Aperture Alignment Keys for Electron Beam Precision
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Solution Overview
Problem
Current electron beam apparatuses face challenges in achieving precise alignment and accuracy of aperture sheets, which affects the formation of electron beams for semiconductor manufacturing, leading to suboptimal patterning and yield in high-integration semiconductor devices.
Innovation Solution
The aperture system includes multiple aperture sheets with overlapping alignment keys, where first and second aperture sheets have the same-sized first alignment keys, and a third aperture sheet with larger second alignment keys, allowing for precise alignment and adjustment to improve beam accuracy and intensity measurement, enabling fine adjustments to ensure accurate beam shaping and positioning.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If multiple aperture sheets are used to form electron beams, then beam shaping capability is improved, but alignment precision between aperture sheets deteriorates
Solution Approach 1:
Alignment keys are introduced as intermediary structures between aperture sheets to facilitate precise alignment. These keys protrude from one aperture sheet and fit into corresponding recesses on adjacent sheets, serving as mechanical mediators that ensure accurate positioning without requiring complex alignment procedures
Solution Approach 2:
The aperture system is segmented into multiple discrete aperture sheets rather than using a single monolithic structure. This segmentation allows for flexible beam shaping while the alignment keys ensure that the segmented components maintain precise relative positions, resolving the contradiction between versatility and precision
2Productivity
If aperture sheets are made with through holes for beam passage, then beam transmission is improved, but alignment accuracy deteriorates due to positioning errors
Solution Approach 1:
Alignment keys and recesses are pre-formed on the aperture sheets during manufacturing. This preliminary action ensures that when the sheets are assembled, the through holes are automatically positioned with high accuracy without requiring complex adjustment procedures during system setup or operation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enhances the accuracy and precision of electron beam alignment, leading to improved patterning and yield in semiconductor manufacturing by ensuring optimal beam shaping and positioning, thereby addressing the limitations of existing systems.
Implementation Method 1
a lens unit arranged between the substrate and the electron gun and focusing the electron beam
Implementation Method 2
a first area including at least one through hole allowing an electron beam to pass therethrough
Data Source
AI summary
An aperture system of an electron beam apparatus includes a plurality of apertures each including a first area including at least one through hole allowing an electron beam to pass therethrough and a second area disposed outside the first area and including first and second alignment keys, wherein two apertures, among the plurality of apertures, include the first alignment keys arranged in mutually overlapping positions and having the same size, and an aperture, excluding the two apertures, among the plurality of apertures, includes the second alignment keys arranged to overlap the first alignment keys and having an area larger than an area of the first alignment keys.