Photosensitive Material Processing TRIZ Cases
- Sn-Containing Photoresist Composition for EUV Sensitivity and Low LER
An Sn-containing composition uses EUV-absorbing organometallic chemistry to form fine patterns with high sensitivity and reduced LER.
- Pixel Defining Layer Formation for Low-Outgas OLED Panels
Single-process photolithography forms vivid pixel patterns while limiting OLED outgas.
- Photomask Cleaning with Ozonated Water for Cross-Linked Resist Removal
Ozonated deionized water and alkaline treatment soften resistant photoresist before mechanical removal, preserving critical dimensions.