Muffle Furnaces TRIZ Cases
- Dual Heater Substrate Support for Uniform CIGS Deposition
Inner and outer heaters maintain uniform substrate temperature during CIGS deposition, preventing deformation and cracking caused by thermal stress.
- Segmented Nozzle for Thermal Expansion in Heat Treatment
A segmented nozzle combines quartz and silicon carbide to prevent thermal expansion damage on the adaptor.
- Bake Plate Projections and Suction for Substrate Curvature Correction
Exhaust bores generate negative pressure to correct substrate curvature caused by thermal expansion differences, ensuring uniform heat treatment.