Adjustable Heat Reflector for Uniform Substrate Heating
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Solution Overview
Problem
Existing substrate processing technologies face challenges in achieving rapid and uniform heating, leading to temperature variations across the substrate during processing, which can result in defects and longer processing times.
Innovation Solution
A substrate processing apparatus with annular radiant heaters and heat reflectors that redirect radiant heat towards the substrate support, using thermally reflective sections and adjustable mechanisms to ensure uniform temperature distribution across the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If radiant heat is generated by lamps fixed outside the quartz wall of the process chamber, then the substrate can be heated, but it takes a relatively long amount of time to heat the substrate to the desired temperature
Solution Approach 1:
A heat reflector is introduced as an intermediary component between the radiant heater and the substrate. The heat reflector reflects radiant heat that would otherwise be lost away from the substrate back toward the substrate support, increasing the efficiency of heat transfer and reducing the time required to heat the substrate to the desired temperature.
Solution Approach 2:
The heat reflector ensures continuous and efficient heat delivery to the substrate by constantly redirecting radiant heat back toward the substrate support. This maintains a continuous heating action, preventing heat loss and ensuring the substrate reaches the desired temperature faster.
2Temperature
If radiant heat is generated by lamps fixed outside the quartz wall, then the substrate can be heated, but the temperature distribution across the substrate is not uniform
Solution Approach 1:
The heat reflector is designed with different reflective sections oriented at different angles to address local heating needs. A first reflective section reflects heat toward the outer peripheral region of the substrate support, while a second reflective section reflects heat toward the central region, ensuring uniform temperature distribution across the entire substrate surface.
Solution Approach 2:
The heat reflector is segmented into multiple reflective sections, each oriented to direct heat to specific regions of the substrate. This segmentation allows for targeted heat distribution to different areas (central and peripheral regions), achieving uniform overall temperature distribution.
3Productivity
If heat reflectors are added to redirect radiant heat back towards the substrate support, then heating efficiency is improved, but the device complexity increases
Solution Approach 1:
The heat reflector serves as a relatively simple intermediary component that efficiently redirects radiant heat without requiring complex mechanisms. By positioning the heat reflector outside the process chamber and using passive reflection, the system achieves improved heating efficiency without significantly increasing device complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables rapid and uniform heating of substrates, reducing processing time and minimizing defects by efficiently directing heat to both peripheral and central regions of the substrate, thereby enhancing productivity and reliability.
Implementation Method 1
heat reflectors disposed outside the process chamber to reflect radiant heat emanating from the heaters away from the substrate support back towards the substrate support
Implementation Method 2
annular radiant heaters respectively disposed above and below the process chamber and oriented generally parallel to the substrate
Data Source
AI summary
A substrate processing apparatus includes a process chamber including upper and lower quartz walls, a substrate support disposed in the process chamber, radiant heaters respectively provided above and below the quartz walls of the chamber, and heat reflectors disposed outside the process chamber for reflecting heat towards the substrate support. Each of the heat reflectors has heating has a first thermally reflective section oriented to reflect the heat towards an outer peripheral region of the substrate support and a second thermally reflective section oriented to reflect the heat towards a central region of the substrate support. Each heat reflector also has a reflection angle adjusting mechanism by which an angle at which the second thermally reflective section reflects heat can be adjusted. The angle is adjusted depending on the temperature distribution across the substrate so that the substrate can be processed uniformly.