3D Non-Volatile NOR Flash Memory Vertical Stacking
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Solution Overview
Problem
Current NOR flash memory technology lacks competitive storage density compared to NAND flash memory, limiting its applications despite offering full random access to individual memory cells.
Innovation Solution
Design and fabrication of three-dimensional non-volatile NOR flash memory devices with vertically or parallelly stacked FETs connected in parallel, utilizing a multilayer conductor/insulator stack for gates and degenerately doped Si posts for electrodes, enabling high storage density and full random access.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If NOR flash memory uses conventional planar architecture, then full random access to individual memory cells is achieved, but storage density is low
Solution Approach 1:
The patent transitions from conventional planar (2D) flash memory architecture to a three-dimensional stacked architecture. Multiple layers of memory cells are vertically stacked above the substrate, with each layer containing NOR memory cells that can be independently accessed. This vertical stacking enables significantly higher storage density while preserving the parallel connection topology that provides full random access capability.
Solution Approach 2:
The three-dimensional architecture divides the memory structure into multiple discrete layers, with each layer containing segmented NOR memory cells. Each layer can be independently controlled and accessed through dedicated word lines and bit lines, allowing individual cell access while maintaining high density through the stacked configuration.
2Quantity of substance
If NOR flash memory cells are connected in series to increase density, then storage density improves, but random access capability is lost
Solution Approach 1:
Instead of connecting cells in series within a single plane, the patent stacks multiple parallel NOR memory cell arrays vertically in the third dimension. Each layer maintains parallel cell connections, and selective access to individual layers through vertical word lines enables random access to any cell in the stacked structure without requiring series connections.
Solution Approach 2:
The patent introduces intermediate control structures including layer-select transistors and vertical word lines that act as mediators between the control logic and the stacked memory cells. These intermediaries enable selective activation of specific layers and individual cells within layers, providing full random access capability while maintaining the parallel architecture needed for NOR functionality.
Data Source
AI summary
The present invention provides a design of three-dimensional non-volatile NOR flash memory devices consisting of arrays of basic NOR memory group in which individual memory cells (field-effect-transistors) are stacked along a direction (or directions) either out of or parallel to the plane of the substrate and electrically connected in parallel to achieve high storage densities approaching 1 TB with lower manufacturing cost. Offering full random access to every individual memory cells and also capability of parallel programming/erasing in blocks of memory cells, such three-dimensional non-volatile NOR flash memory can be widely used for both executable-code storage and mass data storage applications.


