Adjustable Circumference Electrostatic Chuck for Ion Implantation
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Solution Overview
Problem
Conventional ion implantation systems require significant modifications and incur high costs and productivity losses when handling workpieces of varying diameters, as grippers and electrostatic chucks are typically designed for specific workpiece sizes and ion beam sizes.
Innovation Solution
A system comprising a central electrostatic chuck and multiple peripheral electrostatic chuck members with adjustable positions, along with shields, allows for the clamping and processing of workpieces of different diameters using a single ion beam, enabling flexible handling without the need for extensive system modifications.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If conventional fixed-size electrostatic chucks and grippers are used for a specific workpiece diameter, then the system achieves reliable clamping and processing for that size, but the system requires modifications and incurs losses when handling workpieces of different diameters
Solution Approach 1:
The electrostatic chuck is divided into a central fixed chuck member and multiple adjustable peripheral chuck members. Each peripheral member can be independently positioned to accommodate different workpiece diameters, allowing the system to handle various sizes without complete system modification.
Solution Approach 2:
The peripheral electrostatic chuck members are made adjustable through elevators that can change their radial positions. This dynamic reconfiguration allows the chuck to adapt to different workpiece sizes by extending or retracting peripheral members as needed.
2Productivity
If conventional fixed-size electrostatic chucks are used, then the clamping force is optimized for a specific workpiece size, but productivity is reduced when changing workpiece sizes due to system modifications
Solution Approach 1:
The peripheral electrostatic chuck members can be dynamically adjusted between retracted and extended positions using elevators, allowing rapid reconfiguration for different workpiece sizes without complete system shutdown or modification.
Solution Approach 2:
A single electrostatic chuck system with adjustable peripheral members can handle multiple workpiece diameters (e.g., 200mm, 150mm, and other sizes), replacing the need for multiple dedicated chucks and reducing changeover time between different workpiece sizes.
3Area of stationary object
If the peripheral electrostatic chuck members are extended to accommodate larger workpieces, then the workpiece contact area is increased, but the risk of contamination to the ion beam increases
Solution Approach 1:
When not in use or when accommodating smaller workpieces, the peripheral electrostatic chuck members can be retracted away from the ion beam path, extracting potential contamination sources from the critical processing zone.
Solution Approach 2:
Shields are introduced as intermediary elements to protect the ion beam from potential contamination by peripheral chuck members. These shields can be positioned between the ion beam and the peripheral chuck surfaces when they are extended.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables efficient and cost-effective handling of workpieces with varying diameters within an ion implantation system by allowing the ion beam to be configured for any size of workpiece, reducing the need for frequent system adjustments and minimizing losses in productivity.
Implementation Method 1
electrostatic chuck members with adjustable radial positions... configured to selectively clamp various sized workpieces
Data Source
AI summary
An electrostatic chuck for clamping workpieces having differing diameters is provided. A central electrostatic chuck member associated with a first workpiece and a first peripheral electrostatic chuck member associated with a second workpiece are provided. An elevator translates the first peripheral electrostatic chuck member with respect to central electrostatic chuck member between a retracted position and an extended position. In the retracted position, the first workpiece contacts only the first surface. In the extended position, the second workpiece contacts the first surface and the second surface. A first peripheral shield generally shields the second surface when the first peripheral electrostatic chuck member is in the retracted position. Additional peripheral electrostatic chuck members and peripheral shields can be added to accommodate additional workpiece diameters.


