Aerosol Deposition Vortex Detection and Control

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Solution Overview

Problem

Existing film formation techniques using aerosols often result in non-uniform film thickness due to the generation of vortices in air flows, leading to inconsistent deposition of particles.

Innovation Solution

A processing system that includes a chamber, a supplier, a detector, and a controller, which detects the generation of vortices in the air flow and controls the supply of particles to maintain a steady-state air flow, ensuring uniform film thickness.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the supply amount or flow velocity of the aerosol is increased to improve film formation speed, then productivity is improved, but a vortex is generated in the air flow causing non-uniform film thickness

Engineering Contradiction:
Improvefilm formation speedVSAvoidfilm thickness uniformity
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The system uses a detector to continuously monitor the air flow state and provides feedback to the controller. When a vortex is detected, the controller adjusts the aerosol supply to eliminate the vortex, ensuring uniform film thickness while maintaining high productivity

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The system dynamically adjusts the aerosol supply amount and flow velocity based on real-time detection of air flow conditions. The controller modifies supply parameters during operation to prevent vortex formation while maintaining optimal film formation speed

Inventive Principle:
Principle #15Dynamics

2Productivity

If the aerosol concentration is increased to improve deposition rate, then productivity is improved, but vortex generation causes non-uniform particle deposition

Engineering Contradiction:
Improvedeposition rateVSAvoiddeposition uniformity
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The detector monitors air flow conditions in real-time and provides feedback to the controller. When vortex conditions are detected, the controller adjusts aerosol concentration to maintain uniform particle deposition while preserving high deposition rates

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The system changes aerosol concentration parameters dynamically based on detected air flow conditions. The controller modifies concentration levels to prevent vortex-induced non-uniformity while maintaining optimal deposition performance

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The system achieves uniform film thickness by interrupting particle deposition when a vortex is detected and restarting when the air flow returns to a steady state, thereby maintaining consistent film formation across the substrate.

Implementation Method 1

The detector is configured to detect a state of air flow in a vicinity of the processing object

Methodology Applied
Scientific EffectAir flow detection:

Implementation Method 2

supplying a plurality of particles and a gas to the processing object

Methodology Applied
Scientific EffectAerosol deposition: Deposition (physical)

Implementation Method 3

form a film by generating an aerosol, supplying the generated aerosol toward a processing object, and depositing a plurality of particles included in the aerosol on a surface of the processing object

Methodology Applied
Scientific EffectFilm formation: Thin Films

Data Source

PatentUS12208405B2Processing system, processing method, and storage medium
Publication Date: 2025.01.28 KK TOSHIBA
  • US12208405B2 patent drawing
  • US12208405B2 patent drawing
  • US12208405B2 patent drawing

AI summary

According to one embodiment, a processing system includes a chamber, a supplier, a detector, and a controller. The chamber is configured to store a processing object inside. The supplier is configured to supply a plurality of particles and a gas inside the chamber. The detector is configured to detect a state of air flow in a vicinity of the processing object. The controller is configured to control the supplier based on a detection value from the detector. The controller determines generation of a vortex based on data regarding a steady state of the air flow and the detection value from the detector, and controls the supplier to stop supply of the plurality of particles when the generation of the vortex is determined.