Inductively Coupled Antenna Lid Gap-Free Attachment
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional plasma treatment apparatuses face contamination issues due to plasma generation between antenna conductors and lids, leading to discharge and contamination within the vacuum chamber.
Innovation Solution
The plasma treatment apparatus features an inductively coupling antenna unit with antenna conductors attached to a lid without gaps, using a reciprocating circuit and a thin, insulating lid to prevent discharge and contamination, while reducing the size and thickness of the lid for mechanical strength and cost efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If antenna conductors are attached to the lid with gaps, then the attachment process is simpler and more cost-effective, but discharge occurs in the gaps causing plasma generation and contamination inside the vacuum chamber
Solution Approach 1:
An insulating lid is introduced as an intermediary component between the antenna conductors and the vacuum chamber environment. The lid provides both electrical insulation to prevent discharge and physical containment to prevent contamination, while the antenna conductors are attached to the lid without gaps in the insulating material itself.
Solution Approach 2:
A thin insulating lid is used to cover the antenna conductors, providing contamination prevention and discharge prevention through its insulating properties. The thin film structure maintains electrical isolation while allowing the antenna unit to be compact and cost-effective.
2Reliability
If a thick lid is used to prevent discharge and contamination, then reliability is improved, but the size and cost of the apparatus increase
Solution Approach 1:
A thin insulating lid is used instead of a thick lid, achieving reliable discharge prevention and contamination containment through the insulating material's electrical properties rather than relying on thickness alone. This reduces the overall size and complexity of the antenna unit.
Solution Approach 2:
The insulating properties of the lid material are optimized to provide sufficient electrical insulation and contamination prevention with minimal thickness. By changing the material parameters (insulating properties) rather than increasing geometric parameters (thickness), reliability is improved without increasing device complexity.
3Ease of manufacture
If conventional antenna units are used with gaps between conductors and lid, then manufacturing is easier, but plasma generation causes contamination and operational issues
Solution Approach 1:
The insulating lid serves as a mediator that is attached to the vacuum chamber wall, with antenna conductors then attached to the lid. This intermediary structure prevents direct contact between conductors and the chamber environment, eliminating discharge and contamination issues while maintaining manufacturing simplicity.
Solution Approach 2:
A thin insulating lid is used to cover the antenna conductors, providing a simple yet effective barrier that prevents contamination and discharge. The thin film approach maintains ease of manufacture while ensuring reliable operation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively prevents plasma generation between the antenna and lid, reduces contamination, and allows for the use of elongated antenna units with reduced impedance, enhancing the apparatus's operational efficiency and cost-effectiveness.
Implementation Method 1
applies a high frequency current to an inductively coupling antenna unit disposed in a vacuum chamber, thereby, generating plasma in the vacuum chamber
Implementation Method 2
a lid that covers an opening formed in a wall surface of the vacuum chamber... one or a plurality of antenna conductors is attached to the lid without a gap in which discharge occurs
Data Source
AI summary
A plasma treatment apparatus is provided to suppress plasma from being generated between an antenna conductor and a lid to prevent contamination inside a vacuum chamber and to put an elongated antenna unit to practical use. The plasma treatment apparatus includes a vacuum chamber that accommodates a treatment target; an inductively coupling antenna unit that generates plasma in the vacuum chamber; and a high frequency power source that supplies a high frequency power to the inductively coupling antenna unit. The inductively coupling antenna unit has one or a plurality of antenna conductors and a lid that covers an opening formed in a wall surface of the vacuum chamber, and the one or plurality of antenna conductors are attached to the lid without a gap where discharge may occur.


