Phototherapy mask (MK-10A)

CN310003492SActive Publication Date: 2026-05-26深圳市彩虹光医疗器械有限公司
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
深圳市彩虹光医疗器械有限公司
Filing Date
2025-09-09
Publication Date
2026-05-26

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Abstract

1. Name of the product in this design: Phototherapy Mask (MK-10A). 2. Application of this design: This design is used for phototherapy and physiotherapy of the face. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: 3D view 1. 5. Other situations requiring explanation: Part A in the perspective figure 2 is made of transparent material.
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