Ion production system with a mass resolving aperture having a scatter recess
The use of a mass resolving aperture with a scatter recess and a carbon-based collection system in ion beam technologies addresses the inefficiency in collecting ions as a solid material, achieving high-purity and efficient ion collection for healthcare and other applications.
Patent Information
- Application Number
- PCT/US2024/046578
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2023-09-14
- Filing Date
- 2024-09-13
- Publication Date
- 2025-03-20
AI Technical Summary
Existing ion beam technologies do not efficiently collect and reconstitute ions for use in applications such as healthcare, as they primarily focus on high-energy collisions rather than the collection of ions as a solid material.
The implementation of a mass resolving aperture with a scatter recess, which separates and obstructs secondary beam portions while allowing target beam portions to pass through, combined with a magnetic analyzer and a collection target made of carbon material, to efficiently collect and reconstitute ions.
This approach enables high-efficiency collection of target isotopes with high purity, improving the efficiency of the ion production system and allowing the collected ions to be reconstituted as a material for various applications.