A 3D active region and auxiliary buffer layer let GAA nanowire stacks choose channel strips without etching, preserving integrity and blocking leakage.
Individually addressable electrodes create localized electric fields to translate, rotate, and hold dipole molecules with high precision.
N2/H2 plasma cleaning strips oxides from source/drain contacts, cutting resistance while preserving silicide and metal nitride barrier layers.
Parallel channels with distinct gate work functions linearize FeFET conductivity changes, improving neural network weight update accuracy.
Wrapping silicide around epitaxial structures increases contact area and lowers resistance in scaled semiconductor devices.