Composition and kit, and method for removing resist and method for manufacturing electronic substrate each using these

WO2025063222A1 Publication Date: 2025-03-27MITSUBISHI GAS CHEM CO INC
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Patent Information

Application Number
PCT/JP2024/033398
Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
Priority Date
2023-09-21
Filing Date
2024-09-19
Publication Date
2025-03-27
Patent Text Reader

Abstract

The present invention provides a composition and the like capable of suppressing oxidation of copper wiring after resist removal. This composition contains a basic compound, and a copper surface protective agent that contains at least one substance which is selected from the group consisting of an ammonium salt represented by formula (1), a heteroaryl salt that has a substituted or unsubstituted alkyl group having 5 to 30 carbon atoms, and a substituted or unsubstituted thiol having 5 to 30 carbon atoms. The composition has a pH of 13 or more. In formula (1), R1 represents a substituted or unsubstituted alkyl group having 5 to 30 carbon atoms, a substituted or unsubstituted alkyl (poly)heteroalkylene group having 5 to 30 carbon atoms, or a substituted or unsubstituted aryl (poly)heteroalkylene group having 7 to 30 carbon atoms; each R2 independently represents a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms or a substituted or unsubstituted aryl group having 6 to 30 carbon atoms; and X represents a halide ion, a hydroxide ion, an organic sulfonate ion, a tetrafluoroborate anion, or a hexafluorophosphate anion.
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