Film-forming composition and method for manufacturing semiconductor substrate
A film-forming composition with aromatic compounds and solvents forms a capping film to address surface roughness issues during annealing, enhancing the quality of semiconductor substrates for future high-performance devices.
JP7881997B2Active Publication Date: 2026-06-30JSR CORPORATION
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- JSR CORPORATION
- Filing Date
- 2022-06-07
- Publication Date
- 2026-06-30
AI Technical Summary
Technical Problem
Existing semiconductor manufacturing processes face challenges in suppressing surface roughness during high-temperature annealing, which affects the reliability and performance of semiconductor devices, particularly for wide-bandgap materials like silicon carbide and gallium nitride.
Method used
A film-forming composition containing compounds with aromatic rings and specific solvents is used to create a capping film during the annealing process, ensuring high flatness and quality of the semiconductor substrate surface.
Benefits of technology
The composition enables the formation of a capping film that imparts high flatness to the substrate surface during high-temperature annealing, resulting in high-quality semiconductor substrates suitable for advanced semiconductor devices.
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Abstract
To provide a film-forming composition capable of forming a capping film that can impart high flatness to a substrate surface during high-temperature annealing, and a method of manufacturing a semiconductor substrate using the same.SOLUTION: A film-forming composition for forming a capping film in an annealing process after an ion implantation process into a substrate in the manufacture of a semiconductor substrate includes a compound having an aromatic ring and a solvent, and the compound having an aromatic ring is a polymer having an aromatic ring in the main chain, an aromatic ring-containing compound having a molecular weight of 600 or more and 3000 or less, or a combination thereof.SELECTED DRAWING: None
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