Display panel

Abstract

This application belongs to the field of display technology, and more particularly relates to display panels and display devices. This application discloses a display panel comprising a substrate, a first electrode wherein a plurality of first electrodes are arranged in an array on one side of the substrate, and the first electrode includes a first edge region, and an isolation structure provided on the same side of the substrate as the first electrode and surrounding and forming a plurality of isolation openings, wherein the isolation structure is insulated from each other from the first electrode, and at least a portion of the first electrode is exposed from the isolation openings, the isolation structure includes an isolation wall having a first surface away from the substrate and a second surface facing the substrate, the isolation wall further includes a first side surface connecting the first surface and the second surface, and the orthographic projection of at least a portion of the first edge region on the substrate is offset from the orthographic projection of the first side surface on the substrate.

Description

Technical Field

[0001] This application claims the priority of Chinese Patent Application No. 202310707209.0, entitled "Display Panel and Display Device", filed on June 13, 2023, and Chinese Patent Application No. 202311694025.1, entitled "Display Panel and Its Manufacturing Method, and Display Device", filed on December 8, 2023, and all the contents of the said applications are incorporated herein by reference.

[0002] This application belongs to the field of display technology, and particularly relates to display panels and display devices.

Background Art

[0003] Flat display devices based on technologies such as Organic Light Emitting Diode (OLED) and Light Emitting Diode (LED) have advantages such as high image quality, low power consumption, thin body, and wide application range. Therefore, they are widely applied to various consumer electronic products such as mobile phones, televisions, notebook computers, and desktop computers, and have become the mainstream in display devices.

[0004] However, current OLED display products require improvement in process performance.

Summary of the Invention

[0005] Embodiments of this application provide a display panel and a display device aimed at improving the process performance of the display panel.

[0006] Embodiments of this application provide a display panel comprising a substrate, a first electrode, wherein a plurality of first electrodes are arranged in an array on one side of the substrate, the first electrode having a first edge region, and an isolation structure provided on the same side of the substrate as the first electrode, surrounding and forming a plurality of isolation openings, wherein the isolation structure is insulated from the first electrode and at least a portion of the first electrode is exposed from the isolation openings, the isolation structure includes an isolation wall having a first surface away from the substrate and a second surface facing the substrate, the isolation wall further includes a first side surface connecting the first surface and the second surface, and the orthographic projection of at least a portion of the first edge region on the substrate is offset from the orthographic projection of the first side surface on the substrate.

[0007] An embodiment of a first aspect of this application provides a display panel comprising: a substrate; a first electrode located on one side of the substrate; an insulating layer located on the side of the first electrode away from the substrate and surrounding it to form a pixel aperture, wherein at least a portion of the first electrode is exposed from the pixel aperture; and an isolation structure provided on the side of the insulating layer away from the substrate, wherein the isolation structure includes an isolation wall having a first surface away from the substrate and a second surface facing the substrate, the isolation wall further includes a first side surface connecting the first surface and the second surface, the surface of the insulating layer away from the substrate includes a flat region, and the orthographic projection of the first side surface on the substrate further provides a display panel located within the orthographic projection of the flat region on the substrate.

[0008] Embodiments of a first aspect of the present application provide a display panel comprising: a substrate including a pixel circuit and a first via hole; a first electrode provided on one side of the substrate so as to be located away from the pixel circuit of the first via hole and electrically connected to the pixel circuit via the first via hole; and an isolation structure provided on one side of the substrate so as to be located on the same side as the first electrode with respect to the substrate, surrounding and forming a plurality of isolation openings, the isolation structure being insulated from each other from the first electrode and at least a portion of the first electrode being exposed through the isolation openings, wherein the isolation structure includes an isolation wall, and the orthographic projection of the first via hole on the substrate is offset from the orthographic projection of the isolation wall on the substrate.

[0009] Embodiments of a second aspect of the present application further provide a display device including a display panel of any of the above embodiments.

[0010] In the display panel according to the embodiment of this application, the display panel includes a substrate, a first electrode, and an isolation structure, wherein a plurality of first electrodes are arranged in an array on one side of the substrate, and the plurality of first electrodes are used to drive a plurality of light-emitting functional units of the display panel to emit light. The first electrode has a first edge region that affects the flatness of the surface away from the substrate of the subsequent film layer. The isolation structure and the first electrode are provided on the same side of the substrate, and an isolation opening is formed by the isolation structure, and at least a portion of the first electrode is exposed from the isolation opening, so that the isolation opening is used to house a light-emitting functional unit, and the first electrode exposed from the isolation opening can drive the light-emitting functional unit within the isolation opening to emit light. The isolation structure includes an isolation wall having a first side surface, and the orthographic projection of at least a portion of the first edge region on the substrate is offset from the orthographic projection of the first side surface on the substrate, so that at least a portion of the first edge region does not affect the flatness of the first side surface, thereby facilitating the overlap of the subsequent film layer onto the first side surface and improving the process performance of the display panel. [Brief explanation of the drawing]

[0011] To more clearly illustrate the technical concept of the embodiments of this application, the necessary drawings for the embodiments of this application are briefly described below, and those skilled in the art can obtain other drawings based on these drawings without requiring any creative work. [Figure 1] This is a schematic diagram showing the planar structure of a display panel according to several embodiments of this application. [Figure 2] This is a schematic diagram showing an enlarged planar structure in area B of the display panel in Figure 1, as in one example. [Figure 3] This is a cross-sectional view along section A to A of the display panel in Figure 2, as an example. [Figure 4] This is a cross-sectional view along section A to A of the display panel in Figure 2 in another example. [Figure 5]This is a cross-sectional view along section A to A of the display panel in Figure 2 in another example. [Figure 6] This is a cross-sectional view along section A to A of the display panel in Figure 2 in another example. [Figure 7] This is a cross-sectional view along section A to A of the display panel in Figure 2 in another example. [Figure 8] This is a local cross-sectional view of a display panel in one example. [Figure 9] This is a local cross-sectional view of a display panel in another example. [Figure 10] This is a schematic diagram showing an enlarged planar structure in area B of the display panel in Figure 1, in another example. [Figure 11] This is a local cross-sectional view of a display panel in another example. [Figure 12] This is a local cross-sectional view of a display panel in another example. [Figure 13] This is a local cross-sectional view of a display panel in another example. [Figure 14] This is a local cross-sectional view of a display panel in another example. [Figure 15] This is a local cross-sectional view of a display panel in another example. [Figure 16] This is yet another example, a cross-sectional view along section A-A of the display panel in Figure 2. [Figure 17] This is yet another example, a cross-sectional view along section A-A of the display panel in Figure 2. [Figure 18] Figure 17 is a schematic diagram showing a localized magnified structure. [Explanation of Symbols]

[0012] 10 Display panel 30 Auxiliary electrode 31 Transparent conductive connector 100 circuit boards, 110 pixel circuits, 120 first via holes 200 First electrode 210 First gap 220 First edge region 230 First top surface 240 First bottom surface 250 First side wall 260 Auxiliary electrode 300 First insulating layer 310 Pixel aperture 320 First groove 330 Fifth surface 340 Sixth surface 350 Pixel defining portion 301 Second insulating layer 302 Flat region 303 First region 304 Second region 400 Isolation structure 410 Second groove 420 Isolation wall 421 Third groove 422 First surface 423 Second surface 430 Barrier portion 460 Isolation aperture 470 First side surface 480 Light transmission hole 500 Light-emitting functional layer 510 Light-emitting functional portion 600 Second electrode AA Display area, in the thickness direction of the Z display panel.

Modes for Carrying Out the Invention

[0013] Hereinafter, the features and exemplary embodiments of each aspect of the present application will be described in detail. Hereinafter, in order to more clearly clarify the object, technical solution and advantages of the present application, the present application will be described in more detail while referring to the drawings and specific embodiments. It should be understood that the specific embodiments described in this specification are not intended to limit the present application, but only to interpret the present application. A person skilled in the art can implement the present application without some of these specific details. The description of the embodiments described below is only for showing examples of the present application in order to better understand the present application.

[0014] In addition, in this specification, relational terms such as first and second are only for distinguishing one entity or operation from another entity or operation, and do not necessarily require or imply the existence of such an actual relationship or order between these entities or operations. Also, the terms "comprising", "including" or any other variation thereof are intended to cover non-exclusive inclusion, so that when a process, method, article or device includes a series of elements, it includes not only those elements but also other elements not explicitly listed, as well as elements specific to such a process, method, article or device. Without more limitations, an element defined by the phrase "including..." does not exclude the existence of other same elements in the process, method, article or device that includes the said element.

[0015] The applicant has found that, in the related technology, there is a need to improve the process performance of existing OLED display panels.

[0016] In view of the above problems, the applicant proposes a display panel comprising a substrate, a first electrode having a plurality of first electrodes arranged in an array on one side of the substrate and having a first edge region, and an isolation structure provided on one side of the substrate and located on the same side as the first electrode with respect to the substrate, surrounding and forming a plurality of isolation openings, wherein the isolation structure is insulated from the first electrode and at least a portion of the first electrode is exposed from the isolation opening, the isolation structure includes an isolation wall having a first surface away from the substrate and a second surface facing the substrate in the thickness direction of the display panel, the isolation wall further includes a first side surface connecting the first surface and the second surface, and the orthographic projection of at least a portion of the first edge region on the substrate is offset from the orthographic projection of the first side surface on the substrate.

[0017] In the display panel of the embodiment of this application, the display panel includes a substrate, a first electrode, and an isolation structure, wherein a plurality of first electrodes are arranged in an array on one side of the substrate, and the plurality of first electrodes are used to drive a plurality of light-emitting functional units of the display panel to emit light. The first electrode has a first edge region that affects the flatness of the surface away from the substrate of the subsequent film layer. The isolation structure and the first electrode are provided on the same side of the substrate, and an isolation opening is formed by being surrounded by the isolation structure, and at least a portion of the first electrode is exposed from the isolation opening, so that the isolation opening is used to house a light-emitting functional unit, and the first electrode exposed from the isolation opening can drive the light-emitting functional unit within the isolation opening to emit light. The isolation structure includes an isolation wall having a first side surface, and the orthographic projection of at least a portion of the first edge region on the substrate is offset from the orthographic projection of the first side surface on the substrate, so that at least a portion of the first edge region does not affect the flatness of the first side surface, thereby facilitating the overlap of the subsequent film layer onto the first side surface and improving the process performance of the display panel.

[0018] To better understand this application, the display panel and display device according to the embodiments of this application will be described in detail below with reference to the drawings. In the drawings, the z-direction is the thickness direction of the display panel. For the sake of drawing convenience, the sizes shown in the drawings are not necessarily proportional to the actual sizes, and some of the hierarchical structure of the display module is not depicted.

[0019] Referring to Figures 1 to 3, Figure 1 is a schematic diagram showing the planar structure of the display panel 10 according to several embodiments of this application, Figure 2 is a schematic diagram showing an enlarged planar structure of area B of the display panel 10 in Figure 1 in one example, and Figure 3 is a cross-sectional view of the display panel 10 in Figure 2 along section A to A in one example. However, area B in Figure 1 is located in the display area AA of the display panel 10.

[0020] As shown in Figures 1 to 3, an embodiment of the first aspect of this application comprises a substrate 100 and a first electrode 200, wherein a plurality of first electrodes 200 are arranged in an array on one side of the substrate 100, and the first electrode 200 includes a first electrode 200 having a first edge region 220 and an isolation structure 400 provided on one side of the substrate 100 so as to be on the same side as the first electrode 200 with respect to the substrate 100, surrounding and forming a plurality of isolation openings 460, wherein the isolation structure 400 is insulated from the first electrode 200 and a small portion of the first electrode 200 The display panel 10 comprises an isolation structure 400, at least a portion of which is exposed from the isolation opening 460, wherein the isolation structure 400 includes an isolation wall 420 having a first surface 422 away from the substrate 100 and a second surface 423 facing the substrate 100 in the thickness direction Z of the display panel 10, and the isolation wall 420 further includes a first side surface 470 connecting the first surface 422 and the second surface 423, and the orthographic projection of at least a portion of the first edge region 220 on the substrate 100 is offset from the orthographic projection of the first side surface 470 on the substrate 100.

[0021] In the display panel 10 of the embodiment of this application, the display panel 10 includes a substrate 100, a first electrode 200, and an isolation structure 400, wherein a plurality of first electrodes 200 are arranged in an array on one side of the substrate 100, and the plurality of first electrodes 200 are used to drive a plurality of light-emitting functional units 510 of the display panel 10 to emit light. The first electrodes 200 have a first edge region 220 that affects the flatness away from the substrate 100 surface of the subsequent film layer. The isolation structure 400 and the first electrodes 200 are provided on the same side of the substrate 100, and an isolation opening 460 is formed by being surrounded by the isolation structure 400, and at least a portion of the first electrodes 200 is exposed from the isolation opening 460, so that the isolation opening 460 is used to house the light-emitting functional units 510, and the first electrodes 200 exposed from the isolation opening 460 can drive the light-emitting functional units 510 within the isolation opening 460 to emit light. The isolation structure 400 includes an isolation wall 420 having a first side surface 470, and the orthographic projection of at least a portion of the first edge region 220 on the substrate 100 is offset from the orthographic projection of the first side surface 470 on the substrate 100, so that at least a portion of the first edge region 220 does not affect the flatness of the first side surface 470, thereby facilitating the overlap of the subsequent film layer onto the first side surface 470 and improving the process performance of the display panel 10.

[0022] In several selectable embodiments, the substrate 100 may further include a base and a circuit layer which may have a pixel circuit. For example, the circuit layer may include a first conductive layer, a second conductive layer, and a third conductive layer laminated on one side of the base. An inorganic or organic layer is provided between adjacent conductive layers for insulation. Exemplarily, the pixel circuit provided on the circuit layer includes a transistor and a storage capacitor. The transistor includes a semiconductor, a gate, a source, and a drain. The storage capacitor includes a first plate and a second plate. As an example, the gate and the first plate may be located in the first conductive layer, the second plate in the second conductive layer, and the source and drain in the third conductive layer.

[0023] Selectively, as shown in Figure 3, the first electrode 200 has a first bottom surface 240 facing the substrate 100, a first top surface 230 away from the substrate 100, and a first side wall 250 connecting the first top surface 230 and the first bottom surface 240. If the first top surface 230 and the first bottom surface 240 are the same size and the first side wall 250 extends along the thickness direction Z, the first edge region 220 may be the edge of the first top surface 230 and / or the first bottom surface 240. If the first top surface 230 and the first bottom surface 240 are of different sizes, and the first side wall 250 is inclined with respect to the thickness direction Z, the region where the first side wall 250 is located is considered to be the first edge region 220, and the orthographic projection of the first side wall 250 on the substrate 100 is considered to be the orthographic projection of the first edge region 220 on the substrate 100.

[0024] Optionally, the first electrode 200 further includes a first central region enclosed by a first edge region 220. Optionally, the region of the first electrode 200 excluding the first edge region 220 may be the first central region. The fact that the orthographic projection of at least a portion of the first edge region 220 on the substrate 100 is offset from the orthographic projection of the first side surface 470 on the substrate 100 means that the orthographic projection of the first edge region 220 located on one side of the first central region may be offset from the orthographic projection of the first side surface 470 on the substrate 100, the orthographic projection of the first edge region 220 located around the center of the first region may be offset from the orthographic projection of the first side surface 470 on the substrate 100, and the orthographic projection of at least a portion of the first edge region 220 on the substrate 100 may be offset from the orthographic projection of the first side surface 470 on the substrate 100.

[0025] In several selectable embodiments, the display panel 10 further comprises a light-emitting functional layer 500 including a plurality of light-emitting functional units 510 at least partially located within an isolation opening 460, and a second electrode 600. The second electrode 600 is located on the side of the light-emitting functional layer 500 away from the substrate 100. The first electrode 200 and the second electrode 600 are electrically connected to the light-emitting functional units 510, and the second electrode 600 and the first electrode 200 are used to supply power to the light-emitting functional units 510 and drive them to emit light. Specifically, one of the first electrode 200 and the second electrode 600 is an anode and the other is a cathode, and embodiments of this application describe, as an example, the case in which the second electrode 600 is the cathode and the first electrode 200 is the anode.

[0026] The light-emitting functional layer 500 may include a sequentially stacked film layer structure such as a hole injection layer (HIL), a hole transport layer (HTL), a light-emitting material layer (EL), an electron transport layer (ETL), and an electron injection layer (EIL). The light-emitting material layer (EL) may include light-emitting material for red subpixels, light-emitting material for green subpixels, and light-emitting material for blue subpixels.

[0027] Optionally, the isolation structure 400 is located between adjacent light-emitting functional units 510.

[0028] Optionally, the material of the isolation wall 420 includes a conductive material, and the second electrode 600 and the isolation wall 420 are electrically connected to each other. Optionally, the second electrode 600 overlaps the first side surface 470, and the isolation wall 420 supplies a power signal to the second electrode 600.

[0029] In the display panel 10 according to the embodiment of this application, the orthographic projection of at least a portion of the first edge region 220 on the substrate 100 is offset from the orthographic projection of the first side surface 470 on the substrate 100. As a result, at least a portion of the first edge region 220 does not affect the flatness of the first side surface 470, thereby facilitating the overlap of the second electrode 600 with the first side surface 470, improving the yield of connections between the second electrode 600 and the isolation wall 420, and improving the process performance of the display panel 10.

[0030] In some embodiments, the presence of the isolation structure 400 allows it to not only partition the light-emitting functional layer 500, but also partition the layer of the second electrode 600 to form the second electrode 600.

[0031] Optionally, the second electrodes 600 may be separated by the isolation structure 400, and multiple second electrodes 600 may be electrically connected by other members, for example, the second electrodes 600 may be connected in contact with the isolation structure 400, and the second electrodes 600 in at least two adjacent pixel apertures 310 may be electrically connected to each other by the isolation structure 400.

[0032] However, the isolation structure 400 includes a conductive material, and the second electrodes 600 in at least two adjacent isolation openings 460 are electrically connected to each other via the conductive material of the isolation structure 400. In the above embodiment, because the isolation structure 400 has excellent dimensional uniformity, the second electrodes 600 easily overlap the conductive material of the isolation structure 400, enabling electrical connection between adjacent second electrodes 600 via the conductive material of the isolation structure 400.

[0033] For example, the second electrodes 600 within at least two adjacent isolation openings 460 are electrically connected to each other via the isolation wall 420. Due to the excellent dimensional uniformity of the isolation structure 400, the second electrodes 600 easily overlap the isolation wall 420.

[0034] In the display panel 10 according to this embodiment, the second electrodes 600 corresponding to at least two adjacent pixel apertures 310 are electrically connected via an isolation structure 400, thereby enabling inter-regional communication or full-surface communication in the display panel 10.

[0035] Continuing to refer to Figures 2 and 5, in several selectable embodiments, the orthographic projection of the isolation structure 400 on the substrate 100 is grid-like. The isolation structure 400 may separate the light-emitting function units 510 from each other; for example, the isolation structure 400 may separate the light-emitting function units 510 of each subpixel from each other. The isolation structure 400 may separate the light-emitting function units 510 of a set of subpixels from each other; for example, the isolation structure 400 may separate the light-emitting function units 510 of a set of subpixels of the same color from each other.

[0036] Optionally, referring to Figures 1 to 3, the display panel 10 further comprises a first insulating layer 300 provided on the side of the first electrode 200 away from the substrate 100, having a pixel limiting portion 350 and a pixel aperture 310 surrounded by the pixel limiting portion 350, wherein the orthographic projection of the pixel aperture 310 on the substrate 100 at least partially overlaps with the orthographic projection of the first electrode 200 on the substrate 100, so that the first electrode 200 can be exposed from the pixel aperture 310. Optionally, an isolation structure 400 is located on the side of the first insulating layer 300 away from the substrate 100, and the isolation aperture 460 communicates with the pixel aperture 310, so that the first electrode 200 can be exposed from both the isolation aperture 460 and the pixel aperture 310.

[0037] In these selectable embodiments, the first edge region 220 affects the flatness of the surface of the first insulating layer 300 and further affects the flatness of the isolation structure 400 provided on the first insulating layer 300. By offsetting the orthographic projection of at least a portion of the first edge region 220 on the substrate 100 with the orthographic projection of the first side surface 470 on the substrate 100, at least a portion of the first edge region 220 does not affect the flatness of the first insulating layer 300 below the first side surface 470, and further does not affect the flatness of the first side surface 470, thereby facilitating the overlap of the second electrode 600 onto the first side surface 470, improving the connection yield of the second electrode 600 and the isolation wall 420, and improving the process performance of the display panel.

[0038] As shown in Figures 1 to 4, the first surface 422 and the second surface 423 are installed in various ways. For example, the first surface 422 and the second surface 423 are the same size. In another selectable embodiment, the first surface 422 and the second surface 423 have different orthographic areas on the substrate 100, so the first side surface 470 is inclined, which further facilitates the overlap of the second electrode 600.

[0039] In several selectable embodiments, at least a portion of the orthographic projection of the first edge region 220 on the substrate 100 lies within the orthographic projection of the substrate 100 that has a smaller area than the first surface 422 and the second surface 423.

[0040] In these selectable embodiments, the first edge region 220 may extend below the smaller of the first surface 422 and the second surface 423, that is, the first edge region 220 may extend below the isolation wall 420, thereby offsetting the first edge region 220 from the first surface 470 so as not to affect the flatness of the first surface 470.

[0041] Selectively, as shown in Figure 5, if the orthographic projection of the first surface 422 on the substrate 100 lies within the orthographic projection of the second surface 423 on the substrate 100, then at least a portion of the orthographic projection of the first edge region 220 on the substrate 100 lies within the orthographic projection of the first surface 422 on the substrate 100. That is, if the size of the first surface 422 is small but the area size of the second surface 423 is large, then at least a portion of the first edge region 220 lies below the first surface 422, and at least a portion of the first edge region 220 extends below the first surface 422 so as to be offset from the first side surface 470.

[0042] The dashed line A3 in Figure 5 is not a physical connection line, but rather represents the projection line of the orthographic projection of the first surface 422 on the substrate 100, and the orthographic projection of the first surface 422 on the substrate 100 can be understood as the section between the two dashed lines A3 in Figure 5. The orthographic projection of the first electrode 200 on the substrate 100 at least partially overlaps with the orthographic projection of the first surface 422 on the substrate 100, i.e., the orthographic projection of the first gap 210 on the substrate 100 is located within the orthographic projection of the first surface 422 on the substrate 100, thereby reducing the undulation region of the insulating layer 300, improving the dimensional uniformity of the isolation structure 400, and further improving the display effect of the display panel 10.

[0043] Selectively, the first side surface 470 is inclined toward the direction away from the isolation opening 460 as it moves away from the substrate 100. When the isolation structure 400 is provided on the side of the first insulating layer 300 away from the substrate 100, the angle between the first side surface 470 and the surface of the first insulating layer 300 exposed from the isolation opening 460 is greater than 90 degrees to facilitate the overlap of the second electrode 600 onto the first side surface 470.

[0044] In some selectable embodiments, the orthographic projection of the first edge region 220 on the substrate 100 may be located within the orthographic projection of the first surface 422 on the substrate 100, or a portion of the orthographic projection of the first edge region 220 on the substrate 100 may be located within the orthographic projection of the first surface 422 on the substrate 100, while another portion of the orthographic projection of the first edge region 220 on the substrate 100 may be offset from the orthographic projection of the second surface 423 on the substrate 100. In other words, as shown in Figure 5, the entirety of the first edge region 220 may extend below the first surface 422, or, as shown in Figure 4, a portion of the first edge region 220 may extend below the first surface 422, and a portion of the first edge region 220 may extend outside the second surface 423 so as to be offset from the isolation wall 420, provided that the orthographic projection of the first edge region 220 on the substrate 100 is offset from the orthographic projection of the first side surface 470 on the substrate 100.

[0045] The dashed line A2 in Figure 4 is not a physical connection line, but rather represents the orthographic projection line of the first surface 422 on the substrate 100, and the orthographic projection of the first surface 422 on the substrate 100 can be understood as the interval between the two dashed lines A2 in Figure 4. A portion of the first edge region 220 extends below the first surface 422, and a portion of the first edge region 220 extends outward from the second surface 423, offset from the isolation wall 420.

[0046] In another selectable embodiment, as shown in Figure 6, the orthographic projection of the second surface 423 on the substrate 100 lies within the orthographic projection of the first surface 422 on the substrate 100, and at least a portion of the orthographic projection of the first edge region 220 on the substrate 100 lies within the range of the orthographic projection of the second surface 423 on the substrate 100.

[0047] In these selectable embodiments, the area size of the second surface 423 is small, the area size of the first surface 422 is large, and at least a portion of the orthographic projection of the first edge region 220 on the substrate 100 lies within the range of the orthographic projection of the second surface 423 on the substrate 100, so that at least a portion of the first edge region 220 extends below the smaller area of ​​the second surface 423.

[0048] The first side surface 470 can be optionally inclined toward the isolation opening 460 as it moves away from the substrate 100, so that the lower part of the first side surface 470 can be concave to facilitate cutting the light-emitting material to form independent light-emitting functional parts 510.

[0049] Selectively, a first gap 210 is formed between adjacent first electrodes 200. As shown in Figure 6, selectively, the orthographic projection of the first gap 210 on the substrate 100 lies within the orthographic projection of the second surface 423 of the isolation wall 420 on the substrate 100.

[0050] In several selectable embodiments, as shown in Figures 1 to 6, the display panel 10 further comprises a first insulating layer 300 filled between adjacent first electrodes 200, the isolation structure 400 is provided on the side of the first insulating layer 300 away from the substrate 100, and a first groove 320 is provided on the side of the first insulating layer 300 away from the substrate 100, and the orthographic projection of the first groove 320 on the substrate 100 is offset from the orthographic projection of the first electrodes 200 on the substrate 100. In these embodiments, the surface of the first insulating layer 300 away from the substrate 100 becomes uneven due to the presence of the first electrodes 200, and the insulating layer fills the first gap 210 between adjacent first electrodes 200 to form the first groove 320.

[0051] Selectively, as shown in Figure 6, the orthographic projection of the first electrode 200 on the substrate 100 at least partially overlaps with the orthographic projection of the second surface 423 on the substrate 100. The orthographic projection of the first electrode 200 on the substrate 100 at least partially overlaps with the orthographic projection of the second surface 423 on the substrate 100, i.e., the orthographic projection of the first gap 210 on the substrate 100 lies within the orthographic projection of the second surface 423 on the substrate 100, and the edge of the first electrode 200 extends within the coverage area of ​​the isolation wall 420, thereby reducing the size of the first gap 210, further reducing the undulation area of ​​the first insulating layer 300, improving the uniformity of the dimensions of the isolation structure 400 (e.g., dimensions such as the height of the isolation structure 400), and further improving the display effect of the display panel 10.

[0052] Selectively, at least a portion of the orthographic projection of the first edge region 220 on the substrate 100 lies within the orthographic projection of the substrate 100 which has a smaller area than the first surface 422 and the second surface 423; the orthographic projection of the first groove 320 on the substrate 100 lies within the orthographic projection of the substrate 100 which has a smaller area than the first surface 422 and the second surface 423; and a portion of the isolation wall 420 lies within the first groove 320.

[0053] In these selectable embodiments, as shown in Figure 6 or Figure 5, the presence of the first electrode 200 forms a first groove 320 in the first insulating layer 300, and a portion of the isolation wall 420 is located within the first groove 320, i.e., the isolation wall 420 completely covers the first groove 320, thereby increasing the contact area between the isolation wall 420 and the first insulating layer 300 and improving the connection yield between the isolation wall 420 and the first insulating layer 300. In some selectable embodiments, the orthographic projection of the first groove 320 on the substrate 100 at least partially overlaps with the orthographic projection of the first gap 210 on the substrate 100, and at least a portion of the isolation structure 400 is located within the first groove 320.

[0054] Selectively, at least a portion of the first insulating layer 300 is located within the first gap 210, thereby forming the first groove 320 on the side of the first insulating layer 300 away from the substrate 100.

[0055] Selectively, the first insulating layer 300 includes a fifth surface 330 which is the upper surface of the first insulating layer 300 away from the substrate 100, and a sixth surface 340 which is the lower surface of the first insulating layer 300 facing the substrate 100. The orthographic projection of the fifth surface 330 on the substrate 100 lies within the orthographic projection of the sixth surface 340 on the substrate 100, and the orthographic projection of the first gap 210 on the substrate 100 lies within the orthographic projection of the fifth surface 330 on the substrate 100.

[0056] In the display panel 10 according to the embodiment of this application, the orthographic projection of the first gap 210 on the substrate 100 lies within the orthographic projection of the fifth surface 330 on the substrate 100. That is, the edge of the first electrode 200 extends into the coverage area of ​​the fifth surface 330, causing the edge of the first electrode 200 to deviate from the edge of the first insulating layer 300 that points to the boundary between the fifth surface 330 and the side surface of the first insulating layer 300. This reduces the undulation area of ​​the first insulating layer 300, which is advantageous for manufacturing the isolation structure 400 in a subsequent process and improves the process performance of the display panel 10.

[0057] Selectively, at least a portion of the isolation wall 420 is located within the first groove 320, and a third groove 421 is provided on the side of the isolation wall 420 away from the substrate 100, wherein the orthographic projection of the third groove 421 on the substrate 100 at least partially overlaps with the orthographic projection of the first groove 320 on the substrate 100, and / or the orthographic projection of the third groove 421 on the substrate 100 at least partially shifts from the orthographic projection of the first electrode 200 on the substrate 100.

[0058] In some selectable embodiments, as shown in Figure 6, the isolation structure 400 may include only an isolation wall 420. The isolation wall 420 includes a first surface 422 which is the upper surface of the isolation structure 400 away from the substrate 100, and a second surface 423 which is the lower surface of the isolation structure 400 facing the substrate 100. The orthographic projection of the second surface 423 on the substrate 100 lies within the orthographic projection of the first surface 422 on the substrate 100, and the orthographic projection of the first electrode 200 on the substrate 100 at least partially overlaps with the orthographic projection of the second surface 423 on the substrate 100.

[0059] Selectively, the orthographic projection of the first gap 210 on the substrate 100 is located within the orthographic projection of the second surface 423 on the substrate 100, so that the edges of the first electrode 200 extend within the coverage area of ​​the isolation structure 400, thereby reducing the uneven area of ​​the first insulating layer and improving the process performance of the display panel 10.

[0060] Optionally, the isolation structure 400 has an inverted trapezoidal cross-section along the thickness direction Z (z direction in the figure) of the display panel 10. By configuring the isolation structure 400 to have an inverted trapezoidal cross-section along the thickness direction Z of the display panel 10, the devices are made independent of each other, optimizing the optical performance of the display panel 10, and enabling the individual packaging of each light-emitting function unit 510, thereby improving the packaging reliability of the display panel 10.

[0061] Optionally, the isolation structure 400 is a single-piece structure, and the isolation structure 400 is formed as an inverted trapezoidal structure by etching. The second groove 410 is located on the first surface 422.

[0062] In an optional embodiment, as shown in Figures 1 to 5, the isolation structure 400 further includes a barrier portion 430 provided on the side of the isolation wall 420 away from the substrate 100, wherein the orthographic projection of the isolation wall 420 on the substrate 100 lies within the orthographic projection of the barrier portion 430 on the substrate 100, at least a portion of the barrier portion 430 lies within a third groove 421, the second groove 410 lies on the side of the barrier portion 430 away from the isolation wall 420, and the orthographic projection of the second groove 410 on the substrate 100 at least partially overlaps with the orthographic projection of the third groove 421 on the substrate 100.

[0063] As shown in Figure 3, in several selectable embodiments, the orthographic projection of the isolation wall 420 on the substrate 100 lies within the orthographic projection of the barrier portion 430 on the substrate 100, and the orthographic projection of the first gap 210 on the substrate 100 lies within the orthographic projection of the barrier portion 430 on the substrate 100. The dashed line A1 in Figure 3 is not a physical connection line, but rather indicates the projection line of the orthographic projection of the barrier portion 430 on the substrate 100, and the orthographic projection of the barrier portion 430 on the substrate 100 can be understood as the interval between the two dashed lines A1 in Figure 3.

[0064] In several selectable embodiments, as shown in Figures 1 to 6, the isolation structure 400 has a second groove 410 on the side away from the substrate 100, and the orthographic projection of the second groove 410 on the substrate 100 at least partially overlaps with the orthographic projection of the first groove 320 on the substrate 100.

[0065] Selectively, the orthographic projection of the second groove 410 on the substrate 100 overlaps at least partially with the orthographic projection of the first gap 210 on the substrate 100.

[0066] In the display panel 10 according to the embodiment of this application, at least a portion of the first insulating layer 300 is located within the first gap 210, so that the first insulating layer 300 has a first groove 320 formed on the side away from the substrate 100, and at least a portion of the isolation structure 400 is located within the first groove 320, so that the isolation structure 400 has a second groove 410 formed on the side away from the substrate 100.

[0067] The isolation structure 400, by being used as a substitute for a metal mask, reduces mold opening costs and increases the pixel density of the display panel 10. The barrier portion 430 is formed in a roof-like structure, which isolates the devices from each other and further optimizes the optical performance of the display panel 10. The orthographic projection of the first gap 210 on the substrate 100 lies within the orthographic projection of the barrier portion 430 on the substrate 100. For example, the barrier portion 430 has two surfaces arranged opposite each other in the thickness direction Z, and the orthographic projection of the first gap 210 on the substrate 100 lies within the orthographic projection of the smaller of the two surfaces. That is, the edge of the first electrode 200 extends within the coverage area of ​​the barrier portion 430, reducing the uneven area of ​​the first insulating layer 300. Furthermore, it reduces unevenness in a large area of ​​the film layer forming the isolation structure 400, which is advantageous for manufacturing the isolation structure 400 in subsequent processes and improves the process performance of the display panel 10.

[0068] In several selectable embodiments, both the isolation wall 420 and the barrier portion 430 are made of a metallic material, and furthermore, the isolation wall 420 and the barrier portion 430 are made of different metallic materials. For example, the isolation wall 420 is made of aluminum and the barrier portion 430 is made of titanium, and of course, the materials for the isolation wall 420 and the barrier portion 430 are not limited to these, and other types of metallic materials may be included and are not specifically limited herein. Hereinafter, for illustrative purposes, embodiments of this application will be described using the case in which the isolation wall 420 is made of aluminum and the barrier portion 430 is made of titanium as an example.

[0069] After forming the metallic aluminum layer of the isolation wall 420 and the metallic titanium layer of the barrier portion 430, and before forming the isolation wall 420 and the barrier portion 430, dry etching is first performed on the metallic aluminum layer and the metallic titanium layer, followed by wet etching, thereby forming an isolation structure 400 with a larger shape on top and a smaller shape on the bottom. By designing the edge of the first electrode 200 to extend within the coverage area of ​​the barrier portion 430, the influence of the undulations of the metallic aluminum layer and the metallic titanium layer on dry etching can be reduced, thereby improving the dry etching effect.

[0070] Selectively, the orthographic projection of the third groove 421 on the substrate 100 at least partially overlaps with the orthographic projection of the first gap 210 on the substrate 100. Selectively, the orthographic projection of the third groove 421 on the substrate 100 at least partially deviates from the orthographic projection of the first electrode 200 on the substrate 100.

[0071] In the display panel 10 according to the embodiment of this application, at least a portion of the first insulating layer 300 is located within the first gap 210, so that the first insulating layer 300 has a first groove 320 formed on the side away from the substrate 100; at least a portion of the isolation wall 420 is located within the first groove 320, so that the isolation wall 420 has a third groove 421 formed on the side away from the substrate 100; and at least a portion of the barrier portion 430 is located within the third groove 421, so that the barrier portion 430 has a second groove 410 formed on the side away from the substrate 100.

[0072] In several other selectable embodiments, as shown in Figure 3, at least a portion of the orthographic projection of the first edge region 220 on the substrate 100 is deviated from the orthographic projection of the isolation wall 420 on the substrate 100. Figure 3 shows the edge of the first edge region 220 as a dashed line.

[0073] In these selectable embodiments, the distribution area of ​​the first electrode 200 is small, and at least a portion of the first edge region 220 does not extend below the isolation wall 420, thereby improving the influence of the first edge region 220 on the flatness of the isolation wall 420.

[0074] Selectively, the orthographic projection of the first edge region 220 on the substrate 100 is offset from the orthographic projection of the isolation wall 420 on the substrate 100, that is, the first electrode 200 does not extend at all below the isolation wall 420, and the first electrode 200 does not affect the flatness of the isolation wall 420 at all.

[0075] Selectively, as shown in Figure 3, the orthographic projection of the first electrode 200 on the substrate 100 is located within the orthographic projection of the isolation aperture 460 on the substrate 100. In this way, the first electrode 200 can be driven to cause the light-emitting function unit 510 within the isolation aperture 460 to emit light.

[0076] As described above, the display panel 10 further comprises a first insulating layer 300, and the isolation structure 400 is provided on the side of the first insulating layer 300 away from the substrate 100. Optionally, a first groove 320 is provided on the side of the first insulating layer 300 away from the substrate 100, and the orthographic projection of the first groove 320 on the substrate 100 is offset from the orthographic projection of the first electrode 200 on the substrate 100.

[0077] Selectively, the orthographic projection of the isolation wall 420 between adjacent subpixels on the substrate 100 is located within the orthographic projection of the first groove 320 on the substrate 100.

[0078] In these selectable embodiments, since there is a gap between adjacent first electrodes 200, a first groove 320 is formed in the first insulating layer 300, and the orthographic projection of the isolation wall 420 on the substrate 100 lies within the orthographic projection of the first groove 320 on the substrate 100, so that the edge of the first groove 320 does not significantly affect the flatness of the first side surface of the isolation wall 420.

[0079] In several selectable embodiments, as shown in Figure 3, the substrate 100 includes a pixel circuit 110 and a first via hole 120 located between the pixel circuit 110 and the first electrode 200, the pixel circuit 110 and the first electrode 200 being electrically connected via the first via hole 120, and the orthographic projection of the first via hole 120 in the plane on which the substrate 100 is located is offset from the orthographic projection of the isolation wall 420 in the plane on which the substrate 100 is located. This improves the effect of the presence of the first via hole 120 on the flatness of the isolation wall 420 and improves the overlap yield between the second electrode 600 and the isolation wall 420.

[0080] In several selectable embodiments, as shown in Figure 7, in the thickness direction Z of the substrate 100, the substrate 100 includes a pixel circuit 110 and a first via hole 120 located between the pixel circuit 110 and the first electrode 200, wherein the orthographic projection of the first via hole 120 in the plane on which the substrate 100 is located lies within the range of the orthographic projection of the isolation wall 420 in the plane on which the substrate 100 is located, and the orthographic projection of the first via hole 120 on the substrate 100 is offset from the orthographic projection of the first side surface 470 on the substrate 100. In this way, the first via hole 120 is less likely to affect the flatness of the first side surface 470, and the overlap yield between the second electrode 600 and the first side surface 470 is improved.

[0081] In some selectable embodiments, as shown in Figure 8, the display panel 10 further comprises an auxiliary electrode 30 electrically connected to the first electrode 200 to supply an electrical signal to the first electrode 200. For example, the auxiliary electrode 30 and the pixel circuit 110 are electrically connected via the first via hole 120. In this embodiment, a voltage signal is transmitted to the first electrode 200 via the auxiliary electrode 30 by providing an auxiliary electrode 30 that overlaps the first electrode 200.

[0082] As selectable, the auxiliary electrode 30 is positioned on the side of the first electrode 200 away from the substrate 100, as shown in Figures 8 to 10. In this way, the auxiliary electrode 30 can protect the first electrode 200 from damage during the manufacturing process of the auxiliary electrode 30 by covering it, which is advantageous for improving the integrity of the first electrode 200.

[0083] As selectable, as shown in Figure 11, the auxiliary electrode 30 may be connected in contact with the outer circumferential surface of the first electrode 200, or for example, the auxiliary electrode 30 may be connected in contact with the first side wall 250, that is, the auxiliary electrode 30 may not cover the first top surface 230, but rather be connected in contact with the first side wall 250, thereby improving the effect of providing the auxiliary electrode 30 on the flatness of the film layer.

[0084] As optional, as shown in Figure 8, the orthographic projection of the auxiliary electrode 30 on the substrate 100 covers the orthographic projection of the first electrode 200 on the substrate 100. The auxiliary electrode 30 may be exposed through the isolation opening 460. This configuration reduces the number of mask reticles, reduces the number of etching cycles, and simplifies the process. Alternatively, as shown in Figures 9 and 10, the auxiliary electrode 30 may cover a portion of the first electrode 200, thereby reducing the distribution area of ​​the auxiliary electrode 30 and improving the large film layer step caused by the presence of the auxiliary electrode 30.

[0085] Selectively, as shown in Figures 8 and 12, the orthographic projection of the auxiliary electrode 30 on the substrate 100 partially overlaps with the orthographic projection of the isolation wall 420 on the substrate 100 and covers the first via hole 120. In this way, the auxiliary electrode 30 extends below the isolation structure 400 and is electrically connected to the pixel circuit 110 below the isolation structure 400 via the first via hole 120.

[0086] Selectively, in the thickness direction Z of the display panel 10, the thickness of the auxiliary electrode 30 is smaller than the thickness of the first electrode 200. When the auxiliary electrode 30 is connected to the pixel circuit 110, even if the auxiliary electrode 30 is located below the isolation structure 400, because the thickness of the auxiliary electrode 30 is smaller than the thickness of the first electrode 200, the auxiliary electrode 30 has little effect on the flatness of the upper surface of the insulating layer, and the flatness of the isolation structure 400 can be improved compared to the configuration of the conventional technology.

[0087] Optionally, as shown in Figures 13 to 15, the isolation structure 400 has an isolation opening 460 and a light-transmitting hole 480 spaced apart, and the display panel 10 is installed on the same layer as the auxiliary electrode 30 and further includes a transparent conductive connector 31 connected to the isolation structure 400 surrounding the light-transmitting hole 480. Optionally, the isolation structure 400 may be made of a conductive material and may supply voltage to the transparent conductive connector 31, thereby the transparent conductive connector 31 acting as a shield to prevent problems such as touch and display defects due to interference between touch signals in the upper layer and drive signals in the lower layer. Optionally, by providing the transparent conductive connector 31 on the same layer as the auxiliary electrode 30 at a distance, the number of film layers is reduced, which is advantageous for thinning the display panel 10. However, both the transparent conductive connector 31 and the auxiliary electrode 30 are made of indium tin oxide.

[0088] The transparent conductive connector 31 is optionally provided at a distance from the auxiliary electrode 30, and the orthographic projection of the transparent conductive connector 31 on the substrate 100 covers the orthographic projection of the light-transmitting hole 480 on the substrate 100. In this way, the shielding effect of the transparent conductive connector 31 is improved.

[0089] The first electrode 200 is optionally provided at a distance from the transparent conductive connection portion 31. In this way, the short-circuit connection between the first electrode 200 and the transparent conductive portion 270 is improved, and the short-circuit connection between the first electrode 200 and the isolation structure 400 is also improved.

[0090] The thickness of the auxiliary electrode 30 can be selected to be between 0.01 μm and 0.1 μm. In this way, the influence of the auxiliary electrode 30 on the flatness of the film layer, which is caused by the auxiliary electrode 30 being too thick, can be improved, and the influence on the connection between the first electrode 200 and the pixel circuit 110, which is caused by the auxiliary electrode 30 being too thin, can also be improved.

[0091] Optionally, the isolation structure 400 further includes a barrier portion 430 provided on the side of the isolation wall 420 away from the substrate 100, such that the orthographic projection of the isolation wall 420 on the substrate 100 lies within the orthographic projection of the barrier portion 430 on the substrate 100. In this way, the lower part of the barrier portion 430 can be formed as a recess, which facilitates cutting the light-emitting material at this location to form independent light-emitting functional portions 510, thereby simplifying the manufacturing of the display surface.

[0092] Selectively, as shown in Figure 9, the orthographic projection of at least a portion of the first edge region 220 on the substrate 100 is offset from the orthographic projection of the isolation structure 400 on the substrate 100. That is, at least a portion of the first edge region 220 does not extend below the isolation structure 400. Selectively, the orthographic projection of the first edge region 220 on the substrate 100 is located, for example, within the orthographic projection of the isolation opening 460 on the substrate 100, and the orthographic projection of the first edge region 220 on the substrate 100 is offset from the orthographic projection of the isolation structure 400 on the substrate 100.

[0093] Selectively, the display panel 10 further includes a first insulating layer 300 located on one side of the substrate 100, and the isolation structure 400 is provided on the side of the first insulating layer 300 away from the substrate 100, and the first insulating layer 300 includes a pixel limiting portion 350 and a pixel aperture 310 surrounded by the pixel limiting portion 350, and the orthographic projection of the pixel aperture 310 on the substrate 100 at least partially overlaps with the orthographic projection of the first electrode 200 on the substrate 100, so that the first electrode 200 can be electrically connected to the light-emitting function portion 510 in the pixel aperture 310. Region aa, as shown in Figure 8, is the region where the pixel aperture 310 is located. bb is the region where the isolation aperture 460 is located.

[0094] Selectively, the width of a portion of the pixel limiting area located between two adjacent pixel apertures 310 is 8 μm or more. In this way, the pixel limiting area 350 has a sufficiently large size to prevent phenomena such as color mixing and color unevenness.

[0095] Selectively, as described above, the display panel 10 further includes a light-emitting function unit 510, at least a portion of which is located in an isolation opening 460, and a second electrode 600 located on the side of the light-emitting function unit 510 away from the substrate 100, wherein the material of the isolation structure 400 includes a conductive material, and the second electrode 600 and the isolation wall 420 are electrically connected to each other. In this way, a plurality of second electrodes 600 are connected via the isolation wall 420 to form surface electrodes.

[0096] In some selectable embodiments, the distance between two adjacent first electrodes 200 is 5 μm or more.

[0097] In the display panel 10 according to this embodiment, the distance between two adjacent first electrodes 200 is 5 μm or more, thereby reducing the probability that adjacent first electrodes 200 will be connected as a single unit during the manufacturing process, and further reducing the difficulty of manufacturing the first gap 210.

[0098] Referring together to Figures 1 to 16, an embodiment of the first aspect of the present application further provides a display panel 10 comprising a substrate 100, a first electrode 200, an insulating layer, and an isolation structure 400, wherein the first electrode 200 is located on one side of the substrate 100, the insulating layer is located on the side of the first electrode 200 away from the substrate 100 and surrounds it to form a pixel aperture 310, at least a portion of the first electrode 200 is exposed from the pixel aperture 310, and the isolation structure 400 is provided on the side of the insulating layer away from the substrate 100. The isolation structure 400 includes an isolation wall 420 having a first surface 422 away from the substrate 100 and a second surface 423 toward the substrate 100, wherein the isolation wall 420 further includes a first side surface 470 connecting the first surface 422 and the second surface 423, and the surface of the insulating layer away from the substrate 100 comprises a flat region 302, and the orthographic projection of the first side surface 470 on the substrate 100 lies within the orthographic projection of the flat region 302 on the substrate 100.

[0099] In the display panel 10 according to this application, at least a portion of the first electrode 200 is exposed from the pixel aperture 310, so that the first electrode 200 can drive the plurality of light-emitting functional units 510 of the display panel 10 to emit light. The isolation structure 400 and the first electrode 200 are provided on the same side of the substrate 100, the isolation structure 400 is provided on the side of the insulating layer away from the substrate 100, and the flatness of the surface of the insulating layer affects the shape of the isolation structure 400. The surface of the insulating layer away from the substrate 100 includes a flat region 302, the surface within the flat region 302 is flat, and the orthographic projection of the first side surface 470 on the substrate 100 is located within the orthographic projection of the flat region 302 on the substrate 100, so that the first side surface 470 is positioned correspondingly on the flat region 302, thereby improving the flatness of the first side surface 470, facilitating the overlap of subsequent film layers, and improving the yield of the display panel 10.

[0100] Selectively, the flat region 302 may be a region with a low coefficient of friction on the surface of the insulating layer away from the substrate 100, or it may be a flat region on the surface of the insulating layer away from the substrate 100, or the flat region 302 may be a region in which the insulating layer does not overlap with the edge of the film layer located beneath it, thereby preventing large steps from being formed in the flat region 302 due to steps at the edges of other film layers. Selectively, the difference in distance from any two points in the flat region 302 to the substrate 100 is less than or equal to a preset threshold, which may be, for example, 1 μm, 0.1 μm, 0.01 μm, etc., and can be determined by the user according to their actual usage needs.

[0101] In some selectable embodiments, as shown in Figure 16, the insulating layer includes a first insulating layer 300 and a second insulating layer 301 located in the gap between two adjacent first electrodes 200, wherein the distance along the thickness direction Z of the display panel 10 between the side of the second insulating layer 301 away from the substrate 100 and the substrate 100 is equal to the distance along the thickness direction Z of the display panel 10 between the side of the first electrodes 200 away from the substrate 100 and the substrate 100, the first insulating layer 300 is located on the side of the second insulating layer 301 away from the substrate 100 and covers at least a portion of the second insulating layer 301 and the first electrodes 200, and the side of the first insulating layer 300 away from the substrate 100 constitutes a flat region 302.

[0102] In these selectable embodiments, the second insulating layer 301 may be filled into the first gap 210 between adjacent first electrodes 200 to improve the step caused by providing the first electrodes 200. The first insulating layer 300 is provided on a flat surface so as to cover the second insulating layer 301 and the first electrodes 200, thereby improving the flatness of the surface of the first insulating layer 300 and improving the flatness of the isolation structure 400 provided on the first insulating layer 300.

[0103] Alternatively, in some other embodiments, as shown in Figures 17 and 18, the surface of the first insulating layer 300 away from the substrate 100 includes a first region 303 and a second region 304, the first region 303 forms a first groove 320, the orthographic projection of the first groove 320 on the substrate 100 is offset from the orthographic projection of the first electrode 200 on the substrate 100, the second insulating layer 301 is located within the first groove 320, the distance along the thickness direction Z of the display panel 10 between the surface of the second insulating layer 301 away from the substrate 100 and the substrate 100 is equal to the distance along the thickness direction Z of the display panel 10 between the second region 304 and the substrate 100, and the second region 304 and the surface of the second insulating layer 301 away from the substrate 100 constitute a flat region 302.

[0104] In these selectable embodiments, the presence of the first electrode 200 fills at least a portion of the first insulating layer 300 into the first gap 210 between adjacent first electrodes 200, thereby forming a first groove 320 in the first insulating layer 300, into which the second insulating layer 301 is filled, thereby improving the flatness of the surface of the insulating layer and improving the flatness of the isolation structure 400 provided on the first insulating layer 300.

[0105] In several selectable embodiments, the insulating layer includes a first insulating layer 300 having a first groove 320 on the side away from the substrate 100, wherein the orthographic projection of the first groove 320 on the substrate 100 is offset from the orthographic projection of the first electrode 200 on the substrate 100. Due to the presence of the first electrode 200, at least a portion of the first insulating layer 300 is filled into a first gap 210 between adjacent first electrodes 200, thereby forming a first groove 320 in the first insulating layer 300 that is offset from the first electrode 200.

[0106] In several selectable embodiments, as shown in Figure 5, the orthographic projection of the flat region 302 on the substrate 100 is offset from the orthographic projection of the first groove 320 on the substrate 100, or as shown in Figure 3, the orthographic projection of the flat region 302 on the substrate 100 is located within the orthographic range of the bottom of the first groove 320 on the substrate 100. That is, the flat region 302 is outside the first groove 320, offset from the first groove 320, and is flat with no significant steps. Alternatively, the flat region 302 is located within the first groove 320, and does not cross any steps at the edges of the first groove 320, thereby improving the flatness of the flat region 302 and further ensuring the flatness of the first side surface of the isolation wall.

[0107] In several selectable embodiments, the first electrode 200 includes a first edge region 220 in which the orthographic projection on the substrate 100 is offset from the area of ​​the flat region 302. In this way, the influence of the step of the first edge region 220 on the flatness of the flat region 302 is improved, and the influence on the flatness of the first side surface of the isolation wall is reduced, thereby reducing the overlap defect rate between the subsequent film layer and the first side surface of the isolation wall.

[0108] In several selectable embodiments, the orthographic projection of at least a portion of the first edge region 220 on the substrate 100 is offset from the orthographic projection of the first side surface 470 on the substrate 100. In this way, the effect of the step in the first edge region 220 on the flatness of the first side surface 470 can be improved.

[0109] In several selectable embodiments, as shown in Figures 4-6, at least a portion of the orthographic projection of the first edge region 220 on the substrate 100 lies within the orthographic projection of the substrate 100 of the first surface 422 and the second surface 423, whichever has the smaller area of ​​the orthographic projection on the substrate 100, or, as shown in Figure 3, at least a portion of the orthographic projection of the first edge region 220 on the substrate 100 is offset from the orthographic projection of the isolation wall 420 on the substrate 100. That is, the first edge region 220 may extend below the isolation wall 420 so as to be offset from the first side surface 470, or the first edge region 220 may extend outside the isolation wall 420 so as to be offset from the first side surface 470, and the first side surface 470 may be located in a flat area.

[0110] As shown in Figure 3 or Figure 16, an embodiment of the first aspect of the present application further provides a display panel 10 including a substrate 100, a first electrode 200, and an isolation structure 400. The substrate 100 includes a pixel circuit 110 and a first via hole 120. The first electrode 200 is located on one side of the substrate 100 such that it is on the side of the first via hole 120 away from the pixel circuit 110, and is connected to the first electrode 200 via the first via hole 120. The isolation structure 400 is provided on one side of the substrate 100 such that it is on the same side of the substrate 100 as the first electrode 200, and is surrounded by the isolation structure 400 to form a plurality of isolation openings 460. The isolation structure 400 is insulated from the first electrode 200, and at least a portion of the first electrode 200 is exposed through the isolation openings 460. The isolation structure 400 includes an isolation wall 420, and the orthographic projection of the first via hole 120 on the substrate 100 is misaligned with the orthographic projection of the isolation wall 420 on the substrate 100. In this way, the influence of providing the first via hole 120 on the flatness of the isolation structure 400 is improved.

[0111] Embodiments of a second aspect of this application further provide a display device including a display panel according to any of the above embodiments. Since the display device according to the second aspect of this application includes a display panel according to the above embodiments, the display device according to the second aspect of this application achieves the beneficial effects of the display panel according to any of the above embodiments, which are not repeated herein.

[0112] The display devices in the embodiments of this application include, but are not limited to, devices with display functions such as mobile phones, personal digital assistants (abbreviated as PDAs), tablet computers, e-readers, televisions, door access devices, smart landline phones, and consoles. The display devices may be not only the mobile phones shown in Figure 1, but also tablets, mobile phones, watches, wearable devices, and electronic devices such as in-car displays, camera displays, televisions, and computer screens.

[0113] The above are merely specific embodiments of the present application, and for the sake of convenience and simplicity, it will be obvious to those skilled in the art that the specific operating processes of the systems, modules, and units described above can be found by referring to the corresponding processes in the embodiments of the above methods, and this will not be repeated herein. It should be understood that the scope of protection of this application is not limited thereto, and those skilled in the art will readily conceive of various equivalent modifications or alterations within the technical scope disclosed herein, all of which should fall within the scope of protection of this application.

Claims

1. It comprises a substrate, a first electrode, and an isolation structure. On one side of the substrate, a plurality of the first electrodes are arranged in an array, and the first electrodes have the first edge region. The isolation structure is provided on one side of the substrate so as to be located on the same side as the first electrode with respect to the substrate, and surrounds a plurality of isolation openings, the isolation structure is insulated from the first electrode, and at least a portion of the first electrode is exposed through the isolation openings. The isolation structure includes an isolation wall having a first surface away from the substrate and a second surface facing the substrate in the thickness direction of the display panel, wherein the isolation wall further includes a first side surface connecting the first surface and the second surface, and the orthographic projection of at least a portion of the first edge region on the substrate is offset from the orthographic projection of the first side surface on the substrate.

2. The display panel according to claim 1, characterized in that the first surface and the second surface have different orthographic projection areas on the substrate, and at least a portion of the orthographic projection of the first edge region on the substrate is located within the orthographic projection of the substrate which has the smaller orthographic projection area among the first surface and the second surface.

3. The display panel according to claim 2, characterized in that the orthographic projection of the first surface on the substrate lies within the orthographic projection of the second surface on the substrate, and at least a portion of the orthographic projection of the first edge region on the substrate lies within the orthographic projection of the first surface on the substrate.

4. The display panel according to claim 3, characterized in that the first side surface is inclined toward the direction away from the isolation opening as it moves away from the substrate.

5. The display panel according to claim 3, characterized in that the orthographic projection of the first edge region on the substrate lies within the orthographic projection of the first surface on the substrate, or a portion of the orthographic projection of the first edge region on the substrate lies within the orthographic projection of the first surface on the substrate, and the other portion is offset from the orthographic projection of the second surface on the substrate.

6. The orthographic projection of the second surface on the substrate is located within the orthographic projection of the first surface on the substrate. The display panel according to claim 2, characterized in that at least a portion of the orthographic projection of the first edge region on the substrate lies within the range of the orthographic projection of the second surface on the substrate.

7. The display panel according to claim 6, characterized in that the first side surface is inclined toward the isolation opening as it moves away from the substrate.

8. The first electrode further comprises a first insulating layer provided on the side of the first electrode away from the substrate and filling the space between adjacent first electrodes, The display panel according to claim 2, characterized in that the isolation structure is provided on the side of the first insulating layer away from the substrate, a first groove is provided on the side of the first insulating layer away from the substrate, and the orthographic projection of the first groove on the substrate is offset from the orthographic projection of the first electrode on the substrate.

9. The display panel according to claim 8, characterized in that the orthographic projection of the first groove on the substrate is located within the orthographic projection area of ​​the substrate which is smaller than the first surface and the second surface, and a part of the isolation wall is located within the first groove.

10. A third groove is provided on the side of the isolation wall that is away from the substrate. The orthographic projection of the third groove on the substrate at least partially overlaps with the orthographic projection of the first groove on the substrate. The display panel according to claim 9, characterized in that and / or, the orthographic projection of the third groove on the substrate is at least partially offset from the orthographic projection of the first electrode on the substrate.

11. The isolation structure further comprises a barrier portion provided on the side of the isolation wall away from the substrate, The display panel according to claim 10, characterized in that the orthographic projection of the isolation wall on the substrate lies within the orthographic projection of the barrier portion on the substrate, at least a portion of the barrier portion lies within the third groove, a second groove is provided on the side of the barrier portion away from the isolation wall, and the orthographic projection of the second groove on the substrate at least partially overlaps with the orthographic projection of the third groove on the substrate.

12. The display panel according to claim 1, characterized in that the orthographic projection of the first edge region on the substrate is offset from the orthographic projection of the isolation wall on the substrate.

13. The display panel according to claim 12, characterized in that the orthographic projection of the first electrode on the substrate is located within the orthographic projection of the isolation aperture on the substrate.

14. The display panel according to claim 12, further comprising a first insulating layer provided on the side of the first electrode away from the substrate, wherein the isolation structure is provided on the side of the first insulating layer away from the substrate, a first groove is provided on the side of the first insulating layer away from the substrate, and the orthographic projection of the first groove on the substrate is offset from the orthographic projection of the first electrode on the substrate.

15. The display panel according to claim 14, characterized in that the orthographic projection of the isolation wall located between adjacent subpixels on the substrate is located within the range of the orthographic projection of the first groove on the array substrate.

16. The display panel according to claim 12, wherein the substrate includes a pixel circuit and a first via hole located between the pixel circuit and the first electrode, the pixel circuit and the first electrode are electrically connected via the first via hole, and the orthographic projection of the first via hole in the plane on which the substrate is located is offset from the orthographic projection of the isolation wall in the plane on which the substrate is located.

17. The display panel according to claim 12, wherein the substrate includes a pixel circuit and a first via hole located between the pixel circuit and the first electrode in the thickness direction of the substrate, the orthographic projection of the first via hole in the plane on which the substrate is located is located within the orthographic range of the isolation wall in the plane on which the substrate is located, and the orthographic projection of the first via hole on the substrate is offset from the orthographic projection of the first side surface on the substrate.

18. The display panel further comprises an auxiliary electrode that is electrically connected to the first electrode and electrically connected to the pixel circuit via the first via hole. The auxiliary electrode is located on the side of the first electrode away from the substrate, The display panel according to claim 17, characterized in that the auxiliary electrode is connected in contact with the outer circumferential surface of the first electrode, and / or.

19. The orthographic projection of the auxiliary electrode on the substrate partially overlaps with the orthographic projection of the isolation wall on the substrate and covers the first via hole. and / or, the thickness of the auxiliary electrode is smaller than the thickness of the first electrode in the thickness direction of the display panel. The display panel according to claim 18, characterized in that the thickness of the auxiliary electrode is 0.01 μm to 0.1 μm.

20. The display panel according to claim 18, wherein the isolation structure has a light-transmitting hole provided at a distance from the isolation opening, the display panel further includes a transparent conductive connecting portion provided at a distance from the auxiliary electrode in the same layer, the transparent conductive connecting portion is connected to the isolation structure surrounding the light-transmitting hole, and the orthographic projection of the transparent conductive connecting portion on the substrate covers the orthographic projection of the light-transmitting hole on the substrate.

21. The display panel according to claim 1, characterized in that the isolation structure further includes a barrier portion provided on the side of the isolation wall away from the substrate, and the orthographic projection of the isolation wall on the substrate is located within the orthographic projection of the barrier portion on the substrate.

22. The display panel according to claim 1, further comprising a first insulating layer provided on the side of the first electrode away from the substrate, wherein the isolation structure is provided on the side of the first insulating layer away from the substrate, the first insulating layer includes a pixel limiting portion, the pixel limiting portion surrounds and forms a pixel aperture, and the orthographic projection of the pixel aperture on the substrate at least partially overlaps with the orthographic projection of the first electrode on the substrate.

23. The present invention further comprises a light-emitting function unit, at least a portion of which is located in the isolation opening, and a second electrode located on the side of the light-emitting function unit away from the substrate, The display panel according to claim 1, characterized in that the material of the isolation structure includes a conductive material, and the second electrode and the isolation wall are electrically connected to each other.

24. circuit board and A first electrode located on one side of the substrate, An insulating layer located on the side of the first electrode away from the substrate, surrounding it to form a pixel aperture, and exposing at least a portion of the first electrode from the pixel aperture, The insulating layer comprises an isolation structure provided on the side of the insulating layer away from the substrate, The isolation structure includes an isolation wall having a first surface away from the substrate and a second surface facing the substrate, the isolation wall further includes a first side surface connecting the first surface and the second surface, the surface of the insulating layer away from the substrate includes a flat region, and the orthographic projection of the first side surface on the substrate lies within the orthographic projection of the flat region on the substrate, characterized in that the display panel.

25. The insulating layer includes a first insulating layer and a second insulating layer. The second insulating layer is located in the gap between two adjacent first electrodes, and the distance along the thickness direction of the display panel between the surface of the second insulating layer away from the substrate and the substrate is equal to the distance along the thickness direction of the display panel between the surface of the first electrode away from the substrate and the substrate, the first insulating layer is located on the side of the second insulating layer away from the substrate and covers at least a portion of the second insulating layer and the first electrodes, and the surface of the first insulating layer away from the substrate constitutes the flat region. Alternatively, the display panel according to 24, wherein the surface of the first insulating layer away from the substrate includes a first region and a second region, the first region forms a first groove, the orthographic projection of the first groove on the substrate is offset from the orthographic projection of the first electrode on the substrate, the second insulating layer is located within the first groove, the distance between the surface of the second insulating layer away from the substrate and the substrate along the thickness direction of the display panel is equal to the distance between the second region and the substrate along the thickness direction of the display panel, and the second region and the surface of the second insulating layer away from the substrate constitute the flat region.

26. The display panel according to claim 24, characterized in that the insulating layer includes a first insulating layer, a first groove is provided on the side of the first insulating layer away from the substrate, and the orthographic projection of the first groove on the substrate is offset from the orthographic projection of the first electrode on the substrate.

27. The display panel according to claim 26, characterized in that the orthographic projection of the flat region on the substrate is offset from the orthographic projection of the first groove on the substrate, or the orthographic projection of the flat region on the substrate is located within the orthographic projection range of the bottom of the first groove on the substrate.

28. The display panel according to claim 26, characterized in that the first electrode includes a first edge region, and the orthographic projection of the first edge region on the substrate is offset from the flat region.

29. The display panel according to claim 28, characterized in that the orthographic projection of at least a portion of the first edge region on the substrate is offset from the orthographic projection of the first side surface on the substrate.

30. At least a portion of the orthographic projection of the first edge region on the substrate is located within the orthographic projection of the substrate which has a smaller area than the first surface and the second surface. Alternatively, the display panel according to claim 29, characterized in that at least a portion of the orthographic projection of the first edge region on the substrate is offset from the orthographic projection of the isolation wall on the substrate.

31. A substrate including a pixel circuit and a first via, A first electrode is located on one side of the substrate such that it is positioned away from the pixel circuit of the first via hole, and is electrically connected to the pixel circuit via the first via hole. An isolation structure provided on one side of the substrate so as to be on the same side as the first electrode with respect to the substrate, and surrounding and forming a plurality of isolation openings, wherein the isolation structure is insulated from the first electrode and at least a portion of the first electrode is exposed through the isolation openings, A display panel characterized in that the isolation structure includes an isolation wall, and the orthographic projection of the first via hole on the substrate is offset from the orthographic projection of the isolation wall on the substrate.

32. A display device characterized by comprising a display panel according to any one of claims 1 to 32.

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