Multi-State Inspection System for Semiconductor Wafer Defect Detection
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Solution Overview
Problem
Existing electro-optical semiconductor inspection systems lack versatility in operating modes, as they typically either inspect multiple locations with different detectors or the same location with varying angles, but not efficiently switch between these modes to achieve high throughput with adjustable sensitivity.
Innovation Solution
An inspection system configured to operate in multiple states, using a combination of multiple detectors and imaging optics that can switch between viewing different locations and the same location in various imaging modes, with mechanical, electrical, optical, and electro-optical controls to adjust the detector arrangement and optics for different imaging states.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple detectors view different locations to increase throughput, then productivity is improved, but measurement precision deteriorates
Solution Approach 1:
The inspection system is designed to support multiple operating states using the same set of detectors. The system can switch between a first state where detectors view different locations (high throughput) and a second state where detectors view the same location in different imaging modes (high sensitivity). This multi-functionality allows the system to adapt to different inspection requirements without adding dedicated detectors for each mode, thereby resolving the contradiction between throughput and sensitivity.
2Adaptability or versatility
If the system supports multiple operating states with switchable detector arrangements, then adaptability is improved, but device complexity worsens
Solution Approach 1:
The system employs dynamic reconfiguration of the optical path using switchable optical elements that can change the arrangement of detectors and imaging optics between different states. This dynamic capability allows the system to transition between viewing different locations and viewing the same location in different imaging modes, providing adaptability without requiring completely separate detector systems for each mode.
Solution Approach 2:
The same set of detectors and optical components serve multiple functions by being reconfigured between different operating states. The system uses a universal detector array that can be arranged to view different locations or the same location with different imaging modes, reducing the need for duplicate components and managing complexity through multi-use design.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables high throughput with adjustable sensitivity by allowing the system to switch between imaging multiple locations and the same location in different modes, enhancing the inspection process's versatility and efficiency.
Implementation Method 1
a set of imaging optics that relays light from the imaged object to the imaging detectors
Implementation Method 2
an illumination system comprising one or more light sources
Data Source
AI summary
An inspection system can support operation in multiple states. For instance, when inspecting an article, such as a semiconductor wafer, the tool can switch between imaging multiple locations using respective detectors to another operating state wherein multiple detectors operating in multiple imaging modes inspect a single location. An inspection system may combine the use of multiple detectors for multiple locations and the use of multiple viewing angles or modes for the same locations and thereby achieve high throughput. The different imaging modes can comprise, for example, different collection angles, polarizations, different spectral bands, different attenuations, different focal positions relative to the wafer, and other different types of imaging.