structural members

By controlling the planar surface shape of substrates with a slope of 0.0050 or less through Fourier transform, the protective films on structural members achieve enhanced particle resistance, addressing the issue of film deterioration and particle generation in semiconductor manufacturing.

JP7747237B1Active Publication Date: 2025-10-01TOTO LTD
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Patent Information

Application Number
JP2025013266
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Priority Date
2024-03-28
Filing Date
2025-01-29
Publication Date
2025-10-01
Estimated Expiration
2045-01-29

AI Technical Summary

Technical Problem

Existing protective films on structural members in semiconductor manufacturing equipment deteriorate and generate large particles when exposed to plasma, leading to process disruptions, despite efforts to form dense, particle-resistant films that are thin and influenced by substrate surface shape.

Method used

Control the surface shape of the substrate using a new index in the planar direction, represented by the average slope of a Fourier transform of the surface shape, to ensure a slope of 0.0050 or less, even if the arithmetic mean roughness exceeds 0.15 μm, thereby enhancing particle resistance.

Benefits of technology

This approach results in a structural member with a protective film that exhibits excellent particle resistance, simplifying surface treatment and improving productivity while maintaining film integrity.

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Abstract

To provide a structural member provided with a protective film having excellent particle resistance. [Solution] A structural member (10) comprises a substrate (100) and a protective film (200) covering a surface (S1) of the substrate (100). When a cross section of the substrate (100) cut perpendicularly to its surface (S1) is taken as a cut surface, the shape of the line on the cut surface corresponding to the surface (S1) of the substrate (100) is taken as a surface shape, a function representing the surface shape is subjected to a Fourier transform, and the transformed function is plotted as a graph with wavelength (μm) as the horizontal axis, the average slope of the graph in the wavelength range of 30 μm or less is 0.0050 or less.
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