A conical table cover drains processing liquid radially during substrate grinding, suppressing residue buildup and easing maintenance.
Laser fusion heals grinding cracks and chipping at recess and annular projection boundaries, improving workpiece strength for later processing.
Discharge and outer circumferential grooves collect swarf and liquid while suction stabilizes the substrate to keep its back surface clean.
Negative-pressure suction lets the grinding robot hold walls and ceilings while maintaining contact pressure for automated surface finishing.
A staged grinding process treats the chuck table frame and porous member separately to prevent concavity and uneven wafer thickness.
Bonding a low-expansion ceramic pad to a conductive metal base reduces nanotopography by stabilizing surface flatness against thermal deformation.
A C-shaped yoke clamping device uses a tie rod to transmit axial force, preventing yoke deformation and ram misalignment.
Distinct wear paths from varied port positioning extend abrasive film life and reduce polishing cycle time.
An adjustable workholder with an elastic member allows axial sliding and angular adjustment of the polishing head.
An adjustable ultrasonic vibration mechanism drives nanofluid into micro-channels within the grinding zone to enhance cooling and lubrication.
A workpiece holding device uses a clamping member with radial gaps to press the chuck against the base, accommodating differential thermal expansion.
Roller-mounted rotating carriers process varying height workpieces simultaneously, resolving productivity versus adaptability contradictions.
Surface irregularities on a resin sheet base material layer fix wafers through suction, eliminating adhesive residue during grinding.