Photosensitive Resin Composition with Anthraquinone Dye for Fine Patterns
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Solution Overview
Problem
Existing photosensitive resin compositions used for optical devices with hollow structures suffer from carbon black precipitation, aggregate formation in cured films, and inadequate miniaturization capabilities, necessitating improved light-shielding and pattern formation.
Innovation Solution
A photosensitive resin composition comprising a silicone skeleton-containing polymer, an anthraquinone-based dye, and a photoacid generator, which provides a shielding function, enhances dispersion stability, reduces film aggregates, and enables fine pattern formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If carbon black is used as a light-shielding agent in photosensitive resin composition, then light-shielding function is achieved, but carbon black precipitates and aggregates remain in the cured film
Solution Approach 1:
The patent extracts carbon black from the photosensitive resin composition and replaces it with organic dyes (anthraquinone-based dye and/or azo-based dye). This removal of carbon black eliminates the precipitation and aggregation problems while maintaining the light-shielding function through the alternative dye components.
Solution Approach 2:
The patent changes the chemical composition parameters by substituting inorganic carbon black with organic dye molecules. This parameter change from inorganic particulate to organic molecular structure improves dispersion stability and prevents aggregate formation while achieving the required light-shielding performance.
2Object-affected harmful factors
If conventional photosensitive resin composition is used, then basic light-shielding is achieved, but miniaturization through pattern formation is limited
Solution Approach 1:
The patent employs multiple dye components (anthraquinone-based dye and azo-based dye) with different absorption characteristics to achieve uniform light-shielding across varying pattern sizes. This local quality adjustment through multi-component dye system enables effective miniaturization while maintaining light-shielding performance.
Solution Approach 2:
The patent creates a composite light-shielding system using multiple dye components (anthraquinone-based dye and azo-based dye) combined with specific polymer matrices. This composite approach provides superior light-shielding efficiency at reduced thickness, enabling miniaturization while maintaining functional performance.
3Object-affected harmful factors
If carbon black is used for light-shielding, then shielding function is provided, but dispersion stability in varnish deteriorates
Solution Approach 1:
The patent removes carbon black from the composition and replaces it with soluble organic dyes that exhibit excellent dispersion stability in the varnish medium. This extraction of the problematic inorganic particulate and substitution with compatible organic molecules resolves the dispersion stability issue.
Solution Approach 2:
The patent changes the physical state parameter of the light-shielding agent from insoluble particulate (carbon black) to soluble molecular form (organic dyes). This parameter change from particulate suspension to molecular dissolution dramatically improves dispersion stability while maintaining light-shielding function.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves a photosensitive resin film with improved adhesiveness, crack resistance, and heat resistance, allowing for precise pattern formation and reduced sensitivity changes, while effectively blocking leakage light.
Implementation Method 1
a photoacid generator (C)
Implementation Method 2
an anthraquinone-based dye (B)... capable of providing a photosensitive resin film that has a shielding function... effectively blocking leakage light
Implementation Method 3
a silicone skeleton-containing polymer (A)... repeating units represented by the following formulae (a1) to (a4) and (b1) to (b4)
Data Source
AI summary
The present invention is a photosensitive resin composition including a silicone skeleton-containing polymer (A), an anthraquinone-based dye (B), and a photoacid generator (C). The inventive photosensitive resin composition can provide: a photosensitive resin composition which can provide a photosensitive resin film that has a shielding function, has dispersion stability in varnish, can reduce aggregates in a film, and can form a fine pattern; a photosensitive resin film; a photosensitive dry film; and a pattern forming process by using the compositions.