Multi-phase interferometer for 3D metrology

The multi-phase interferometer system addresses the inefficiencies of traditional interferometry methods by using multiple detectors with preset phase shifts to calculate interferogram envelopes, resulting in faster and more precise 3D metrology measurements.

WO2025068813A1 Publication Date: 2025-04-03ORBOTECH LTD
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Patent Information

Application Number
PCT/IB2024/058856
Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
Priority Date
2023-09-28
Filing Date
2024-09-12
Publication Date
2025-04-03

AI Technical Summary

Technical Problem

Existing interferometry methods for 3D metrology are time-consuming and reduce system throughput due to the need for hundreds of thousands of measurements per scan to achieve accurate measurement resolution.

Method used

A multi-phase interferometer system that uses a processor to calculate an interferogram envelope based on intensities measured by multiple detectors with preset phase shifts, allowing for reduced measurement points and increased throughput.

Benefits of technology

The system achieves accurate height measurements with significantly fewer steps in the scan, reducing total measurement time by a factor of 10 to 100 compared to traditional methods while maintaining precision.

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Abstract

In the system, an illumination source emits light, a first beam splitter directs a portion of the light toward a sample and directs another portion of the light toward a reference surface that reflects the light back to the first beam splitter to be recombined with light reflected by the sample, at least one second beam splitter that directs n portions of the light toward n detectors, each of the n portions of the light having a preset phase shift and n ≥ 2, and a processor receives intensities of the n portions of the light. The processor calculates an interferogram envelope based on the intensities measured by the n detectors as the reference surface moves between a plurality of signal collection positions.
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