Silicon Hydrides TRIZ Cases

A divided-wall distillation column separates halosilanes into three fractions within a single vessel.

Filtration and washing remove aluminum complexes from halosilane reduction mixtures, preventing pipe adhesion and ensuring high product purity.

Nitrogen-containing catalyst cleaves oligomeric silanes into monomeric halosilanes, converting high-purity by-products into valuable semiconductor materials.

Hydrolyzing germanium-silicon alloys with acidic promoters yields higher germanes, lowering manufacturing costs compared to pyrolysis.

A mixed mineral organoclay additive prevents sagging and sedimentation in unsaturated polyester formulations by forming a dynamic gel network.

Limiting linear silane below 0.009 ratio prevents vapor pressure elevation and ensures uniform film formation.

A purification method solidifies n-tetrasilane from a tetrasilane isomeric mixture using controlled cooling and vacuum separation.

Pre-oxidizing silicon hydride in solution eliminates heat treatment damage on plastic substrates.

Segmented distillation columns separate silane from impurities to minimize waste loss.

A monosilane pyrolysis apparatus separates disilane from higher silanes using condensing and separation units.

Replaceable carbon shield prevents silicon deposition on electrodes, maintaining substrate insulation and reducing heat loss.

Segmented solid polysilane sources with distributed energy coupling agents resolve inhomogeneous heating issues, increasing dimethylsilane yield.