Method for manufacturing an antistatic layer and method for manufacturing an optical laminate

Abstract

An antistatic layer suitable for application to an image display device used in a harsh environment such as in-vehicle use A method for manufacturing the same is provided. 【Solution means】The provided manufacturing method is a method for manufacturing an antistatic layer used for an optical laminate, and includes applying a coating liquid containing a conductive material, a binder resin, and a solvent onto the surface of a substrate to form a coating film, and drying the coating film so as to satisfy the following conditions (1) and (2) to remove the solvent and form the antistatic layer. The conductive material is a single-layer carbon nanotube having a length of 3 μm or more and less than 300 μm. Condition (1): The drying temperature T of the coating film is 50° C. or higher Condition (2): The time Z from the start of application of the coating liquid onto the surface of the substrate to the start of drying of the coating film is 0.01 second or more and 50 seconds or less ​​

Description

【Technical Field】 【0001】 The present invention relates to a method for manufacturing an antistatic layer used in an optical laminate, and a method for manufacturing an optical laminate including the antistatic layer. 【Background Art】 【0002】 Image display devices typified by liquid crystal display devices and electroluminescence (EL) display devices (for example, organic EL display devices, inorganic EL display devices) have become widespread. These image display devices have, for example, a laminated structure including an image display cell such as a liquid crystal cell, an EL light-emitting element, etc., and an optical laminate including an optical film such as a polarizing film. The optical laminate may include an adhesive sheet. The adhesive sheet can be used, for example, for bonding between films included in the optical laminate or for bonding between the image display cell and the optical laminate. Static electricity may be generated during the manufacture or use of an image display device. During manufacture, static electricity is likely to be generated when the optical laminate is bonded to the image display cell. During use, static electricity is likely to be generated when a user touches the image display device. When the image display device is charged by static electricity, problems such as poor display may occur. Patent Document 1 discloses an optical laminate including a polarizing film and a conductive layer including a conductive polymer. 【0003】 【Prior Art Documents】 【Patent Documents】 【0004】 【Patent Document 1】 Japanese Patent Translation No. 2015-509615 【Summary of the Invention】 【Problems to be Solved by the Invention】 ​​​​​​​​​​【0005】 According to our research, the optical laminate of Patent Document 1 is an ring in which an image display device is used. There is room for further improvement depending on the circumstances. This invention is used in harsh environments such as in vehicles. The objective is to provide a method for manufacturing an antistatic layer suitable for application to image display devices. [Means for solving the problem] 【0006】 [1] The manufacturing method according to an embodiment of the present invention (first manufacturing method) is: A method for manufacturing an antistatic layer used in an optical laminate, A coating solution containing a conductive material, a binder resin, and a solvent is applied to the surface of a substrate to form a coating film. To do, By drying the coating film so that the following conditions (1) and (2) are met, the This includes removing the solvent to form the antistatic layer, The conductive material is a single-walled carbon nanotube with a length of 3 μm or more and less than 300 μm. . Condition (1): The drying temperature T of the coated film is 50°C or higher. Condition (2): From the start of coating the substrate surface with the coating liquid until the coating film has dried Time Z before start: 0.01 seconds or more and 50 seconds or less [2] In the manufacturing method described in [1] above, the coating film is provided under the conditions (1) and (2) above. In addition, it may be dried to satisfy the following condition (3). Condition (3): The drying time H of the coating film is 10 seconds or more and 150 seconds or less. [3] In the manufacturing method described in [1] or [2] above, the drying temperature T is 130°C or less. That's fine. [4] In the manufacturing method described in any of [1] to [3] above, the coating liquid is The coating liquid contains substantially no leveling agent, or the amount of solids contained in the coating liquid is 100 times the amount of a leveling agent. The leveling agent may be included in an amount of 8 parts by weight or less. [5] In the manufacturing method described in any of [1] to [4] above, the coating liquid is The coating liquid contains substantially no leveling agent, or the amount of solids contained in the coating liquid is 100 times the amount of a leveling agent. The coating film contains a leveling agent in an amount of 8 parts by weight or less, and the time Z is 1 You may dry it to a condition of 5 seconds or less. [6] In the manufacturing method described in any of [1] to [5] above, the thickness is 1 μm or more. The coating film, which is 12 μm or less in thickness, may be formed on the surface of the substrate. [7] In the manufacturing method described in any of [1] to [6] above, the substrate is optical Film is also acceptable. [8] In the manufacturing method described in any of [1] to [7] above, the substrate is polarized It may include film. [9] In the manufacturing method described in any of [1] to [8] above, the shape of the coating film Formation and drying of the formed coating film may be carried out while the strip-shaped substrate is being transported.

[10] In the manufacturing method described in any of [1] to [9] above, 5 nm or more The antistatic layer having a thickness of 00 nm or less may be formed.

[11] In the manufacturing method described in any of [1] to

[10] above, 1.0 × 1 0 9 The antistatic layer having a surface resistivity of Ω / □ or less may be formed.

[12] In the manufacturing method described in any of [1] to

[11] above, the following formula ( The antistatic layer satisfying I) may be formed. However, A and B in formula (I) are Each of these tests was conducted according to the weather resistance test specified in the German industrial standard DIN75220 (test conditions: Z- This is the surface resistivity (unit: Ω / □) of the antistatic layer before and after IN1). -2 ≤ logB - logA ≤ 2 (I)

[13] The manufacturing method according to an embodiment of the present invention (second manufacturing method) is: A method for manufacturing an optical laminate comprising an optical film and an antistatic layer in this order, The antistatic layer is manufactured by any of the methods described in [1] to

[12] above. Including the act of forming.

[14] In the manufacturing method described in

[13] above, the substrate is an optical film, and The antistatic layer may be formed on the optical film.

[15] In the manufacturing method described in

[13] or

[14] above, the optical film is polarized It may include film.

[16] The manufacturing method according to an embodiment of the present invention (third manufacturing method) is: A method for manufacturing an optical laminate comprising, in this order, an optical film, an antistatic layer, and an adhesive sheet. It is a law, The antistatic layer is manufactured by any of the methods described in [1] to

[12] above. Including the act of forming.

[17] In the manufacturing method described in

[16] above, the substrate is an optical film, and The antistatic layer may be formed on the optical film.

[18] In the manufacturing method described in

[16] or

[17] above, the optical film is polarized It may include film. [Effects of the Invention] 【0007】 According to the present invention, static image display devices suitable for application in harsh environments such as in vehicles are available. We can provide a method for manufacturing an electrical protective layer. [Brief explanation of the drawing] 【0008】 [Figure 1]This is a schematic cross-sectional view showing an example of an optical laminate that can be manufactured by the optical laminate manufacturing method according to this embodiment. [Figure 2] This is a schematic cross-sectional view showing an example of an optical laminate that can be manufactured by the optical laminate manufacturing method according to this embodiment. [Figure 3] This is a schematic cross-sectional view showing an example of an optical laminate that can be manufactured by the optical laminate manufacturing method according to this embodiment. [Modes for carrying out the invention] 【0009】 The present invention will be described in detail below. However, the present invention is not limited to the embodiments shown below. The present invention can be implemented by modifying it as needed without departing from the spirit of the invention. 【0010】 [Regarding terminology] In this specification, the term "weight" is conventionally used to refer to the SI unit of weight. It can also be interpreted as "mass" being used. The reverse is also true. 【0011】 Where the term "(meth)acrylic" is used herein, it means "acrylic and / or It means "methacrylic," and if the expression "(meth)acrylate" is used, it means "acrylic." It means "methacrylate and / or methacrylate," and if the expression "(meth)allyl" is used, It means "allyl and / or methallyl," and in the case of the expression "(meth)acrolein" This means "acrolein and / or metacrolein". 【0012】 ≪≪1. Method for Manufacturing an Antistatic Layer≫≫ The method for manufacturing the antistatic layer of this embodiment (hereinafter also referred to as the "first manufacturing method") is optical This is a method for manufacturing an antistatic layer used in a laminate. In the first manufacturing method, a conductive material, a binder A coating solution containing a resin and solvent is applied to the surface of the substrate to form a coating film. The film is dried to satisfy the following conditions (1) and (2). The solvent is removed by drying. Then, an antistatic layer is formed. The formed antistatic layer remains until it is peeled off from the substrate. Typically, it forms a laminate with a substrate. The conductive material used in the first manufacturing method has a length of 3 These are single-walled carbon nanotubes (CNTs) with a thickness of 300 μm or more. The electrostatic barrier layer contains the above-mentioned CNTs and binder resin. Condition (1): The drying temperature T of the coated film is 50°C or higher. Condition (2): From the start of coating the substrate surface with the coating solution until the start of drying of the coating film. Time Z is between 0.01 seconds and 150 seconds. 【0013】 According to our research, using CNTs as a conductive material is possible by using a conductive polymer. Compared to the case where... That's possible. The high oxidation resistance of CNTs may be contributing to the suppression of degradation. Furthermore, the study revealed in-plane variation in the surface resistivity of the formed antistatic layer, and Changes in the resistance of the antistatic layer due to exposure to harsh environments such as automotive applications are a factor in image display equipment. This can be a cause of display defects. Using the above-mentioned specific CNTs as a conductive material, and under certain conditions. Drying the coating film to satisfy (1) and (2) is important for reducing the in-plane variation and resistance mentioned above. It is estimated to contribute to the suppression of change. CNTs have strong shape anisotropy and are conductive polymers. It is more prone to aggregation compared to the above. By using the specific CNTs mentioned above, and by conditions (1) and (2) Drying to ensure sufficient moisture is necessary during the application of the coating solution, during the drying of the coating film, and after formation, to prevent electrostatic discharge. This suppresses the aggregation of CNTs in each case when the gas-preventive layer is exposed to a high-temperature environment, thereby achieving the above Resistance changes may be suppressed. Also, drying to satisfy condition (2) This may further suppress the in-plane variation mentioned above. 【0014】 Drying temperature T is the temperature of the atmosphere used to dry the coating film. When drying, the drying temperature T may be the set temperature of the drying oven. 【0015】 Drying temperature T is 55°C or higher, 60°C or higher, 65°C or higher, 70°C or higher, greater than 70°C, 72°C Above 75°C, 77°C, 80°C, 82°C, and even 85°C or higher. This is also acceptable. The upper limit of the drying temperature T is, for example, 130°C or less, 125°C or less, and 120°C or less. , below 115℃, below 110℃, below 105℃, below 100℃, and even below 95℃ It is also permissible to limit the upper limit of the drying temperature T, for example, to prevent the heat generated during drying from damaging the substrate. This can contribute to suppressing curling. The upper limit is for films that are prone to curling due to heat (for example, polarized film). It is particularly suitable when using film as the base material. 【0016】 Time Z corresponds to the time from coating to drying. Time Z is the time from coating the surface of the substrate. This is defined as the time from the start of the work until the start of drying of the coating film. The start of the coating is defined as the time from the start of the work until the start of drying of the coating film. This can be defined as the point at which coating begins with a predetermined thickness on the surface of the material. The point at which drying begins can be defined as the point at which the coated film is placed in a drying atmosphere. For example, when a coated film is placed in a drying oven or dried by passing it through a drying oven. In this case, when the coating film is placed in a drying oven set to a dry atmosphere, or in a dry atmosphere The drying process can be defined as starting when the coated film enters the pre-set drying oven. 【0017】 The lower limit of time Z is 0.05 seconds or more, 0.1 seconds or more, 0.3 seconds or more, 0.5 seconds or more, 0. 8 seconds or more, 1 second or more, 1.5 seconds or more, 2 seconds or more, 2.5 seconds or more, 3 seconds or more, 3.5 seconds or more , 4 seconds or more, 4.5 seconds or more, 5 seconds or more, 6 seconds or more, 7 seconds or more, 8 seconds or more, 9 seconds or more, and It may be 10 seconds or more. The upper limit of time Z is 140 seconds or less, 130 seconds or less, 120 less than seconds, less than 110 seconds, less than 100 seconds, less than 90 seconds, less than 80 seconds, less than 70 seconds, more than 60 seconds Down, 50 seconds or less, 45 seconds or less, 40 seconds or less, 35 seconds or less, 30 seconds or less, 25 seconds or less, 20 seconds or less, 18 seconds or less, 15 seconds or less, 14 seconds or less, 13 seconds or less, 12 seconds or less, 11 seconds or less, Furthermore, it's acceptable to do it in under 10 seconds. 【0018】 The coating liquid can be applied using various coating methods. For example, roll coating, kiss roll coating. Gravure Coat, Reverse Coat, Roll Brush, Lip Coat, Spray Coat Dip roll coat, bar coat, knife coat, air knife coat, curtain coat Extrusion coating methods using die coaters, etc., can be used. In coating methods such as those that allow coating to be applied to the surface of a substrate to a predetermined thickness simply by applying a coating liquid, Therefore, the start of the coating process can be defined as the point at which the coating liquid adheres to the surface of the substrate. In this coating process, which is carried out while transporting the material, the start of the coating process is determined by the point to which the coating liquid adheres. The point at which the substrate passes through the gate may also be considered. In addition, in order to coat with a predetermined thickness, the surface of the substrate In coating methods that require not only applying a coating liquid but also adjusting the subsequent coating thickness, The start of the coating process is when the adjustment of the coating thickness begins (for example, while transporting the substrate). In bar coating and knife coating, the coating liquid adhering to the surface of the substrate passes through the gap. At a given time, or in bar coating performed with the substrate fixed, the coating liquid on the surface of the substrate This can be defined as the point at which adjustment of the coating thickness by sliding the bar that has come into contact with it begins. Cut. 【0019】 The amount of coating solution applied depends, for example, on the solid content concentration of the coating solution and the desired thickness of the antistatic layer. The following may be taken into consideration when making adjustments. However, according to the inventors' studies, the solid content concentration of the coating solution and The thickness of the coating film formed on the surface of the substrate is the surface resistivity of the formed antistatic layer. This affects in-plane variation and changes in the resistance of the antistatic layer due to exposure to harsh environments. There is a possibility that this will happen. 【0020】 The solid content concentration of the coating solution is, for example, 0.05% by weight or more and 5% by weight or less. The lower limits are 0.08% by weight or more, 0.1% by weight or more, 0.15% by weight or more, and 0.2% by weight. The above is 0.25% by weight or more, and may be even 0.3% by weight or more. The limits are 4.5% by weight or less, 4% by weight or less, 3.5% by weight or less, 3% by weight or less, and 2.5% by weight. % or less, 2% by weight or less, 1.5% by weight or less, 1% by weight or less, 0.8% by weight or less, 0.6% by weight It may be less than or equal to a certain percentage by volume, less than or equal to 0.5% by weight, or even less than or equal to 0.4% by weight. The solid content concentration is It may be 0.2% by weight or more and 2.5% by weight or less. 【0021】 The thickness of the coating film formed on the surface of the substrate is, for example, 0.5 μm or more and 50 μm or less. The upper limits for thickness are 45 μm or less, 40 μm or less, 35 μm or less, 30 μm or less, and 25 μm or less. Bottom, 20μm or less, 18μm or less, 15μm or less, 13μm or less, 12μm or less, 11μ m or less, 10 μm or less, 9 μm or less, 8 μm or less, 7 μm or less, 6 μm or less, and even 5 The thickness may be less than or equal to μm. The lower limit of the thickness is 0.8 μm or more, 1 μm or more, or 1.2 μm or more. , 1.4 μm or larger, 1.5 μm or larger, 1.7 μm or larger, 1.9 μm or larger, and even 2 μm The above is also acceptable. The thickness may be 1 μm or more and 12 μm or less, in other words, the first In the manufacturing method, a coating film with a thickness of 1 μm to 12 μm may be formed on the surface of the substrate. 【0022】 The drying time H of the coating film is determined by the removal of the solvent from the coating film and the final formation of the antistatic layer. It can be set arbitrarily as long as it is possible. The drying time H is, for example, between 10 seconds and 150 seconds. In the first manufacturing method, the coating film is subjected to the following condition (3) in addition to the above conditions (1) and (2). You can also dry it until it is full. Condition (3): Drying temperature H of the coated film is 10 seconds or more and 150 seconds or less. 【0023】 The drying time H is the time from when the coated film is placed in a drying atmosphere until when it is removed from the drying atmosphere. It can be defined as a time. For example, when drying a coated film by placing it in a drying oven. In this case, the coating film is placed in a drying oven set to a dry atmosphere, and the drying process is performed from that point onward. The drying time H can be defined as the time from the moment the fabric film is removed from the drying oven until it is removed from the drying oven. Furthermore, when drying the coating film by passing it through a drying oven, set the drying atmosphere to dry The drying time H is defined as the time from when the coated film enters the drying oven until when it leaves the drying oven. It is possible. 【0024】 The product T·H (°C·seconds) of the drying temperature T and drying time H of the coated film is 2500 or more, and 3000 or more. The above, including 3500 or more, 4000 or more, 4500 or more, and even 5000 or more, are all acceptable. stomach. 【0025】 The coated film can be dried, for example, by a drying oven. However, the drying method must meet the above conditions. (1) to (3) are not limited as long as drying can be carried out in a manner that satisfies these conditions. 【0026】 From the start of coating the substrate surface with the coating liquid until the start of drying of the coating film, the substrate and The ambient temperature in which the coated film is placed is usually 50°C or lower, and also 45°C or lower, 40°C or lower. The temperature may be 30°C or lower, or even 25°C or lower. The temperature of the atmosphere is room temperature (25±5°C). (°C) is also acceptable. 【0027】 In the first manufacturing method, the formation of the coating film and the drying of the formed coating film are performed by transporting a strip-shaped substrate. It may be carried out while doing so. The strip-shaped base material may be one that has been unwound from a roll. Furthermore, in the first manufacturing method, even if the substrate is not transported, the formation and drying of the coating film can be performed. That is fine. For example, the coating film may be formed and dried on a single-leaf substrate. 【0028】 In the first manufacturing method, the surface of the substrate may be surface-treated before applying the coating liquid. Then, a coating liquid may be applied to the surface of the substrate that has undergone surface treatment. Depending on the type, for example, plasma treatment and corona treatment require adhesion of the antistatic layer to the substrate. Suitable for improving properties. Examples of surface treatments include plasma treatment and corona treatment. First manufacturing In the manufacturing method, the coating liquid may be applied to the surface of the substrate without surface treatment. This can be done using publicly known methods. 【0029】 ≪1-1. Coating Liquid≫ <1-1-a.CNT> The coating solution contains single layers of carbon nanotubes (CNTs) with a length of 3 μm or more and less than 300 μm. The upper limit of length is 29 0μm or less, 275μm or less, 250μm or less, 225μm or less, 200μm or less, 17 5μm or less, 150μm or less, 125μm or less, 100μm or less, 90μm or less, 80μ m or less, 70 μm or less, 60 μm or less, 50 μm or less, 40 μm or less, 30 μm or less, 2 5 μm or less, 20 μm or less, 15 μm or less, 10 μm or less, less than 10 μm, 9 μm or less, The length may be 8 μm or less, 7 μm or less, 6 μm or less, or even 5 μm or less. The length of the CNT may be 3.5 μm or more, 4 μm or more, or even 4.5 μm or more. This can be evaluated by observation using an atomic force microscope (AFM) or a scanning electron microscope (SEM). It can be valued. 【0030】 The diameter (outer diameter) of CNTs is, for example, 0.1 to 50 nm, and also 0.2 to 40 nm, 0. 25-30nm, 0.3-20nm, 0.4-15nm, and even 0.5-10nm It is also acceptable. The diameters are 9nm or less, 8nm or less, 7nm or less, 6nm or less, 5nm or less. 4.5nm or less, 4nm or less, 3.5nm or less, 3nm or less, 2.5nm or less, and furthermore It may be 2 nm or less. The diameter of the CNT is as specified in ISO / TS10868:2017. It can be identified in accordance with [the relevant standard]. 【0031】 The coating solution is used to coat single-layer carbon nanotubes (CNTs) with a length of 3 μm or more and less than 300 μm, and a diameter of 10 nm or less. It may be included. 【0032】 The amount of CNTs in the coating solution is calculated based on the amount of solids contained in the coating solution as 100 parts by weight. For example, 0.1 to 5 parts by weight. The lower limit of the content is 0.2 parts by weight or more, and 0.4 parts by weight. The above amounts may be 0.5 parts by weight or more, 0.7 parts by weight or more, or even 0.8 parts by weight or more. The maximum content is 4.5 parts by weight or less, 4 parts by weight or less, 3.5 parts by weight or less, and 3 parts by weight or less. It may be 2.5 parts by weight or less, 2 parts by weight or less, or even 1.5 parts by weight or less. 【0033】 The coating liquid may contain only the above-mentioned CNTs as the conductive material, or it may contain the above-mentioned CNTs and other conductive materials. It may also include electrical materials. Examples of other conductive materials include CNTs other than the above CNTs, conductive materials Remer, composite of conductive polymer and dopant, conductive nanoparticles, carbon material, ionic boundary These are surfactants and ionic compounds. Examples of carbon materials include acetylene black and ketch. Carbon black such as Enblack, natural graphite, and artificial graphite. . 【0034】 <1-1-b. Binder Resin> The coating liquid contains a binder resin. The binder resin is used to improve the film formation properties of the antistatic layer. This can contribute to improving the adhesion and bonding (anchoring force) of the antistatic layer to the surface or substrate. 【0035】 Examples of binder resins include oxazoline group-containing polymers, polyurethane resins, and polyester Polyether resins, acrylic resins, polyether resins, cellulose resins, polyvinyl alcohol Coal resins, epoxy resins, polyvinylpyrrolidone, polystyrene resins, polyethylene The binder resin is preferably oxyglycol and pentaerythritol. Sazoline group-containing polymers, polyurethane resins, polyester resins, and acrylic resins Yes, and especially preferably polyurethane resins and / or acrylic resins. The coating liquid is The binder resin may contain one or more types, or only one type. The combination of more than two types of binder resins is a combination of polyurethane resin and acrylic resin. It's fine to combine them. 【0036】 The binder resin content in the coating solution is calculated based on the amount of solids contained in the coating solution, which is 100 parts by weight. For example, 1 part by weight or more, 10 parts by weight or more, 25 parts by weight or more, 50 parts by weight or more , 60 parts by weight or more, 70 parts by weight or more, 75 parts by weight or more, 80 parts by weight or more, 85 parts by weight or more , 90 parts by weight or more, 92 parts by weight or more, 94 parts by weight or more, 95 parts by weight or more, 96 parts by weight or more It may be 97 parts by weight or more, 98 parts by weight or more, or even 99 parts by weight or more. The upper limit is, for example, 99.9 parts by weight or less, 99.8 parts by weight or less, 99.7 parts by weight or less, It may be 99.5 parts by weight or less, 99.4 parts by weight or less, or even 99.2 parts by weight or less. . 【0037】 The glass transition temperature (Tg) of the binder resin may be 0°C or higher, and may be 20°C or higher. It may be 30°C or higher, 40°C or higher, 50°C or higher, 55°C or higher, or even 60°C or higher. The upper limit of Tg is, for example, 100°C or less. In other words, the coating solution has a Tg of 0°C or higher. It may also contain a binder resin. According to the inventors' studies, the binder resin When using this method, the Tg of the binder resin must be within the above range before the DIN test described later. This may contribute to suppressing changes in the surface resistivity of the antistatic layer later on. The higher the Tg of the inder resin, the greater the thermal transfer of conductive materials contained in the antistatic layer. It is presumed that aggregation and orientation caused by this will be suppressed. Aggregation and orientation occur inside the antistatic layer. The non-uniformity of the conductive material can be improved, and the surface resistivity can be changed. The Tg of the binder resin. The suppression of surface resistivity changes based on this method is effective in preventing the movement of conductive materials during the heating cycle of the DIN test. This may be based on the suppression of [something]. In this specification, the Tg of a polymer is: Unless otherwise specified, Tg is calculated from Fox's formula based on the monomer component composition. Taste. In this specification, Tg of resins (including binder resins) means, unless otherwise specified. This refers to Tg determined by differential scanning calorimetry (DSC). The measurement conditions for DSC are: It is as follows: • Atmosphere gas: Nitrogen (50 mL / min) • Measurement temperature range: 0℃ → 100℃ • Heating rate: 10°C / min • Sample volume: Approximately 3 mg (For the sample container, use, for example, an aluminum Tzero pan.) can) 【0038】 If the coating solution contains a binder with a Tg of 0°C or higher, all of the binder resins contained in it will be affected. The proportion of binder resin with a melting Tg of 0°C or higher may be 50% by weight or more, and 55% by weight Weight% or more, 60% by weight or more, 65% by weight or more, 70% by weight or more, 75% by weight or more, 80% by weight % by weight or more, 85% by weight or more, 90% by weight or more, 91% by weight or more, 92% by weight or more, 93% by weight It may be % by volume or more, and even 94% by weight or more. The upper limit of this percentage is, for example, 100% by weight. It is less than or equal to a certain percentage, such as 99% by weight or less, 98% by weight or less, 97% by weight or less, 96% by weight or less, Furthermore, it may be 95% by weight or less. 【0039】 In particular, if the coating solution contains two or more binder resins, the temperature (Tg) should be less than 0°C. It may contain a binder resin. For example, the coating liquid may contain a binder resin with a Tg of 0°C or higher. It may also contain a binder resin with a Tg of less than 0°C. The lower limit of Tg in der resin is, for example, -70°C or higher, -60°C or higher, and -50°C or lower. The temperature may be above -45°C, or even above -40°C. Depending on the composition of the coating solution, the film-forming properties of the resin and the formation of an antistatic layer from the coated film may vary. This can sometimes contribute to improving the diversification of CNTs. Binder trees with a Tg of 0°C or higher. If the coating solution contains fat and binder resin below 0°C, all of the binder resin contained in it The proportion of binder resin below 0°C may be 50% by weight or less, and 45% by weight Below, 40% by weight or less, 35% by weight or less, 30% by weight or less, 25% by weight or less, 20% by weight Below are 15% by weight or less, 10% by weight or less, 8% by weight or less, 6% by weight or less, and even 5% by weight It may be less than or equal to %. The lower limit of the percentage is, for example, 1% by weight or more, and 2% by weight or more. It may be 3% or more by weight, 4% or more by weight, or even 5% or more by weight. 【0040】 The coating solution consists of a single layer of CNTs with a length of 3 μm or more and less than 300 μm, and a binder with a Tg of 0°C or higher. It may also contain a resin. 【0041】 <1-1-c. Leveling agent> The coating solution may contain a leveling agent. However, the leveling agent in the coating solution The content may be small. According to the inventors' studies, the content of the leveling agent is small. This suggests that it may be particularly suitable for suppressing the above-mentioned resistance change in the formed antistatic layer. The amount of leveling agent in the coating liquid is calculated as follows: For example, 25 parts by weight or less, 23 parts by weight or less, 20 parts by weight or less, 18 parts by weight or less , 15 parts by weight or less, 13 parts by weight or less, 11 parts by weight or less, 10 parts by weight or less, 9 parts by weight or less, 8 parts by weight or less, 7 parts by weight or less, 6 parts by weight or less, 5 parts by weight or less, 4 parts by weight or less, 3 parts by weight or less Below, 2 parts by weight or less, 1 part by weight or less, 0.5 parts by weight or less, and even 0.1 parts by weight or less. The coating liquid may substantially not contain a leveling agent. The agent is substantially free, or the amount of solids contained in the coating liquid is 8 parts by weight, with 100 parts by weight being used. The coating liquid may contain a leveling agent in an amount less than or equal to parts by volume. "Substantially free of ringing agents" means that the above content is less than 0.01 parts by weight. ru. 【0042】 According to our research, shortening time Z is particularly beneficial for the leveling agent in the coating solution. When the content is small, the in-plane variation of the surface resistivity in the formed antistatic layer It may be particularly suitable for suppressing fumes. From this perspective, in the first manufacturing method, the coating liquid is The coating solution contains virtually no leveling agent, or the amount of solids contained in the coating solution is 100 parts by weight. The coating contains a leveling agent in an amount of 8 parts by weight or less, and the coating film has a time Z of 15 seconds or less. It may be dried to satisfy the requirements. In this case, the leveling agent content is 7 parts by weight or less. , 6 parts by weight or less, 5 parts by weight or less, 4 parts by weight or less, 3 parts by weight or less, 2 parts by weight or less, 1 part by weight The amount may be 0.5 parts by weight or less, or even 0.1 parts by weight or less. Time Z is 14 seconds. The following times may be 13 seconds or less, 12 seconds or less, 11 seconds or less, or even 10 seconds or less. 【0043】 The coating solution may contain one or more leveling agents. 【0044】 Examples of leveling agents include ester-based leveling agents, polyether-based leveling agents, and fluorine-based leveling agents. These are leveling agents, silicone-based leveling agents, and acrylic-based leveling agents. However, ester-based leveling agents that have ester bonds and polyethylene ethers that have ether bonds Leveling agents of the ru-type are preferred because they readily interact with CNTs. 【0045】 An example of an ester-based leveling agent is a polyester-modified acrylic group-containing polydimethylsilok These are san, polyester-modified polydimethylsiloxane, and polyester polyol. 【0046】 Examples of polyether-based leveling agents include cellulose ether; pullulan; polyethylene ether. Recall; polyether-modified polydimethylsiloxane, polyether-modified siloxane, Polyether ester-modified hydroxyl group-containing polydimethylsiloxane, polyether-modified acrylic Silicone-modified polyethers such as polydimethylsiloxane containing polyglycerin; polyglycerin; poly Ether polyols, polyoxyethylene-polyoxypropylene condensates, polyoxyethylene Alkyl ethers such as ethylene alkylphenyl ethers and lauryl alcohol alkoxylates These are ether derivatives and alkyl ether sulfates. 【0047】 An example of a fluorine-based leveling agent is perfluoropolyether-modified polydimethylsiloxane. Perfluoropolyester-modified polydimethylsiloxane, perfluorobutanesulfone Acids, oligomers containing fluorine-containing groups, hydrophilic groups, and lipophilic groups, and perfluoroalkyl group-containing calcium These are phosphate salts and phosphate esters containing perfluoroalkyl groups and phosphate groups. 【0048】 Examples of silicone-based leveling agents include polysiloxanes, amino groups, epoxy groups, and hydroxyl groups. Reactive polysiloxanes and alkyl groups with the introduction of reactive groups such as syl groups and carboxyl groups. Non-reactive groups such as ester groups, aralkyl groups, phenyl groups, and polyether groups were introduced. It is a non-reactive polysiloxane. 【0049】 An example of an acrylic leveling agent is an acrylic copolymer consisting of silicone and acrylic. That is the case. 【0050】 However, leveling agents other than those exemplified above can also be used. 【0051】 <1-1-d. Solvent> Examples of solvents for coating solutions include water and organic solvents. The organic solvent may be water-soluble. The medium may be a single solvent or a mixed solvent containing two or more solvents. An example is a solvent containing water and a water-soluble organic solvent. An example of a water-soluble organic solvent is methanol. Ethanol, n-propanol, isopropanol, n-butanol, isobutanol sec-butanol, tert-butanol, n-amyl alcohol, isoamyl alcohol Coal, sec-amyl alcohol, tert-amyl alcohol, 1-ethyl-1-p Ropanol, 2-methyl-1-butanol, n-hexanol, and cyclohexanol These are alcohols. The water-soluble organic solvent may be isopropanol (IPA). According to the inventors' studies, single-walled CNTs with a length of 3 μm or more and less than 300 μm and single-walled soluble Combining with a medium can contribute to suppressing the above-mentioned resistance change in the antistatic layer. Single solvent The solvent is preferably water. Furthermore, studies have shown that the use of a single solvent, especially water, is effective against electrostatic discharge. This may contribute to improving the uniformity of CNTs in the stasis layer. 【0052】 <1-1-e. Dispersant> The coating solution may contain a dispersant for CNTs. The dispersant is a component of the CNTs in the coating solution. It is not particularly limited as long as it can improve dispersion. 【0053】 ≪1-2. Base material≫ The substrate is typically in the form of a film. The thickness of the film-like substrate is usually 5-2 The particle size is 00 μm, preferably around 5 to 100 μm. 【0054】 Examples of constituent materials for the base material include polyethylene, polypropylene, and polyethylene terrestrial. Porous materials such as phthalates, plastic films like polyester films, paper, cloth, and nonwoven fabrics. These include materials, nets, foam sheets, metal foils, and laminates thereof. 【0055】 The base material may be a release film. In this form, static electricity is formed on the release film. It is suitable for transferring the protective layer to other materials. If transferred to an optical film, it will be suitable for optical film It is also possible to form an optical laminate including a release film and an antistatic layer. The surface may be subjected to various treatments, such as release treatment, as needed. Various release agents such as silicone-based, fluorine-based, long-chain alkyl-based, and fatty acid amide-based agents, as well as silica powder. Particles such as these can be used. 【0056】 The substrate may be an optical film. This form consists of an optical film and an antistatic layer. It is suitable for the direct formation of optical laminates. 【0057】 The optical film is selected from the group consisting of, for example, polarizing films and phase difference films. It must include at least one. The optical film may include a polarizing film. In other words, The substrate may contain a polarizing film, or it may be a polarizing film. The optical film is The laminated film may include a polarizing film and / or a phase difference film. The film may include a glass film. 【0058】 <1-2-a. Polarizing film> A polarizing film includes a polarizer. The polarizing film includes a polarizer and at least one side of the polarizer. Includes a protective film (transparent protective film) placed on top. The protective film is usually polarized. It is positioned in contact with the main surface of the child. The polarizer is positioned between two protective films. This is also fine. The protective film may be placed on each of the two sides of the polarizer. The protective film is It may be a single layer or a laminate of two or more layers. 【0059】 The polarizer is not particularly limited and can be, for example, a polyvinyl alcohol-based film, a partial film, etc. Lumarized polyvinyl alcohol-based film, ethylene-vinyl acetate copolymer-based partial keene Dichroic substances such as iodine and dichroic dyes are adsorbed onto hydrophilic polymer films such as chemical films. Uniaxially stretched material; dehydrated polyvinyl alcohol, dehydrochlorinated polyvinyl chloride Examples include polyene-based oriented films of materials, etc. Polarizers are typically made of polyvinyl aluminum. Coal-based films (polyvinyl alcohol-based films include ethylene vinyl acetate copolymer) It consists of a system of partially saponified films and a dichroic substance such as iodine. 【0060】 The thickness of the polarizer is not particularly limited; for example, it can be 80 μm or less, 50 μm or less, or 30 μm. It may be less than or equal to m, less than or equal to 25 μm, or even less than or equal to 20 μm. The lower limit of the polarizer thickness is There are no particular limitations; for example, it can be 1 μm or larger, 5 μm or larger, 10 μm or larger, or even 15 μm. It may be m or more. Thin polarizers (e.g., thickness 20 μm or less) have suppressed dimensional changes. This can contribute to improving the durability of optical laminates, especially their durability under high temperatures. 【0061】 Materials for protective films include, for example, transparency, mechanical strength, thermal stability, and moisture barrier properties. Thermoplastic resins with excellent isotropy and other properties are used. Specific examples of such thermoplastic resins include cellulose resins such as triacetylcellulose, polyester resins, polyethersulfone Polycarbonate resin, polysulfone resin, polycarbonate resin, polyamide resin, polyimide resin, Polyolefin resin, (meth)acrylic resin, cyclic polyolefin resin (norbornene-based) Resins), polyarylate resin, polystyrene resin, polyvinyl alcohol resin, and These mixtures are examples. The protective film material is (meth)acrylic, urethane, Thermosetting resins such as acrylic urethane, epoxy, and silicone, or UV-curing resins This may also apply. If the polarizing film has two protective films, the two protective films The materials may be the same or different. For example, one of the main components of a polarizer A protective film made of thermoplastic resin is bonded to the surface via an adhesive. A protective film made of thermosetting resin or UV-curing resin is applied to the other main surface of the polarizer. The film may be laminated. The protective film may contain one or more additives. Possible additives include, for example, UV absorbers, antioxidants, lubricants, plasticizers, and release agents. Examples include color inhibitors, flame retardants, nucleating agents, antistatic agents, pigments, and colorants. 【0062】 The moisture permeability of the protective film is not particularly limited, but is 200g / (m²). 2 (day) or less Also, 50g / (m 2 It may be less than or equal to (day). In this case, the inside of the polarizing film This prevents moisture from entering the polarizing film and suppresses changes in the moisture content of the polarizing film. This suppresses curling and dimensional changes in the polarizing film. Furthermore, the moisture permeability is as described above. The protective film, which is limited in range, is placed between the adhesive sheet and the polarizer. This can contribute to inhibiting the transfer of radicals from the adhesive sheet at high temperatures. Examples of materials used to form the protective film include polyester polymers and polycarbonates. nitrate polymers, arylate polymers, amide polymers, olefin polymers, cyclic polymers Examples include olefin polymers, (meth)acrylic polymers, and mixtures thereof. . 【0063】 The moisture permeability of the protective film is determined by the moisture permeability test (cup method) of JIS Z0208:1976. Accordingly, it can be measured by the following method. First, cut the protective film to a diameter of 60 mm, Prepare the measurement sample. Next, measure the amount of calcium chloride in a breathable cup containing approximately 15g. Set the sample. This moisture-permeable cup is set to a constant temperature of 40°C and humidity of 92%RH. The moisture permeability test is performed by placing the sample in a heating chamber and leaving it for 24 hours. The chloride content before and after the test is measured. By measuring the increase in calcium weight, the moisture permeability of the protective film can be determined. . 【0064】 The thickness of the protective film can be determined as appropriate, but generally, factors such as strength and workability (e.g., handling) are considered. The thickness is approximately 10-200 μm, considering factors such as thin film properties. 【0065】 The polarizer and protective film are typically bonded together via a water-based adhesive. This includes isocyanate-based adhesives, polyvinyl alcohol-based adhesives, gelatin-based adhesives, and vinyl Examples include water-based latex, water-based polyurethane, water-based polyester, etc. Other adhesives include UV-curing adhesives and electron beam-curing adhesives. The sub-wire curing type polarizing plate adhesive exhibits suitable adhesion to various protective films. The agent may contain a metal compound filler. 【0066】 In polarizing films, instead of a protective film, a phase difference film or the like is formed on the polarizer. It is also possible to place another protective film on top of the protective film, and to use a phase difference film. It is also possible to establish facilities such as a 'mu' (a type of stipulator or similar structure). 【0067】 The polarizing film contains polarizers, and each layer is bonded to each other by an adhesive. It can be identified as a laminate. 【0068】 Regarding the protective film, the surface that is bonded to the polarizer and the surface facing it are hard coated. A layer may be provided, and the purpose may be anti-reflective, anti-sticking, diffusion, anti-glare, etc. It is also possible to apply targeted processing. 【0069】 The polarizing film may also be a circularly polarizing film. 【0070】 <1-2-b. Phase difference film> Phase difference films include those obtained by stretching polymer films and those obtained by orienting liquid crystal materials. A fixed version can be used. The phase difference film is, for example, in-plane and / or It exhibits birefringence in the thickness direction. 【0071】 As for phase difference films, anti-reflective phase difference films (Japanese Patent Publication No. 2012-133303) (See publications

[0221] ,

[0222] ,

[0228] ), phase difference film for viewing angle compensation (Patent (See Publication No. 2012-133303

[0225] ,

[0226] ), tilt for field of view compensation Examples include obliquely oriented phase difference films (see Japanese Patent Publication No. 2012-133303

[0227] ). It is possible. 【0072】 As a phase difference film, any film that substantially has the above functions is acceptable, for example, a phase difference film. The values, placement angle, three-dimensional birefringence, single-layer or multi-layer configuration, etc., are not particularly limited and are known phase difference fills. You can use Mu. 【0073】 The thickness of the phase difference film is preferably 20 μm or less, and more preferably 10 μm or less. The particle size is below, more preferably 1 to 9 μm, and particularly preferably 3 to 8 μm. 【0074】 Phase difference films include, for example, quarter-wave plates and half-wave plates in which liquid crystal materials are aligned and fixed. It consists of two layers of boards. 【0075】 The base material is not limited to the examples above. 【0076】 ≪1-3. Antistatic layer≫ The formed antistatic layer will be described below. In the first manufacturing method, the antistatic layer described below A vapor barrier may be formed. 【0077】 Content of the above CNTs (single-layer CNTs with a length of 3 μm or more and less than 300 μm) in the antistatic layer The amount is, for example, 0.01 to 50.0 mg / m². 2 Therefore, 0.1~10.0 mg / m² 2 And This may also be the case. The proportion of the above CNTs to the total solid content contained in the antistatic layer may be, for example, 0.1 The percentage is approximately 5% by weight. The lower limit of the percentage is 0.2% or more by weight, 0.4% or more by weight, and 0.5% by weight. The above may be 0.7% by weight or more, and even 0.8% by weight or more. The upper limit of the percentage is 4 .5% by weight or less, 4% by weight or less, 3.5% by weight or less, 3% by weight or less, 2.5% by weight or less, It may be 2% by weight or less, or even 1.5% by weight or less. Optical lamination including optical film From the perspective of suppressing the loss of total light transmittance when used as a body, a smaller ratio is preferable. stomach. 【0078】 The proportion of binder resin in the total solid content of the antistatic layer is, for example, 1% by weight or less. Above, 10% or more by weight, 25% or more by weight, 50% or more by weight, 60% or more by weight, 70% Weight % or more, 75 weight % or more, 80 weight % or more, 85 weight % or more, 90 weight % or more, 92 weight % by weight or more, 94% by weight or more, 95% by weight or more, 96% by weight or more, 97% by weight or more, 98% by weight It may be % by quantity or more, and even 99% by weight or more. The upper limit of the percentage is, for example, 99.9% by weight. It is less than or equal to 99.8% by weight, 99.7% by weight, 99.5% by weight, and 99. It may be 4% by weight or less, or even 99.2% by weight or less. 【0079】 The proportion of the leveling agent in the total solid content of the antistatic layer is, for example, 25% by weight or less. Below, 23% or less by weight, 20% or less by weight, 18% or less by weight, 15% or less by weight, 13% % or less, 11% by weight or less, 10% by weight or less, 9% by weight or less, 8% by weight or less, 7% by weight or less Less than 6% by weight, less than 5% by weight, less than 4% by weight, less than 3% by weight, less than 2% by weight, less than 1% by weight %, less than 0.5% by weight, and even less than 0.1% by weight may be acceptable. The antistatic layer may not substantially contain a leveling agent. In this specification, when the antistatic layer does not substantially contain a leveling agent, it means that the above ratio is less than 0.01% by weight. 【0080】 The thickness of the antistatic layer is, for example, 5 to 1500 nm, 1400 nm or less, 130 0 nm or less, 1200 nm or less, 1100 nm or less, 1000 nm or less, 900 nm or less 800 nm or less, 700 nm or less, 600 nm or less, 500 nm or less, 400 nm or less 300 nm or less, 200 nm or less, 180 nm or less, 150 nm or less, 120 nm or less 100 nm or less, 90 nm or less, 80 nm or less, 70 nm or less, 60 nm or less, 55 n m or less, 50 nm or less, 45 nm or less, 40 nm or less, 35 nm or less, 30 nm or less, 2 5 nm or less, 20 nm or less, 19 nm or less, 18 nm or less, 17 nm or less, 16 nm or less and even 15 nm or less may be acceptable. The thickness may be 6 nm or more, 7 nm or more, 8 nm or more 9 nm or more, 10 nm or more, 11 nm or more, 12 nm or more, 13 nm or more, 14 nm or more and even 15 nm or more may be acceptable. In the first manufacturing method, an antistatic layer having a thickness of 5 nm or more and 200 nm or less may be formed. 【0081】 The surface resistivity of the antistatic layer is, for example, 1.0×10 9 Ω / □ or less, 9.0×1 0 8 Ω / □ or less, 8.0×10 8 Ω / □ or less, 7.0×10 8 Ω / □ or less, 6.0×10 8 Ω / □ or less, 5.0×10 8 Ω / □ or less, 4.0×10 8 Ω / □ or less, 3.0×10 8 Ω / □ Below, 2.5×10 8 Ω / □ or less, 2.0×10 8 Ω / □ or less, 1.5×10 8 Ω / □ and below 1.0×10 8 Ω / □ or less, 9.0×10 7 Ω / □ or less, 8.0×10 7 Ω / □ and below, 7 .0×10 7 Ω / □ or less, 6.0×10 7 Ω / □ or less, 5.0×10 7 Ω / □ or less, 4.0 ×10 7 Ω / □ or less, 3.0×10 7 Ω / □ or less, 2.0×10 7 Ω / □ or less, さらには1 0.5×10 7 Ω / □ and below are the same. The lower limit of surface resistance is 1.0×10 5 Ω / □Above であり、2.0×10 5 Ω / □ or more, 3.0×10 5 Ω / □ or higher, 4.0×10 5 Ω / □ or above, 5.0×10 5 Ω / □ or higher, 6.0×10 5 Ω / □ or above, 7.0×10 5 Ω / □ Above, 8.0×10 5 Ω / □ or higher, 9.0×10 5 Ω / □ or more, 1.0×10 6 Ω / □ and above 2.0×10 6 Ω / □ or more, 3.0×10 6 Ω / □ or higher, 4.0×10 6 Ω / □ or above, 5 .0×10 6 Ω / □ or higher, 6.0×10 6 Ω / □ or above, 7.0×10 6 Ω / □ or higher, 8.0 ×10 6Ω / □ or more, 9.0×10 6 Ω / □ or greater, and even 1.0 × 10 7 Ω / □ or greater, It may be. In the first manufacturing method, 3.0 × 10 8 A static device having a surface resistivity of Ω / □ or less An electrical barrier layer may be formed. 【0082】 The antistatic layer may satisfy the following equation (I). However, A in equation (I) And B are subjected to weathering tests as defined in German industrial standard DIN75220 (test conditions The object is the surface resistivity (unit: Ω / □) of the antistatic layer before and after Z-IN1. In the manufacturing method of 1, an antistatic layer satisfying the following formula (I) may be formed. -2 ≤ logB - logA ≤ 2 (I) 【0083】 As described above, according to the inventors' studies, when exposed to harsh environments such as in automotive applications... Changes in the resistance of the anti-static layer can cause display malfunctions in image display devices. (DIN75) The weather resistance test specified in 220 (hereinafter referred to as the "DIN test") takes into account the harsh environment described above. This is a weather resistance test that takes this into consideration. For an antistatic layer that satisfies formula (I), the DIN test is performed before and after the test. The change in surface resistivity is suppressed. 【0084】 In the DIN test, test condition Z-IN1 is for testing Indoor (Zone 1). This is due to a 15-day dry climate cycle followed by a 10-day wet climate cycle. This refers to a cycle test (Z). In the dry climate cycle, (1) temperature 80°C and relative (2) UV irradiation in an atmosphere of 20% humidity for 8 hours, and at a temperature of 10°C and relative humidity of 60% (3) Leave at ambient temperature (without UV irradiation) for 3.5 hours, (3) temperature 80°C and relative humidity 20 (4) UV irradiation in an atmosphere of % for 8 hours, and in an atmosphere of 10°C and 60% relative humidity Leaving the device unattended (without UV exposure) for 3.5 hours constitutes one cycle, and repeat this cycle for 15 hours. Repeat for several days. However, between (4) of one cycle and (1) of the next cycle, Leave it at a temperature of 23°C for 1 hour. In a humid climate cycle, (1) an atmosphere at a temperature of -10°C (2) Leave in an open environment (without UV exposure) for 5 hours, (2) in an atmosphere with a temperature of 80°C and a relative humidity of 50%. (3) Exposure to ultraviolet light in the atmosphere for 12 hours, and (4) leaving in an atmosphere at a temperature of -10°C (ultraviolet light (No irradiation) is considered one cycle of 6 hours, and this cycle is repeated for 10 days. However, Between (3) of one cycle and (1) of the next cycle, leave the device at room temperature for one hour. Indoor (Zone 1) refers to the area relating to the mounting location of in-vehicle components and materials within the vehicle. This refers to interior components and materials that are exposed to high temperatures, although the intensity of sunlight exposure is lower than that of the exterior. It means that something is being treated. The illuminance of the metal halide lamp used for ultraviolet irradiation is 830W. / m 2 Let's assume that. 【0085】 The lower limit of logB-logA in equation (I) is -1.9 or greater, -1.8 or greater, and -1.7 or greater. -1.6 or higher, -1.5 or higher, -1.4 or higher, -1.3 or higher, -1.2 or higher, -1.1 5 or higher, -1.1 or higher, -1.05 or higher, -1.0 or higher, -0.95 or higher, -0.9 or higher -0.85 or higher, -0.8 or higher, -0.75 or higher, -0.7 or higher, -0.65 or higher, - 0.6 or higher, -0.55 or higher, -0.5 or higher, -0.45 or higher, -0.4 or higher, -0.3 5 or higher, -0.3 or higher, -0.25 or higher, -0.2 or higher, -0.15 or higher, -0.1 or higher Furthermore, it may be -0.05 or greater. The upper limit of logB-logA is 1.9 or less. 1.8 or less, 1.7 or less, 1.6 or less, 1.5 or less, 1.4 or less, 1.3 or less, 1.2 or less Lower, 1.15 or less, 1.1 or less, 1.05 or less, 1.0 or less, 0.95 or less, 0.9 or less , 0.85 or less, 0.8 or less, 0.75 or less, 0.7 or less, 0.65 or less, 0.6 or less, 0.55 or less, 0.5 or less, 0.45 or less, 0.4 or less, 0.35 or less, 0.3 or less, 0 Even if it is 0.25 or less, 0.2 or less, 0.15 or less, 0.1 or less, or even 0.05 or less good. 【0086】 Surface resistivity A (surface resistivity before DIN test) and surface resistivity B (DIN test) of the antistatic layer The range that each of the surface resistivity values ​​(after testing) can take is the range that the above-mentioned antistatic layer can take. The range is the same as the resistance range. However, surface resistivity B is the same as surface resistivity A, or surface resistivity It can be smaller than resistivity A. In other words, between surface resistivity A and surface resistivity B, The relationship expressed by the formula: surface resistivity B ≤ surface resistivity A may also hold. 【0087】 The surface resistivity of the antistatic layer is measured using a high-resistivity resistivity meter (for example, Mitsubishi Chemical Analyst). (Manufactured by K Corporation, Highresta series) conforms to Japanese Industrial Standard (JIS) K6911:1995. Measurement can be performed in accordance with the prescribed method. However, for surface resistivity measurement, an applied voltage of 10V is required. The procedure is performed for an application time of 10 seconds at an ambient temperature of 25±3℃. 【0088】 Solid components in the coating solution, such as CNTs and binder resins, typically form static electricity. It is also included in the protective layer. Furthermore, unless it is a component that is removed by volatilization or decomposition during drying, That amount will be maintained. 【0089】 The formed antistatic layer can be used in optical laminates. 【0090】 ≪≪2. Method for Manufacturing Optical Laminates 1≫≫ The optical laminate manufacturing method 1 of this embodiment (hereinafter referred to as "second manufacturing method") is an optical A method for manufacturing an optical laminate comprising a film and an antistatic layer in that order. Second manufacturing method The method involves forming an antistatic layer by the first manufacturing method. 【0091】 The second manufacturing method is, for example, on the antistatic layer formed on the substrate by the first manufacturing method. This may be carried out by laminating an optical film, or by forming an antistatic layer on a substrate and applying light This can also be done by transferring the image onto a film. Alternatively, static electricity can be applied to the optical film that serves as the substrate. This may be carried out by forming a protective layer. Examples of the substrate and optical film are given in the first manufacturing method. As illustrated in the explanation, the optical film may contain a polarizing film. In this case, an optical laminate including a polarizing film and an antistatic layer can be formed. 【0092】 The second manufacturing method may be carried out by methods other than those exemplified above. 【0093】 An example of an optical laminate that can be formed by the second manufacturing method is shown in Figure 1. Optical laminate 3 in Figure 1 (3A) includes one layer each of the antistatic layer 1 and the optical film 4. The optical laminate 3A is The optical laminate 3A includes, in this order, an optical film 4 and an antistatic layer 1. The optical laminate 3A has a structure in which film 4 and antistatic layer 1 are laminated in this order. Alternatively, it may be attached to an object such as an image display panel via an adhesive sheet. 【0094】 The optical film 4 in Figure 1 is in contact with the antistatic layer 1. However, the optical film 4 and the antistatic layer are in contact. Other films and / or layers may be disposed between the antistatic layer 1. Also, in FIG. As viewed in the stacking direction, the optical film 4 in FIG. 1 is formed over the entire one main surface of the antistatic layer 1. However, the optical film 4 may be formed over a part of one main surface of the antistatic layer 1 as viewed in the stacking direction. As used herein, the “main surface” means the surface having the largest area in the film or layer. 部に形成されていてもよい。本明細書における「主面」は、フィルム又は層における最大 の面積を有する面を意味する。 【0095】 The optical laminate 3 formed by the second manufacturing method may include other layers in addition to the optical film 4 and the antistatic layer 1. Examples of the other layers include an adhesive sheet and other optical films such as a cover film and a protective film. The other layers may be layers included in a known optical laminate. 外の他の層を含んでもよい。他の層の例は、粘着シート、及びカバーフィルムや保護フィ ルム等の他の光学フィルムである。他の層は、公知の光学積層体が含む層であってもよい 。 【0096】 ≪≪3. Optical laminate manufacturing method 2≫≫ The second manufacturing method of the optical laminate of the present embodiment (hereinafter referred to as the “third manufacturing method”) is a method for manufacturing an optical laminate including an optical film, an antistatic layer, and an adhesive sheet in this order. In the third manufacturing method, the antistatic layer is formed by the first manufacturing method. 。第3の製造方法では、第1の製造方法によって静電気防止層を形成する。 。第3の製造方法では、第1の製造方法によって静電気防止層を形成する。 【0097】 The third manufacturing method may be implemented, for example, by the following method. · Transfer the antistatic layer formed on the base material by the first manufacturing method to the optical film, and form an adhesive sheet on the transferred antistatic layer. The formation of the adhesive sheet on the antistatic layer may be performed by transferring a separately formed adhesive sheet. 後の静電気防止層上に粘着シートを形成する。静電気防止層上への粘着シートの形成は、 別途形成した粘着シートを転写することにより行ってもよい。 · Form an antistatic layer on a base material that is an optical film. Form an adhesive sheet on the formed antistatic layer. The formation of the adhesive sheet on the antistatic layer may be performed by transferring a separately formed adhesive sheet. シートを形成する。静電気防止層上への粘着シートの形成は、別途形成した粘着シートを 転写することにより行ってもよい。 【0098】 More specifically, the third manufacturing method may be carried out, for example, by the following method. A first laminate consisting of an optical film and an antistatic layer is formed. Separately, a substrate and an adhesive sheet are formed to form a second laminate. The adhesive sheet of the second laminate and the first laminate An optical laminate is manufactured by bonding an antistatic layer to a layered structure. 【0099】 The third manufacturing method may be carried out by methods other than those exemplified above. 【0100】 Examples of substrates and optical films are as illustrated in the description of the first manufacturing method. The optical film may be a polarizing film, in which case the polarizing film and an antistatic layer are used. This allows for the manufacture of optical laminates including adhesive sheets. 【0101】 An example of an optical laminate that can be formed by the third manufacturing method is shown in Figure 2. Optical laminate 3 in Figure 2 (3B) includes one layer each of the antistatic layer 1, optical film 4, and adhesive sheet 5. The laminated body 3B includes an optical film 4, an antistatic layer 1, and an adhesive sheet 5 in that order. The optical laminate 3B is constructed by stacking the optical film 4, the antistatic layer 1, and the adhesive sheet 5 in that order. It has a layered structure. The optical laminate 3B is connected to, for example, an image display panel via an adhesive sheet 5. It may be attached to objects such as rubbing. 【0102】 The adhesive sheet 5 in Figure 2 is in contact with the antistatic layer 1. However, the adhesive sheet 5 and static electricity Other films and / or layers may be placed between the protective layer 1 and the other film. Also, Figure 2 The adhesive sheet 5 is formed over the entire surface of one of the main surfaces of the antistatic layer 1 when viewed in the lamination direction. However, the adhesive sheet 5 may be formed on a part of one main surface of the antistatic layer 1 when viewed in the stacking direction. It may be formed. 【0103】 The optical film 4 in FIG. 2 is in contact with the antistatic layer 1. However, other films and / or layers may be disposed between the optical film 4 and the antistatic layer 1. Further, the optical film 4 in FIG. 2 is formed over the entire one main surface of the antistatic layer 1 when viewed in the stacking direction. However, the optical film 4 may be formed on a part of one main surface of the antistatic layer 1 when viewed in the stacking direction. 2 is formed over the entire one main surface of the antistatic layer 1 when viewed in the stacking direction. However, the optical film 4 may be formed on a part of one main surface of the antistatic layer 1 when viewed in the stacking direction. It may be formed. 【0104】 The optical laminate 3 formed by the third manufacturing method may include other layers other than the optical film 4, the antistatic layer 1, and the adhesive sheet 5. Examples of other layers include additional adhesive sheets, other optical films such as cover films and protective films, and release liners that protect the adhesive sheet 5. Other layers may be layers included in known optical laminates. Examples of the optical film 4 are as exemplified in the description of the first manufacturing method. 【0105】 【0106】 ≪3-1. Adhesive Sheet≫ The adhesive sheet 5 is typically a layer formed from an adhesive composition (B) containing a polymer (A).​​​​​​​​​​​​​It may also contain, in other words, adhesive composition (B) is an acrylic adhesive composition This may be done. In this specification, the main component is the component that has the largest weight content in the composition. This refers to the components. The content of the main component is, for example, 50% by weight or more, 60% by weight or more. It may be 70% by weight or more, 75% by weight or more, or even 80% by weight or more. In this context, (meth)acrylic polymers refer to (meth)acrylic polymers such as (meth)acrylates. This refers to polymers that have constituent units derived from monomers. (Meth)acrylic polymers The content of the constituent unit is, for example, 40% by weight or more, 50% by weight or more, and 60% by weight. Quantity % or more, 70% by weight or more, 80% by weight or more, 85% by weight or more, 90% by weight or more, and further The (meth)acrylic polymer may be 95% by weight or more. It may consist only of constituent units derived from monomers. (Meth)acrylic may consist only of acrylic and meth. It means takryl. (Meth)acrylate means acrylate and methacrylate. do. 【0108】 Polymer (A) may have a polyether structure. Adhesive composition (B) is a poly It may contain a polymer (A) having a polyether structure as its main component. The structure is one that contains at least two ether groups (-O-). The polyether structure is It may be linear or branched. An example of a polyether structure is linear. It comprises an alkyl group which may or may be branched, and at least two ether groups. Mer (A) may have a polyether structure in its main chain or in its side chains, and the side chain may have It is preferable that it has. Polymer (A) has a polyether structure in its side chains (meth) Acrylic polymers are also acceptable. 【0109】 Polymer (A) may have constituent units having a polyether structure. In a unit, the polyether structure may be located in the main chain or in the side chain. It is preferable that it be located in the chain. Polymer (A) has a polyether structure in its side chains ( (t) It may have constituent units derived from acrylic monomers. 【0110】 A polymer (A) having a polyether structure in its side chains is, for example, the simple structure shown in formula (2) below. It has constituent units derived from mass A1. In other words, polymer (A) is given by the following formula (2) It may have constituent units derived from the monomer shown in formula (2). 1 is a hydrogen atom or It is a methyl group. 2 This is an alkyl group that may be linear or branched, Preferably, it is a linear alkyl group. The alkyl group has 1 to 10 carbon atoms, and more preferably 1 to 4 is also acceptable. 2 Examples include the methyl group and the ethyl group. n is an integer from 1 to 15. Yes, preferably an integer from 1 to 10, and more preferably an integer from 1 to 5. In this case, monomer A1 contains two ether groups, including the "-O-" of the COO group. Monomer A 1 is a type of (meth)acrylic monomer, more specifically, (meth)acrylate It is a type of monomer. R at the end of the side chain 2 Focusing on the O group, monomer A1 contains an alkoxy group. It is also a type of methacrylate monomer. The constituent units derived from monomer A1 are poly It has an etheric structure in its side chains. 【0111】 [ka] 【0112】 Examples of monomer A1 include 2-methoxyethyl (meth)acrylate and 2-ethoxyethyl ( Meth)acrylate, 2-(2-ethoxyethoxy)ethyl (meth)acrylate, met Xytriethylene glycol (meth)acrylate and methoxypolyethylene glycol (Meth)acrylate, preferably 2-methoxyethyl acrylate (MEA) The constituent units derived from monomer A1 are formed from the adhesive composition (B). This may contribute to a reduction in surface resistivity in T5. 【0113】 The content of constituent units having a polyether structure in polymer (A) is, for example, 0 by weight. % or more, including 10% or more by weight, 15% or more by weight, 20% or more by weight, 25% or more by weight, 3 0% or more by weight, 35% or more by weight, 40% or more by weight, 45% or more by weight, and even 50% by weight It may be greater than or equal to 100% by weight. The upper limit of the content is, for example, 100% by weight or less, and 90% by weight. Below are 80% or less by weight, 70% or less by weight, 65% or less by weight, 60% or less by weight, and even 6 It may be less than 0% by weight. Also, the composition derived from monomer A1 in polymer (A) The concentration of the unit may be within the above range. 【0114】 Polymer (A) does not necessarily have to have constituent units having a polyether structure. 【0115】 Polymer (A) may have one or more constituent units derived from monomer A2. The monomer A2 may be copolymerizable with monomer A1. Polymer (A) is a monomer Even if it has both constituent units derived from mass A1 and constituent units derived from monomer A2 good. 【0116】 An example of monomer A2 is a (meth)acrylic monomer having an alkyl group with 1 to 30 carbon atoms in its side chain. It is a mer. The alkyl group may be linear or branched. Examples of acrylic monomers include methyl (meth)acrylate, ethyl (meth)acrylate, and p Ropil (meth)acrylate, isopropyl (meth)acrylate, n-butyl (meth) Acrylate, s-butyl (meth)acrylate, t-butyl (meth)acrylate, i Sobutyl (meth)acrylate, n-pentyl (meth)acrylate, isopentyl (meth)acrylate acrylate, n-hexyl(meth)acrylate, isohexyl(meth)acrylate , isoheptyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, n-octyl(meth)acrylate, isooctyl(meth)acrylate, n-nonyl( meth)acrylate, isononyl (meth)acrylate, n-decyl (meth)acrylate Isodecyl (meth)acrylate, n-dodecyl (meth)acrylate (lauryl ( meth)acrylate, n-tridecyl(meth)acrylate, n-tetradecyl(meth)acrylate ) Acrylate, Pentadecyl (meth)acrylate, Hexadecyl (meth)acrylate The heptadecyl (meth)acrylate and octadecyl (meth)acrylate are also included. The content of constituent units derived from the above (meth)acrylic monomer in polymer (A) is For example, 80% by weight or less, 70% by weight or less, 60% by weight or less, 50% by weight or less, 4 0% by weight or less, 30% by weight or less, 20% by weight or less, 10% by weight or less, and even 5% by weight or less It may be lower, or it may be 0% by weight (it may not contain the constituent unit). 【0117】 Another example of monomer A2 is a hydroxyl group-containing monomer. A hydroxyl group-containing monomer is a hydroxyl group-containing ( It may also be a meth)acrylic monomer. An example of a hydroxyl group-containing monomer is 2-hydroxyethyl Hydroxypropyl(meth)acrylate, 3-hydroxypropyl(meth)acrylate, 4-hydroxypropyl(meth)acrylate Sibutyl (meth)acrylate, 6-hydroxyhexyl (meth)acrylate, 8-H Droxyoctyl (meth)acrylate, 10-hydroxydecyl (meth)acrylate and hydroxyalkyl(meth)acrylates such as 12-hydroxylauryl(meth)acrylate The acrylates and (4-hydroxymethylcyclohexyl)-methylacrylates From the viewpoint of improving the durability of the adhesive sheet 5 formed from the adhesive composition (B), 2-Hydroxyethyl (meth)acrylate, 4-Hydroxybutyl (meth)acrylate Polymers are preferred, and 4-hydroxybutyl (meth)acrylate is more preferred. The content of constituent units derived from hydroxyl group-containing monomers in A) is, for example, 0.1 to 5% by weight. The amount may be 3% by weight or less, and even 2% by weight or less. Polymer (A) is hydroxyl It does not need to have constituent units derived from group-containing monomers. 【0118】 Monomer A2 is an aromatic ring-containing monomer, a carboxyl group-containing monomer, an amino group-containing monomer, It may also be an amide group-containing monomer. 【0119】 The aromatic ring-containing monomer may also be an aromatic ring-containing (meth)acrylic monomer. Examples of monomers include phenyl(meth)acrylate, benzyl(meth)acrylate, and phenyl(meth)acrylate. Noxydiethylene glycol (meth)acrylate, ethylene oxide modified nonyl phosphate Nol (meth)acrylate, hydroxyethylated β-naphthol (meth)acrylate and biphenyl (meth)acrylate. Manufacturing of image display devices including optical laminate 3C Birefringence may occur due to shifting of the adhesive sheet during time and / or use. If this occurs, problems such as light leakage and display unevenness may occur in the image display device. The inclusion of the resulting structural units is suitable for reducing birefringence that may occur due to the displacement of the adhesive sheet. Yes, they are. 【0120】 The aromatic ring-containing monomer may also be monomer A3 shown in the following formula (3). R in formula (3) 3 R in formula (3) is either a hydrogen atom or a methyl group. 4 This may be the case even if hydrogen atoms are substituted. It is a phenyl group, preferably a phenyl group. The substituent on the hydrogen atom is, for example, carbon. Linear or branched alkyl groups having 1 to 10, and even 1 to 4, and a carbon-1 It is an alkoxy group of ~4. n is an integer from 1 to 15, preferably an integer from 1 to 10. Yes, and more preferably an integer from 1 to 5. When n is 1, monomer A3 is (meta)actin It is a type of lyl monomer, and more specifically, a type of (meth)acrylate monomer. Monomer A3 contains two ether groups, including the "-O-" of the COO group. In other words, The constituent units derived from mass A3 are also constituent units that have a polyether structure. The content of constituent units derived from monomer A3 in rimer (A) is such that the polyether structure is present. This shall be included in the content of the constituent units. 【0121】 [ka] 【0122】 An example of monomer A3 is phenoxyethyl (meth)acrylate. 【0123】 Polymer (A), which has constituent units derived from monomer A3, provides durability for optical laminate 3C. It can contribute to improvement. In addition, polymer (A) having constituent units derived from monomer A3 is added Even when the optical laminate 3C includes an optical film 4 that can shrink due to heat, at the edges It is suitable for suppressing the misalignment of the optical film 4. 【0124】 Examples of monomers containing carboxyl groups include (meth)acrylic acid and carboxyethyl (meth)acrylic acid. acrylate, carboxypentyl (meth)acrylate, itaconic acid, maleic acid, fuma These are chlorotic acid and crotonic acid. An example of an amino group-containing monomer is N,N-dimethylaminoethyl acetate. N,N-dimethylaminopropyl(meth)acrylate and N,N-dimethylaminopropyl(meth)acrylate Examples of monomers containing an amide group include (meth)acrylamide and N,N-dimethyl(meth)acrylamide. Acrylamide, N,N-diethyl(meth)acrylamide, N-isopropylacrylamide Mid, N-methyl(meth)acrylamide, N-butyl(meth)acrylamide, N-H Xyl(meth)acrylamide, N-methylol(meth)acrylamide, N-methylol ru-N-propane(meth)acrylamide, aminomethyl(meth)acrylamide, ami Noethyl(meth)acrylamide, mercaptomethyl(meth)acrylamide and mercaptomethyl Acrylamide monomers such as putoethyl(meth)acrylamide; N-(meth)acrylo Ilmorpholin, N-(meth)acryloylpiperidine and N-(meth)acryloyl N-acryloyl heterocyclic monomers such as pyrrolidine; and N-vinylpyrrolidone and N-vinylpyrrolidone. These are N-vinyl group-containing lactam monomers such as nyl-ε-caprolactam. 【0125】 Monomer A2 may be a polyfunctional monomer. An example of a polyfunctional monomer is hexanediode 1,6-Hexanediol di(meth)acrylate, Tandiol di(meth)acrylate, trimethylolpropane tri(meth)acrylate Neopentyl glycol di(meth)acrylate, pentaerythritol di(meth)acrylate Acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol hexa(meth)acrylate, tetramethylolmethanetri(meth)acrylate, Lyl (meth)acrylate, vinyl (meth)acrylate, epoxy acrylate, poly Polyfunctional acrylates such as ester acrylates and urethane acrylates; and zivinyl It is a benzene. The polyfunctional acrylate is preferably 1,6-hexanedioldiac The acrylate is dipentaerythritol hexa(meth)acrylate. 【0126】 Aromatic ring-containing monomers, carboxyl group-containing monomers, and amino group-containing monomers in polymer (A) The total content of constituent units derived from monomers, amide group-containing monomers, and polyfunctional monomers is: Preferably 20% by weight or less, more preferably 15% by weight or less, even more preferably The amount is 10% by weight or less, and particularly preferably 8% by weight or less. If it contains constituent units, the total content is, for example, 0.01% by weight or more, and 1% by weight or less. The above may be 2% by weight or more, and even 3% by weight or more. Polymer (A) is these It does not need to have constituent units. In particular, polymer (A) contains a carboxyl group The content of constituent units derived from the body may be less than 0.1% by weight, or 0% by weight. It is also acceptable (even if it does not have the said constituent unit). 【0127】 Other examples of monomer A2 include nitrile group-containing compounds such as acrylic acid and (meth)acrylonitrile. (Meth)acrylates; glycidyl (meth)acrylate and methyl (meth)acrylate Monomers containing epoxy groups such as glycidyl; monomers containing sulfonic acid groups such as sodium vinyl sulfonate. Monomers; phosphate group-containing monomers; cyclopentyl (meth)acrylate, (meth)acrylic (The following are examples of cyclohexyl acid and isobornyl (meth)acrylate having alicyclic hydrocarbon groups.) meth)acrylic acid esters; vinyl esters such as vinyl acetate and vinyl propionate; Aromatic vinyl compounds such as styrene and vinyltoluene; ethylene, propylene, butadiene Olefins such as isoprene and isobutylene, or dienes; vinyl alkylate Vinyl ethers such as tel; and vinyl chloride. 【0128】 The total percentage of constituent units derived from other monomers A2 in polymer (A) is, for example, For example, it may be 30% by weight or less, 10% by weight or less, 5% by weight or less, or 0% by weight. It is preferable that it has (or does not have) such a component unit. 【0129】 Polymer (A) has a glass transition temperature (Tgh) of -55°C or lower when it is a homopolymer. It may have constituent units derived from (meth)acrylic monomers within the above range, Tg It has constituent units derived from (meth)acrylic monomers where h is in the range of -40°C or higher. This may also be the case, and the composition may be derived from (meth)acrylic monomers in the range of -30°C or higher. (Meth)acrylic monomers that may have units and whose Tgh is in the range of -10°C or higher. It may have constituent units derived from the above. An example of the above constituent units is a constituent unit derived from monomer A3. Derived from a compound unit and a (meth)acrylic monomer having an alkyl group with 1 to 3 carbon atoms in its side chain. It is a constituent unit. Polymer (A) is a constituent unit derived from monomer A3, and has 1 carbon atoms. It consists of structural units derived from (meth)acrylic monomers having ~3 alkyl groups in their side chains. It may have at least one constituent unit selected from the group. The rimer (A) may contribute to improving the durability of the optical laminate 3C. 【0130】 Polymer (A) is formed by polymerizing one or more of the above-mentioned monomers by known methods. Polymerization can be carried out by polymerizing a monomer and a partially polymerized monomer. Polymerization can be carried out, for example, by polymerizing a solution. This can be carried out by polymerization, emulsion polymerization, bulk polymerization, thermal polymerization, and active energy ray polymerization. Optically transparent. From the viewpoint of forming an adhesive sheet with excellent properties, solution polymerization and active energy ray polymerization are preferred. Polymerization is preferably carried out while avoiding contact between the monomer and / or partial polymer and oxygen. For this reason, for example, polymerization under an inert gas atmosphere such as nitrogen, or resin f Polymerization can be carried out under conditions where oxygen is blocked by a film or the like. The polymer to be formed (A) is It may be any of the following forms: random copolymer, block copolymer, graft copolymer, etc. stomach. 【0131】 The polymerization system that forms polymer (A) may contain one or more polymerization initiators. The type of polymerization initiator can be selected depending on the polymerization reaction, for example, a thermal polymerization initiator, a photopolymerization initiator. It can also be an agent. 【0132】 The solvents used in solution polymerization include, for example, esters such as ethyl acetate and n-butyl acetate; Aromatic hydrocarbons such as benzene and n-hexane; aliphatic carbonaceous waters such as n-hexane and n-heptane. Elemental compounds; alicyclic hydrocarbons such as cyclohexane and methylcyclohexane; methyl ethyl keto These are ketones such as methyl isobutyl ketone. However, the solvent is not limited to the above examples. The solvent may be a mixture of two or more solvents. 【0133】 Polymerization initiators used in solution polymerization include, for example, azo polymerization initiators and peroxide polymerization initiators. These are redox polymerization initiators. Peroxide polymerization initiators include, for example, dibenzoyl peroxide. The oxide is t-butyl permaleate. In particular, Japanese Patent Publication No. 2002-69411 The azo polymerization initiator disclosed in the report is preferred. The azo polymerization initiator is, for example, 2,2'- Azobisisobutyronitrile (AIBN), 2,2'-azobis-2-methylbutyronite Lyl, 2,2'-Azobis(2-methylpropionic acid)dimethyl, 4,4'-Azobis- It is 4-cyanovaleric acid. However, the polymerization initiator is not limited to the above examples. Azo heavy The amount of initiator used is, for example, 0.05 to 0.5 by weight per 100 parts by weight of the total amount of monomer. It is a part, and may be 0.1 to 0.3 parts by weight. 【0134】 The active energy rays used in active energy ray polymerization include, for example, alpha rays, beta rays, gamma rays, and intermediate rays. These include ionizing radiation such as ion beams and electron beams, and ultraviolet light. Ultraviolet light is preferred as the active energy ray. Polymerization by ultraviolet irradiation is also called photopolymerization. The system typically includes a photopolymerization initiator. The polymerization conditions for active energy polymerization are the polymer ( As long as A) is formed, it is not limited. 【0135】 Examples of photopolymerization initiators include benzoin ether-based photopolymerization initiators and acetophenone-based photopolymerization initiators. Initiators, α-ketol-based photopolymerization initiators, aromatic sulfonyl chloride-based photopolymerization initiators, light Active oxime-based photopolymerization initiators, benzoin-based photopolymerization initiators, benzyl-based photopolymerization initiators, Nzophenone-based photopolymerization initiators, ketal-based photopolymerization initiators, thioxanthone-based photopolymerization initiators However, the photopolymerization initiator is not limited to the above examples. 【0136】 Benzoin ether-based photopolymerization initiators include, for example, benzoin methyl ether, benzoin Benzoin ethyl ether, benzoin propyl ether, benzoin isopropyl ether, Isobutyl ether, 2,2-dimethoxy-1,2-diphenylethane-1- n, anisole methyl ether. Acetophenone-based photopolymerization initiators include, for example, 2, 2-diethoxyacetophenone, 2,2-dimethoxy-2-phenylacetophenone, 1 -Hydroxycyclohexylphenyl ketone, 4-Phenoxydichloroacetophenone, It is 4-(t-butyl)dichloroacetophenone. α-ketol-based photopolymerization initiators are, for example, For example, 2-methyl-2-hydroxypropiophenone, 1-[4-(2-hydroxyeth It is phenyl-2-methylpropan-1-one. Aromatic sulfonyl chloride system light Polymerization initiators include, for example, 2-naphthalenesulfonyl chloride. (Photoactive oxime system) Examples of photopolymerization initiators include 1-phenyl-1,1-propanedione-2-(o-ethoxy It is a carbonyl oxime. Benzoin-based photopolymerization initiators include, for example, benzoin. Benzyle-based photopolymerization initiators include, for example, benzyl. Benzophenone-based photopolymerization initiators Examples of agents include benzophenone, benzoylbenzoic acid, and 3,3'-dimethyl-4-methylbenzoic acid. Cibenzophenone, polyvinylbenzophenone, α-hydroxycyclohexylphenyl It is a ketone. An example of a ketal-based photopolymerization initiator is benzyldimethyl ketal. Thioxanthone-based photopolymerization initiators include, for example, thioxanthone and 2-chlorothioxanthone. , 2-methylthioxanthone, 2,4-dimethylthioxanthone, isopropylthioxane These are thonthone, 2,4-diisopropylthioxanthone, and dodecylthioxanthone. 【0137】 The amount of photopolymerization initiator used is, for example, 0.01 to 1 part by weight per 100 parts by weight of the total amount of monomer. This is expressed in parts by volume, and may be 0.05 to 0.5 parts by weight. 【0138】 The weight-average molecular weight (Mw) of polymer (A) is, for example, 1 million to 3 million. The average molecular weight of polymer (A) is between 1.8 million and 3 million. Being 0 million suppresses cracking of the adhesive sheet, as well as preventing increases in viscosity and aging. It tends to suppress the occurrence of ionization. The weight-average molecular weight (Mw) of the polymer in this specification. ) is a value based on GPC (gel permeation chromatography) measurement (poly (This is in styrene equivalent terms.) 【0139】 The content of polymer (A) in adhesive composition (B) is, for example, 50 by weight in terms of solid content. It is % or more, including 60% or more by weight, 70% or more by weight, 75% or more by weight, and even 80% by weight. It may be more than that. The upper limit of the content is, for example, 99% by weight or less, and 97% by weight or less. Furthermore, it may be 95% by weight or less. 【0140】 <3-1-b. Antistatic agent> The adhesive composition (B) may contain an antistatic agent. The antistatic agent is used in the adhesive sheet 5 This can contribute to reducing the surface resistivity. Examples of antistatic agents are ionic compounds such as salts. The ionic compound may be an ionic liquid that is liquid at room temperature (25°C). 【0141】 Examples of ionic compounds are inorganic cation salts and organic cation salts. An example is inorganic cation-anionic salts. An example of a cation contained in an inorganic cation salt is A These are alkali metal ions. Examples of alkali metal ions include lithium ions and sodium ions. The ion is a potassium ion, preferably a lithium ion. The inorganic cation salt is Lithium salts are also acceptable. 【0142】 An example of anion contained in inorganic cation salts is Cl - , Br - , I - AlCl4 - Al2C l7 - BF4 - PF6 - ClO4 - NO3 - CH3COO - CF3COO - CH3SO3 - CF3SO3 - , (CF3SO2)3C - AsF6 - SbF6 - , NbF6 - TaF6 - , (C N)2N - , C4F9SO3 - C3F7COO - (CF3SO2)(CF3CO)N - , -O3S( CF2)3SO3 - , and anions represented by the following general formulas (a) to (d). (a) (C n F 2n+1 SO2)2N - (n is an integer from 1 to 10) (b) CF2(C m F 2m SO2)2N - (m is an integer from 1 to 10) (c) -O3S(CF2) l SO3 - (l is an integer from 1 to 10) (d) (C p F 2p+1 SO2)N - (C q F 2q+1 SO2) (p and q are each independently an integer from 1 to 10) 【0143】 The anion contained in the inorganic cation salt is preferably a fluorine-containing anion, more preferably a fluorine-containing imide anion. Examples of the fluorine-containing imide anion are imide anions having a perfluoro alkyl group. More specific examples of the fluorine-containing imide anion are (CF3SO2)(CF3CO)N and the anions represented by the above general formulas (a), (b) or (d), preferably (CF3SO2)2N - and the like, which are (perfluoroalkylsulfonyl)imides represented by the general formula (a), and more preferably (CF3SO2)2N - (C2F5SO2)2N - and the like, which are bis(trifluoromethanesulfonyl)imide represented by the general formula (a), and more preferably (CF3SO2)2N represented by - (CF3SO2)2N which is bis(trifluoromethanesulfonyl)imide. Examples of preferred inorganic cation salts are lithium bis(trifluoromethanesulfonyl)im ide (LiTFSI). 【0144】 Examples of the organic cation salt are organic cation-anion salts. The organic cation salt contains An example of a cation is an organonium containing an organic group. Examples include nitrogen-containing onium, sulfur-containing onium, and phosphorus-containing onium, preferably nitrogen-containing onium. This refers to onium, which contains sulfur. Examples of nitrogen-containing onium include ammonium cations and piperix. It contains dinium cation, pyrrolidinium cation, pyridinium cation, and pyrroline skeleton. Cations, cations having a pyrrole skeleton, imidazolium cations, tetrahydro Pyrimidinium cation, dihydropyrimidinium cation, pyrazolium cation, py This is a lazolinium cation. An example of a sulfur-containing onium is a sulfonium cation. An example of phosphonium is the phosphonium cation. Examples of organic groups included in organonium. These are alkyl groups, alkoxyl groups, and alkenyl groups. Specific examples of preferred organoonium groups. This is a tetraalkylammonium cation (for example, tributylmethylammonium cation). These are (ON), alkylpiperidinium cation, and alkylpyrrolidinium cation. 【0145】 Examples of anions contained in organic cation salts are similar to examples of anions contained in inorganic cation salts. They are the same. A preferred example of an organic cationic salt is 1-ethyl-3-methylimidazolium bimethylimidazolium. Fluorosulfonyl imide (EMI-FSI), trimethylbutylammonium bi It is (trifluoromethanesulfonyl)imide. 【0146】 Antistatic agents may be used in combination with inorganic cation salts and organic cation salts. The inhibitor preferably contains an organic cationic salt. 【0147】 The amount of antistatic agent in adhesive composition (B) is, per 100 parts by weight of polymer (A) For example, 0.5 parts by weight or more, 1 part by weight or more, 2 parts by weight or more, 3 parts by weight or more, Furthermore, it may be 4 parts by weight or more. The upper limit of the blending amount is per 100 parts by weight of polymer (A). For example, less than 30 parts by weight, 20 parts by weight or less, 15 parts by weight or less, 12 parts by weight or less 10 parts by weight or less, 9 parts by weight or less, 8 parts by weight or less, 7 parts by weight or less, and even 6 parts by weight or less This may also be the case. The amount of antistatic agent in the adhesive composition (B) may be appropriately adjusted. This can further improve the durability of the adhesive sheet 5. 【0148】 <3-1-c. Radical scavengers> The adhesive composition (B) may further contain a radical scavenger. Examples include hindered phenols, hindered amines, phosphates, phenols, and Various antioxidants, including thioether-based and blended types containing mixtures of these types. ru. 【0149】 Examples of antioxidants include radical chain inhibitors and peroxide decomposers. 【0150】 Antioxidants include hindered phenols, hindered amines, and phosphites. It may be at least one of the selected types. 【0151】 Hindered phenol antioxidants are carbon atoms on the aromatic ring to which the OH group of phenol is attached. A structure in which a tert-butyl group is bonded to at least one carbon atom adjacent to an atom. It may have. An example of a hindered phenol antioxidant is dibutylhydroxy Luen (BHT); and Irganox1010, Irganox1010FF, Ir ganox1035, Irganox1035FF, Irganox1076, Irga nox1076FD, Irganox1076DWJ, Irganox1098, Irg anox1135, Irganox1330, Irganox1726, Irganox 1425WL, Irganox1520L, Irganox245, Irganox24 5FF, Irganox259, Irganox3114, Irganox565 and I rganox295 (both are product names, manufactured by BASF) 【0152】 Hindered amine antioxidants contain at least one hindered piperidine molecule. It may have a group. An example of a hindered amine antioxidant is Adekastab LA-63. , Adeka Stab LA-63P, Adeka Stab LA-52 and Adeka Stab LA-57 ( The name "Zure" is also a product name and is manufactured by ADEKA Corporation. 【0153】 Examples of phosphite antioxidants include triphenylphosphite and diphenylisodecyl. Phosphites and phenyl diisodecyl phosphites; and Adekastab 2112, A DecaStub 2112RG, AdekaStub 1178 and AdekaStub 3010 (all commercial products) This is the product name (manufactured by ADEKA Corporation). 【0154】 Examples of phenolic antioxidants include monophenolic antioxidants and bisphenolic antioxidants. These are antioxidants and polymeric phenolic antioxidants. Examples of monophenolic antioxidants are , 2,6-di-t-butyl-p-cresol, butylated hydroxyanisole, 2,6- Di-t-butyl-4-ethylphenol, stearin-β-(3,5-di-t-butyl- It is 4-hydroxyphenyl)propionate. An example of a bisphenol antioxidant is, 2,2'-Methylenebis(4-methyl-6-t-butylphenol), 2,2'-Methylene Nbis(4-ethyl-6-t-butylphenol), 4,4'-thiobis(3-methyl- 6-t-butylphenol), 4,4'-butylidenebis(3-methyl-6-t-butyl Phenol), 3,9-bis[1,1-dimethyl-2-[β-(3-t-butyl-4-Hyphenol) [Droxy-5-methylphenyl)propionyloxyethyl]2,4,8,10-Tet It is laoxaspiro[5,5]undecane. An example of a high molecular weight phenolic antioxidant is, 1,1,3-Tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane, 1,3,5-trimethyl-2,4,6-tris(3,5-di-t-butyl-4-hydrox Sibenzyl)benzene, tetrakis-[methylene-3-(3',5'-di-t-butyl- 4'-Hydroxyphenyl)propionate]methane, bis[3,3'-bis-(4'- Hydroxy-3'-t-butylphenyl)butyric acid]glycol ester, 1 ,3,5-Tris(3',5'-di-t-butyl-4'-hydroxybenzyl)-S- These are lyazin-2,4,6-(1H,3H,5H)trione and tocopherol. 【0155】 Examples of thioether-based antioxidants include Adekastab AO-503 and Adekastab AO- 26 (These are all product names, manufactured by ADEKA Corporation) 【0156】 The molecular weight of the radical scavenger (e.g., antioxidant) may be 1000 or less, and 90 0 or less, 850 or less, 800 or less, 700 or less, 600 or less, 500 or less, 450 or less, Furthermore, it may be 400 or less. The lower limit of the molecular weight is, for example, 100 or more. According to their investigation, radical scavengers with molecular weights within the above range are found in adhesive composition (B) or It is particularly suitable for suppressing the amount of radicals generated in the adhesive sheet formed from it. 【0157】 The radical scavenger (e.g., antioxidant) may be a liquid at 25°C. 【0158】 The amount of radical scavenger in adhesive composition (B) is 100 parts by weight of polymer (A). For example, 0.1 parts by weight or more, 0.2 parts by weight or more, 0.3 parts by weight or more, 0. It may be 4 parts by weight or more, or even 0.5 parts by weight or more. The upper limit of the amount blended is polymer ( A) For example, 15 parts by weight or less per 100 parts by weight, 10 parts by weight or less, 7 parts by weight or less Below, 5 parts by weight or less, less than 5 parts by weight, 4 parts by weight or less, 3 parts by weight or less, and even 2 parts by weight or less. That's fine. 【0159】 <3-1-d. Additives> The adhesive composition (B) may further contain materials other than those described above. Examples of such materials These are additives. Examples of additives include crosslinking agents, silane coupling agents, pigments, and dyes. Colorants, UV absorbers, surfactants, plasticizers, tackifiers, surface lubricants, leveling agents, Rework improvers, softeners, polymerization inhibitors, rust inhibitors, inorganic fillers, organic fillers, metal powders, and other powders. These are bodies, particles, and foil-like materials. The additives are totaled in amounts per 100 parts by weight of polymer (A). For example, in the range of 10 parts by weight or less, preferably 5 parts by weight or less, and more preferably 3 parts by weight or less. It can be combined. 【0160】 Examples of crosslinking agents include organic crosslinking agents and polyfunctional metal chelates. Examples of organic crosslinking agents include: Isocyanate-based crosslinking agents, peroxide-based crosslinking agents, epoxy-based crosslinking agents, and imine-based crosslinking agents. Organic crosslinking agents and polyfunctional metal chelates are solvent-type and active energy ray-curable types. It can also be used for adhesive compositions (B) of the slip-type. In this case, the crosslinking agent is preferably a peroxide-based crosslinking agent or an isocyanate-based crosslinking agent. A combination of a chemical crosslinking agent and an isocyanate crosslinking agent may be used. The adhesive composition (B) is: It may contain a socianate-based crosslinking agent, or it may contain a peroxide-based crosslinking agent, The product may contain both cyanate-based crosslinking agents and peroxide-based crosslinking agents. 【0161】 Examples of isocyanate crosslinking agents include tolylene diisocyanate and chlorphenylenediisocyanate. Cyanates, diphenylmethane diisocyanate, xylene diisocyanate and polymers Aromatic isocyanate compounds such as ethylene polyphenyl isocyanates; cyclopentylene Diisocyanates, cyclohexylene diisocyanates, hydrogenated diphenylmethane Alicyclic isocyanate compounds such as isocyanates and isophorone diisocyanates; Buty Diisocyanates, tetramethylene diisocyanates, and hexamethylene diisocyanates These are aliphatic isocyanate compounds such as phosphates. The isocyanate crosslinking agent is the above isocyanate Compounds obtained by adding an annealing compound to a polyhydric alcohol compound such as trimethylolpropane. Adduct compound; the above isocyanate compound is a polyether polyol, polyester poly Polyols, acrylic polyols, polybutadiene polyols, and polyisoprene polyols Compounds obtained by addition reaction with polyols such as the above; isocyanurates such as isocyanurates. It may also be a derivative of the compound. A specific example of a derivative is trimethylolpropane / trinene. Diisocyanate trimer adducts (e.g., Coronate L, manufactured by Tosoh Corporation), trimethylol Propane / hexamethylene diisocyanate trimer adduct (e.g., manufactured by Tosoh Corporation, Coronet) (HL), isocyanurate derivative of hexamethylene diisocyanate (for example, Tosoh Corporation) It is made by Coronate HX. 【0162】 If the adhesive composition (B) contains an isocyanate-based crosslinking agent, the amount of the agent is determined by the polymer ( A) For example, 0.1 to 10 parts by weight per 100 parts by weight, 0.2 to 5 parts by weight, 0. It may be 25 to 3 parts by weight, 0.3 to 1 part by weight, or even 0.3 to 0.5 parts by weight. 【0163】 Examples of peroxide-based crosslinking agents include di(2-ethylhexyl)peroxydicarbonate, di( 4-t-butylcyclohexyl)peroxydicarbonate, di-sec-butylperoxydicarbonate Xydicarbonate, t-butyl peroxyneodecanoate, t-hexyl peroxy Pivalate, t-butyl peroxypivalate, dilauroyl peroxide, di-n- Octanoyl peroxide, 1,1,3,3-tetramethylbutylperoxy-2-e Tylhexanoate, di(4-methylbenzoyl)peroxide, benzoyl peroxide Side, t-butyl peroxyisobutyrate, 1,1-di(t-hexyl peroxy) It is cyclohexane. Peroxide-based crosslinking agents are used because they have excellent crosslinking reaction efficiency, such as benzoyl peroxide. Ruper oxide may also be used. 【0164】 If the adhesive composition (B) contains a peroxide-based crosslinking agent, the amount of the agent is equal to the amount of polymer (A) For 00 parts by weight, for example, 0.005 to 5 parts by weight, 0.01 to 3 parts by weight, 0.0 5~2 parts by weight, 0.07~1 parts by weight, 0.07~0.5 parts by weight, 0.07~0.3 parts by weight Furthermore, it may be as much as 0.07 to 0.2 parts by weight. 【0165】 Examples of silane coupling agents include 3-glycidoxypropyltrimethoxysilane, 3-g Ricidoxypropyltriethoxysilane, 3-glycidoxypropylmethyldiethoxysilane epoxy, such as lan, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane Group-containing silane coupling agent; 3-aminopropyltrimethoxysilane, N-2-(Aminopropyltrimethoxysilane) (Noethyl)-3-aminopropylmethyldimethoxysilane, 3-triethoxysilyl-N -(1,3-dimethylbutylidene)propylamine, N-phenyl-γ-aminopropyl amino group-containing silane coupling agents such as trimethoxysilane; 3-acryloxypropyl (Meth)actyls such as trimethoxysilane and 3-methacryloxypropyltriethoxysilane Lyl group-containing silane coupling agents; such as 3-isocyanate-propyltriethoxysilane. It is an isocyanate group-containing silane coupling agent. 【0166】 If the adhesive composition (B) contains a silane coupling agent, the amount of the silane coupling agent is such that the polymer (A) For example, 5 parts by weight or less per 100 parts by weight, 3 parts by weight or less, 1 part by weight or less, 0 0.5 parts by weight or less, 0.2 parts by weight or less, 0.1 parts by weight or less, and even 0.05 parts by weight or less It may be present. Adhesive composition (B) does not need to contain a silane coupling agent. 【0167】 The type of adhesive composition (B) is, for example, emulsion type, solvent type (solution type), or activated energy. It is a heat-curing type (photocuring type) or a heat-melt type (hot melt type). It is an adhesive with excellent durability. From the viewpoint of being able to form a bond, adhesive composition (B) is solvent-type or active energy ray curing. It may be a mold type or a solvent type. The solvent-type adhesive composition (B) is UV curable. It does not need to contain photocuring agents such as chemicals. 【0168】 The adhesive sheet 5 is formed from an adhesive composition (B). The adhesive sheet 5 is, for example, ( (t) Contains a crosslinked acrylic polymer. The adhesive sheet 5 is made from the adhesive composition (B), for example For example, it may be formed by the following method. 【0169】 The adhesive sheet 5 is formed by, for example, applying an adhesive composition (B) to a substrate to form a coating film. The obtained coating film may be dried and formed by this process. This allows the substrate and viscosity to be formed. A second laminate consisting of the attached sheet 5 is obtained. 【0170】 As a base material, for example, a release film can be used. Sheet 5 can be transferred to, for example, the antistatic layer 1. The example of the material is the same as the example of base material 12. 【0171】 The release film is transferred to the antistatic layer 1 of the adhesive sheet 5, and the adhesive sheet 5 is put into practical use. It can be used as a release film until it is used. In this case, the process is simplified. It is possible to transform it. 【0172】 Examples of materials used in release films include plastic film, paper, cloth, nonwoven fabric, etc. Suitable thin sheets of porous materials, nets, foam sheets, metal foils, and laminates thereof. While various materials such as the human body can be used, plastic film is preferred due to its superior surface smoothness. It is used. 【0173】 The plastic film is not particularly limited; for example, polyethylene film, Polypropylene film, polybutene film, polybutadiene film, polymethylphenyl Polyethylene film, polyvinyl chloride film, polyvinyl chloride copolymer film, polyethylene film Reflatate film, polybutylene terephthalate film, polyurethane film, Examples include ethylene-vinyl acetate copolymer films. 【0174】 The thickness of the release film is typically 5 to 200 μm, preferably about 5 to 100 μm. The release film contains release agents such as silicone-based, fluorine-based, and long-chain alkyl-based agents. A release agent may be applied. The release film may contain a fatty acid amide-based release agent and silica powder. Release treatments and antifouling treatments by means of, etc., or various antistatic treatments such as coating, mixing, and vapor deposition. It may be treated to prevent throttling. 【0175】 The substrate may be coated with a solution containing the adhesive composition (B) (adhesive solution). The solid content concentration of the liquid is, for example, 5 to 50% by weight, preferably 10 to 40% by weight. The adhesive solution is the same as the polymerization solvent, depending on the polymerization form of the (meth)acrylic polymer (A). It may also be prepared by appropriately adding a solvent or a different solvent to the adhesive composition (B). 【0176】 Various methods can be used to apply the adhesive composition (B) to the substrate, for example. For example, roll coat, kiss roll coat, gravure coat, reverse coat, roll bra Spray coat, dip roll coat, bar coat, knife coat, air coat Extrusion coating methods using IFcoat, curtain coat, lip coat, die coater, etc. The amount of adhesive composition (B) to be applied depends on the thickness of the target adhesive sheet 5. It can be adjusted as needed. 【0177】 The coating hardens upon drying, forming an adhesive sheet 5. The drying temperature of the coating is, for example, The temperature is 130°C or lower, preferably 125°C or lower, and more preferably 120°C or lower. The temperature is preferably 110°C or lower, and particularly preferably 100°C or lower. The drying temperature of the fabric film may be 60°C or higher, or 80°C or higher. The drying temperature is, for example, to allow the reaction of isocyanate-based crosslinking agents to proceed smoothly. This can contribute to improving the cohesive strength of the adhesive sheet 5. Drying temperatures below 130°C are, for example, isotherapy. By appropriately adjusting the reaction rate of the annealing crosslinking agent, the transparency of the adhesive sheet 5 can be improved. I can agree. 【0178】 The drying time of the coated film can be adjusted as appropriate depending on the composition of the adhesive composition (B), preferably 3 0 to 300 seconds, more preferably 40 to 240 seconds, and especially preferably 60 to 180 seconds That is the case. 【0179】 The thickness of the adhesive sheet 5 is not particularly limited and may be 2 to 150 μm, or 2 to 100 The thickness may be μm, or 5 to 50 μm. Adjust the thickness of the adhesive sheet 5 appropriately. This can contribute to improving the adhesion between the adhesive sheet 5 and the antistatic layer 1. Properly adjusting the thickness of the 5th layer prevents adhesive from sticking to the substrate, such as glass and image display devices. This may help suppress the peeling of layer 5. 【0180】 Figure 3 shows another example of an optical laminate that can be formed by the third manufacturing method. Optical laminate in Figure 3 Body 3 (3C) consists of an optical film 4, an antistatic layer 1, an adhesive sheet 5, and a release liner 6. The optical laminate 3C has a structure in which these are stacked in this order. For example, it can be used by attaching it to an object such as an image display panel. 【0181】 Examples of materials used in the peel-off liner 6 include polyethylene, polypropylene, and poly Ethylene terephthalate, plastic films such as polyester film, paper, cloth, non Appropriately suitable porous materials such as woven fabrics, nets, foam sheets, metal foils, and laminates thereof. Examples include thin leaves, but plastic films are superior in terms of surface smoothness. It is used as a suitable tool. 【0182】 As for the plastic film, there are no particular limitations as long as it is a film that can protect the adhesive sheet 5. For example, polyethylene film, polypropylene film, polybutene film Polybutadiene film, polymethylpentene film, polyvinyl chloride film, salt Vinyl copolymer film, polyethylene terephthalate film, polybutylene terephthalate Talate film, polyurethane film, ethylene-vinyl acetate copolymer film, etc. It can be listed. 【0183】 The thickness of the release liner 6 is usually 5 to 200 μm, preferably about 5 to 100 μm. The release liner 6 is treated with release treatment, anti-fouling treatment and anti-static treatment as needed. The seeds may be treated. For mold release treatment and antifouling treatment, silicone-based, fluorine-based, Various release agents such as long-chain alkyl and fatty acid amide types, as well as particles such as silica powder, can be used. The anti-static treatment may be applied by coating, mixing, or vapor deposition. To improve release properties, it is particularly suitable to apply a peeling treatment to the surface of the peeling liner 6. ru. 【0184】 The release film used to form the adhesive sheet 5 may also be used as the release liner 6. 【0185】 The optical laminate formed by the second or third manufacturing method is, for example, a strip-shaped optical It can be distributed and stored as a wound laminate or as a single-wafer optical laminate. The above optical laminate is used in image display devices in environments where static electricity is particularly likely to occur. It is particularly suitable for use in automotive displays. For example, Examples include car navigation system panels, cluster panels, and mirror displays. The cluster panel is a panel that displays the vehicle's speed, engine RPM, and other information. An image display device using an optical laminate formed by the second or third manufacturing method is It may also be equipped with a touch sensing function. Furthermore, the touch sensing function may be used for image display. It may be built into the image display panel of the device. Even if the image display panel is a so-called in-cell type image display panel, it is an on-cell type image display A panel is also acceptable. 【0186】 Image display device using an optical laminate formed by the second or third manufacturing method. This may be an OLED display or an LCD display. However, Image display devices are not limited to this example. Image display devices include electroluminescent (E L) Display, Plasma Display (PD), Field Emission Display (FED:Fi It may also be an Emission Display, etc. Image display devices are used for home appliances, automotive applications, and public spaces. It can be used for applications such as PID (Personal Information Display) and automotive data It can be a display. [Examples] 【0187】 The present invention will be described in more detail below with reference to examples. The present invention is as shown in the following examples. Not limited. 【0188】 In this embodiment, an antistatic layer is formed on a polarizing film, and the polarizing film and antistatic layer An optical laminate containing the above was fabricated. 【0189】 <Preparation of coating solution for forming an anti-static layer> (Coating liquid A1) Solution containing single-walled carbon nanotubes and binder resin (manufactured by Nagase ChemteX Corporation, product name: TS066- 11-7) By mixing 15 parts by weight and 85 parts by weight of water, a solid content concentration of 0.3% by weight is obtained. Coating solution A1 was prepared. The binder resin was acrylic. The solid content ratio (by weight) of the CNTs and binder resin was 1:99. The length of the CNTs was... The size was in the range of 5 μm to 200 μm, and the diameter was in the range of 2 nm to 8 nm. . 【0190】 (Coating liquid A2) Solution containing single-walled carbon nanotubes and binder resin (manufactured by Nagase ChemteX Corporation, product name: TS066- 11-7) 15 parts by weight of Emulmin 2, manufactured by Sanyo Chemical Industries, Ltd., as a polyether-based leveling agent. By mixing 1.6 parts by weight of 40 (1% aqueous solution) and 83.4 parts by weight of water, a solid is formed. A coating solution A2 with a concentration of 0.3% by weight was prepared. In the prepared coating solution A2, CNTs and bicarbonates were found. The solid content ratio (by weight) of the undercoat resin and leveling agent was 1:94:5. 【0191】 (Coating liquid A3) Solution containing single-walled carbon nanotubes and binder resin (manufactured by Nagase ChemteX Corporation, product name: TS066- 11-7) was used as coating solution A3 (solid content concentration 2% by weight). 【0192】 (Coating liquid A4) Solution containing single-walled carbon nanotubes and binder resin (manufactured by Nagase ChemteX Corporation, product name: TS066- 11-7) By mixing 50 parts by weight and 50 parts by weight of water, a coating with a solid content concentration of 1% by weight is obtained. Solution A4 was prepared. 【0193】 (Coating liquid A5) Solution containing single-walled carbon nanotubes and binder resin (manufactured by Nagase ChemteX Corporation, product name: TS066- 11-7) 15 parts by weight of Emulmin 2, manufactured by Sanyo Chemical Industries, Ltd., as a polyether-based leveling agent. By mixing 6.3 parts by weight of 40 (1% aqueous solution) and 78.7 parts by weight of water, a solid is formed. A coating solution A5 with a concentration of 0.3% by weight was prepared. In the prepared coating solution A5, CNTs and bicarbonates were found. The solid content ratio (by weight) of the undercoat resin and leveling agent was 1:79:20. 【0194】 (Coating liquid A6) Solution containing single-walled carbon nanotubes and binder resin (manufactured by Nagase ChemteX Corporation, product name: TS066- 11-7) Mixing 5 parts by weight and 95 parts by weight of water yields a coating with a solid content concentration of 0.1% by weight. Solution A6 was prepared. 【0195】 (Coating liquid A7) Solution containing multilayer carbon nanotubes (manufactured by Mitsubishi Paper Mills, product name: YTM06) 1.86 parts by weight, oxazoli As a binder resin containing a polymer, Epocross WS700 (manufactured by Nippon Shokubai Co., Ltd.) By mixing 0.4 parts by weight and 96.7 parts by weight of water, a coating with a solid content concentration of 0.5% by weight is obtained. Process solution A7 was prepared. The solid content ratio of CNTs and binder resin in the prepared coating solution A7 was determined. The weight ratio was 2.5:97.5. The length of the CNT was 0.8 μm and the diameter was 10 It was nm. 【0196】 Table 1 summarizes the details for each coating solution. 【0197】 [Table 1] 【0198】 <Preparation of polarizing film> (Preparation of protective film A with a hard coat layer) UV-curable resin monomers or oligomers containing urethane acrylate as the main component Resin solution dissolved in butyl acetate (DIC Corporation, product name: Unidic 17-806) A solution with a solid content of 80% was prepared. Next, the photogravity was added to 100 parts by weight of the solid content of the resin solution. 5 parts by weight of a compounding initiator (BASF, product name: IRGACURE 907) and a leveling agent. 0.1 parts by weight of (DIC Corporation product name: GRANDIC PC4100) was added. Next, Add cyclopentamine to the resin solution so that the solid content concentration of the resin solution is adjusted to 36% by weight. Add Tanone and propylene glycol monomethyl ether in a weight ratio of 45:55, A hard coat layer forming material was prepared. Next, the prepared forming material was mixed with triacetylcellulose. Includes a transparent protective film (TAC film manufactured by Konica Minolta, product name "KC4UY") A coating film was formed by applying it to a 40 μm thick surface. The thickness of the coating film was determined by the curing of the forming material. The thickness of the hard coat layer was adjusted to 7 μm. Next, the coating film was heated at 90°C for 1 minute. After drying, the luminous intensity was increased to 300 mJ / cm using a high-pressure mercury lamp. 2 The coating is irradiated with ultraviolet light. This hardened the coating, and a protective film A (thickness 47) with a hard coat layer (HC) was applied. A size of μm was obtained. 【0199】 (Fabrication of polarizer A) Polyvinyl alcohol with an average degree of polymerization of 2400, a degree of saponification of 99.9 mol%, and a thickness of 45 μm. The (PVA) film is transported while being immersed in a 20°C swelling bath (water bath) for 30 seconds to allow it to swell. The material was stretched 2.2 times in the direction (swelling process). Next, a dyeing bath at 30°C (100 parts by weight of water) was added. In an iodine aqueous solution obtained by mixing iodine and potassium iodide in a weight ratio of 1:7, the final Adjust the iodine concentration so that the polarizer obtained has a concentration of 3.1% by weight for 30 seconds. While immersing and dyeing, the original PVA film (the PVA film that is not stretched at all in the direction of transport) The material was stretched 3.3 times in the conveying direction based on the (lum) (dyeing process). Different peripheral speed ratios were used for stretching. A roll was used. Next, the stained PVA film was placed in a 40°C crosslinking bath (boric acid concentration 3. A water-soluble solution containing 5% by weight, potassium iodide (3.0% by weight), and zinc sulfate (3.6% by weight). Immerse in liquid for 28 seconds and stretch to 3.6 times its original size in the transport direction relative to the original PVA film. (Crosslinking process). Next, the crosslinked PVA film is stretched in a 64°C stretching bath (boric acid concentration 4.5%). (Aqueous solution containing 5.0% by weight potassium iodide and 5.0% by weight zinc sulfate) It was immersed in the container for 60 seconds and stretched to 6.0 times its original size in the transport direction relative to the original PVA film. (Stretching process). Next, a washing bath at 27°C (an aqueous solution with a potassium iodide concentration of 2.3% by weight). Immerse in the solution for 10 seconds (washing process), then dry the washed PVA film at 40°C for 30 seconds. A polarizer A with a thickness of 18 μm was obtained. 【0200】 (Preparation of phase difference film A) In an autoclave equipped with a stirrer, condenser, nitrogen inlet tube and thermometer, hydroxypropyl Methylcellulose (Shin-Etsu Chemical, Metroze 60SH-50) 48 parts by weight, distilled water 15 601 parts by weight, 8161 parts by weight of diisopropyl fumarate, 3-ethyl-3-o acrylate 240 parts by weight of xetanylmethyl and t-butyl peroxypivalate, which is a polymerization initiator. Place 45 parts by weight into the container, bubbling with nitrogen for 1 hour, then hold at 49°C for 24 hours with stirring. Then, radical suspension polymerization was carried out. Next, after cooling to room temperature, the fumarole produced by polymerization was used. The particles of the acid ester resin were centrifuged. The resulting particles were rinsed twice with distilled water and methanol. After washing twice, it was dried under reduced pressure. Next, it was treated with a toluene-methyl ethyl ketone mixed solution (toluene). Dissolve the particles in 50% by weight methyl ethyl ketone, and concentrate to a concentration of 20% by weight. A % solution was prepared. Furthermore, a plasticizer was added to 100 parts by weight of the fumarate ester resin. A dope was prepared by adding 5 parts by weight of libutyl trimelite. Next, the prepared dope was The film is coated onto a support film so that the dry film thickness is 6.3 μm, and then dried at 140°C. The support material is polyester (polyethylene terephthalate / polyethylene isophthalate). A biaxially oriented film (75 μm thick, heat-treated) of a copolymer was used. Next, The laminate obtained in this manner was uniaxially stretched at a temperature of 140°C. Supporting Fi The film was peeled off to obtain a phase difference film A (thickness 6 μm, Re(550) is 35 nm). 【0201】 (Preparation of polarizing film A) A protective film A with HC is attached to one main surface of polarizer A, and a phase difference film B is attached to the other main surface. Each roll is made of Zeon Corporation's ZT12 cycloolefin film (17 μm thick). The panels were bonded using a bonding machine. Bonding was performed at 30°C using adhesive. It contains PVA (average degree of polymerization 1200, degree of saponification 98.5 mol) containing acetoacetyl groups. It contains 5 mol% acetoacetylated melamine and methylolmelamine in a weight ratio of 3:1. An aqueous solution was used. Next, the entire structure was heated and dried in an oven, and then the resulting laminated film was... A light-curing adhesive composition was coated to a thickness of 1 μm onto the side of the phase difference film B. MC was used for coating. A D-coater (manufactured by Fuji Machinery) was used. The composition of the adhesive is as follows: • Unsaturated fatty acid hydroxyalkyl ester modified ε-caprolactone (manufactured by Daicel, p Luxel FA1DDM) 20 parts by weight • Acryloylmorpholin (manufactured by Kojin) 20 parts by weight • Diethylacrylamide (manufactured by KJ Chemicals, DEAA) 3 parts by weight • Lauryl acrylate (manufactured by Kyoeisha Chemical, "Light Acrylate LA") 6.7 parts by weight Isostearyl acrylate (manufactured by Osaka Organic Chemical Industry Co., Ltd., ISTA) 27 parts by weight • 1,9-nonanediol diacrylate (manufactured by Kyoeisha Chemical, light acrylate 1,9) ND-A) 10 parts by weight • 34 / 66 molar ratio copolymer oligomer of butyl acrylate and methacrylate (East Asia) Synthetic product, ARUFON UP-1190, molecular weight 1700) 13.3 parts by weight • As a photoinitiator, Omnirad 907 (manufactured by IGM Resins BV) 3 Weight part • As a photoinitiator, diethylthioxanthone (manufactured by Nippon Kayaku Co., Ltd., KAYACURE DET XS)3 parts by weight 【0202】 Next, the prepared phase difference film A is rolled so as to be in contact with the coated adhesive composition. The films were bonded together using a laminating machine. The bonding was performed at 30°C. Next, the phase difference film A From the side, visible light from a gallium-filled metal halide lamp is used as the active energy ray. Light (Irradiation device: Light HAMMER manufactured by Fusion UV Systems, Inc.) 10. Bulb: V-bulb, Peak illuminance: 1600mW / cm 2 , wavelength 380~440nm The cumulative irradiation dose is 1000 / mJ / cm². 2 The adhesive composition was cured by irradiating it with ) then. Then, the film was heat-dried at 70°C for 3 minutes to obtain polarizing film A. 【0203】 <Formation of an anti-static layer and fabrication of an optical laminate using the same> The above-prepared transparent protective film was applied to the exposed surface of the polarizing film A prepared above. Apply one of the coating liquids using a wire bar, and dry the formed coating film in a drying oven. By drying, an optical laminate having a laminated structure of an antistatic layer / polarizing film was fabricated. Table 2 below shows the manufacturing conditions for the antistatic layer on the fabricated optical laminate, and the formed static This indicates the thickness of the electrical insulation layer. 【0204】 [Table 2] 【0205】 [evaluation] The following evaluations were performed on the formed antistatic layer. 【0206】 (In-plane variation of surface resistivity) The in-plane variation of surface resistivity was evaluated as follows: Exposed surface of the formed antistatic layer. The surface resistivity was measured at each of the six measurement points set above. The key point is that the measurement points were set randomly so that they did not overlap with each other. The surface resistivity in the int is HIRESTA MCP-HT800 (Mitsubishi Chemical Analyst). Using a (manufactured by CK Corporation), the applied voltage was measured in accordance with the method specified in JIS K6911:1995. The test was conducted under conditions of 10V and an application time of 10 seconds. The measurement was also performed in an environment of 25°C. 6 Find the difference between the common logarithm of the maximum value and the common logarithm of the minimum value among the two measured values. The in-plane variation of surface resistivity was evaluated according to the following evaluation criteria. A: Difference is 0.3 or less B: Difference greater than 0.3 and less than 1 C: Difference is 1 or greater but less than 1.5 D: Difference is 1.5 or greater 【0207】 (Resistivity reliability) The resistivity reliability of the antistatic layer is evaluated by the change in surface resistivity before and after the DIN test. It was worthwhile. Specifically, at each point in time before and after the DIN test, the antistatic layer The surface resistivity A (before DIN test) and surface resistivity B (after DIN test) of the exposed surface were measured, The value of logB-logA was calculated. The closer the value of logB-logA is to zero, the higher the resistivity reliability. The quality can be judged to be high. The DIN test is a weathering test defined in DIN 75220 (test Conditions: Conducted in accordance with Z-IN1). Surface resistivity A and B were measured using Highresta MCP-H. Using T800 (manufactured by Mitsubishi Chemical Analytec Co., Ltd.), according to JIS K6911:1995. Measurements were taken in accordance with the specified method, using an applied voltage of 10V, an application time of 10 seconds, and an ambient temperature of 25°C. . 【0208】 Separately from the above, the following evaluations were performed on the fabricated optical laminates containing polarizing films. . 【0209】 (Degree of curl) The degree of curling of the optical laminate is determined by the size of the fabricated optical laminate (330mm x 230mm). After cutting out a rectangle, it was placed on a horizontal surface with the convex side down, and then stabilized. Then, the maximum amount of upward movement from the horizontal plane was measured. The amount of upward movement is perpendicular to the horizontal plane. It was measured directly. 【0210】 The evaluation results are shown in Table 3 below. 【0211】 [Table 3] 【0212】 As shown in Table 3, the surface resistivity of the antistatic layer in the example is higher than that of the comparative example. This allowed us to suppress internal variations and improve resistivity reliability. [Industrial applicability] 【0213】 The antistatic layer manufactured by the manufacturing method of the present invention can be used, for example, in harsh environments such as in automobiles. It is suitable for use in image display devices. [Explanation of Symbols] 【0214】 1. Antistatic layer 3,3A,3B,3C optical laminate 4 Optical film 5 Adhesive sheets 6. Peel-off liner

Claims

[Claim 1] A method for manufacturing an antistatic layer used in an optical laminate, A coating solution containing a conductive material, a binder resin, and a solvent is applied to the surface of a substrate to form a coating film. To do, By drying the coating film so that the following conditions (1) and (2) are met, This includes removing the solvent to form the antistatic layer, The conductive material is a single-walled carbon nanotube with a length of 3 μm or more and less than 300 μm. 、 A method for manufacturing an antistatic layer. Condition (1): The drying temperature T of the coating film is 50°C or higher. Condition (2): From the start of coating the substrate surface with the coating liquid until the coating film has dried The time Z before starting is between 0.01 seconds and 50 seconds. [Claim 2] The coating film is dried in a manner that satisfies the following condition (3) in addition to the conditions (1) and (2) above. The manufacturing method according to claim 1, wherein the material is dried. Condition (3): The drying time H of the coating film is 10 seconds or more and 150 seconds or less. [Claim 3] The manufacturing method according to claim 1, wherein the drying temperature T is 130°C or less. [Claim 4] The coating liquid substantially does not contain leveling agents, or contains solid leveling agents. Claim 1, which contains a leveling agent in an amount of 8 parts by weight or less, with the total amount being 100 parts by weight. Manufacturing method for the product. [Claim 5] The coating liquid substantially does not contain leveling agents, or contains solid leveling agents. The product contains a leveling agent in an amount of 8 parts by weight or less, with a quantity of 100 parts by weight. The coating film is dried such that the time Z satisfies the condition of 15 seconds or less, according to claim 1. The manufacturing method described. [Claim 6] The coating film having a thickness of 1 μm or more and 12 μm or less is formed on the surface of the substrate, as described in claim 1. Manufacturing method for the product. [Claim 7] The manufacturing method according to claim 1, wherein the substrate is an optical film. [Claim 8] The manufacturing method according to claim 1, wherein the substrate includes a polarizing film. [Claim 9] The formation of the coating film and the drying of the formed coating film are performed while transporting the strip-shaped substrate. The manufacturing method according to claim 1, which is to be implemented. [Claim 10] The antistatic layer having a thickness of 5 nm to 200 nm is formed as described in claim 1. Manufacturing method for the product. [Claim 11] 1.0 x 10 9 A claim for forming an antistatic layer having a surface resistivity of Ω / □ or less. The manufacturing method described in 1. [Claim 12] The manufacturing method according to claim 1, wherein the antistatic layer satisfying the following formula (I) is formed. However, A and B in formula (I) are defined in German Industrial Standard DIN 75220, respectively. Surface of the antistatic layer before and after the specified weather resistance test (test conditions: Z-IN1) This is resistivity (unit: Ω / □). -2≦logB-logA≦2 (I) [Claim 13] A method for manufacturing an optical laminate comprising an optical film and an antistatic layer in this order, The antistatic layer is formed by the manufacturing method described in any one of claims 1 to 12. Including, A method for manufacturing optical laminates. [Claim 14] The substrate is an optical film, The manufacturing method according to claim 13, wherein the antistatic layer is formed on the optical film. [Claim 15] The manufacturing method according to claim 13, wherein the optical film includes a polarizing film. [Claim 16] A method for manufacturing an optical laminate comprising, in this order, an optical film, an antistatic layer, and an adhesive sheet. It is a law, The antistatic layer is formed by the manufacturing method described in any one of claims 1 to 12. Including, A method for manufacturing optical laminates. [Claim 17] The substrate is an optical film, The manufacturing method according to claim 16, wherein the antistatic layer is formed on the optical film. [Claim 18] The manufacturing method according to claim 16, wherein the optical film includes a polarizing film.

Images