Antimony Organic Compounds TRIZ Cases
- Organometallic Resist Composition for Low-Diffusion Patterning
An organometallic resist with a polar aprotic solvent limits acid diffusion and chemical degradation to improve pattern uniformity and storage stability.
- Bi/Sb Thin-Film Precursors for Fast, Low-Carbon ALD Deposition
Specific Bi and Sb precursor compounds enable faster ALD metal thin-film growth with uniform thickness and lower residual carbon.