Resist composition, resist pattern forming method, compound, polymer compound, and fluorine additive component

Abstract

The present invention provides a resist composition, a resist pattern forming method, a compound, a polymer compound, and a fluorine additive component that reduce environmental load and have excellent lithography properties. The present invention relates a resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution under the action of an acid. The resist composition contains: a base component (A) which exhibits changed solubility in a developing solution under the action of an acid; an acid generator component (B) which generates an acid upon exposure; and a fluorine additive component (F). The fluorine additive component (F) contains a polymer compound (F1) having a structural unit (f1) represented by general formula (f1-1) described in the specification. The polymer compound (F1) does not contain any compound having a perfluoroalkyl skeleton or a difluoromethyl group.

Claims

1. A resist composition that generates acid upon exposure and whose solubility in a developer changes due to the action of the acid, comprising a base component (A) whose solubility in a developer changes due to the action of the acid, an acid generating agent component (B) that generates acid upon exposure, and a fluorine additive component (F), wherein the fluorine additive component (F) comprises a polymer compound (F1) having a constituent unit (f1) represented by the following general formula (f1-1), and the polymer compound (F1) does not contain either a perfluoroalkyl skeleton or a difluoromethyl group. [In the general formula (f1-1), R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkyl halogen having 1 to 5 carbon atoms. nf ２ Lf is either 1 or 2. １ Rf is a divalent linking group. １ is an optionally substituted linear hydrocarbon group, an optionally substituted cyclic hydrocarbon group, a nitro group, or a cyano group. Ar is an aryl group. nf １ [ is an integer greater than or equal to 2.] 2. The resist composition according to claim 1, wherein the polymer compound (F1) further comprises a constituent unit (fa1) containing an acid-degradable group or a constituent unit (fa2) containing a lactone-containing cyclic group.

3. The resist composition according to claim 2, wherein the constituent unit (fa1) containing the acid-degradable group comprises a constituent unit (fa-1) represented by the following general formula (fa-1). [In general formula (fa-1), R ０１ Vfa is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkyl halogen having 1 to 5 carbon atoms. ０１ n is a divalent hydrocarbon group which may have an ether bond. ｆ０１ Rfa is an integer between 0 and 2. ０１ It is an acid-dissociating group.

4. The resist composition according to claim 2, wherein the structural unit (fa2) containing the lactone-containing cyclic group contains a structural unit (fa-2) represented by the following general formula (fa-2). [In the general formula (fa-2), R ０２ is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Vfa ０２ is a divalent hydrocarbon group which may have an ether bond. n ｆ０２ is an integer of 0 to 2. Rfa ０２ is a lactone-containing cyclic group represented by any one of the following formulas (a2-r-1) to (a2-r-7). ] [In the formulas (a2-r-1) to (a2-r-7), Ra' ２１ are each independently a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, -COOR", -OC(=O)R", a hydroxyalkyl group or a cyano group; R" is a hydrogen atom, an alkyl group, a lactone-containing cyclic group, a carbonate-containing cyclic group, or a -SO ２ -containing cyclic group; A" is an alkylene group having 1 to 5 carbon atoms which may contain an oxygen atom (-O-) or a sulfur atom (-S-), an oxygen atom or a sulfur atom, n' is an integer of 0 to 2, and m' is 0 or 1. * represents a bond. ] 5. The resist composition according to claim 1 or 2, further comprising an acid diffusion control agent component (D) that controls the diffusion of acid generated by exposure from the acid generating agent component (B).

6. A method for forming a resist pattern, comprising the steps of forming a resist film on a support using the resist composition described in claim 1 or 2, exposing the resist film, and developing the resist film to form a resist pattern.

7. A compound represented by the following general formula (f1-m1) that does not have a perfluoroalkyl skeleton or a difluoromethyl group. [In the general formula (f1-m1), R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkyl halogen having 1 to 5 carbon atoms. nf ２ Lf is either 1 or 2. １ Rf is a divalent linking group. １ is an optionally substituted linear hydrocarbon group, an optionally substituted cyclic hydrocarbon group, a nitro group, or a cyano group. Ar is an aryl group. nf １ [ is an integer greater than or equal to 2.] 8. A polymer compound having a structural unit represented by the following general formula (f1-1), and lacking both a perfluoroalkyl skeleton and a difluoromethyl group. [In the general formula (f1-1), R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkyl halogen having 1 to 5 carbon atoms. nf ２ Lf is either 1 or 2. １ Rf is a divalent linking group. １ is an optionally substituted linear hydrocarbon group, an optionally substituted cyclic hydrocarbon group, a nitro group, or a cyano group. Ar is an aryl group. nf １ [ is an integer greater than or equal to 2.] 9. A fluorine additive component containing a polymer compound having a structural unit represented by the following general formula (f1-1), and not containing any compound having a perfluoroalkyl skeleton or a compound having a difluoromethyl group. [In the general formula (f1-1), R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkyl halogen having 1 to 5 carbon atoms. nf ２ Lf is either 1 or 2. １ Rf is a divalent linking group. １ is an optionally substituted linear hydrocarbon group, an optionally substituted cyclic hydrocarbon group, a nitro group, or a cyano group. Ar is an aryl group. nf １ [ is an integer greater than or equal to 2.]

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