolation sub-patterns 101” may refer only to the sum of the dimensions of the two isolation sub-patterns 101, or the sum of the dimensions of the two isolation sub-patterns 101 and the interval between them.

[0177] For example, such as Figure 28 and Figure 29 As shown, a fifth interval 205 is provided between the second isolation layer 12 and the first isolation layer 11. The width of at least a portion of the first part extending along the first direction in the fifth interval 205 is 0.9 to 1.1 compared with the width of at least a portion of the third interval 203. The width of at least a portion of the second part extending along the second direction in the fifth interval 205 is 0.9 to 1.1 compared with the width of at least a portion of the first interval 201.

[0178] By setting the dimensional relationship between the width of the fifth interval 205 and the width of the third interval 203, and simultaneously setting the dimensional relationship between the width of the fifth interval 205 and the width of the first interval 201, it is beneficial to improve the uniformity of the width of the interval between the first isolation layer 11 and the second isolation layer 12, and to avoid a large difference between the developing reaction environment of the developer at the edge of the display area 010 and the developing reaction environment inside the display area 010.

[0179] Figure 29 The width of at least a portion of the second part extending along the second direction in the fifth interval 205 is substantially the same as the width of at least a portion of the third interval 203 described above, and the first part extending along the first direction in the fifth interval 205 may have the same morphology as the second part.

[0180] For example, such as Figure 28 and Figure 29 As shown, the fifth interval 205 can be a ring-shaped interval surrounding the display area 010. In addition to the first and second portions mentioned above, it also includes portions extending in other directions. The width of this portion can be the same as or different from the width of the first and second portions mentioned above.

[0181] For example, such as Figure 29 As shown, a connecting portion for connecting the first isolation layer 11 and the second isolation layer 12 can be provided in the fifth interval 205, similar to... Figure 7 The protrusion 1011 is shown. However, it is not limited to this; the fifth interval 205 can also be a completely continuous interval without any structure in the isolation layer 10.

[0182] For example, such as Figure 29 As shown, the width of at least a portion of the first part extending along the first direction in the fifth interval 205 is the same as the width of at least a portion of the third interval 203, and the width of at least a portion of the second part extending along the second direction in the fifth interval 205 is the same as the width of at least a portion of the first interval 201.

[0183] For example, Figure 29 The second isolation layer 12 is schematically shown to include a plurality of opening patterns, but is not limited thereto; at least a portion of the second isolation layer 12 may not have opening patterns.

[0184] For example, such as Figure 29 As shown, the second isolation layer 12 includes a plurality of sub-patterns, and at least some of the sub-patterns are separated by a sixth interval 206. The width of at least a portion of the sixth interval 206 extending along the first direction is 0.9 to 1.1, and the width of at least a portion of the sixth interval 206 extending along the second direction is 0.9 to 1.1, and the width of at least a portion of the sixth interval 206 extending along the second direction is 0.9 to 1.1, and the width of at least a portion of the first interval 201 is 0.9 to 1.1.

[0185] By setting the dimensional relationship between the width of the sixth interval 206 and the widths of the first interval 201 and the third interval 203, it is beneficial to improve the uniformity of the width of the intervals in the isolation layer.

[0186] For example, such as Figure 28 and Figure 29 As shown, the second isolation layer 12 can be a ring-shaped isolation layer surrounding the display area 010. In addition to the portions extending along the first direction and the portions extending along the second direction, the sixth interval 206 also includes portions extending along other directions. The width of this portion can be the same as or different from the width of the portions extending along the first direction and the portions extending along the second direction.

[0187] In some examples, such as Figure 29 As shown, the second isolation layer 12 includes multiple sub-patterns, including at least a first sub-pattern 12-1, a second sub-pattern 12-1, and a third sub-pattern 12-3. The shape of the first sub-pattern 12-1 is substantially the same as the shape of the first isolation sub-pattern 110. The shape of the second sub-pattern 12-1 is substantially the same as the shape of the second isolation sub-pattern 120. The shape of the third sub-pattern 12-3 is substantially the same as the shape of the isolation sub-pattern 101 in the third isolation sub-pattern 130 and the fourth isolation sub-pattern 140, which is different from the shape of the first isolation sub-pattern 110 and the second isolation sub-pattern 120.

[0188] By setting the shape of the sub-pattern in the second isolation layer 12 to be substantially the same as the shape of the isolation sub-pattern 101 in the first isolation layer 11, it is beneficial to provide the developer with a substantially similar developing reaction environment.

[0189] The phrase "basically the same shape" can refer to the fact that the outlines of the sub-pattern and the isolation sub-pattern 101 are exactly the same or roughly the same. Figure 29 The sub-pattern is schematically shown to include a zigzag edge, where the outline of the sub-pattern is approximately the same as that of the isolated sub-pattern 101. Of course, the shape of the sub-pattern is not limited to... Figure 29 As shown, it can also be exactly the same shape as the isolation sub-pattern 101 described above.

[0190] For example, such as Figure 29 As shown, the shape of the first sub-pattern 12-1 is basically the same as the shape of the isolation sub-pattern 101 corresponding to the first color sub-pixel 301, the shape of the second sub-pattern 12-1 is basically the same as the shape of the isolation sub-pattern 101 corresponding to the second color sub-pixel 302, and the shape of the third sub-pattern 12-3 is basically the same as the shape of the isolation sub-pattern 101 corresponding to the third color sub-pixel 303.

[0191] For example, Figure 29The second isolation layer 12 is schematically shown to include a four-ring pattern, such that the size of the second isolation layer 12 in the X direction may be approximately 400 micrometers. However, it is not limited to this, and the second isolation layer 12 may include at least two ring patterns, such that the ring width of the second isolation layer 12 is not less than 200 micrometers.

[0192] For example, such as Figure 28 As shown, the second isolation layer 12 includes an edge pattern 12-4, which is distributed in at least one of the four corner areas of the peripheral area 011.

[0193] By setting an edge pattern 12-4 in at least one of the four corner areas of the peripheral area 011, it is beneficial to reduce the difference between the flow rate of the developer in at least one of the four corner areas of the peripheral area 011 and the flow rate of the developer in the edge area of ​​the display area 010, so as to reduce the probability of the first electrode 311 appearing in the edge area of ​​the display area 010.

[0194] For example, such as Figure 28 As shown, edge patterns 12-4 are provided in the four corner areas of the peripheral area 011. For example, the edge patterns 12-4 can have the same shape as the sub-patterns.

[0195] It should be noted that the aforementioned edge pattern 12-4 only serves to regulate the flow rate of the developer during the formation of the first electrode. After the subsequent film layer is formed, the batch display substrate structure including the display substrate will be cut to form multiple individual display substrates. The display substrates formed after the cutting process do not include the aforementioned edge pattern 12-4.

[0196] Figure 30 This is a partial planar structure schematic diagram of a display substrate provided according to another example of an embodiment of the present utility model. Figure 30 The display substrate shown is Figure 7 The difference in the display substrate is that the shape of the isolation pattern 100 is different.

[0197] In some examples, such as Figure 30 As shown, there are no gaps between different isolation sub-patterns 101 within the same isolation pattern 100. For example, different isolation sub-patterns 101 within the same isolation pattern 100 are an integrated structure.

[0198] For example, such as Figure 30As shown, in the same pixel unit 300, there is no gap extending along the second direction between the isolation sub-pattern 101 corresponding to the first color sub-pixel 301 and the isolation sub-pattern 101 corresponding to the other color sub-pixel 310, only a via 1010; there is no gap extending along the first direction between the isolation sub-pattern 101 corresponding to the first color sub-pixel 301 and the isolation sub-pattern 101 corresponding to the second color sub-pixel 302, only a via 1010.

[0199] In some examples, such as Figure 30 As shown, the different isolation patterns 100 are independent structures. For example, the protrusions 1011 of each isolation pattern 100 are spaced apart from the adjacent isolation patterns 100.

[0200] For example, such as Figure 30 As shown, the distance between adjacent isolation patterns 100 is not less than 1.8 micrometers.

[0201] For example, such as Figure 30 As shown, the width of the interval between adjacent isolation patterns 100 arranged in the first direction can be greater than the width of the interval between adjacent isolation patterns 100 arranged in the second direction.

[0202] In some examples, such as Figure 30 As shown, in the same isolation pattern 100, at least one isolation sub-pattern 101 includes a protrusion 1011, the protrusion 1011 including a via 1010 so that the connection electrode 3112 of the first electrode 311 is electrically connected to the pixel circuit 3100 through the via 1010; the ratio between the width of each position in one of the first interval 201 and the second interval 202 other than the protrusion 1011 and the width of each position in the other is 0.9~1.1, and the ratio between the width of each position in the third interval 203 and the width of each position in the fourth interval 204 is 0.9~1.1.

[0203] For example, such as Figure 30 As shown, each isolation sub-pattern 101 also includes an isolation opening 1013, and a second opening 420 exposes the edge of the isolation opening 1013 to achieve isolation of at least one of the light-emitting functional layers 313.

[0204] Figure 30 Other structures in the display substrate shown may have the same features as the corresponding structures in the display substrates shown in the above examples, and will not be described again here.

[0205] Figure 31 This is a schematic diagram of a partial planar structure in a display substrate. Figure 31 The display substrate shown is Figure 1 The difference in the display substrates shown lies in the pixel arrangement. Figure 31The pixel arrangement shown is a blue diamond pixel arrangement. Because the area of ​​the light-emitting region of the blue sub-pixel 003 is larger than that of the light-emitting regions of other color sub-pixels 310, the width difference between the spacing of the inorganic patterns 004 corresponding to different sub-pixels 310 is relatively large. For example, the distance D3 between the blue sub-pixel 003 and other color sub-pixels 310 is smaller than the distance D4 between other color sub-pixels. This causes the developer to flow faster between the red sub-pixel 001 and the green sub-pixel 002, affecting the sufficient development of the photoresist and potentially leading to residue on the first electrode. Furthermore, the inorganic patterns 004 corresponding to all sub-pixels are integrated, which obstructs the flow of the developer in different directions, easily leading to insufficient photoresist development.

[0206] To address the above problems, this utility model provides the following embodiments: Figures 32 to 35 The display substrate shown reduces the difference by adjusting the width of the spacing between the isolation sub-patterns 101 corresponding to different color sub-pixels 310, thereby improving the reaction effect between the developer and the photoresist and reducing the possibility of residue appearing on the first electrode 311.

[0207] Figure 32 This is a partial planar structure schematic diagram of a display substrate provided according to an example of an embodiment of the present utility model. Figure 33 For including Figure 32 A schematic diagram of the display substrate with the isolation layer shown. Figure 32 The substrate was omitted.

[0208] In some examples, such as Figure 32 and Figure 33 As shown, the portion of the isolation layer 10 located in the display area includes multiple isolation patterns 100 arranged in an array along a first direction and a second direction. Each isolation pattern 100 includes multiple isolation sub-patterns 101, and the first direction intersects with the second direction. For example, the isolation layer 10 can be made of inorganic non-metallic materials, such as silicon nitride (SiNx) or silicon oxide (SiOx).

[0209] For example, such as Figure 32 and Figure 33 As shown, different isolation patterns 100 may have the same shape, but are not limited thereto; at least two isolation patterns 100 may have different shapes. For example, at least two of the multiple isolation sub-patterns 101 included in the same isolation pattern 100 may have different shapes.

[0210] For example, such as Figure 32 and Figure 33As shown, the first direction can be parallel to the X0 direction, and the second direction can be parallel to the Y0 direction. For example, the angle between the first and second directions can be 80 to 100 degrees, or the first and second directions can be perpendicular. For example, one of the first and second directions can be a row direction, and the other can be a column direction. However, this is not a limitation, and the first and second directions can be interchanged.

[0211] It is important to note that Figure 7 The first direction X and the second direction Y shown are parallel to two sides of the substrate 01, respectively. Figure 32 The first direction X0 and the second direction Y0 shown are both... Figure 7 The two sides of the substrate 01 shown extend in different directions, such as an angle of 30 to 60 degrees between the X direction and the X0 direction, such as a 45-degree angle.

[0212] For example, the display substrate includes a plurality of pixel units 300, and the plurality of pixel units 300 are configured one-to-one with a plurality of isolation patterns 100. The plurality of isolation sub-patterns 101 in each isolation pattern 100 are configured one-to-one with the sub-pixels 310 in each pixel unit 300.

[0213] In some examples, such as Figure 33 As shown, each pixel unit 300 includes a first color sub-pixel 301, two second color sub-pixels 302, and a third color sub-pixel 303. The two second color sub-pixels 302 include a first pixel block 3021 and a second pixel block 3022. The area of ​​the light-emitting region of each first color sub-pixel 301 and each second color sub-pixel 302 is smaller than the area of ​​the light-emitting region of each third color sub-pixel 303. The first color sub-pixel 301 and the first pixel block 3021 are arranged along a first direction, the third color sub-pixel 303 and the second pixel block 3022 are arranged along the first direction, the first color sub-pixel 301 and the second pixel block 3022 are arranged along a second direction, and the third color sub-pixel 303 and the first pixel block 3021 are arranged along the second direction.

[0214] For example, the first color sub-pixel 301 is a red sub-pixel, the second color sub-pixel 302 is a green sub-pixel, and the third color sub-pixel 303 is a blue sub-pixel. For example, in the same pixel unit 300, the line connecting the centers of the light-emitting areas of the first color sub-pixel 301 and the third color sub-pixel 303 intersects the line connecting the centers of the light-emitting areas of the two second color sub-pixels 302.

[0215] like Figure 32As shown, adjacent isolation patterns 100 arranged along a first direction have at least a first interval 201 and a second interval 202 arranged along a second direction. One of the adjacent isolation patterns 100 includes at least a first isolation sub-pattern 110 and a second isolation sub-pattern 120 arranged along the second direction. The interval between the first isolation sub-pattern 110 and another isolation pattern 100 in the adjacent isolation patterns 100 is the first interval 201, and the interval between the second isolation sub-pattern 120 and another isolation pattern 100 in the adjacent isolation patterns 100 is the second interval 202. The ratio between the width of at least a portion of the first interval 201 and the width of at least a portion of the second interval 202 is 0.9 to 1.1. For example, the width of the first interval 201 can refer to the dimension of the first interval 201 in the first direction; the width of the second interval 202 can refer to the dimension of the second interval 202 in the first direction.

[0216] For example, such as Figure 32 As shown, the distance between the edge of the first isolation sub-pattern 110 away from the center of the isolation pattern 100 and the edge of the adjacent isolation pattern 100 near the first isolation sub-pattern 110 is the first distance 201. The distance between the edge of the second isolation sub-pattern 120 away from the center of the isolation pattern 100 and the edge of the adjacent isolation pattern 100 near the second isolation sub-pattern 120 is the second distance 202. For example, the width of each position in the first distance 201 is equal. The second distance 202 includes the protrusions in the isolation layer 10, so the width of some positions in the second distance 202 is equal. For example, the width of the first distance 201 is equal to the width of the second distance 202 except for the protrusions 1011.

[0217] like Figure 32 As shown, adjacent isolation patterns 100 arranged along the second direction have at least a third interval 203 and a fourth interval 204 arranged along the first direction. One of the adjacent isolation patterns 100 includes at least a third isolation sub-pattern 130 and a fourth isolation sub-pattern 140 arranged along the first direction. The interval between the third isolation sub-pattern 130 and another isolation pattern 100 in the adjacent isolation patterns 100 is the third interval 203, and the interval between the fourth isolation sub-pattern 140 and another isolation pattern 100 in the adjacent isolation patterns 100 is the fourth interval 204. The ratio between at least a portion of the width of the third interval 203 and at least a portion of the width of the fourth interval 204 is 0.9 to 1.1. For example, the width of the third interval 203 can refer to the dimension of the third interval 203 in the second direction; the width of the fourth interval 204 can refer to the dimension of the fourth interval 204 in the second direction.

[0218] By setting the ratio between the width of the first interval 201 and the width of the second interval 202 between different isolation patterns 100, and simultaneously setting the ratio between the width of the fourth interval 204 and the width of the third interval 203, it is beneficial to reduce the difference in the interval width between different isolation patterns 100, thereby significantly alleviating the problem of display bright spots caused by anode residue on the display substrate.

[0219] For example, such as Figure 32 and Figure 33 As shown, the first color sub-pixel 301 corresponds to the first isolation sub-pattern 110, the second pixel block 3022 corresponds to the second isolation sub-pattern 120 (or the fourth isolation sub-pattern 140), and the third color sub-pixel 303 corresponds to the third isolation sub-pattern 130. However, this is not limited to this; alternatively, the first pixel block 3021 can correspond to the first isolation sub-pattern 110, the third color sub-pixel 303 to the second isolation sub-pattern 120 (or the third isolation sub-pattern 130), and the second pixel block 3022 to the fourth isolation sub-pattern 140. The first isolation sub-pattern 110 and the second isolation sub-pattern 120, and the third isolation sub-pattern 130 and the fourth isolation sub-pattern 140 can be interchanged.

[0220] In some examples, such as Figure 33 As shown, in the same direction of the first and second directions, the distance D03 between the edge of the light-emitting area of ​​the third color sub-pixel 303 and the edge of its corresponding isolation sub-pattern 101 is not greater than the distance D04 between the edge of the light-emitting area of ​​at least one of the other color sub-pixels 310 and the edge of its corresponding isolation sub-pattern 101.

[0221] Compared to Figure 31 The display substrate shown has its isolation sub-pattern 101 corresponding to at least one of the second color sub-pixels 302 and the third color sub-pixels 303 extended in at least one of the first and second directions. This makes the edge of the isolation sub-pattern 101 corresponding to the color sub-pixel 310 approximately flush with the edge of the isolation sub-pattern 101 corresponding to the third color sub-pixel 303. This helps to reduce the difference in width between different intervals, making the developing environment of the developer the same at different intervals. This avoids the different flow speeds of the developer at different intervals affecting the full reaction of the photoresist, and thus avoids the presence of residues at locations where the first electrode 311 should not be retained during the patterning process of forming the first electrode 311.

[0222] For example, such as Figure 33As shown, in the same direction of the first and second directions, the distance D03 between the edge of the light-emitting area of ​​the third color sub-pixel 303 and the edge of its corresponding isolation sub-pattern 101 is less than the distance D04 between the edge of the light-emitting area of ​​the second color sub-pixel 302 and the edge of its corresponding isolation sub-pattern 101. After adjusting the edge position of the isolation sub-pattern 101 corresponding to the second color sub-pixel 302, in order to ensure that the edges of the second color sub-pixel 302 and the isolation sub-pattern 101 corresponding to the first color sub-pixel 301 are flush, the edge position of the isolation sub-pattern 101 corresponding to the first color sub-pixel 301 needs to be appropriately adjusted.

[0223] In some examples, such as Figure 32 and Figure 33 As shown, the different isolated sub-patterns 101 are independent of each other.

[0224] Compared to Figure 31 The different isolation sub-patterns 101 shown are integrated structures. In the display substrate provided by this utility model embodiment, the different isolation sub-patterns 101 are set to be independent of each other, which helps to reduce the difference of the developer at different positions and ensure that the developer flows fully between the isolation sub-patterns 101. In particular, when the isolation sub-pattern 101 overlapping with the second color sub-pixel 302 is extended to be basically flush with the edge of the isolation sub-pattern 101 overlapping with other color sub-pixels 310, the difference in the developing reaction environment of the developer between the different isolation sub-patterns 101 can be significantly reduced, providing a suitable path for the flow of the developer, thereby avoiding the bright spot phenomenon caused by the residue problem of the first electrode 311.

[0225] However, the present invention is not limited to this, and the sub-patterns 101 can also be partially isolated and connected to each other.

[0226] In some examples, such as Figure 32 and Figure 33As shown, in the same pixel unit 300, there is a first sub-spacement 211 extending along a first direction (such as a direction parallel to the X0 direction) between the isolation sub-pattern 101 corresponding to the third color sub-pixel 303 and the isolation sub-pattern 101 corresponding to the first pixel block 3021, and a second sub-spacement 212 extending along the first direction between the isolation sub-pattern 101 corresponding to the first color sub-pixel 301 and the isolation sub-pattern 101 corresponding to the second pixel block 3022. The ratio of the width of at least a portion of the first sub-spacement 211 to the width of at least a portion of the second sub-spacement 212 is 0.9 to 1. 1; In the same pixel unit 300, there is a third sub-space 213 extending along a second direction (such as a direction parallel to the Y0 direction) between the isolation sub-pattern 101 corresponding to the third color sub-pixel 303 and the isolation sub-pattern 101 corresponding to the second pixel block 3022, and there is a fourth sub-space 214 extending along a second direction between the isolation sub-pattern 101 corresponding to the first color sub-pixel 301 and the isolation sub-pattern 101 corresponding to the first pixel block 3021, and the ratio of the width of at least a portion of the third sub-space 213 to the width of at least a portion of the fourth sub-space 214 is 0.9~1.1.

[0227] By setting the widths of the two sub-spacers between the isolation sub-patterns corresponding to two sub-pixels arranged along the first direction in the same pixel unit 300 to be approximately equal, and setting the widths of the two sub-spacers between the isolation sub-patterns corresponding to two sub-pixels arranged along the second direction in the same pixel unit 300 to be approximately equal, it is beneficial to improve the uniformity of the flow rate of the developer in the same pixel unit 300, i.e., the interval of the same isolation pattern 100. This makes the development environment of the developer the same at different sub-spacers, avoiding the influence of different flow rates of the developer at different sub-spacers on the full reaction of the photoresist. This also avoids the occurrence of residues at locations where the first electrode 311 should not be retained during the patterning process of forming the first electrode 311.

[0228] Figure 32 and Figure 33The protrusion 1011 in the shown display substrate can have the same function as the protrusion 1011 in the above example, and an isolation sub-pattern 101 and a protrusion 1011 are integrally formed. For example, the spacing between the protrusion 1011 and the isolation sub-pattern 101 is greater than 1.8 micrometers. For example, the spacing between adjacent protrusions 1011 is greater than 1.8 micrometers. For example, the first spacing 201, the second spacing 202, the third spacing 203, the fourth spacing 204, the first sub-spacing 211, the second sub-spacing 212, the third sub-spacing 213, and the fourth sub-spacing 214 are all 1.8 to 12 micrometers. For example, the first spacing 201, the second spacing 202, the third spacing 203, the fourth spacing 204, the first sub-spacing 211, the second sub-spacing 212, the third sub-spacing 213, and the fourth sub-spacing 214 are all 6 to 9 micrometers.

[0229] Figure 34 This is a partial planar structure schematic diagram of a display substrate provided according to an example of an embodiment of the present utility model. Figure 34 The display substrate shown is Figure 33 The difference in the display substrate shown lies in the shape of the second opening 420, such as... Figure 33 Each second opening 420 in the display substrate shown has a straight line shape, which exposes only one edge of the isolation subpattern 101; Figure 34 Each second opening 420 in the display substrate shown has a curved shape that exposes the two edges of the isolation subpattern 101.

[0230] Figure 35 This is a partial planar structure schematic diagram of a display substrate provided according to another example of an embodiment of the present utility model. Figure 35 The display substrate shown is Figure 33 The difference in the display substrate is that the shape of the isolation pattern 100 is different.

[0231] In some examples, such as Figure 35 As shown, there are no gaps between different isolation sub-patterns 101 within the same isolation pattern 100. For example, different isolation sub-patterns 101 within the same isolation pattern 100 are an integrated structure.

[0232] For example, such as Figure 35 As shown, in the same pixel unit 300, there is no gap extending along the second direction between the isolation sub-pattern 101 corresponding to the first color sub-pixel 301 and the isolation sub-pattern 101 corresponding to the other color sub-pixel 310, only a via 1010; there is no gap extending along the first direction between the isolation sub-pattern 101 corresponding to the first color sub-pixel 301 and the isolation sub-pattern 101 corresponding to the second color sub-pixel 302, only a via 1010.

[0233] In some examples, such as Figure 35 As shown, the different isolation patterns 100 are independent structures. For example, the protrusions 1011 of each isolation pattern 100 are spaced apart from the adjacent isolation patterns 100.

[0234] For example, such as Figure 35 As shown, each isolation sub-pattern 101 also includes an isolation opening 1013, and a second opening 420 exposes the edge of the isolation opening 1013 to achieve isolation of at least one of the light-emitting functional layers 313.

[0235] Figure 35 The isolation pattern 100 shown has a protrusion 1011 of through hole 1010 that can be integrated with the isolation sub-pattern 101, that is, the protrusion 1011 is part of the isolation sub-pattern 101, rather than a part of the pattern that protrudes relative to the isolation sub-pattern 101.

[0236] In some examples, such as Figure 35 As shown, the ratio between the width of each position in the first interval 201 and the width of each position in the second interval 202 is 0.9 to 1.1, and the ratio between the width of each position in the third interval 203 and the width of each position in the fourth interval 204 is 0.9 to 1.1. For example, the width of each position in the first interval 201 is exactly the same as the width of each position in the second interval 202, and the width of each position in the third interval 203 is exactly the same as the width of each position in the fourth interval 204.

[0237] Figure 36 This is a schematic block diagram of a display device according to another embodiment of the present invention.

[0238] like Figure 36 As shown, an embodiment of the present invention provides a display device including any of the above-mentioned display substrates.

[0239] For example, the display device also includes a cover plate located on the light-emitting side of the display substrate.

[0240] For example, the display device can be an organic light-emitting diode display device or other display device, as well as any product or component with display function, such as a television, digital camera, mobile phone, watch, tablet computer, laptop computer, or navigator that includes the display device. This embodiment is not limited to this.

[0241] The following points need to be explained:

[0242] (1) The accompanying drawings of the embodiments of this utility model only involve the structures involved in the embodiments of this utility model. Other structures can be referred to the general design.

[0243] (2) Where there is no conflict, features of the same embodiment and different embodiments of the present invention can be combined with each other.

[0244] The above description is merely an exemplary embodiment of the present utility model and is not intended to limit the scope of protection of the present utility model. The scope of protection of the present utility model is determined by the appended claims.

Claims

1. A display substrate, characterized in that, include: Substrate, including the display area; An isolation layer is located on the substrate. The portion of the isolation layer located in the display area includes multiple isolation patterns arranged in an array along a first direction and a second direction. Each isolation pattern includes multiple isolation sub-patterns, and the first direction intersects with the second direction. The adjacent isolation patterns arranged along the first direction have at least a first interval and a second interval arranged along the second direction. One of the adjacent isolation patterns includes at least a first isolation sub-pattern and a second isolation sub-pattern arranged along the second direction. The interval between the first isolation sub-pattern and another isolation pattern in the adjacent isolation patterns is the first interval, and the interval between the second isolation sub-pattern and another isolation pattern in the adjacent isolation patterns is the second interval. The ratio between the width of at least a portion of the first interval and the width of at least a portion of the second interval is 0.9 to 1.

1.

2. The display substrate according to claim 1, characterized in that, The adjacent isolation patterns arranged along the second direction have at least a third interval and a fourth interval arranged along the first direction. One of the adjacent isolation patterns includes at least a third isolation sub-pattern and a fourth isolation sub-pattern arranged along the first direction. The interval between the third isolation sub-pattern and another isolation pattern in the adjacent isolation patterns is the third interval. The interval between the fourth isolation sub-pattern and another isolation pattern in the adjacent isolation patterns is the fourth interval. The ratio between the width of at least a portion of the third interval and the width of at least a portion of the fourth interval is 0.9 to 1.

1.

3. The display substrate according to claim 2, characterized in that, At least a portion of the edges of the first isolation sub-pattern are flush with at least a portion of the edges of the second isolation sub-pattern, and at least a portion of the edges of the third isolation sub-pattern are flush with at least a portion of the edges of the fourth isolation sub-pattern.

4. The display substrate according to claim 2, characterized in that, The widths of the first interval, the second interval, the third interval, and the fourth interval are all not less than 1.8 micrometers and not greater than 12 micrometers.

5. The display substrate according to claim 1, characterized in that, At least two adjacent isolation patterns are independent structures.

6. The display substrate according to claim 2, characterized in that, The substrate further includes a peripheral region surrounding the display area, and the isolation layer includes a first isolation layer located in the display area and a second isolation layer located in the peripheral region. The first isolation layer includes the plurality of isolation patterns, and the second isolation layer surrounds at least a portion of the first isolation layer.

7. The display substrate according to claim 6, characterized in that, In the first direction, the size of the second isolation layer is not less than the sum of the sizes of two adjacent isolation sub-patterns arranged along the first direction; in the second direction, the size of the second isolation layer is not less than the sum of the sizes of two adjacent isolation sub-patterns arranged along the second direction.

8. The display substrate according to claim 6, characterized in that, The second isolation layer includes multiple sub-patterns, including at least a first sub-pattern, a second sub-pattern, and a third sub-pattern. The shape of the first sub-pattern is substantially the same as the shape of the first isolation sub-pattern, the shape of the second sub-pattern is substantially the same as the shape of the second isolation sub-pattern, and the shape of the third sub-pattern is substantially the same as the shape of the isolation sub-patterns that are different from the first and second isolation sub-patterns among the third and fourth isolation sub-patterns.

9. The display substrate according to any one of claims 1-8, characterized in that, Also includes: Multiple pixel units are located on the substrate. Each pixel unit includes sub-pixels of different colors. At least some of the sub-pixels include a first electrode, a light-emitting functional layer, and a second electrode stacked sequentially. The first electrode is located between the light-emitting functional layer and the substrate. A pixel defining pattern is located at least on the side of the first electrode away from the substrate. The pixel defining pattern includes a plurality of first openings and a plurality of second openings. The plurality of first openings are configured to define the light-emitting areas of a plurality of sub-pixels in the plurality of pixel units. The isolation layer is located between the first electrode and the substrate, and the edges of the isolation layer exposed by the plurality of second openings are configured to block at least a portion of the light-emitting functional layer.

10. The display substrate according to claim 9, characterized in that, The plurality of pixel units are configured in a one-to-one correspondence with the plurality of isolation patterns, and the plurality of isolation sub-patterns in each isolation pattern are configured in a one-to-one correspondence with the sub-pixels of each pixel unit; Each pixel unit includes a first color sub-pixel, a second color sub-pixel, and a third color sub-pixel. The first color sub-pixel and the second color sub-pixel are arranged along a second direction, and the first color sub-pixel and the third color sub-pixel are arranged along a first direction. In the second direction, the distance between the edge of the light-emitting area of ​​at least one of the first color sub-pixel and the second color sub-pixel and the edge of the corresponding isolation sub-pattern is less than the distance between the edge of the light-emitting area of ​​the third color sub-pixel and the edge of its corresponding isolation sub-pattern.

11. The display substrate according to claim 9, characterized in that, The plurality of pixel units are configured in a one-to-one correspondence with the plurality of isolation patterns, and the plurality of isolation sub-patterns in each isolation pattern are configured in a one-to-one correspondence with the sub-pixels of each pixel unit; Each pixel unit includes a first color sub-pixel, two second color sub-pixels and a third color sub-pixel. The two second color sub-pixels include a first pixel block and a second pixel block. The area of ​​the light-emitting region of each first color sub-pixel and each second color sub-pixel is smaller than the area of ​​the light-emitting region of each third color sub-pixel. The first color sub-pixel and the first pixel block are arranged along the first direction, the third color sub-pixel and the second pixel block are arranged along the first direction, the first color sub-pixel and the second pixel block are arranged along the second direction, and the third color sub-pixel and the first pixel block are arranged along the second direction. In the same direction of the first direction and the second direction, the distance between the edge of the light-emitting area of ​​the third color sub-pixel and the edge of its corresponding isolation sub-pattern is not greater than the distance between the edge of the light-emitting area of ​​at least one of the other color sub-pixels and the edge of its corresponding isolation sub-pattern.

12. The display substrate according to claim 10, characterized in that, In the same pixel unit, at least a portion of the edge of the isolation sub-pattern corresponding to the third color sub-pixel extending along the first direction is flush with at least a portion of the edge of the isolation sub-pattern corresponding to the other color sub-pixel extending along the first direction.

13. The display substrate according to claim 10, characterized in that, The multiple isolation patterns are an integrated structure.

14. The display substrate according to claim 10, characterized in that, Within the same isolation pattern, there is a gap between adjacent isolation sub-patterns, and the direction of extension of the gap intersects with the direction of arrangement of the adjacent isolation sub-patterns.

15. The display substrate according to claim 10, characterized in that, The first electrode includes a main electrode and a connecting electrode. Along a direction perpendicular to the substrate, the connecting electrode does not overlap with the first opening, and the connecting electrode is configured to be electrically connected to the pixel circuitry included in the sub-pixel. The isolation pattern includes a protrusion located between at least two adjacent isolation sub-patterns, the protrusion being integrally formed with at least one of the two adjacent isolation sub-patterns, and the protrusion including a via to allow the connection electrode to be electrically connected to the pixel circuit through the via.

16. The display substrate according to claim 15, characterized in that, The isolation sub-pattern corresponding to the third color sub-pixel and the isolation sub-pattern corresponding to other color sub-pixels adjacent to the third color sub-pixel in the first direction have a gap extending along the second direction, wherein the ratio of the widths of the gap at different positions other than the protrusion is 0.9 to 1.

1.

17. The display substrate according to claim 15, characterized in that, At least one protrusion is spaced apart from the adjacent isolation sub-pattern.

18. The display substrate according to claim 10, characterized in that, Each protrusion is connected to one of the isolation sub-patterns located on its two sides, and is spaced apart from the other.

19. The display substrate according to claim 10, characterized in that, Any two adjacent isolation sub-patterns arranged along the second direction are independent structures, and the isolation sub-pattern corresponding to the third color sub-pixel and the isolation sub-pattern corresponding to one of the first color sub-pixels and the second color sub-pixel adjacent to the third color sub-pixel are connected to each other; or Any adjacent isolation sub-patterns arranged along the first direction are independent structures. In the same pixel unit, the isolation sub-pattern corresponding to the first color sub-pixel and the isolation sub-pattern corresponding to the second color sub-pixel are connected to each other, or the isolation sub-pattern corresponding to the first color sub-pixel and the isolation sub-pattern corresponding to the second color sub-pixel located in adjacent pixel units are connected to each other.

20. The display substrate according to claim 10, characterized in that, In one of the adjacent pixel units arranged along the second direction, the isolation sub-pattern corresponding to the third color sub-pixel and the isolation sub-pattern corresponding to the other color sub-pixels are integrated into a single structure; in the other adjacent pixel unit, the isolation sub-pattern corresponding to the third color sub-pixel and the isolation sub-pattern corresponding to the other color sub-pixels are independent of each other. In the first direction, the isolation sub-pattern corresponding to the third color sub-pixel is integrated with the isolation sub-pattern corresponding to other color sub-pixels on one side of it, and is independent of the isolation sub-pattern corresponding to other color sub-pixels on the other side.

21. The display substrate according to claim 11, characterized in that, Different isolated sub-patterns are independent of each other.

22. The display substrate according to claim 11, characterized in that, In the same pixel unit, the isolation sub-pattern corresponding to the third color sub-pixel and the isolation sub-pattern corresponding to the first pixel block have a first sub-space extending along the first direction, and the isolation sub-pattern corresponding to the first color sub-pixel and the isolation sub-pattern corresponding to the second pixel block have a second sub-space extending along the first direction, and the ratio of the width of at least a portion of the first sub-space to the width of at least a portion of the second sub-space is 0.9 to 1.

1. In the same pixel unit, there is a third sub-space between the isolation sub-pattern corresponding to the third color sub-pixel and the isolation sub-pattern corresponding to the second pixel block, which extends along the second direction; there is a fourth sub-space between the isolation sub-pattern corresponding to the first color sub-pixel and the isolation sub-pattern corresponding to the first pixel block, which extends along the second direction; and the ratio of the width of at least a portion of the third sub-space to the width of at least a portion of the fourth sub-space is 0.9 to 1.

1.

23. The display substrate according to claim 10 or 11, characterized in that, Within the same isolation pattern, there are no gaps between different isolation sub-patterns.

24. The display substrate according to claim 23, characterized in that, The different isolation patterns are independent structures.

25. The display substrate according to claim 23, characterized in that, The ratio between the width at each position in the first interval and the width at each position in the second interval is 0.9 to 1.1; or The first electrode includes a main electrode and a connecting electrode. Along a direction perpendicular to the substrate, the connecting electrode does not overlap with the first opening. The connecting electrode is configured to be electrically connected to the pixel circuitry included in the sub-pixel. The isolation pattern includes a protrusion located between at least two adjacent isolation sub-patterns. The protrusion includes a via to allow the connecting electrode to be electrically connected to the pixel circuitry through the via. The ratio between the width at each location in one of the first and second intervals, excluding the protrusion, and the width at each location in the other interval is 0.9 to 1.

1.

26. A display device, characterized in that, Includes the display substrate as described in any one of claims 1-25.

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