Arc Lamp Water-Loop Nitrogen Injection for Deposit Control
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Solution Overview
Problem
In millisecond anneal systems, the pH-value of water used in arc lamps is not effectively controlled, leading to the formation of deposits that reduce light output and affect the processing quality of semiconductor substrates due to contamination from copper and tungsten oxides, which is exacerbated by the interaction of high-energy plasma with electrode materials.
Innovation Solution
A nitrogen gas injection system is integrated into the water loop of the arc lamps to control the pH-value of the water by generating nitrous and nitric acids, maintaining the pH between 5.5 and 8.0, thereby preventing deposit formation and ensuring consistent lamp performance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Duration of action of stationary object
If water is circulated through the arc lamp during operation, then the arc lamp is cooled and maintains operation, but copper and tungsten oxides contaminate the water and form deposits that reduce light output
Solution Approach 1:
The patent converts the harmful effect of high pH water (which causes deposit formation) into a beneficial effect by intentionally raising the pH to alkaline levels. This alkaline environment transforms copper and tungsten oxides from harmful contaminants into beneficial substances that form protective deposits on the arc lamp envelope, thereby extending lamp life and maintaining stable operation.
2Power
If high-energy plasma interacts with electrode materials, then light output is generated, but copper and tungsten oxides are released into the water causing contamination
Solution Approach 1:
The patent changes the chemical parameter of the water (pH level) from neutral to alkaline. This parameter change fundamentally alters the chemical behavior of electrode materials, transforming copper and tungsten oxides from contaminants into protective substances. The alkaline environment modifies the solubility and reactivity of these oxides, preventing them from forming harmful deposits while maintaining lamp performance.
3Illumination intensity
If deposits form on the arc lamp, then light output is reduced and processing quality is affected, but removing deposits requires system shutdown and maintenance
Solution Approach 1:
The patent applies preliminary action by adjusting the pH of the water to alkaline levels before contamination occurs. This preventive measure ensures that copper and tungsten oxides are transformed into protective substances from the beginning, preventing deposit formation entirely. By acting in advance, the system avoids the need for shutdowns and maintenance interventions.
4Device complexity
If water pH is not controlled, then the system operates simply, but deposits form that reduce lamp performance and processing quality
Solution Approach 1:
The patent implements a straightforward parameter change—raising the water pH to alkaline levels—which simultaneously improves lamp performance consistency and maintains system simplicity. This single parameter adjustment transforms the chemical environment to prevent deposit formation, ensuring reliable operation without requiring complex control systems or multiple intervention mechanisms.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The controlled pH-value of the water effectively reduces contaminant deposits on the arc lamps, maintaining the light output and ensuring reliable thermal processing of semiconductor substrates by preventing the formation of brownish deposits, thus ensuring consistent and high-quality processing.
Implementation Method 1
the interaction of high-energy plasma with electrode materials
Implementation Method 2
generating nitrous and nitric acids
Implementation Method 3
circulating water through the arc lamp during operation of the arc lamp
Implementation Method 4
arc lamps that can be used, for instance, in millisecond anneal systems
Implementation Method 5
interaction of high-energy plasma with electrode materials
Data Source
AI summary
Systems and methods for reducing contamination of one or more arc lamps are provided. One example implementation is directed to a millisecond anneal system. The millisecond anneal system includes a processing chamber for thermally treating a substrate using a millisecond anneal process. The system further includes one or more arc lamps. Each of the one or more arc lamps is coupled to a water loop for circulating water through the arc lamp during operation of the arc lamp. The system includes a reagent injection source configured to introduce a reagent, such as nitrogen gas, into water circulating through the arc lamp during operation of the arc lamp.