Polarisation-Affecting Properties TRIZ Cases
- Quasi-Dynamic In Situ Ellipsometry for Photoresist Exposure
Inverting measured Mueller matrices against theoretical models extracts Dill parameters, resolving static measurement limitations in photolithography.
- Semi-Circular Focusing Lens for Ellipsometer Auto-Focus
A semi-circular focusing lens concentrates divergent light onto minute patterns, resolving the mismatch between spot size and feature dimensions.
- Stress Profile Measurement Using Combined LSP and RNF Techniques
Combined light-scattered polarimetry and refractive near field apparatus measures stress profiles with high precision.
- Ellipsometric Apparatus Using Conical Refraction for Parallel Polarization Analysis
Replacing rotating polarizers with a biaxial crystal eliminates mechanical delay, enabling parallel multi-wavelength ellipsometry.
- Polarimeter Using Anisotropic Meta Surface for Compact Rotation Detection
Replacing bulky Faraday rotators, the meta surface enables high sensitivity polarization measurement in a compact footprint.
- Polarimetric Measurement Device for SOP Transient Localization
A polarimetric measurement device detects state of polarization transients in optical fibers using signal echo analysis.
- Achromatic Rotating-Element Ellipsometer Mueller Matrix Measurement
Achromatic rotating-element ellipsometer measures Mueller-matrix elements using four polarizers and constant speed rotation.
- Multi-Site Optical Metrology for Semiconductor Stack Characterization
Segmenting test sites on a single wafer reduces measurement time and carry-over errors while maintaining high precision.
- Broadband Wafer Inspection via Polarization Control
A broadband wafer inspection system uses polarization control to detect surface defects across multiple wavelengths.
- Multi-State Inspection System for Semiconductor Wafer Defect Detection
Switchable detector arrangement enables high throughput semiconductor wafer inspection.
- Dielectric Tensor Measurement via Mueller Matrix Fitting
A method determines dielectric tensors by fitting theoretical Mueller spectra to measured data using a 4x4 matrix model.
- Metrology Calibration Using Polarization Settings for Overlay Accuracy
Polarization calibration targets correct sensor asymmetries to minimize overlay and critical dimension errors in device manufacturing.