Active Array Substrate Two-Step Photolithography
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Solution Overview
Problem
The existing manufacturing methods for active array substrates in flat panel display devices require multiple photolithography steps, leading to high production costs and inefficiencies, necessitating a more economical and efficient method.
Innovation Solution
A method involving only two photolithography process steps is developed, where a transparent conductive layer and metal layers are sequentially formed on a substrate, with patterned photoresist layers used to create specific patterns and structures, followed by etching and passivation to form the necessary electrodes and layers, reducing the number of photolithography steps required.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If five photolithography process steps are used to manufacture active array substrate, then manufacturing precision is maintained, but manufacturing cost increases and productivity decreases
Solution Approach 1:
The patent combines multiple photolithography steps into two main steps by using a first photoresist layer to form both the data line pattern and pixel electrode pattern, and a second photoresist layer to form both the gate line pattern and transistor electrode patterns. This merging of operations reduces the total number of photolithography steps from five to two, thereby improving productivity while maintaining manufacturing precision through careful control of each combined step.
2Manufacturing precision
If five photolithography process steps are used to manufacture active array substrate, then manufacturing precision is maintained, but manufacturing cost increases
Solution Approach 1:
The patent merges multiple photolithography operations into two cost-effective steps by using first and second photoresist layers to simultaneously define multiple patterns. This reduces material consumption, equipment usage time, and labor costs associated with five separate photolithography steps, thereby lowering manufacturing cost while maintaining the required manufacturing precision through optimized combined processes.
3Productivity
If four photolithography process steps are used to manufacture active array substrate, then productivity is improved, but manufacturing precision may be compromised
Solution Approach 1:
The patent segments the photoresist layer formation into two distinct layers: a first photoresist layer for forming data lines and pixel electrodes, and a second photoresist layer for forming gate lines and transistor electrodes. This segmentation allows each layer to be optimized for its specific patterning requirements, maintaining manufacturing precision while achieving the productivity benefits of reduced photolithography steps compared to conventional five-step processes.
4Ease of manufacture
If two photolithography process steps are used to manufacture active array substrate, then manufacturing cost is reduced and productivity is improved, but process complexity increases
Solution Approach 1:
The patent divides the simplified two-step photolithography process into clearly defined segments: Step 1 uses a first photoresist layer to form data lines and pixel electrodes, while Step 2 uses a second photoresist layer to form gate lines and transistor electrodes. This segmentation reduces process complexity by providing clear procedural boundaries and optimization targets for each step, making the reduced two-step process easier to control and manufacture compared to attempting a fully integrated single-step approach.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly reduces manufacturing costs and enhances product efficiency by simplifying the process while maintaining the reliability of the active array substrate, making it suitable for various display devices.
Implementation Method 1
The second patterned photoresist layer is heated to become flowable, thereby forming a passivation layer covering the stacked structure
Data Source
AI summary
A method for manufacturing an active array substrate is provided herein. The active array substrate can be manufactured by using only two photolithography process steps. The photolithography process step using a first photomask may be provided for forming a drain electrode, a source electrode, a data line and/or a data line connecting pad and a patterned transparent conductive layer, etc. The photolithography process step using a second photomask may be utilized for forming a gate electrode, a gate line, a gate insulating layer, a channel layer and/or a gate line connecting pad, and so forth.