The invention relates to the technical field of precise positioning control, in particular to a two-degree-of-freedom large-
stroke motion platform applied to
wafer detection, which comprises a base platform and a load platform surface, the top surface of the base platform is provided with a
linear motion platform and a rotary motion platform which are coaxially arranged, the
linear motion platform is used for driving the load platform surface to do lifting motion, and the rotary motion platform is used for driving the load platform surface to do rotating motion. The rotary motion table is used for driving the
linear motion table and the load table top to do
circular motion, and the linear motion table comprises a
linear actuator, an air floatation guide
assembly, a first feedback device and a plate spring. The
integrated design is adopted, the Z shaft and the Rz shaft are coaxially arranged and share the same air floatation guide
assembly, the number of parts is effectively reduced, the axial space is compressed, the structure is more compact, the size of equipment is reduced, the
self weight and the
assembly difficulty are reduced, non-mechanical-friction guide is achieved, and the influence of friction on precision is avoided; besides, the plate springs distributed in a single layer achieve flexible decoupling through the axial and radial rigidity difference of the plate springs, motion
crosstalk is restrained, and the dynamic response speed can be increased without a
complex algorithm.