Adjustable Resistor for Plating Apparatus Electric Field Control
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Solution Overview
Problem
Existing plating apparatuses face challenges in achieving uniform thickness of plating due to structural limitations in adjusting the size or shape of through holes in the resistor, leading to increased work and cost for resistor procurement and replacement.
Innovation Solution
A resistor for a plating apparatus is designed with a first resistance member and a second resistance member, where the first resistance member has a plurality of first through holes and the second resistance member has a plurality of second through holes, allowing for variable overlap and adjustment of the electric field without removing the resistor from the apparatus.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a resistor with fixed hole size and arrangement is used, then the manufacturing and installation are simple, but the adaptability to different target object specifications is poor
Solution Approach 1:
The resistor is divided into a first resistor and a second resistor, each with through holes at different positions. By selectively combining these segmented resistor parts, the apparatus can adapt to different target object specifications without requiring complete resistor replacement, thus improving adaptability while managing structural complexity.
Solution Approach 2:
The first resistor and second resistor are nested within the same resistor holder, allowing multiple resistor configurations to be stored and selected within a single structural framework. This nesting approach enables adaptability to different specifications while maintaining a relatively simple overall device structure.
2Manufacturing precision
If the resistor hole size is made variable to adjust electric field, then the plating thickness uniformity is improved, but the device complexity increases due to throttle mechanisms
Solution Approach 1:
The resistor configuration is made dynamic by enabling the selective combination of first and second resistors with different through hole arrangements. This dynamic reconfiguration allows adjustment of the electric field to achieve uniform plating thickness without requiring complex throttle mechanisms within each individual resistor.
Solution Approach 2:
The effective hole arrangement and size are changed by selecting different combinations of first and second resistors. This parameter change approach achieves variable electric field adjustment for improved plating uniformity while avoiding the mechanical complexity of in-resistor throttle mechanisms.
3Adaptability or versatility
If resistors are frequently replaced to match different specifications, then the adaptability is maintained, but the operational time and cost increase
Solution Approach 1:
The resistor holder is designed to accommodate multiple resistor types (first and second resistors) with different through hole specifications. This universal holder design allows a single apparatus to handle multiple target object specifications without frequent resistor replacements, thereby improving productivity while maintaining adaptability.
Solution Approach 2:
Multiple resistor types with different specifications are pre-prepared and stored in the resistor holder before operation. This preliminary preparation allows rapid selection and switching between different resistor configurations without requiring frequent procurement and replacement operations, reducing operational time and cost.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design enhances the uniformity of the plating thickness on the target object by allowing for flexible adjustment of the electric field through the resistor's through holes, reducing the need for frequent resistor replacements and minimizing operational costs.
Implementation Method 1
a resistor for a plating apparatus, for adjusting an electric field, the resistor being disposed between an anode and a holder holding a target object to be plated
Data Source
AI summary
A resistor and the like capable of enhancing uniformity of a plating film formed on a substrate are provided. A resistor for a plating apparatus, for adjusting an electric field, the resistor being disposed between an anode and a holder holding a target object to be plated in the plating apparatus, is provided. The resistor for the plating apparatus includes a first resistance member having a first surface and including a plurality of first through holes formed open on the first surface, and a second resistance member having a second surface and including a plurality of second through holes formed open on the second surface, the first resistance member and the second resistance member are arranged with the first surface and the second surface facing each other, and a size of overlap between the plurality of first through holes and the plurality of second through holes is variable.