A passive pseudo-inertial light reference decouples from platform vibrations via elastomeric supports to stabilize optical line-of-sight measurements.
An integrated illumination apparatus uses a single micro lens array with distinct radiation-emitting element arrangements to generate both structured light patterns and flood illumination beams.
An adaptive filter calculates multiple correction values based on distinct coefficients to manage measurement noise in lithography metrology systems.
Tapered illumination replaces mechanical z-scanning with optical depth resolution, enabling wide-field imaging without complex moving parts.
Synchronized pattern movement and scanning speed resolve the trade-off between measurement precision and productivity.