A two-step implantation uses easy- and difficult-to-diffuse regions to deepen the P-well while reducing SiC channel roughness and conductivity loss.
Punch-through NPN electron extraction and JFET field shielding address RC-IGBT reverse recovery loss and high-temperature leakage current.
This IGBT uses differential body doping and staged shielded-gate control to remove stored carriers and speed turn-off.
Shielded gates and segmented body doping speed channel turn-off, reducing carrier storage and IGBT switching loss.
An amorphous InAlGaN layer shields thin barriers during insulating-layer formation, preserving 2DEG density and high-frequency behavior.