Hydrogen Fluoride TRIZ Cases
- Offline Brush Conditioning With Chemical Delivery for Wafer Cleaning
Controlled chemical delivery conditions wafer-cleaning brushes offline, cutting prep time, contamination risk, and semiconductor processing defects.
- Dry Non-Plasma Surface Treatment for Precise Material Removal
Chemical surface alteration followed by thermal desorption removes substrate material precisely without plasma damage or contamination.
- Hexafluorosilicic Acid Processing via Two-Stage Neutralization
Two-stage neutralization precipitates hexafluorosilicate before HF recovery, cutting water evaporation, energy use, and process time.
- Microbubble Silicon Defluorination in Phosphate Rock Acid Decomposition
Microbubbles and active silicon convert fluorine in phosphate rock into volatile fluorides, improving recovery and lowering fluorine in phosphogypsum.
- Electronic-Grade HF and Nitric Acid Recovery via Salt-Assisted Distillation
Alkali metal salts, distillation, mist removal, and condensation regenerate high-purity HF and nitric acid from waste acid.
- Sulfuric Acid Alkylation Reactor Conversion Design
A sulfuric acid alkylation reactor system uses an external emulsion pump to mix reactants and catalyst efficiently.
- Azeotrope-like Composition for Hydrogen Fluoride Separation
An azeotrope-like composition enables efficient separation of hydrogen fluoride from fluoroethylene products through constant boiling point distillation.