Substrate processing device and substrate processing method

Abstract

A technology disclosed in the description of the present application relates to suppressing damage to an electrolytic cell in substrate processing. A substrate processing device related to the technology disclosed in the description of the present application comprises: a substrate processing unit; a supply tank; a generation unit; a recovery unit; a first supply path for supplying, to the supply tank, a processing liquid generated by the generation unit; and a second supply path for supplying, to the recovery unit, the processing liquid generated by the generation unit. The recovery unit supplies, to the generation unit, a post-processing liquid obtained after mixing of the processing liquid which has been supplied through the second supply path.