Anti-Reflection Film Composition for Resist Patterning

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Solution Overview

Problem

Conventional methods for forming anti-reflection films on resist films face challenges such as mask alignment difficulties due to light attenuation, environmental and health risks associated with fluorochemical surfactants like C8F17SO3H (PFOS), and the generation of deposits that affect resist pattern formation.

Innovation Solution

A composition comprising specific fluorochemical surfactants and water-soluble film forming components, which do not include PFOS, is used to form an anti-reflection film on a resist film, preventing deposit generation and ensuring easy handling without environmental or health hazards.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If an anti-reflection film is formed on a substrate before forming a resist film, then the stationary wave effect is reduced, but mask alignment becomes difficult due to light attenuation by the anti-reflection film

Engineering Contradiction:

Improvedimensional accuracy of resist patternVSAvoidmask alignment

Core Design Contradiction:

Manufacturing precisionVSEase of operation

Solution Approach 1:

Instead of forming the anti-reflection film on the substrate before the resist film, the patent inverts the sequence by forming the anti-reflection film on the resist film after the resist film is already formed on the substrate. This inversion resolves the mask alignment problem while maintaining the anti-reflection effect.

Inventive Principle:

Principle #13The other way round (Inversion)

Solution Approach 2:

The resist film is formed in advance on the substrate before the anti-reflection film is applied. This preliminary action allows the mask alignment to be performed on the resist film without interference from the anti-reflection film, while the anti-reflection film still provides its function during exposure.

Inventive Principle:

Principle #10Preliminary action

2Reliability

If conventional fluorochemical surfactants like PFOS are used in anti-reflection film composition, then film formation is improved, but environmental and health risks increase

Engineering Contradiction:

Improveanti-reflection film formationVSAvoidenvironmental and health risks

Core Design Contradiction:

ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The patent changes the chemical composition parameters by replacing conventional fluorochemical surfactants (like PFOS) with alternative surfactants that have similar film-forming properties but lower environmental and health risks. This maintains the anti-reflection film formation quality while eliminating the harmful effects.

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The patent employs surfactant alternatives that can be easily disposed of or degraded without causing environmental harm, replacing persistent and toxic conventional surfactants. This allows for safe handling and disposal while maintaining functional performance.

Inventive Principle:

Principle #27Cheap short-living objects (Disposable)

3Ease of operation

If anti-reflection film is formed on resist film, then handling is easier and deposits are prevented, but the number of operation steps increases

Engineering Contradiction:

ImprovehandlingVSAvoidnumber of operation steps

Core Design Contradiction:

Ease of operationVSLoss of time

Solution Approach 1:

The patent combines the anti-reflection film formation step with the existing resist film processing workflow. By forming the anti-reflection film on the already-formed resist film, the process merges multiple functions into a unified sequence, reducing the overall number of discrete operation steps while maintaining ease of handling.

Inventive Principle:

Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution allows for accurate mask alignment, prevents deposit formation, and ensures safe handling, thereby improving the dimensional accuracy and patterning of resist films without adverse environmental or health effects.

Implementation Method 1

the fluorochemical surfactant is at least one selected from compounds represented by the following general formulae (1) to (4)

Methodology Applied

Scientific EffectSurfactant: Surfactant

Implementation Method 2

a water soluble film forming component which includes a water soluble resin having at least a constituent unit represented by the following general formula (5)

Methodology Applied

Scientific EffectEvaporation: Evaporation

Data Source

PatentUS8158328B2Composition for formation of anti-reflection film, and method for formation of resist pattern using the same

Publication Date: 2012.04.17 TOKYO OHKA KOGYO CO LTD

AI summary

A composition for forming an anti-reflection film on a resist film is provided, which is superior in handling characteristics, and is not accompanied by generation of deposits and the like after forming the film. A composition for forming an anti-reflection film to be provided on a resist film is provided, which includes at least a certain fluorochemical surfactant, and a certain water soluble film forming component. The composition for forming an anti-reflection film can be easily handled, has no adverse effect on health or the environment, and also avoids the generation of deposits and the like even after forming an anti-reflection film.