ALD-Coated Plasmonic Nanoparticles for Biocompatible TPAF Imaging

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Solution Overview

Problem

There is a need for non-toxic, high spatial resolution plasmonic nanoparticles for two-photon absorption-induced fluorescence (TPAF) imaging and biological sensing applications, as existing semiconductor quantum dots are cytotoxic and lack the necessary brightness and precision for sub-100 nm dimensions.

Innovation Solution

The development of free-standing plasmonic nanoparticles using vapor phase atomic layer deposition (ALD) to coat semiconductor quantum dots with conformal dielectric and metallic layers, creating nanoparticles with enhanced electric field enhancements and improved biocompatibility.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Illumination intensity

If semiconductor quantum dots are used for TPAF imaging, then brightness and imaging capability are improved, but cytotoxicity increases making them unsuitable for biological applications

Engineering Contradiction:
ImprovebrightnessVSAvoidcytotoxicity
Core Design Contradiction:
Illumination intensityVSObject-affected harmful factors

Solution Approach 1:

The quantum dot structure is segmented into multiple functional layers: a semiconductor core for TPAF emission, a dielectric insulating layer for isolation, and a metallic nanoshell for plasmonic enhancement. This segmentation allows each layer to perform its specific function while mitigating the toxicity of the semiconductor core through physical isolation.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent creates a composite nanoparticle structure combining semiconductor quantum dots with dielectric materials (e.g., silica, titania) and metallic materials (e.g., gold, silver). This composite approach maintains the optical properties of the semiconductor while adding biocompatibility and plasmonic enhancement from the other materials.

Inventive Principle:
Principle #40Composite materials

2Measurement precision

If nanoparticle size is reduced to sub-100 nm dimensions for high spatial resolution, then imaging precision is improved, but brightness and signal intensity decrease

Engineering Contradiction:
Improvespatial resolutionVSAvoidbrightness
Core Design Contradiction:
Measurement precisionVSIllumination intensity

Solution Approach 1:

The patent optimizes multiple parameters including the size of the semiconductor core, thickness of the dielectric layer, and thickness of the metallic nanoshell to maximize TPAF signal intensity at sub-100 nm dimensions while maintaining high spatial resolution for cellular imaging.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent employs spherical quantum dot cores with concentric spherical dielectric and metallic layers. This spherical geometry optimizes the plasmonic field enhancement and ensures uniform optical properties in all directions, maximizing brightness at small dimensions.

Inventive Principle:
Principle #14Spheroidality (Curvature)

3Object-affected harmful factors

If conformal coating layers are added to quantum dots to reduce toxicity, then biocompatibility is improved, but structural complexity and manufacturing difficulty increase

Engineering Contradiction:
ImprovetoxicityVSAvoidstructural complexity
Core Design Contradiction:
Object-affected harmful factorsVSDevice complexity

Solution Approach 1:

The patent uses thin conformal dielectric films (e.g., silica, titania) deposited by atomic layer deposition (ALD) to isolate the semiconductor core. These thin films provide effective toxicity barrier and plasmonic coupling while adding minimal structural complexity and maintaining nanoparticle compactness.

Inventive Principle:
Principle #30Flexible shells and thin films

Solution Approach 2:

The dielectric insulating layer acts as an intermediary between the semiconductor quantum dot core and the metallic nanoshell. This intermediate layer prevents direct contact between toxic semiconductor materials and biological environments while enabling controlled plasmonic field enhancement.

Inventive Principle:
Principle #24Intermediary (Mediator)

4Manufacturing precision

If vapor phase ALD is used to deposit conformal layers, then coating uniformity is improved, but process time and manufacturing complexity increase

Engineering Contradiction:
Improvecoating uniformityVSAvoidprocess time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The patent employs continuous vapor phase atomic layer deposition (ALD) processes to deposit dielectric and metallic layers. This continuous deposition method ensures uniform conformal coating throughout the nanoparticle population while optimizing process throughput by maintaining continuous operation without interruption.

Inventive Principle:
Principle #20Continuity of useful action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The approach enables the creation of nanoparticles with high electric field enhancements and improved biocompatibility, suitable for precise TPAF imaging and sensing applications, providing enhanced spatial resolution and reduced toxicity for biological use.

Implementation Method 1

At least one layer chosen from i) the conformal layers of dielectric material and ii) the conformal metallic nanoshell is deposited using a vapor phase atomic layer deposition (ALD) process

Methodology Applied
Scientific EffectAtomic layer deposition (ALD): Chemical Vapour Deposition

Implementation Method 2

plasmonic nanoparticles, methods of making plasmonic nanoparticles and sensors made therefrom

Methodology Applied
Scientific EffectPlasmonic resonance: Resonance

Data Source

PatentUS11275089B2Plasmonic nanoparticles, methods of making plasmonic nanoparticles and sensors made therefrom
Publication Date: 2022.03.15 UNM RAINFOREST INNOVATIONS
  • US11275089B2 patent drawing
  • US11275089B2 patent drawing
  • US11275089B2 patent drawing

AI summary

A method of making free-standing ALD-coated plasmonic nanoparticles. The method comprises providing a plurality of semiconductor quantum dots. One or more conformal layers of dielectric material are deposited over the quantum dots to form dielectric-coated quantum dots. A conformal metallic nanoshell is deposited over the dielectric-coated quantum dots to form plasmonic nanoparticles. At least one layer chosen from i) the conformal layers of dielectric material and ii) the conformal metallic nanoshell is deposited using a vapor phase atomic layer deposition (ALD) process. Plasmonic nanoparticles and systems employing the nanoparticles are also disclosed.