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30results about "Interferometers" patented technology

Measuring setup for position determination and projection exposure system

PendingDE102024211301A1InterferometersUsing optical means
The invention relates to an optical measuring arrangement (100) for measuring the distance of a component relative to a reference along at least one measuring axis, comprising a sensor (101) with a sensor head (102) and a measuring target (103) connected or connectable to the component, wherein the sensor head (102) has an input mirror (104) for coupling a measuring beam (106) and an end mirror (105) enclosing a resonator cavity (107) of an optical resonator, and wherein the measuring target (103) is configured to deflect the measuring beam (106) back and forth between the mirrors (104, 105, 108, 109) of the sensor head (102). The sensor head (102) additionally has at least two retroreflectors (108, 109).
Owner:CARL ZEISS SMT GMBH

Robust atom interferometer

This disclosure relates to an inertial sensor for measuring an inertial quantity along a sensing axis. The sensor comprises an atom interferometer comprising a pulse generator to generate one or more pulsed light beams, defined by a respective pulse duration to place atoms into a superposition, and re-combine the atoms to measure an interference of the atoms and calculate the inertial quantity based on the measured interference. The sensor further comprises an auxiliary acceleration sensor configured to measure acceleration transverse to one or more of the pulsed light beams; and a control system configured to calculate a transversal offset of the atoms relative to the pulsed light beams caused by the measured acceleration transverse to the one or more of the light beams, increase the pulse durations, and adjust the pulse timings to compensate for a reduced beam intensity applied to the atoms as a result of the transversal offset.
Owner:Q CTRL PTY LTD

Measuring assembly and laser machining device

PCT designated stageWO2026114659A1InterferometersUsing optical meansLaser processingLaser beam guide
The invention relates to a measuring assembly (46) comprising a deflection unit (16) for directing a machining laser beam (14) onto a surface to be machined, in particular a machining head (18) of a laser machining device (10), and a measuring optical unit (34), which is arranged upstream of the deflection unit (16) in a beam propagation direction (52), for coupling a measuring beam (36, 36a, 36b) into the deflection unit (16); wherein the measuring optical unit (34) has a measuring scanner (50) for deflecting the measuring beam (36, 36a, 36b) in a scanning plane (64, 66) in at least one scanning direction transversely to the beam propagation direction (52) of the measuring beam (36, 36a, 36b); wherein the measuring optical unit (34) has a lens group (86), which is arranged downstream of the measuring scanner (50) in the beam propagation direction (52), for determining an imaging position (70) of the scanning plane (64, 66) in the beam propagation direction (52) at or downstream of an input aperture (40) of the deflection unit (16), wherein the lens group (86) has an entry lens (88) or has an entry lens subgroup with positive refractive power for refracting the measuring beam (36) entering the lens group (86) and an exit lens (90) or an exit lens subgroup with positive refractive power for refracting the measuring beam (36, 36a, 36b) exiting the lens group. The invention further relates to a laser machining device (10).
Owner:TRUMPF LASER SE

Method for super-resolution microscopic interferometric measurement based on broadband annular radially polarized light

ActiveUS20260146849A1InterferometersMicroscopesMicroscope objectiveAperture angle
Disclosed in this disclosure is a method for super-resolution microscopic interferometric measurement based on broadband annular radially polarized light, where a broad-spectrum light source with an extended surface is selected; uniform illumination covering a to-be-tested FOV and having a certain aperture angle is provided using a Kohler illumination system; a two-stage relay system is designed, and amplitude and polarization of a full-FOV beam is modulated by a liquid crystal spatial light modulator and a vortex waveplate; broadband annular radially polarized light is focused based on the extended surface light source and a microscopic objective lens with a high numerical aperture to implement super-resolution microscopic interference imaging of a sample; and super-resolution topography measurement directed at a surface of a microstructure is implemented combined with phase-shifting interferometry.
Owner:NANJING UNIV OF SCI & TECH

Lateral shearing interferometry for surface profile measurement of pattern wafers

PendingUS20260146850A1InterferometersUsing optical meansTime domainAngle of incidence
A system may include a lateral shearing interferometer. The lateral shearing interferometer may enable measuring a surface profile of a sample, such as the pattern wafers, using reflected light from the sample. The reflected light may be reflected at a grazing incidence angle. A controller may receive images from the lateral shearing interferometer and measure the surface profile. The controller may measure the surface profile by reconstructing a phase of the reflected light from the images. The controller may reconstruct the phase using spatial reconstruction or time-domain reconstruction. The gratings may allow the controller to measure the edge roll-off in one or two dimensions. The controller may also calibrate the grazing incidence angle and determine refractive indices of thin-films on the sample. The controller may also perform full measurements of the surface profile using line beams, rectangular beams, or full-sample beams.
Owner:KLA CORP

Three-dimensional measuring device

Provided is a three-dimensional measurement device capable of achieving an improvement in measurement accuracy or the like. A three-dimensional measurement device (1) includes an interference optical system (3) having a half mirror (HM) that splits incident light into two lights, irradiates one of the split lights to a workpiece (W), and irradiates the other light to a reference surface (23), recombines and emits them, a first light projecting system (2A) that emits first light of a first wavelength toward the half mirror (HM), a second light projecting system (2B) that emits second light of a second wavelength toward the half mirror (HM), a first imaging system (4A) that images output light related to the first light emitted from the half mirror (HM), and a second imaging system (4B) that images output light related to the second light emitted from the half mirror (HM), is configured to perform three-dimensional measurement of the workpiece (W) based on image data acquired by the imaging systems (4A, 4B), and the traveling directions of the first light and the second light toward the workpiece (W) are different, and the traveling directions of the first light and the second light toward the reference surface (23) are different.
Owner:CKD CORP +1

Heterodyne light source for metrology systems

ActiveCN115727756BInterferometersUsing optical meansFirst lightLight beam
A metrology system including a heterodyne light source is provided. The heterodyne light source includes a first light source, an acousto-optic modulator, and source optics. The acousto-optic modulator receives at least one wavelength laser beam from the first light source and generates at least one corresponding frequency-shifted laser beam (e.g., having orthogonal polarization). The source optics include a receiving optical element portion and a birefringent optical element portion. The receiving optical element portion receives the wavelength laser beam and the corresponding frequency-shifted laser beam and directs the beams along an optical path toward the birefringent optical element portion. The birefringent optical element portion combines the beams to output a combined beam (e.g., which can be used as part of a measurement process to determine at least one measured distance to at least one surface point on a workpiece, etc.).
Owner:MITUTOYO CORP

MEASURING MODULE WITH ADJUSTABLE PATHWAY DIFFERENCE AND FOCUSING DEVICE FOR LASER PROCESSING DEVICES

UndeterminedDE26159494T1InterferometersUsing optical meansLaser processingControl system
Measuring module (10) for a laser processing device (1) comprising the following: a housing (11) having a connection port (12) for optically coupling the measuring module (10) with a distance detection device and a coupling port (14) for optically coupling the measuring module (10) with a laser processing module (30) of the laser processing device (1); wherein a first optical path (P1) and a second optical path (P2) are defined for the laser light within the housing (11) for laser light that is received and output through the connection port (12), wherein the first optical path (P1) is defined from the connection port (12) to an optical reference reflector (16) of the measuring module (10), wherein the optical reference reflector (16) reflects the laser light back to the connection port (12), and wherein the second optical path (P2) is defined from the connection port (12) to the coupling port (14) and back to the connection port (12); and wherein the measuring module (10) further comprises an optical path length control system (20), that is configured to set an optical path length difference between an optical path length of the first optical path (P1) and an optical path length of the second optical path (P2); where the first optical path (P1) has a fixed, predefined optical path length; and wherein the second optical path (P2) has a variable optical path length which is adjustable by the optical path length control system (20); wherein the measuring module (10) further comprises a focusing device (18) which is arranged in the second optical path (P2) between the connecting port (12) and the optical path length control system (20) and is configured to focus the laser light transmitted through the second optical path (P2).
Owner:RAYLASE GMBH

Compact line-field oct system with intolerance to spurious reflections

PCT designated stageWO2026112133A1InterferometersUsing optical meansRefractive errorEyepiece
A compact line- or full-field optical coherence tomography (OCT) system designed for high-resolution retinal imaging with reduced artifacts employs quarter wave plates in both the sample and reference arms to manipulate the polarization state of light, effectively suppressing spurious reflections and coherence repeat artifacts. A symmetrical arrangement of, for example, Plössl eyepiece and camera objective lenses minimizes optical aberrations and maintains a flat imaging field despite the retina's curvature. The scanning galvanometer mirror is positioned at the conjugate plane of the patient's eye pupil and sized to act as an aperture stop. An adjustable eyepiece compensates for individual refractive errors, enhancing image clarity across a wide range of patients.
Owner:KINEOLABS INC

Method for determining a height map and interferometric system for the same

PendingEP4764398A1InterferometersUsing optical means
The invention relates to a method for determining a height map of a sample surface comprising an edge. The invention further relates to an interferometric system for determining a height map of a sample surface comprising an edge. The invention further relates to a computer readable data carrier comprising a computer program that, when run on a processor of an interferometric system according to the invention, causes the interferometric system to perform the method according to the invention.
Owner:MITUTOYO CORP

Measuring array for determining the position of a projection exposure system

PCT designated stageWO2026114664A1InterferometersPhotomechanical apparatusOptical cavityLight beam
The invention relates to an optical measuring array (100) for measuring the distance of a component relative to a reference along at least one measuring axis, comprising a sensor (101) having a sensor head (102) and a measurement target (103) which is connected or can be connected to the component, wherein the sensor head (102) has an incoupling mirror (104), for coupling in a measurement beam (106), and an end mirror (105), which mirrors enclose a resonator cavity (107) of an optical resonator, and wherein the measurement target (103) is designed to deflect the measurement beam (106) back and forth between the mirrors (104, 105, 108, 109) of the sensor head (102). The sensor head (102) additionally comprises at least two retroreflectors (108, 109).
Owner:CARL ZEISS SMT GMBH

Measuring setup and laser processing device

PendingDE102024135439A1InterferometersUsing optical meansLaser processingLight beam
The invention relates to a measuring arrangement (46) comprising a deflection unit (16) for aligning a processing laser beam (14) onto a surface to be processed, in particular a processing head (18) of a laser processing device (10), and a measuring optic (34) positioned upstream of the deflection unit (16) in a beam propagation direction (52) for coupling a measuring beam (36, 36a, 36b) into the deflection unit (16); wherein the measuring optic (34) has a measuring scanner (50) for deflecting the measuring beam (36, 36a, 36b) in a scan plane (64, 66) in at least one scan direction transverse to the beam propagation direction (52) of the measuring beam (36, 36a, 36b);wherein the measuring optics (34) comprises a lens group (86) downstream of the measuring scanner (50) in the beam propagation direction (52) for defining an imaging position (70) of the scan plane (64, 66) in the beam propagation direction (52) at or after an inlet aperture (40) of the deflection unit (16), wherein the lens group (86) comprises an inlet lens (88) or an inlet lens subgroup with positive refractive power for refracting the measuring beam (36) entering the lens group (86) and an outlet lens (90) or an outlet lens subgroup with positive refractive power for refracting the measuring beam (36, 36a, 36b) exiting the lens group. The invention also relates to a laser processing device (10).
Owner:TRUMPF LASER SE

Oct-device, method of controlling such a device and program

ActiveEP4317909B1InterferometersEye diagnostics
A signal processing device includes a controller which acquires an output signal output from a single light receiver that receives a plurality of interference beams in which a light beam that is output from a single light source and traces a sample arm toward a measurement target and a light beam that is output from the light source and traces a reference arm that is different from the sample arm interfere with each other, the plurality of interference beams each having a different wavelength dispersion characteristic difference between the sample arm and the reference arm traced by the light beams interfering with each other; and extracts an extraction signal that is a signal for each of the interference beams on the basis of the output signal acquired and a correction signal obtained by applying wavelength dispersion correction processing to the output signal.
Owner:TOMEY CORP

Measuring module with adjustable path length difference and with focusing device for laser processing apparatus

PendingEP4721909A3InterferometersUsing optical means
The invention refers to a measurement module (10) for a laser processing apparatus (1) in which a first optical path (P1) and a second optical path (P2) are defined for laser light within a housing (11). The first optical path (P1) has a fixed predefined optical path length. The second optical path (P2) is defined between a connection port (12) of the housing and a coupling port (14) and has a variable optical path length adjustable by an optical path length regulator system (20). The invention further refers to an interferometer system comprising a measurement module with a first optical path (P1) corresponding to a reference arm of the interferometer system and with a second optical path (P2) corresponding to an object arm of the interferometer system, wherein an optical path length regulator system (20) is configured for adjusting an optical path length of the second optical path (P2), i.e., of the object arm of the interferometer system. The measurement module (10) further comprises a focusing device (18) arranged in the second optical path (P2) between the connection port (12) and the optical path length regulator system (20) and configured for focusing the laser light transmitted through the second optical path (P2). The invention further refers to a laser processing apparatus (1) comprising a laser processing module (30) for laser-processing a workpiece (P) on a work field (37) using a work beam (W) and a measurement module (10) according to the invention.
Owner:RAYLASE GMBH

Charged particle beam lithography apparatus, charged particle beam lithography method, and method for adjusting a phase difference plate

To measure stage positions with good accuracy and prevent a decrease in drawing accuracy.SOLUTION: A charged particle beam drawing device comprises a length measurement unit that measures the position of a stage using first and second frequency laser beams, and a wall surface displacement measurement unit that measures the wall surface displacement of a drawing chamber using the first and second frequency laser beams. The length measurement unit has a first laser interferometer that is provided to a wall surface of the drawing chamber, synthesizes the first frequency laser beam having reciprocated between the first laser interferometer and the stage and the second frequency laser beam having been reflected inside of the first interferometer, and outputs a first beat signal. The wall surface displacement measurement unit has a second laser interferometer that is provided to the wall surface of the drawing chamber, synthesizes the first frequency laser beam having reciprocated between the second laser interferometer and a fixed mirror in the drawing chamber and the second frequency laser beam having been reflected inside of the second interferometer, and outputs a second beat signal. The stage position is determined on the basis of a difference between the first and second beat signals.SELECTED DRAWING: Figure 2
Owner:NUFLARE TECH INC

laser interferometer

ActiveCN115727935BSubsonic/sonic/ultrasonic wave measurementInterferometers
Provided is a laser interferometer capable of suppressing return light from being incident on a laser light source and suppressing a decrease in precision of demodulation of a sample signal originating from a measurement target object from a light-received signal. A laser interferometer characterized by comprising: a laser light source that emits laser light; a shielding element that has an opening through which the laser light passes; a light modulator that modulates the laser light into reference light having different frequencies; and a light-receiving element that receives object light generated by reflection of the laser light by a measurement target object and the reference light, and outputs a light-received signal, wherein when a diameter of the opening is set to D, the following is satisfied:
Owner:SEIKO EPSON CORP

Polarizing Fizeau interferometer

ActiveJP7871000B2InterferometersUsing optical means
To provide an interferometer, in particular a Fizeau interferometer capable of improving contrast of interferograms.SOLUTION: A Fizeau interferometer 1 is provided, comprising a light source 2, a reference surface 4, a tested surface 5 provided on a support of the Fizeau interferometer, and an image capturing system 3. The Fizeau interferometer uses a polarization reference surface to improve contrast of an interferogram. The present invention also relates to a method of using the Fizeau interferometer provided herein to improve contrast of interferograms obtained by the Fizeau interferometer.SELECTED DRAWING: Figure 1
Owner:MITUTOYO CORP

Gradient matter-wave gradiometry

ActiveUS12650537B2InterferometersUsing optical meansDifferential effectsParticle physics
Each atom in a population of atoms can be characterized by a probability density distribution (PDD). Using a shaken-lattice technique, each PDD is split into a pair of sub-PDDs. The sub-PDDs of a pair are propagated along different paths to a common endpoint of the paths, resulting in a matter-wave interference pattern that encodes a net phase between the paths, e.g., due to differential effects associated with a gravity gradient. The matter-wave interference pattern can be measured to yield a respective measurement for each atom. The measurements can be aggregated to yield a result distribution that can serve as a classical domain estimate of the quantum-domain matter-wave interference pattern, and thus of the gravity gradient. Other embodiments can determine gradients for other types of fields.
Owner:COLDQUANTA INC

Using physical surface finishing for rapid and effective surface depth measurement of metal components

This invention is titled "Rapid and Effective Measurement of Surface Depth of Metal Components Using Physical Surface Trimming." A method for determining the effective surface depth of a metal component includes forming a trimmed core surface by blasting or shot peening an exposed surface of the metal component with a blasting medium. The exposed surface is a continuous exposed surface of the surface and the core. The method includes measuring the surface texture, compressive stress, or another suitable feature of the trimmed core surface using a surface metrology sensor, and using the measured features to identify the surface-core boundary, including identifying the location of predetermined differences or gradients within the exposed surface. The method also includes measuring the effective surface depth as the vertical distance between a reference surface of the surface and the surface-core boundary.
Owner:THE BOEING CO

Single-frame ramp interferometer

ActiveCN116507877BSave on testing logisticsSave measurement timeInterferometersReflective surface testingReference waveWavelength
An interferometer (10) is provided for measuring the surface (108) or optical thickness of an optically smoothed test object (122), wherein the interferometer (10) is configured to simultaneously illuminate the optically smoothed test object with multiple object waves (14.1, 14.2, 14.3) having different wavelengths from each other, and to superimpose the object waves (14.1, 14.2, 14.3) deformed by the illuminated test object onto a coherent reference wave on an image capturing device (K), and to decompose the spectrum of the superimposed interferogram into wavelength-specific partial interferograms.
Owner:UNIVERSITAT STUTTGART

Lateral shearing interferometry for surface profile measurement of pattern wafers

PCT designated stageWO2026111929A1InterferometersUsing optical meansTime domainAngle of incidence
A system may include a lateral shearing interferometer. The lateral shearing interferometer may enable measuring a surface profile of a sample, such as the pattern wafers, using reflected light from the sample. The reflected light may be reflected at a grazing incidence angle. A controller may receive images from the lateral shearing interferometer and measure the surface profile. The controller may measure the surface profile by reconstructing a phase of the reflected light from the images. The controller may reconstruct the phase using spatial reconstruction or time-domain reconstruction. The gratings may allow the controller to measure the edge roll-off in one or two dimensions. The controller may also calibrate the grazing incidence angle and determine refractive indices of thin-films on the sample. The controller may also perform full measurements of the surface profile using line beams, rectangular beams, or full-sample beams.
Owner:KLA CORP

Signal processing device, OCT device, signal processing method, and program

ActiveJP7875591B2InterferometersEye diagnostics
To extract, more easily than before, signals at a plurality of positions to be measured from signals obtained in one measurement in an FD-OCT.SOLUTION: A signal processor includes: an acquisition part which acquires an output signal outputted by a single light receiving part receiving a plurality of interference lights where light outputted by a single light source and tracing a measurement optical path heading for an object to be measured and light outputted by the light source and tracing a reference light path different from the measurement optical path which differ in wavelength dispersion characteristics between the measurement optical path traced by the interfering lights and the reference light path vary respectively; and an extraction part which extracts an extraction signal to be a signal every interference light on the basis of the output signal acquired by the acquisition part and a correction signal in which wavelength dispersion correction processing is applied to the output signal.SELECTED DRAWING: Figure 11
Owner:TOMEY CORP

Optical coherence tomography device and optical coherence tomography method

ActiveEP4220127B1InterferometersPhase-affecting property measurements
Provided are an optical coherence tomography device that is less likely to cause a shift in a tomographic image even in a portable form and that performs tomographic imaging over a wide area at one time, and an optical coherence tomography method using the optical coherence tomography device. The optical coherence tomography device includes an objective lens configured to focus light from a light source onto a sample and is configured to perform tomographic imaging of the sample based on interference between sample light, which is reflected light from the sample, and reference light, which is reflected light from a reference surface provided between the objective lens and the sample. The sample light and the reference light are each to pass through the objective lens. The objective lens is an Fθ lens.
Owner:DAIKIN INDUSTRIES LTD

Automatic optical path adjustment in home OCT

ActiveCN113056226BInterferometersUsing optical meansRetinal imagingTomography
Retinal imaging systems and related methods employ user-specific approaches to control the reference arm length in an optical coherence tomography (OCT) imaging apparatus. One method involves restricting the user's head relative to the OCT imaging apparatus. A control reference arm length adjustment module alters the reference arm length to search for a user-specific reference arm length range, thereby identifying the reference arm length at which the OCT image detector generates an OCT signal corresponding to the user's retina. This user-specific reference arm length range covers a smaller range of reference arm lengths than the reference arm length adjustment range of the reference arm length adjustment module.
Owner:NOTAL VISION LTD

Optical measuring device and multi-mirror

ActiveJP7867052B2MirrorsInterferometers
To provide a device capable of reducing a structure size and making quality of a result independent of a measuring direction.SOLUTION: There is provided a multiple mirror (10) for multiplying a single incoming wavefront (12) of electromagnetic radiation (11) into a plurality of outgoing wavefronts (14). The multiple mirror (10) includes: at least one first mirror (16) on which an incident wave front (12) first impinges; and a second mirror (18) on which the wave front is finally reflected, where these mirror surfaces are overlapped in a moving direction of the first wave front (12). The first mirror (16) is partially transparent to the electromagnetic radiation (11) and the second mirror (18) is fully reflective.SELECTED DRAWING: Figure 1
Owner:ホーホシューレ トリアー

Parallel optical coherence tomography system using an integrated photonic device

PendingUS20260153324A1InterferometersUsing optical meansMultiplexingPhotonic Chip
Integrated photonic chips and related systems and methods suitable for parallel optical coherence tomography scanning are disclosed that include multiplexed data detection and transmission to a single channel of a DAC or parallel data detection and transmission to separate channels of a multi-channel DAC.
Owner:WASHINGTON UNIV IN SAINT LOUIS

Optical filter, heterodyne interferometer system comprising the filter and method for filtering an input beam of a heterodyne interferometer

PendingCN122122436AInterferometersUsing optical meansHeterodyne interferometerBeam polarization
A heterodyne interferometer system comprising: a first light source providing a first laser beam having a first frequency f1; a second light source providing a second laser beam having a second frequency f2 different from the first frequency; a combiner for polarizing the first laser beam and the second laser beam and for providing an input beam, wherein the polarized first laser beam and the polarized second laser beam are combined; an optical resonator cavity comprising an odd number of at least partially reflecting mirrors arranged in the cavity for reflecting the input beam and circulating it in the cavity, the cavity being adapted to receive the input beam and provide an output beam comprising a first spatial mode having the first frequency f1 and a first polarization, and a second spatial mode having the second frequency f2 and a second polarization different from the first polarization; and a heterodyne interferometer for receiving the output beam.
Owner:ASML NETHERLANDS BV

Laser interferometer

PendingJP2026098062ASubsonic/sonic/ultrasonic wave measurementInterferometers
To provide a low-cost laser interferometer equipped with an optical modulator that enables frequency modulation of laser light without the use of a diffraction grating. [Solution] A laser interferometer comprising: a laser light source that emits a first laser beam; an optical modulator having a vibration element having a vibration component in a direction intersecting the incident surface of the first laser beam, which modulates the first laser beam using the vibration element and generates a second laser beam including a modulated signal; a photodetector that receives a third laser beam including a sample signal generated when the first laser beam is reflected by an object, and the second laser beam, and outputs a received signal; a demodulation circuit that demodulates the sample signal from the received signal based on a reference signal; and an oscillation circuit that operates with the vibration element as a signal source and outputs the reference signal to the demodulation circuit.
Owner:SEIKO EPSON CORP