3D Wafer Stack Redistribution Layer for Functional Die Bypass
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Solution Overview
Problem
Current semiconductor technologies face challenges in maximizing functional yield in 3D wafer stacks due to limitations in connecting functional die sites while bypassing non-functional sites, leading to inefficiencies in power management and interconnection density.
Innovation Solution
A customized redistribution layer is introduced between each semiconductor wafer in a 3D stack, electrically connecting functional die sites while bypassing non-functional sites, utilizing tested wafer maps to optimize connections and reduce redundant circuit overhead.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If traditional bonding techniques are used to stack semiconductor wafers, then the wafer stack can be formed, but non-functional die sites cannot be bypassed leading to reduced functional yield
Solution Approach 1:
A redistribution layer is introduced as an intermediary component between stacked semiconductor wafers. This redistribution layer selectively connects functional die sites while bypassing non-functional ones, thereby improving functional yield without requiring changes to the core wafer stacking process
Solution Approach 2:
The redistribution layer is configured with locally differentiated connectivity: it provides electrical connections to functional die sites while intentionally omitting connections to non-functional die sites. This local quality differentiation enables selective bypassing of defective areas
2Use of energy by moving object
If all die sites are connected in traditional stacking, then interconnection density is maximized, but power is wasted in non-functional circuits
Solution Approach 1:
The redistribution layer extracts and removes connections to non-functional die sites from the interconnection structure. By taking out these redundant connections, power consumption is reduced without significantly impacting the overall interconnection density among functional circuits
3Quantity of substance
If minimum feature size is reduced to increase integration density, then more components fit in given area, but manufacturing precision requirements increase
Solution Approach 1:
The patent transitions from two-dimensional planar integration to three-dimensional stacked architecture. By adding the vertical dimension with multiple wafer layers and a redistribution layer, integration density is dramatically increased without requiring further reduction of minimum feature sizes in the lateral plane
Data Source
AI summary
A 3D chip (or wafer) stack is provided in which a customized redistribution layer is located between each semiconductor wafer of the chip (or wafer) stack. The customized redistribution layer connects functional die sites on a first semiconductor wafer to functional die sites on a second semiconductor wafer, while by-passing non-functional die sites on the second semiconductor wafer.


