Adaptive Arc Detection Threshold in Plasma Power Supplies

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Solution Overview

Problem

Existing methods for detecting arcs in plasma processes are not reliable due to varying impedance, leading to false detections and inefficient arc detection, especially when using fixed threshold values in power regulation modes.

Innovation Solution

A method that dynamically adjusts the arc detection threshold value based on modified setpoints for output quantities like voltage, current, or power, using measured values and regulation units like PI regulation, to ensure accurate and rapid arc detection.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a fixed threshold value is used for arc detection, then the detection method is simple, but arc detection reliability is poor due to varying plasma impedance

Engineering Contradiction:
Improvearc detection reliabilityVSAvoidthreshold determination complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent applies dynamics by transforming the static fixed threshold into a dynamic adaptive threshold that automatically adjusts according to real-time plasma impedance conditions. The threshold is continuously updated based on measured voltage and current values, allowing the detection system to adapt to varying plasma conditions without manual intervention, thereby resolving the contradiction between reliability and complexity.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The patent implements feedback by using the measured output voltage and current values to continuously update the arc detection threshold. The control unit receives feedback from the plasma process parameters and adjusts the threshold accordingly, creating a closed-loop system that improves detection reliability while maintaining operational simplicity through automated adaptation.

Inventive Principle:
Principle #23Feedback

2Reliability

If output voltage or current is monitored with a fixed threshold, then the monitoring is straightforward, but false arc detections occur due to impedance variations

Engineering Contradiction:
Improvearc detection accuracyVSAvoidplasma process efficiency
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The patent applies parameter changes by dynamically adjusting the arc detection threshold based on real-time measurements of output voltage and current. Instead of using a fixed parameter, the system modifies the threshold parameter according to actual plasma conditions, thereby eliminating false detections caused by impedance variations while maintaining high detection accuracy and process efficiency.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent implements preliminary action by pre-calculating and storing multiple threshold values that correspond to different plasma impedance conditions. Before arc detection is performed, the system determines the appropriate threshold based on current process parameters, ensuring accurate detection without requiring complex real-time calculations during the detection moment itself.

Inventive Principle:
Principle #10Preliminary action

3Reliability

If the arc detection threshold is adjusted dynamically, then false detections are reduced, but the system complexity increases

Engineering Contradiction:
Improvearc detection reliabilityVSAvoidcontrol system complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent applies self-service by enabling the control unit to automatically determine and adjust the arc detection threshold without external intervention. The system uses its own measured voltage and current data to self-calculate the appropriate threshold, eliminating the need for manual threshold setting or complex external control mechanisms, thereby achieving high reliability with minimal added complexity.

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

The patent implements universality by using the control unit to perform multiple functions: it not only controls the plasma process but also determines the arc detection threshold. This multi-functionality eliminates the need for separate threshold determination mechanisms, reducing overall system complexity while maintaining high detection reliability through integrated adaptive control.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Data Source

PatentEP2905802B1Method of detecting arcs in a plasma process and power supply for supplying an output quantity to a plasma process
Publication Date: 2019.05.22 TRUMPF HUETTINGER SP ZOO
  • EP2905802B1 patent drawingFigure 1~2
  • EP2905802B1 patent drawingFigure 3~4
  • EP2905802B1 patent drawingFigure 5

AI summary

In a Method of detecting arcs in a plasma process which is supplied by a power supply (1) with an output quantity (Uout, Iout, Pout), wherein the output quantity (Uout, Iout, Pout) is compared with an arc detection threshold value (Iarc_thres, Uarc_thres) and an arc is detected if the output quantity (Uout, Iout, Pout) passes the arc detection threshold value (Iarc_thres, Uarc_thres), wherein the arc detection therehold value (Iarc_thres, Uarc_thres) is determined based on at least one set point (Iset, Uset, Pset) for an output quantity.