Acidic Developer Composition for Color Filter Photoresist Patterns

Resolve Bottlenecks,
Find Innovative SolutionsGenerate Solutions

Solution Overview

Problem

Current developer compositions for color filters, particularly basic developer compositions, face challenges in achieving fine pigment particle dispersion, leading to deteriorated resolution and pattern formation issues, and can contaminate liquid crystals with metal ions, causing defects like image retention.

Innovation Solution

An acidic developer composition comprising inorganic or organic acids, surfactants, water-soluble organic solvents, and additives, which improves dispersing stability and prevents metal ion contamination, comprising 100 parts by weight of the composition: 0.01 to 5.0 parts inorganic or organic acid, 0.01 to 5.0 parts surfactant, 0.1 to 10.0 parts water-soluble organic solvent, 85 to 99 parts water, and 0 to 2 parts additives, specifically selected to enhance developing properties and prevent metal ion residue.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If basic developer composition is used, then good developing properties for photoresists are achieved, but resolution deteriorates when fine pigment particles are used

Engineering Contradiction:

Improvedeveloping propertiesVSAvoidresolution

Core Design Contradiction:

Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent changes the fundamental chemical parameter of the developer composition from basic to acidic pH. This parameter change enables the developer to work effectively with fine pigment particles (1-10 micrometers) that cause resolution deterioration in basic developers, while maintaining good developing properties for the photoresist layer.

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The patent converts the harmful interaction between basic developers and fine pigment particles into a beneficial process by using acidic developers. The acidic environment prevents the complications that arise with fine particle dispersion in basic conditions, turning what was a problematic combination into an effective developing system.

Inventive Principle:

Principle #22Blessing in disguise (Convert harm into benefit)

2Productivity

If basic developer composition is used, then developing effectiveness is improved, but metal ion contamination occurs

Engineering Contradiction:

Improvedeveloping effectivenessVSAvoidmetal ion contamination

Core Design Contradiction:

ProductivityVSObject-affected harmful factors

Solution Approach 1:

The patent inverts the conventional approach by using acidic developers instead of basic developers. This inversion eliminates the presence of metal ions (Na+, K+) that contaminate the liquid crystal layer, while maintaining effective developing performance through the acidic chemical environment.

Inventive Principle:

Principle #13The other way round (Inversion)

3Illumination intensity

If pigment particle size is reduced for high brilliance, then transmission performance is improved, but dispersing stability becomes more difficult

Engineering Contradiction:

ImprovebrillianceVSAvoiddispersing stability

Core Design Contradiction:

Illumination intensityVSStability of the object's composition

Solution Approach 1:

The patent changes the pH parameter of the developer composition to acidic conditions, which improves the dispersing stability of fine pigment particles (1-10 micrometers) in the photoresist layer. This parameter change enables effective development without compromising the stability of the dispersed pigment particles, thereby maintaining high brilliance and transmission performance.

Inventive Principle:

Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The acidic developer composition effectively improves the resolution and pattern formation of color photoresists, preventing metal ion contamination and ensuring high-fining and high-resolution color filters with reduced image retention risks.

Implementation Method 1

the incorporation of basic hyperdispersants can improve effectively the dispersing stability of particles... the produced photoresists show deteriorated resolution in the basic developer composition

Methodology Applied

Scientific EffectDispersion: Dispersion (of waves)

Implementation Method 2

surfactant 0.01 to 5.0 parts by weight

Methodology Applied

Scientific EffectSurfactant action: Surfactant

Implementation Method 3

inorganic basic developer composition may remain in the photoresist layer due to the presence of metal ions including Na+, K+, etc., which is likely to contaminating the liquid crystal and causing the occurrence of defects

Methodology Applied

Scientific EffectNeutralization:

Data Source

PatentUS10197912B2Method for manufacturing color photoresist pattern in color filter

Publication Date: 2019.02.05 BOE TECHNOLOGY GROUP CO LTD

AI summary

A method for manufacturing a color photoresist pattern in a color filter is provided. The method includes applying a layer of negative color resist onto a substrate; exposing the layer of negative color resist through a mask; and developing the exposed layer of negative color resist with a developer composition which comprises 0.01 to 5.0 parts by weight of inorganic or organic acids, 0.01 to 5.0 parts by weight of surfactant, 0.1 to 10.0 parts by weight of water-soluble organic solvent, 85 to 99 parts by weight of water, and 0 to 2 parts by weight of additives, based on 100 parts by weight of the developer composition.