Low-Oxygen Ag Alloy Sputtering Target for Arc-Stable Coatings
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing silver-based sputtering targets face challenges in achieving homogeneous adhesion properties, uniform layer thickness, and avoiding arcing during the sputtering process, particularly due to the difficulty in achieving low oxygen content and homogeneous distribution of alloying elements like Mg, Al, Si, Ca, Sr, Sc, Y, rare earth metals, and Ge.
Innovation Solution
A sputtering target comprising an AgX alloy with low oxygen content (less than 50 ppm-wt.) and a homogeneous distribution of alloying elements (0.06 to 0.50 at.-%), achieved through a direct melting process under vacuum or inert gas conditions, ensuring the alloying elements remain predominantly in their metallic state.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional silver-based alloys are used in sputtering targets, then good adhesion and corrosion resistance are achieved, but arcing occurs during the sputtering process and layer uniformity is compromised
Solution Approach 1:
The patent changes the chemical composition parameters by introducing specific alloying elements (Ti, Al, Si, B) in precisely controlled low concentrations (0.01-1 at.%), and controls the physical parameter of oxygen content below 50 ppm-wt. These parameter changes modify the material properties to reduce arcing susceptibility while maintaining adhesion
Solution Approach 2:
The patent creates a composite alloy system combining Ag with multiple alloying elements (Ti, Al, Si, B) in specific proportions. This composite material approach leverages the synergistic effects of different elements: Ti and Al for adhesion enhancement, Si and B for arc suppression, achieving both good adhesion and reduced arcing simultaneously
2Stability of the object's composition
If alloying elements are added to improve adhesion, then layer stability is enhanced, but homogeneous distribution of alloying elements becomes difficult to achieve
Solution Approach 1:
The patent optimizes the concentration parameters of alloying elements to very low levels (0.01-1 at.%), which facilitates homogeneous distribution. The low concentration reduces segregation tendencies during solidification and sputtering, enabling uniform layer formation while maintaining the stabilizing effect on adhesion properties
Solution Approach 2:
The patent achieves uniform local distribution of alloying elements throughout the silver matrix through controlled melting and casting processes. The homogeneous local composition ensures consistent sputtering behavior and uniform layer properties across the entire target surface
3Reliability
If oxygen content is reduced to prevent arcing, then sputtering stability is improved, but achieving low oxygen content becomes increasingly difficult
Solution Approach 1:
The patent employs inert atmosphere processing (argon or vacuum environment) during melting, casting, and sputtering operations. This inert environment prevents oxygen ingress and oxidation, enabling achievement of low oxygen content (<50 ppm-wt.) and maintaining sputtering stability without excessive manufacturing complexity
Solution Approach 2:
The addition of specific alloying elements (particularly B and Si) creates a composite material system that has inherent oxygen-trapping capability. These elements form stable oxides that preferentially bind oxygen, effectively reducing the oxygen content in the bulk material and at the surface, thereby improving sputtering stability
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution results in stable, uniformly adhered layers with reduced arcing, maintaining high film conductivity and reflectivity, and achieving smooth, homogeneous layers on glass and displays.
Implementation Method 1
silver-based sputtering targets... are often used for the preparation of layers
Implementation Method 2
the selected alloying elements X have good oxygen affinity and thus good adhesion to glass. Accordingly, they form stable layers with good adhesion and corrosion resistance on glass
Data Source
Figure 1~2B
AI summary
The present invention relates to a sputtering target with low oxygen content. The sputtering target is based on silver (Ag) and comprises a low amount of alloying element(s) selected from Mg, Al, Si, Ca, Sr, Sc, Y, rare earth metals, Ti and Ge and combinations thereof. The present invention also relates to a layer produced with said sputtering target and to a process for the production of the sputtering target.