Element manufacturing method and wafer cutting device
By forming a concave groove in the wafer and using image correction, the method addresses the challenge of reduced accuracy in cutting elements with sides near the wafer thickness, enhancing both accuracy and cutting efficiency.
Patent Information
- Application Number
- JP2021005192
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- Filing Date
- 2021-01-15
- Publication Date
- 2025-03-18
- Estimated Expiration
- 2041-01-15
AI Technical Summary
The accuracy of correcting the feed amount of a rotating blade in cutting elements from a wafer is reduced when the length of one side of the cutting element is less than or equal to the thickness of the wafer, leading to potential blade instability and changes in the gap between the cut-out and uncut elements.
A method where the rotating blade forms a concave groove in the wafer intersecting the direction of one side of the element, images this groove, and corrects the feed amount based on the captured image to improve accuracy and stability.
This method enhances the accuracy of blade feed correction and improves cutting efficiency by stabilizing the blade and maintaining consistent gap measurements, even when the element's side length is near or below the wafer thickness.