Chemical vapor deposition device with adhesion breaking capability and method of use thereof
By using agitated devices to manage particle distribution and prevent aggregation in ALD systems, the challenges of particle adhesion and uneven coatings are addressed, leading to improved coating uniformity and reduced product loss.
JP2025507980APending Publication Date: 2025-03-21VITRIVAX INC +1
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Patent Information
- Application Number
- JP2024552655
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2022-04-29
- Filing Date
- 2023-03-03
- Publication Date
- 2025-03-21
AI Technical Summary
Technical Problem
In chemical vapor deposition systems, such as those used in atomic layer deposition (ALD), particles or microparticles tend to aggregate and adhere to the reactor walls and filters, leading to uneven coatings, product loss, and reduced coating uniformity.
Method used
The implementation of agitated devices, including vibration, shock, and sonication, in communication with the reactor vessel to maintain particle distribution, reduce aggregation, and prevent adhesion of particles or microparticles within the reactor system.
Benefits of technology
This approach effectively maintains the distribution of particles, reduces aggregation and adhesion, resulting in more uniform coatings, reduced product loss, and improved manufacturing efficiency.
✦ Generated by Eureka AI based on patent content.
Abstract
The embodiments disclosed herein relate to a modified reactor system for making coated particles of a thermostable drug with reduced losses and improved coating uniformity due to avoidance of particle adhesion to the reactor or other particles. In certain embodiments, the reactor system includes a reaction vessel configured to receive particles of a thermostable drug, and one or more stirring attachments or devices including at least one of an ultrasonic agitator, a mechanical impactor, and a low-frequency vibrator directly connected or in fluid communication with the reactor system to sonicate, impact, or vibrate the reaction vessel during the particle coating process. In some embodiments, the reactor system includes a gas phase injection system configured to introduce alternating pulses of a chemical vapor material into the reaction vessel to form a coating on the particles while continuously or intermittently stirring the reactor system.
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