Alignment Marks in Organic Light Emitting Displays

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Solution Overview

Problem

The conventional manufacturing process of organic light emitting displays requires multiple masks for forming alignment marks, leading to a complex process and reduced production yield due to potential misalignment issues.

Innovation Solution

The process involves forming alignment marks during the SGS crystallization process for producing thin film transistors, using polycrystalline silicon with no or minimal grain boundaries, which allows for the integration of alignment marks and transistors on the same plane, reducing the need for separate masks and improving precision.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If separate masks are used for forming alignment marks in each manufacturing operation, then position control can be achieved, but the manufacturing process becomes more complicated and production yield is reduced

Engineering Contradiction:
Improveposition controlVSAvoidmanufacturing process complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The invention merges the formation of alignment marks with the formation of thin film transistors by using the same mask pattern during the SGS crystallization process. This integration eliminates the need for separate alignment mark formation steps and masks, thereby simplifying the manufacturing process while maintaining position control precision.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The mask used for forming thin film transistors serves a dual function: it creates both the transistor structures and the alignment marks simultaneously. This multi-functionality approach reduces the total number of masks required and streamlines the manufacturing process without compromising positioning accuracy.

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Manufacturing precision

If separate masks are used for forming alignment marks, then position control is possible, but additional masks are required increasing process steps

Engineering Contradiction:
Improvealignment precisionVSAvoidproduction yield
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The invention combines alignment mark formation with thin film transistor fabrication into a single process step using the SGS crystallization method. This merger eliminates additional process steps and masks, thereby improving production yield while maintaining alignment precision through the integrated pattern formation.

Inventive Principle:
Principle #5Merging (Combining)

3Manufacturing precision

If multiple separate operations are performed for forming alignment marks, then position control can be achieved, but the process becomes more time-consuming

Engineering Contradiction:
Improveposition controlVSAvoidmanufacturing time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The invention performs alignment mark formation preliminarily during the thin film transistor fabrication process itself, rather than as a separate subsequent step. By incorporating alignment mark creation into the SGS crystallization process, the method eliminates time-consuming separate operations while ensuring position control is established early in manufacturing.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach simplifies the manufacturing process, enhances production yield by eliminating the need for additional masks and misalignment errors, and ensures high-quality thin film transistors and organic light emitting elements.

Implementation Method 1

crystallizing to form a polycrystalline silicon

Methodology Applied
Scientific EffectCrystallization: Crystallisation

Data Source

PatentUS9496321B2Organic light emitting display and method of manufacturing the same
Publication Date: 2016.11.15 SAMSUNG DISPLAY CO LTD
  • US9496321B2 patent drawing
  • US9496321B2 patent drawing
  • US9496321B2 patent drawing

AI summary

An organic light emitting display and a method of manufacturing the same that reduces the number of the masks needed and improves production yield by forming alignment marks during an SGS crystallization process for producing a thin film transistor. The organic light emitting display includes a substrate having a display region and a non-display region, at least one pixel region formed of a thin film transistor and an organic light emitting element electrically coupled to each other in the display region of the substrate, and at least one alignment mark formed in a non-display region of the substrate by the SGS crystallization process.