A 3D stochastic resist model predicts line edge roughness and unintended printing while avoiding costly Monte Carlo lithography analysis.
A metalens array splits an optical beam into multiple focal points to induce simultaneous two-photon polymerization across a large area.
Replacing amine groups with non-amine chemistries prevents hydrolysis during UV polymerization, reducing protein loss and precipitation.
Incorporating photolabile bonds into the polymer backbone eliminates synthetic complexity from external additives while enabling precise UV-driven patterning.
A lithographic method controls radiation beam spectrum to adjust the plane of best focus via chromatic aberrations.
A pulsed light beam with varying wavelengths generates multiple aerial images at distinct planes on a wafer during one exposure pass.