Aperture Substrate Beam Size Control
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Solution Overview
Problem
Existing multi-beam writing apparatuses face limitations in adjusting beam sizes due to the number of opening arrays on the aperture substrates, allowing only a few beam sizes to be formed, which restricts the flexibility in switching between high-speed and high-accuracy writing.
Innovation Solution
A set of aperture substrates comprising a first shaping aperture array substrate with elongated openings and a second shaping aperture array substrate with rotated, elongated openings, allowing for independent adjustment of beam sizes by adjusting the relative positions of the substrates, enabling more precise control over beam dimensions and stability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If multiple opening arrays are formed on the aperture substrate to enable beam size adjustment, then the number of beam sizes can be increased, but the device complexity and manufacturing difficulty increase significantly
Solution Approach 1:
The aperture substrate is divided into two separate substrates: a first aperture substrate with a first opening array and a second aperture substrate with a second opening array. Each substrate independently provides opening arrays of different sizes, allowing beam size adjustment without requiring a single complex substrate to contain all opening arrays. This segmentation reduces the manufacturing complexity of each individual substrate while achieving multiple beam sizes.
Solution Approach 2:
Each aperture substrate is designed to serve multiple functions by incorporating opening arrays of different sizes on the same substrate. The first aperture substrate contains both first opening arrays (for first beam sizes) and second opening arrays (for second beam sizes), allowing a single substrate to provide multiple beam size options. This multi-functionality reduces the total number of substrates needed while maintaining versatility.
2Productivity
If the beam current is increased to shorten writing time, then productivity improves, but the beam path changes due to the Coulomb effect and writing accuracy degrades
Solution Approach 1:
The system enables dynamic adjustment of beam current parameters by selecting different beam sizes through the aperture arrays. By changing the beam size parameter, the system can operate at different current levels: larger beam sizes allow higher currents for faster writing, while smaller beam sizes use lower currents for higher precision. This parameter adjustment capability resolves the contradiction between writing speed and accuracy.
3Adaptability or versatility
If a single aperture substrate with multiple opening arrays is used, then beam size adjustment is possible, but the manufacturing precision and alignment accuracy deteriorate
Solution Approach 1:
By segmenting the aperture system into two separate substrates, each substrate can be manufactured with higher precision for its specific opening array pattern. The first substrate specializes in first opening arrays while the second substrate specializes in second opening arrays, allowing optimized manufacturing processes for each type. This segmentation improves alignment accuracy compared to attempting to manufacture all opening arrays on a single substrate.
Solution Approach 2:
A beam path or optical intermediary is used between the two aperture substrates to ensure precise alignment and coordinate the opening arrays. This intermediary element facilitates accurate positioning and matching of the opening arrays from both substrates, maintaining high alignment accuracy while enabling beam size adjustment through the combined system.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration allows for a wider range of beam sizes to be achieved with high accuracy and stability, overcoming the limitations of previous systems by enabling independent adjustment of beam dimensions and maintaining precision even with slight positional deviations.
Implementation Method 1
a first shaping aperture array substrate including a plurality of first openings, the first shaping aperture array substrate being irradiated with a charged particle beam in a region in which the first openings are formed whereby first multiple beams are formed with a part of the charged particle beams having passed respectively through the first openings
Data Source
AI summary
A set of aperture substrates for multiple beams includes a first shaping aperture array substrate including a plurality of first openings, the first shaping aperture array substrate being irradiated with a charged particle beam in a region in which the first openings are formed whereby first multiple beams are formed with a part of the charged particle beams having passed respectively through the first openings, and a second shaping aperture array substrate including a plurality of second openings through which corresponding first multiple beam passes respectively whereby second multiple beams are formed. Each of the second multiple beams is shaped by a pair of opposite sides of the first opening and a pair of opposite sides of the second opening.