SUBSTANCE PROCESSING DEVICE
Patent Information
- Application Number
- DE602023002516
- Authority / Receiving Office
- DE · DE
- Patent Type
- Patents
- Current Assignee / Owner
- Priority Date
- 2022-03-18
- Filing Date
- 2023-01-11
- Publication Date
- 2025-03-26
- Estimated Expiration
- 2043-01-11
AI Technical Summary
Existing substrate processing apparatuses face challenges in maintaining a comfortable working environment due to the leakage of processing liquids with strong odors, as they struggle to effectively manage pressure differences between processing and non-processing spaces, leading to odor leakage.
A substrate processing apparatus with a chamber partitioned into processing and non-processing spaces using a partition plate and cylindrical member, where the partition plate has through holes to guide airflow and a nozzle opening covered by a lid to reduce odor leakage, and an exhauster to control pressure, ensuring the processing space pressure is lower than the non-processing space.
This configuration effectively suppresses odor leakage, maintaining a comfortable working environment by ensuring the processing space pressure is lower than the non-processing space pressure, reducing the likelihood of odor escape and preventing interference between nozzle and lid components.